In Situ Growth Studies of Artificial Layered (BA,SR,CA)CUO2 on Quasi-Ideal SrTiO3 Substrates by High Pressure Rheed

1999 ◽  
Vol 569 ◽  
Author(s):  
Gertjan Koster ◽  
Guus J.H.M. Rijnders ◽  
Dave H.A. Blank ◽  
Horst Rogalla
Keyword(s):  
High Pressure ◽  
Thin Film Deposition ◽  
High Energy ◽  
Layer Growth ◽  
Film Deposition ◽  
Perovskite Oxide ◽  
Ex Situ ◽  
Layer By Layer ◽  
Substrate Surfaces

ABSTRACTThe layered structure of oxides, like the high-T, cuprates, has been topic of research for some years now. The possibility to control thin film deposition on an atomic level has made fabrication of artificial structures and junctions accessible by depositing atomic layers or molecular blocks sequentially. Perfectly smooth substrate surfaces are hereby a prerequisite.Using Pulsed Laser Deposition (PLD), different perovskite oxide materials have been deposited on SrTiO3 substrates. With in situ high pressure Reflection High Energy Electron Diffraction we studied growth at different temperatures and oxygen pressures. Ex situ XRD and AFM have been used to study the morphology after deposition.Here we applied a new approach in obtaining layer-by-layer growth implied by the way of depositing the material, almost regardless of the deposition conditions. By alternating intervals of high supersaturation depositing one unit cell layer with intervals of lower supersaturation, one is able to force a layer-by-layer growth mode, which is in principle only feasible with PLD. We applied this technique to fabricate the layered infinite structure (Ba,Sr,Ca)CuO2 with artificial layered modulation, which have been characterized by XRD and AFM.

Atomic Layer and Unit-Cell Layer Growth of (Ca,Sr)CuO2 and Bi2Sr2Can-1CunO2n+4 Thin Films by Laser Molecular Bean Epitaxy

1991 ◽  
Vol 222 ◽  
Author(s):  
Masaki Kanai ◽  
Tomoji Kawai ◽  
Takuya Matsumoto ◽  
Shichio Kawai
Keyword(s):  
Thin Films ◽  
Diffraction Pattern ◽  
Cell Layer ◽  
Atomic Layer ◽  
High Energy ◽  
Layer Growth ◽  
Unit Cell ◽  
Layer By Layer ◽  
Diffraction Intensity

ABSTRACTThin films of (Ca,Sr)CuO2 and Bi2Sr2Can-1CunO2n+4 are formed by laser molecular beam epitaxy with in-situ reflection high energy electron diffraction observation. The diffraction pattern shows that these materials are formed with layer-by-layer growth. The change of the diffraction intensity as well as the analysis of the total diffraction pattern makes It possible to control the grown of the atomic layer or the unit-cell layer.

scholarly journals In Situ Initial Growth Studies of SrTiO3 on SrTiO3 by Time Resolved High Pressure RHEED

1998 ◽  
Vol 526 ◽  
Author(s):  
Gertjan Koster ◽  
Guus J.H.M. Rijnders ◽  
Dave H.A. Blank ◽  
Horst Rogalla
Keyword(s):  
High Pressure ◽  
Pulsed Laser ◽  
High Energy ◽  
Initial Growth ◽  
Time Resolved ◽  
Force Microscopy ◽  
Atomic Force ◽  
Different Temperatures ◽  
Substrate Surfaces

AbstractThe initial growth of pulsed laser deposited SrTiO3 on SrTiO3 has been studied using high pressure Reflection High Energy Electron Diffraction (RHEED) and Atomic Force Microscopy (AFM). For this, we developed a Pulsed Laser Deposition (PLD)-RHEED system, with the possibility to study the growth and to monitor the growth rates, in situ, at typical PLD pressures (10-50 Pa). Using perfect single crystal SrTiO3 substrate surfaces, we observe true 2D intensity oscillations at different temperatures. Simultaneously, information on the diffusion of the deposited material on the surface could be extracted from the relaxation of the intensity after each laser pulse. The characteristic times depend on pressure and temperature as well as the 2D coverage during growth.

