Effect of modification of copper electrode on the space charge accumulation in LDPE

2019 ◽  
Vol 33 (31) ◽  
pp. 1950388 ◽  
Author(s):  
Yuan Li ◽  
Shiyu Yan ◽  
Leran Chen ◽  
Zhaoliang Xing ◽  
Chuncheng Hao

In this paper, titanium and tungsten films were coated on copper sheets, respectively, by plasma chemical vapor deposition (PCVD). The copper sheets before and after coating were, respectively, injected as charge into the low-density polyethylene (LDPE), the space charge accumulation in LDPE was tested by the thermally stimulated current (TSC), and the trap level of the dielectric was calculated by the TSC curve. The results show that the work function improves after the modification of the electrode material, the space charge accumulation in LDPE decreases, and the trap level of the polymer reduces. Because of the oxygen vacancies, the titanium coating electrode has significant suppression on the charge injection in LDPE under 30 kV/mm and the tungsten shows excellent inhibition under 70 kV/mm.

Shinku ◽  
1997 ◽  
Vol 40 (8) ◽  
pp. 660-663
Author(s):  
Hideo OKAYAMA ◽  
Tsukasa KUBO ◽  
Noritaka MOCHIZUKI ◽  
Akiyoshi NAGATA ◽  
Hiromu ISA

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.


Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O


Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 888
Author(s):  
Pengfei Zhang ◽  
Weidong Chen ◽  
Longhui Zhang ◽  
Shi He ◽  
Hongxing Wang ◽  
...  

In this paper, we successfully synthesized homoepitaxial diamond with high quality and atomically flat surface by microwave plasma chemical vapor deposition. The sample presents a growth rate of 3 μm/h, the lowest RMS of 0.573 nm, and the narrowest XRD FWHM of 31.32 arcsec. An effect analysis was also applied to discuss the influence of methane concentration on the diamond substrates.


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