Microprobe metrology for direct sheet resistance and mobility characterization

Author(s):  
P. F. Nielsen ◽  
D. H. Petersen ◽  
Rong Lin ◽  
A. Jensen ◽  
H. H. Henrichsen ◽  
...  
Keyword(s):  
2002 ◽  
Vol 716 ◽  
Author(s):  
G.Z. Pan ◽  
E.W. Chang ◽  
Y. Rahmat-Samii

AbstractWe comparatively studied the formation of ultra thin Co silicides, Co2Si, CoSi and CoSi2, with/without a Ti-capped and Ti-mediated layer by using rapid thermal annealing in a N2 ambient. Four-point-probe sheet resistance measurements and plan-view electron diffraction were used to characterize the silicides as well as the epitaxial characteristics of CoSi2 with Si. We found that the formation of the Co silicides and their existing duration are strongly influenced by the presence of a Ti-capped and Ti-mediated layer. A Ti-capped layer promotes significantly CoSi formation but suppresses Co2Si, and delays CoSi2, which advantageously increases the silicidation-processing window. A Ti-mediated layer acting as a diffusion barrier to the supply of Co suppresses the formation of both Co2Si and CoSi but energetically favors directly forming CoSi2. Plan-view electron diffraction studies indicated that both a Ti-capped and Ti-mediated layer could be used to form ultra thin epitaxial CoSi2 silicide.


2020 ◽  
Vol 35 (9) ◽  
pp. 908-913
Author(s):  
Wei-xing GONG ◽  
◽  
Tao YU ◽  
Wei-zhi WANG ◽  
Jia-lun ZHANG ◽  
...  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Ji-Young Jeong ◽  
Je-Ryung Lee ◽  
Hyeonjin Park ◽  
Joonkyo Jung ◽  
Doo-Sun Choi ◽  
...  

AbstractMicrowave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than − 10 dB in the frequency band range of 8.0–14.6 GHz.


Materials ◽  
2021 ◽  
Vol 14 (9) ◽  
pp. 2219
Author(s):  
Xiaopeng Li ◽  
Jiayue Zhou ◽  
Dejun Yan ◽  
Yong Peng ◽  
Yong Wang ◽  
...  

In this paper, silver nanowires (AgNWs) with a diameter of 40 nm and a length of 45 μm were dispersed into an ethanol solution to prepare AgNW solutions with concentrations of 1, 2, and 3 mg/mL, respectively. The AgNW solutions were then deposited on a glass substrate using spin-coating at 1000, 2000, and 3000 rpm for 45 s, respectively, to prepare transparent electrodes. The results showed that the distribution of AgNWs on the substrate increased in density with the increase in the AgNW solution concentration and the decrease in spin speed. The effect of concentration on the distribution of AgNWs was greater than that of the spin speed. The transmittance of each electrode was between 84.19% and 88.12% at 550 nm, the average sheet resistance was between 20.09 and 358.11 Ω/sq, the highest figure of merit (FoM) was 104.42, and the lowest haze value was 1.48%. The electrode prepared at 1000 rpm with a concentration of 2 mg/mL and that prepared at 3000 rpm with a concentration of 3 mg/mL were very similar in terms of the average sheet resistance, transmittance at 550 nm, FoM, and haze value; thus, these two electrodes could be considered equivalent. The haze value of the electrode was positively correlated with the spin speed at low concentration, but that relationship became inverse as the concentration rose. For the AgNWs used in this experiment with an aspect ratio of 1125, the concentration of the AgNW solution should reach at least 2 mg/mL to ensure that the FoM of the electrode is greater than 35.


Micromachines ◽  
2020 ◽  
Vol 11 (5) ◽  
pp. 474 ◽  
Author(s):  
Bei Wang ◽  
Manuel Baeuscher ◽  
Xiaodong Hu ◽  
Markus Woehrmann ◽  
Katharina Becker ◽  
...  

A novel capacitive sensor for measuring the water-level and monitoring the water quality has been developed in this work by using an enhanced screen printing technology. A commonly used environment-friendly conductive polymer poly(3,4-ethylenedioxythiophene):poly (styrenesulfonate) (PEDOT:PSS) for conductive sensors has a limited conductivity due to its high sheet resistance. A physical treatment performed during the printing process has reduced the sheet resistance of printed PEDOT:PSS on polyethylenterephthalat (PET) substrate from 264.39 Ω/sq to 23.44 Ω/sq. The adhesion bonding force between printed PEDOT:PSS and the substrate PET is increased by using chemical treatment and tested using a newly designed adhesive peeling force test. Using the economical conductive ink PEDOT:PSS with this new physical treatment, our capacitive sensors are cost-efficient and have a sensitivity of up to 1.25 pF/mm.


2006 ◽  
Vol 498 (1-2) ◽  
pp. 282-285 ◽  
Author(s):  
Yen-Ming Chen ◽  
George C. Tu ◽  
Ying-Lang Wang

2001 ◽  
Vol 15 (17n19) ◽  
pp. 774-777 ◽  
Author(s):  
J. CARDOSO ◽  
O. GOMEZ-DAZA ◽  
L. IXTLILCO ◽  
M. T. S. NAIR ◽  
P. K. NAIR

Copper sulfide thin films of 75 nm and 100 nm thickness were coated on Kapton foils (PI) of 25 nm thickness by floating them on a chemical bath. The foils were annealed at 150°C-400°C in N 2 converting the coating from CuS to Cu 1.8 S . The sheet resistance of the annealed coatings (100 nm) is 10-50 ohms/square which is almost unaltered after immersion in dilute HCl for 30-120 min. The infrared reflectance predicted for the coatings is 67%-77% at a wavelength 2.5 μm, which is nearly what is experimentally observed. The coated PI has a transmittance (25-35%) peak located around 550-600 nm. These thermally stable conductive coatings on PI foils might be used as conductive substrates for optoelectronic device structures.


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