Atomic Layer Growth of SiO2 on Si(100) Using the Sequential Deposition of SiCl4 and H2O

1993 ◽  
Vol 334 ◽  
Author(s):  
Ofer Sneh ◽  
Michael L. Wise ◽  
Lynne A. Okada ◽  
Andrew W. Ott ◽  
Steven M. George
Keyword(s):  
High Pressure ◽  
Film Growth ◽  
Atomic Layer ◽  
Reaction Scheme ◽  
Layer Growth ◽  
Film Deposition ◽  
Layer By Layer ◽  
High Pressure Cell ◽  
Experimental Apparatus ◽  
Binary Reaction

AbstractThis study explored the surface chemistry and the promise of the binary reaction scheme:(A) Si-OH+SiCl4 → Si-Cl + HCl(B) Si-Cl + H2O → Si-OH + HClfor controlled SiO2 film deposition. In this binary ABAB… sequence, each surface reaction may be self-terminating and ABAB… repetitive cycles may produce layer-by-layer controlled deposition. Using this approach, the growth of SiO2 thin films on Si(100) with atomic layer control was achieved at 600 K with pressures in the 1 to 50 Torr range. The experiments were performed in a small high pressure cell situated in a UHV chamber. This design couples CVD conditions for film growth with a UHV environment for surface analysis using laser-induced thermal desorption (LITD), temperature-programmed desorption (TPD) and Auger electron spectroscopy (AES). The controlled layer-by-layer deposition of SiO2 on Si(100) was demonstrated and optimized using these techniques. A stoichiometric and chlorine-free SiO2 film was also produced as revealed by TPD and AES analysis. SiO2 growth rates of approximately 1 ML of oxygen per AB cycle were obtained at 600 K. These studies demonstrate the methodology of using the combined UHV/high pressure experimental apparatus for optimizing a binary reaction CVD process.

Structural and Morphological Properties of Ultrathin HfO2 Dielectrics on 4H-SiC (0001)

2006 ◽  
Vol 527-529 ◽  
pp. 1075-1078 ◽  
Author(s):  
Carey M. Tanner ◽  
Jun Lu ◽  
Hans Olof Blom ◽  
Jane P. Chang
Keyword(s):  
Photoelectron Spectroscopy ◽  
Field Effect Transistors ◽  
High Energy ◽  
Oxide Semiconductor ◽  
Ex Situ ◽  
Morphological Properties ◽  
Layer By Layer ◽  
Island Growth ◽  
X Ray

The material properties of HfO2 thin films were studied to evaluate their potential as a high-κ gate dielectric in 4H-SiC power metal-oxide-semiconductor field effect transistors. Stoichiometric HfO2 films were deposited on n-type 4H-SiC (0001) by atomic layer deposition (ALD) at substrate temperatures of 250-450°C. No significant interfacial layer formation was observed by in-situ X-ray photoelectron spectroscopy (XPS) and an abrupt interface was confirmed by high-resolution transmission electron microscopy (HRTEM). A temperature-dependent transition from amorphous layer-by-layer growth to crystalline three-dimensional island growth was identified by in-situ reflection high-energy electron diffraction (RHEED) and ex-situ atomic force microscopy (AFM). X-ray diffraction (XRD) confirmed the presence of monoclinic HfO2 domains in crystallized films.

A computational study of SrTiO3 thin film deposition: Morphology and growth modes

2009 ◽  
Vol 24 (6) ◽  
pp. 1994-2000 ◽  
Author(s):  
Jennifer L. Wohlwend ◽  
Cosima N. Boswell ◽  
Simon R. Phillpot ◽  
Susan B. Sinnott
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Computational Study ◽  
Thin Film Deposition ◽  
Layer Growth ◽  
Film Deposition ◽  
Layer By Layer ◽  
Growth Modes ◽  
Deposition Processes ◽  
Dynamics Simulations

The growth of SrTiO3 (STO) thin films is examined using classical molecular dynamics simulations. First, a beam of alternating SrO and TiO2 molecules is deposited on the (001) surface of STO with incident kinetic energies of 0.1, 0.5, or 1.0 eV/atom. Second, deposition of alternating SrO and TiO2 monolayers, where both have incident energies of 1.0 eV/atom, is examined. The resulting thin film morphologies predicted by the simulations are compared to available experimental data. The simulations indicate the way in which the incident energy, surface termination, and beam composition influence the morphology of the thin films. On the whole, some layer-by-layer growth is predicted to occur on both SrO- and TiO2-terminated STO for both types of deposition processes, with the alternating monolayer approach yielding thin films with compositions that are much closer to that of bulk STO.

