Compact Modeling of Lightly Doped Nanoscale DG MOSFET Transistor
2014 ◽
Vol 492
◽
pp. 306-310
Keyword(s):
In this paper, a compact modeling of lightly doped nanoscale Double Gate (DG) MOSFET transistor is presented. In the first time, a DG MOSFET transistor with long channel is considered. In this case, by using 1-D Poissons equation and applying the Gauss law at the interface of Silicone/Oxide, the static behavior of the long channel DG MOSFET can be observed by simple relationships between charges-voltages and charges-drain current. In second time, the dynamic behavior of the device is described through the intrinsic trans-capacitances. The present results (obtained using MATLAB) are validated by comparing them with those obtained using commercial software (Silvaco Atlas-TCAD).
2019 ◽
Vol 38
(2)
◽
pp. 815-828
Keyword(s):
2017 ◽
Vol 16
(2)
◽
pp. 347-354
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2018 ◽
Vol 65
(5)
◽
pp. 2024-2032
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2013 ◽
Vol 62
(8)
◽
pp. 1188-1193
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Keyword(s):
2012 ◽
Vol 59
(12)
◽
pp. 3292-3298
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2008 ◽
Vol 23
(4)
◽
pp. 045003
◽
Keyword(s):
2015 ◽
Vol 36
◽
pp. 51-63
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Keyword(s):