scholarly journals Influence of Oxygen Flow Rate on the Variation of Surface Roughness of Fused Silica during Plasma Polishing Process

2011 ◽  
Vol 18 ◽  
pp. 107-111 ◽  
Author(s):  
Yuan Tian ◽  
Weiguo Liu ◽  
Lingxia Hang
Keyword(s):  
Surface Roughness ◽  
Flow Rate ◽  
Fused Silica ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Polishing Process

Characterization of Defect Induced Multilayer Graphene

2017 ◽  
Vol 7 (3) ◽  
pp. 1452
Author(s):  
Marriatyi Morsin ◽  
Suhaila Isaak ◽  
Marlia Morsin ◽  
Yusmeeraz Yusof
Keyword(s):  
Surface Roughness ◽  
Flow Rate ◽  
Intensity Ratio ◽  
Oxygen Plasma ◽  
Defect Density ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Multilayer Graphene ◽  
Flow Rates

<p class="Abstract">A study of oxygen plasma on multilayer graphene is done with different flow rates. This is to allow a controlled amount of defect fabricated on the graphene. Results from the study showed that the intensity ratio of defect between D peak and G peak was strongly depended on the amount of oxygen flow rate thus affected the 2D band of the spectra. The inter-defect distance L<sub>D </sub>≥ 15 nm of each sample indicated that low-defect density was fabricated. The surface roughness of the multilayer graphene also increased and reduced the conductivity of the multilayer graphene.</p>

scholarly journals Effect of Oxygen Flow Rate on the Optical, Electrical, and Mechanical Properties of DC Sputtering ITO Thin Films

2018 ◽  
Vol 2018 ◽  
pp. 1-6 ◽  
Author(s):  
Chuen-Lin Tien ◽  
Hong-Yi Lin ◽  
Chih-Kai Chang ◽  
Chien-Jen Tang
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Surface Roughness ◽  
Flow Rate ◽  
Optical Transmittance ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Ito Thin Films ◽  
Effect Of Oxygen

This study presents the effect of oxygen flow rate on the optical, electrical, and mechanical properties of indium tin oxide (ITO) thin films prepared by the DC magnetron sputtering technique. The oxygen flow rate was varied from 10 to 50 sccm. The ITO thin films deposition under different oxygen flow rates exhibits different properties. We used an optical spectrometer to measure the optical transmittance and a four-point probe instrument to determine the resistivity. A home-made Twyman-Green interferometer was used to evaluate residual stress and a microscopic interferometer was used to measure the surface roughness of ITO thin films. The experimental results show that the average optical transmittance is larger than 85% in visible range; the electrical resistivity has a minimum 6.85×10-4 ohm-cm for the oxygen flow of 10 sccm. The residual stress is varied from −0.15 GPa to −0.34 GPa in the range of 10–50 sccm. The root-mean-square (rms) surface roughness is changed from 2.64 nm to 2.74 nm as the oxygen flow rate increases. The results show that the oxygen flow rate has significant influence on the electrical resistivity, residual stress, and surface roughness of the ITO thin film.

Effects of Reaction Conditions on Deposition of Ferrites from Alkaline Metal Hydroxide Gels

1997 ◽  
Vol 495 ◽  
Author(s):  
Karl F. Schoch ◽  
Theodore R. Vasilow
Keyword(s):  
Flow Rate ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
X Ray Diffraction ◽  
Reaction Conditions ◽  
Metal Hydroxides ◽  
X Ray ◽  
Oxidation Reduction ◽  
Oxidation Reduction Potential ◽  
Mg Content

ABSTRACTFormation of ferrites from aqueous solution of metal salts is a well known process involving precipitation of metal hydroxides followed by oxidation of the resulting gel. The purpose of the present work was to determine the effects oxygen flow rate on the progress of the reaction and on the structure and properties of the resulting precipitate. The reaction was carried out at 70°C with pH of 10.5 and oxygen flow rate of 2,4, or 8 standard liters per hour. The progress of the reaction was monitored by following the oxidation-reduction potential of the solution, which changes dramatically after the Fe(II) is consumed. The reaction rate increased with increasing oxygen flow rate. The Mg content of the precipitate was lower than that of the reaction mixture, possibly because of the pH of the reaction mixture. X-ray diffraction and infrared spectroscopy confirmed formation of a ferrite under these conditions.

Novel Liquid Fuel HVOF Torches Fueled with Ethanol: Optimization and Erosion Wear Response of Cr3C2-NiCr Coatings

2021 ◽  
Author(s):  
Shaowu Liu ◽  
Michel Moliere ◽  
Hanlin Liao
Keyword(s):  
Flow Rate ◽  
Feed Rate ◽  
Impact Angle ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Standoff Distance ◽  
Wear Loss ◽  
Erosion Wear ◽  
Powder Feed Rate ◽  
Powder Feed

Abstract In this work; a novel liquid fuel HVOF process fueled with ethanol was used to prepare 75wt%Cr3C2–25wt%NiCr coatings on AISI304 stainless steel substrate. Taguchi method was employed to optimize the spray parameters (ethanol flow rate; oxygen flow rate; powder feed rate and standoff distance) to achieve better erosion resistance at 90° impact angle. The results indicated that ethanol flow rate and oxygen flow rate were identified as the highly contributing parameters on the erosion wear loss. The important sequence of the spray parameter is ethanol flow rate &gt; oxygen flow rate &gt; standoff distance &gt; powder feed rate. The optimal spray parameter (OSP) for minimum erosion wear loss was obtained under ethanol flow rate of 28slph; oxygen flow rate of 420slpm; powder feed rate of 76.7 g/min and standoff distance of 300mm. The phase composition; microstructure; hardness; porosities; and the erosion wear behaviors of the coatings have been studied in detail. Besides; erosion wear testing of the optimized coating was conducted at 30°; 60° and 90° impact angle using air jet erosion testing machine. The SEM images of the erodent samples were taken to analyze the erosion mechanism.