Preparation of (111)-Oriented Pt Electrode Films with Quasi-Monocrystal Properties on MgO/TiN Buffered Si(100) by PLD

2007 ◽  
Vol 280-283 ◽  
pp. 823-826 ◽  
Author(s):  
Tong Lai Chen ◽  
Xiao Min Li
Keyword(s):  
High Energy ◽  
Layer Growth ◽  
Atomic Scale ◽  
Layer By Layer ◽  
X Ray Diffraction ◽  
Pt Electrode ◽  
Force Microscopy ◽  
Atomic Force

Atomic-scale smooth Pt electrode films have been deposited on MgO/TiN buffered Si (100) by the pulsed laser deposition (PLD) technique. The whole growth process of the multilayer films was monitored by using in-situ reflection high energy electron diffraction (RHEED) apparatus. The Pt/MgO/TiN/Si(100) stacked structure was also characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). The HREED observations show that the growth mode of the Pt electrode film is 2D layer-by-layer growth. It is found that the (111)-oriented Pt electrode film has a crystallinity comparable to that of monocrystals. The achievement of the quasi-single-crystal Pt electrode film with an atomic-scale smooth surface is ascribed to the improved crystalline quality of the MgO film.

Laser-Reflectance Interferometry Measurements of Diamond-Film Growth

MRS Bulletin ◽  
1995 ◽  
Vol 20 (5) ◽  
pp. 29-31 ◽  
Author(s):  
Christopher D. Zuiker ◽  
Dieter M. Gruen ◽  
Alan R. Krauss
Keyword(s):  
Film Thickness ◽  
Film Growth ◽  
Substrate Surface ◽  
Diamond Films ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Index Of Refraction ◽  
Ex Situ ◽  
Laser Reflectance

The remarkable properties of diamond, including its hardness, chemical inertness, high thermal conductivity, low coefficient of friction, optical transparency, and semiconducting properties, have led to considerable research in the area of diamond thin-film deposition. Diamond films have been characterized ex situ by a large number of diagnostic techniques including Raman spectroscopy, x-ray diffraction, SEM, and TEM. In situ diagnostics, which can provide information in real time as the film is growing, are less common.Laser-reflectance interferometry (LRI) has been used to monitor the growth of diamond films in situ. The technique involves measuring the intensity of a laser beam reflected from the substrate surface on which the film is growing. The reflected beam is the sum of beams reflected by the gas-diamond interface and the diamond-silicon interface. Oscillations in the reflectivity are observed as the film grows because of interference between the reflected beams. Each oscillation indicates an increase in film thickness of λ/2n, where λ is the laser wavelength and n is the index of refraction of the film. If the index of refraction of the film is known, the thickness and growth rate can be determined in situ. For LRI measurements with 632.8-nm-wavelength HeNe lasers, the index of refraction of diamond films has been found to be within 10% of the bulk diamond value of 2.4. Each oscillation therefore indicates an increase in film thickness of 0.13 μm.The reflectivity measured by LRI is also affected by scattering because of surface roughness.

