Analysis of SiO2 Thin Film Deposited by Reactive Sputtering
Keyword(s):
X Ray
◽
SiO2 layers were deposited by reactive d.c ion sputtering (using 1keV Ar+ ion gun) from a high purity silicon target in an oxygen ambient. The base pressure in the deposition chamber was 4.7·10-9mbar, and the substrate temperature was held at 550 °C. The argon partial pressure during ion gun operation was 1·10-3mbar. Structural characterization of the films was performed by Rutherford backscattering spectrometry (RBS analysis), electron microprobe analysis, X-ray diffraction (XRD analysis) and Raman spectroscopy. Reactive sputtering proved to be efficient for the deposition of silica at an oxygen partial pressure of 2·10-4mbar and an electrical current on the target of 5.5mA.
2000 ◽
Vol 5
(S1)
◽
pp. 412-424
2012 ◽
Vol 581-582
◽
pp. 570-573
2010 ◽
Vol 97-101
◽
pp. 1091-1096