An Influence of Oxygen Flow Rate on Structural, Optical and Tribological Properties of Molybdenum Oxide Thin Films

2021 ◽  
Vol 39 ◽  
pp. 43-53
Author(s):  
Divyeshkumar P. Dave ◽  
Akshay M. Patel ◽  
Kamlesh V. Chauhan ◽  
Sushant K. Rawal
Keyword(s):  
Wear Rate ◽  
Molybdenum Oxide ◽  
Tribological Properties ◽  
Flow Rate ◽  
Gas Flow ◽  
Visible Region ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Oxygen Flow Rate ◽  
Oxygen Flow

The influence of oxygen flow rate is examined on structural, optical and tribological properties of molybdenum oxide films deposited by reactive magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscope (SEM), and contact angle measurement system. The optical properties of the films were measured by UV-Vis-NIR spectrophotometer and transmittance of ∼73% in the visible region of the spectrum was achieved. The band gap increases with increases in oxygen gas flow rate. AFM figure illustrates that the roughness of surface increases as oxygen flow rate increases. As oxygen increases wear rate and COF decreases while at the 18 sccm the lowest wear rate found.

Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering

2022 ◽  
Vol 40 (1) ◽  
pp. 013405
Author(s):  
Nilton Francelosi A. Neto ◽  
Cristiane Stegemann ◽  
Lucas J. Affonço ◽  
Douglas M. G. Leite ◽  
José H. D. da Silva
Keyword(s):  
Cobalt Oxide ◽  
Flow Rate ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow

scholarly journals Relationship between Oxygen Defects and Properties of Scandium Oxide Films Prepared by Ion-Beam Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 517
Author(s):  
Pengfei Kong ◽  
Yunti Pu ◽  
Ping Ma ◽  
Jiliang Zhu
Keyword(s):  
Refractive Index ◽  
Surface Quality ◽  
Flow Rate ◽  
Ion Beam ◽  
Oxygen Flow Rate ◽  
Scandium Oxide ◽  
Oxygen Flow ◽  
Ion Beam Sputtering ◽  
Oxygen Defects ◽  
Beam Sputtering

Scandium oxide (Sc2O3) thin films with different numbers of oxygen defects were prepared by ion-beam sputtering under different oxygen flow rates. The results showed that the oxygen defects heavily affected crystal phases, optical properties, laser-induced damage threshold (LIDT) and surface quality of Sc2O3 films. The thin film under 0 standard-state cubic centimeter per minute (sccm) oxygen flow rate had the largest number of oxygen defects, which resulted in the lowest transmittance, LIDT and the worst surface quality. In addition, the refractive index of 0 sccm Sc2O3 film could not be measured in the same way. When the oxygen flow rate was 15 sccm, the Sc2O3 film possessed the best transmittance, refractive index, LIDT and surface roughness due to the lowest number of oxygen defects. This work elucidated the relationship between oxygen defects and properties of Sc2O3 films. Controlling oxygen flow rate was an important step of limiting the number of oxygen defects, which is of great significance for industrial production.

Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication

2015 ◽  
Vol 73 (1) ◽  
Author(s):  
Jia Wei Low ◽  
Nafarizal Nayan ◽  
Mohd Zainizan Sahdan ◽  
Mohd Khairul Ahmad ◽  
Ali Yeon Md Shakaff ◽  
...  
Keyword(s):  
Thin Film ◽  
Copper Oxide ◽  
Flow Rate ◽  
Langmuir Probe ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Oxide Thin Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Copper Oxide Thin Film

Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir probe was employed to estimate the plasma density, electron temperature and ion flux. In present studies, reactive copper sputtering plasmas were produced at different oxygen flow rate of 0, 4, 8 and 16 sccm. The size of copper target was 3 inches. The dissipation rf power, Ar flow rate and working pressure were fixed at 400 W, 50 sccm and 22.5 mTorr, respectively. Since the substrate bias plays an important role to the thin film formation, the substrate bias voltages of 0, -40, -60 and -100 V were studied. Based on OES results, oxygen emission increased drastically when the oxygen flow rate above 8 sccm. On the other hand, copper and argon emission decreased gradually. In addition, Langmuir probe results showed a different ion flux when substrate bias voltage was applied. Based on these plasma diagnostic results, it has been concluded that the optimized parameter to produce copper oxide thin film are between -40 to -60 V of substrate bias voltage and between 8 to 12 sccm of oxygen flow rate.

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