Borosilicate Glass (BSG) as Gate Dielectric for 4H-SiC MOSFETs
2018 ◽
Vol 924
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pp. 502-505
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Keyword(s):
In this work, we investigate the effect of borosilicate glass (BSG) as gate dielectric on dielectric/4H-SiC interface traps and channel mobility in 4H-SiC MOSFETs. The interface trap characterization by C−ψs analysis and I-V characterization show lower fast interface trap density (Dit) as well as significant improvement of channel field-effect mobility on devices with BSG than that on devices with standard NO anneal. In addition, the results indicate interface trap density decreases with increasing B concentration at the interface of BSG/4H-SiC, which in turn, results in higher channel mobility.
2013 ◽
Vol 740-742
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pp. 723-726
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2006 ◽
Vol 527-529
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pp. 1063-1066
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1995 ◽
Vol 38
(7)
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pp. 1395-1400
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2011 ◽
Vol 269
(23)
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pp. 2765-2770
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Keyword(s):
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2015 ◽
Vol 15
(5)
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pp. 497-503
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2014 ◽
Vol 806
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pp. 139-142
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