Ordered Thin Films of Perylenetetracarboxylicdianhydride-bisimide and bis-(N-alkyl)-Quinacridone Dyes

2000 ◽  
Vol 620 ◽  
Author(s):  
Andrew Back ◽  
Dana Alloway ◽  
Derck Schlettwein ◽  
Brook Schilling ◽  
J.-F. Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Alkali Halides ◽  
Layer Growth ◽  
Ex Situ ◽  
Layer By Layer ◽  
Molecular Plane ◽  
Layered Growth ◽  
Tapping Mode Afm

ABSTRACTWe review here the recent characterization of vacuum deposited monolayer and multilayer thin films of two different perylenetetracarboxylic-dianydride-bisimides (Cn-PTCDI; n =4,5), quinacridone, and two new bis-(N-alkyl)-quinacridone dyes (DIQA and DEHQA) on single crystal alkali halides using a combination of in situ luminescence spectroscopies and ex situ tapping mode AFM. Flat lying monolayer structures are indicated for PTCDA on the (100) faces of NaCl, KCl and KBr, for C4-PTCDI on KCl, for C5-PTCDI on both KCl and KBr and for DIQA on both KCl and KBr. Coherent thin films, exhibiting layer-by-layer growth can be achieved for PTCDA on all substrates, for C4-PTCDI on KCl and for DIQA on both KBr and KCl. Both C4-PTCDI and DIQA appear to fulfill the requirements for dyes which exhibit layered growth with the molecular plane inclined at steep angles to the surface normal.

scholarly journals Rietveld Quantitative Phase Analysis of Oil Well Cement: In Situ Hydration Study at 150 Bars and 150 °C

Materials ◽  
2019 ◽  
Vol 12 (12) ◽  
pp. 1897 ◽  
Author(s):  
Edmundo Fraga ◽  
Ana Cuesta ◽  
Jesus Zea-Garcia ◽  
Angeles De la Torre ◽  
Armando Yáñez-Casal ◽  
...  
Keyword(s):  
High Pressure ◽  
Powder Diffraction ◽  
High Energy ◽  
Ex Situ ◽  
Oil Well ◽  
High Pressure And Temperature ◽  
Quantitative Phase ◽  
Oil Well Cement ◽  
Well Cement

Oil and gas well cements are multimineral materials that hydrate under high pressure and temperature. Their overall reactivity at early ages is studied by a number of techniques including through the use of the consistometer. However, for a proper understanding of the performance of these cements in the field, the reactivity of every component, in real-world conditions, must be analysed. To date, in situ high energy synchrotron powder diffraction studies of hydrating oil well cement pastes have been carried out, but the quality of the data was not appropriated for Rietveld quantitative phase analyses. Therefore, the phase reactivities were followed by the inspection of the evolution of non-overlapped diffraction peaks. Very recently, we have developed a new cell specially designed to rotate under high pressure and temperature. Here, this spinning capillary cell is used for in situ studies of the hydration of a commercial oil well cement paste at 150 bars and 150 °C. The powder diffraction data were analysed by the Rietveld method to quantitatively determine the reactivities of each component phase. The reaction degree of alite was 90% after 7 h, and that of belite was 42% at 14 h. These analyses are accurate, as the in situ measured crystalline portlandite content at the end of the experiment, 12.9 wt%, compares relatively well with the value determined ex situ by thermal analysis, i.e., 14.0 wt%. The crystalline calcium silicates forming at 150 bars and 150 °C are also discussed.

Combinatorial Molecular Layer Epitaxy of Hf Based Phosphor Oxides

2001 ◽  
Vol 700 ◽  
Author(s):  
N. Arai ◽  
T. W. Kim ◽  
H. Kubota ◽  
Y. Matsumoto ◽  
H. Koinuma
Keyword(s):  
Molecular Layer ◽  
High Energy ◽  
Layer Growth ◽  
Laser Deposition ◽  
Layer By Layer ◽  
High Energy Electron ◽  
X Ray ◽  
Substrate Interaction ◽  
Film Substrate

AbstractA series of MHfO3: Tm (M =Ca, Sr and Ba) composition spread films and superlattices (SLs) were quickly fabricated on SrTiO3 (001) substrate in the molecular layer-by-layer growth using combinatorial pulsed laser deposition (PLD) under in-situ reflection high-energy electron diffraction (RHEED) monitoring. Crystal structures and luminescence properties of composition-spread and SLs were evaluated by the concurrent X-ray diffractometer and cathode luminescence (CL), respectively. CL properties of the films were found strongly dependent on their composition and stacking sequence. Possible effect of the stress due to the film-substrate interaction on the CL property is discussed.

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