Effect of Duty Cycle on Pulse Electrodeposited Tin Seleno Telluride Semiconductor Thin Film
Tin seleno telluride thin film was deposited by pulse electrodeposition onto fluorine doped tin oxide coated glass from aqueous solution containing Sn-EDTA, Na2SeO3 and TeO2. The sample was deposited at a potential of-0.40 V vs Ag/AgCl with various duty cycle between 10% to 90% followed by annealing under nitrogen gas at 250°C for 30 minutes. The crystalline structure, morphology and photoresponse of the thin film was analyzed using X-ray diffraction (XRD), scanning electron microscopy and linear sweep photovoltammetry techniques. The XRD pattern shows polycrystalline cubic structure of SnSe0.4Te0.6 for film deposited at 50% duty cycle. The domain peak at 2θ=28.82o shows a high intensity and a better photoresponse due to the small crystalline size. The tin seleno telluride thin film reflects the loose short rod type aggregates at 10%-50% duty cycle and dendritic structure was formed at deposition of 75% and above. The deposited tin seleno telluride is a p-type semicoductor and the band gap was found to be 1.60 eV with direct transition.