Growth of Low Resistivity p-Type 4H-SiC Crystals by Sublimation with Using Aluminum and Nitrogen Co-Doping

2016 ◽  
Vol 858 ◽  
pp. 77-80 ◽  
Author(s):  
Kazuma Eto ◽  
Hiromasa Suo ◽  
Tomohisa Kato ◽  
Hajime Okumura

Low resistivity p-type SiC bulk crystals were grown by the sublimation method with using aluminum and nitrogen co-doping. In the sublimation growth of 4H-SiC, to obtain low-resistive p-type crystals are not easy because of the instability of 4H-SiC polytype with highly Al-doping. We have grown < 90 mΩcm p-type 4H-SiC bulk crystals with the co-doping condition. The results of SIMS and Raman spectroscopy show that high concentration of nitrogen co-doping could be effective to the stabilization of 4H polytype with p-type SiC growth.

2014 ◽  
Vol 778-780 ◽  
pp. 47-50 ◽  
Author(s):  
Tomohisa Kato ◽  
Kazuma Eto ◽  
Satoru Takagi ◽  
Tomonori Miura ◽  
Yasushi Urakami ◽  
...  

The nitrogen (N) and aluminum (Al) co-doped growth of n-type 4H-SiC bulk crystals were performed by sublimation method. In the co-doping growth, we achieved the lowest resistivity of 6.9mWcm, and we also confirmed phenomenon of stacking faults suppression in spite of high N concentration more than 8 x 1019cm-3.


2019 ◽  
Vol 167 ◽  
pp. 76-80 ◽  
Author(s):  
Xuejian Xie ◽  
Li Sun ◽  
Xiufang Chen ◽  
Xianglong Yang ◽  
Xiaobo Hu ◽  
...  

2014 ◽  
Vol 778-780 ◽  
pp. 75-78 ◽  
Author(s):  
Takayuki Shirai ◽  
Katsunori Danno ◽  
Akinori Seki ◽  
Hidemitsu Sakamoto ◽  
Takeshi Bessho

P-type 4H-SiC bulk crystals have been grown at a high growth rate of 1.0 mm/h by solution growth using Si-Cr-Al based melt. The crystals grown from solution with an Al content of 10at% show low resistivity of 35 mcm, which is two orders of magnitude lower than commercialwafers (Resistivity: 2500 mcm). The low-resistivity crystals have flat surface and few solvent inclusions. These results indicate that solution growth is a suitable method for fabricating low-resistivity p-type substrates with low cost.


2005 ◽  
Vol 483-485 ◽  
pp. 315-318
Author(s):  
Tomohisa Kato ◽  
Kazutoshi Kojima ◽  
Shin Ichi Nishizawa ◽  
Kazuo Arai

We report defects study in 4H-SiC bulk crystals grown by sublimation method on micropipe filled seed crystals oriented (0001) on-axis. The seed crystals of 1~3 inch in diameter were prepared from the large 4H-SiC bulk crystals. Before the sublimation growth, micropipes of the seed crystals were filled with epilayers grown by micropipe filling technique of CVD method. We confirmed about 95% of micropipes perfectly disappeared in the grown crystal. The mechanism of the micropipe extinction was also defined by defect analysis.


2015 ◽  
Vol 821-823 ◽  
pp. 47-50 ◽  
Author(s):  
Kazuma Eto ◽  
Tomohisa Kato ◽  
Satoru Takagi ◽  
Tomonori Miura ◽  
Yasushi Urakami ◽  
...  

p-type SiC crystals doped with aluminum and nitrogen were grown by the sublimation method. We found that Al and N co-doping is effective for stabilized growth of p-type 4H-SiC polytype. We studied the relationship of polytype of grown crystals and the condition of Al and N feeding during the crystal growth. p-type 4H-SiC withp~1 x 1018cm-3are stably-obtained with this method.


2007 ◽  
Vol 253 (8) ◽  
pp. 3825-3827 ◽  
Author(s):  
Zhang Xiaodan ◽  
Fan Hongbing ◽  
Zhao Ying ◽  
Sun Jian ◽  
Wei Changchun ◽  
...  

2007 ◽  
Vol 556-557 ◽  
pp. 153-156
Author(s):  
Chi Kwon Park ◽  
Gi Sub Lee ◽  
Ju Young Lee ◽  
Myung Ok Kyun ◽  
Won Jae Lee ◽  
...  

A sublimation epitaxial method, referred to as the Closed Space Technique (CST) was adopted to produce thick SiC epitaxial layers for power device applications. In this study, we aimed to systematically investigate surface morphologies and electrical properties of SiC epitaxial layers grown with varying a SiC/Al ratio in a SiC source powder during the sublimation growth using the CST method. It was confirmed that the acceptor concentration of epitaxial layer was continuously decreased with increasing the SiC/Al ratio. The blue light emission was successfully observed on a PN diode structure fabricated with the p-type SiC epitaxial layer. Furthermore, 4H-SiC MESFETs having a micron-gate length were fabricated using a lithography process and their current-voltage performances were characterized.


2016 ◽  
Vol 4 (2) ◽  
pp. 407-415 ◽  
Author(s):  
Nicholas P. Chadwick ◽  
Emily N. K. Glover ◽  
Sanjayan Sathasivam ◽  
Sulaiman N. Basahel ◽  
Shaeel A. Althabaiti ◽  
...  

Combinatorial AACVD has achieved the production of various niobium/nitrogen co-doped TiO2 materials in a single film. The co-doping concentrations have been correlated with functional properties.


RSC Advances ◽  
2021 ◽  
Vol 11 (39) ◽  
pp. 24456-24465
Author(s):  
Rapaka S. C. Bose ◽  
K. Ramesh

Polycrystalline p-type Sb1.5Bi0.5Te3 (SBT) and n-type Bi2Te2.7Se0.3 (BTS) compounds possessing layered crystal structure show anisotropic electronic and thermal transport properties.


1999 ◽  
Vol 607 ◽  
Author(s):  
S. Kato ◽  
T. Horikoshi ◽  
T. Ohkubo ◽  
T. Iida ◽  
Y. Takano

AbstractThe bulk crystal of silicon germanium was grown by vertical Bridgman method with germanium composition, x, varying from 0.6 to 1.0. The temperature dependent variation of the mobility is indicative of alloy scattering dominantly for the bulk wafer. Phosphorus was diffused in as-grown p-type bulk wafer at 850 °C to form pn-junction, and the diffusion coefficient of phosphorus was evaluated as a function of x. The diffusion behavior of phosphorus in silicon germanium is closely correlated with the germanium self-diffusion with changing x. For specimens with lower content x, P concentration profiles indicated “kink and tail” shape, while it was not observed for higher x. For current-voltage characteristics measurement, an ideality factor was obtained.


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