scholarly journals Production of Graphene-Containing Suspensions for Liquid-Phase Shear Exfoliation of Graphite

Author(s):  
R. A. Al-Jarakh ◽  
V. F. Pershin ◽  
A. A. Osipov

A method and device for obtaining graphene-containing suspensions by liquid-phase shear exfoliation of graphite in a continuous mode have been developed. The comparison of the intensities of the process of exfoliation of graphite in the periodic and continuous modes was carried out and it was found that the intensity of the exfoliation process in the continuous mode is higher than in the periodic one. The limiting concentration of graphene structures in a suspension is reached 1.5 times faster when using an apparatus operating in a continuous mode than in a periodic mode, and its numerical value is greater (by at least 25 %).

Author(s):  
V. V. Rubanik ◽  
◽  
V. O. Savitsky ◽  
V. V. jr. Rubanik ◽  
V. F. Lutsko ◽  
...  

Graphene-based polymer nanocomposites are considered a promising class of future materials. The degree of filling, the filler and binder nature, and the shape, size, and mutual arrangement of filler particles determine the properties of a polymer composite material. The destruction of nanoparticles aggregates occurs most effectively in liquid media under the action of ultrasonic vibrations. The authors proposed the technique and designed laboratory equipment for ultrasonic treatment of the finely-dispersed graphite suspension, carried out the ultrasonic treatment (UST) of finely-dispersed graphite powder. The suspensions based on graphite with a solvent were obtained. The authors carried out the experiments on producing graphene using the graphite liquid-phase exfoliation method at the ultrasonic treatment with different ultrasonic treatment times, analyzed experimental data, and selected the UST optimal time. The paper contains the results of the study of the effect of the graphite suspension base on the degree of ultrasonic liquid-phase exfoliation of graphite. The most effective synthesis of graphene structures using UST is synthesis from graphite suspensions based on dichloroethane, benzol, and dichlorobenzene. Graphene structures’ output ratio amounts to up to 66 %. The authors developed the technology for producing polymers modified with graphene structures using ultrasonic dispersion. Based on graphene synthesized by the graphite liquid-phase exfoliation, the authors obtained nanopolymers using ultrasonic vibrations, carried out DSC measurements, and studied their strength properties. The limit strength of elastic polymers is from 1.9 to 3.6 MPa at different concentrations of graphene inclusions. The residual elongation of samples within the deviation did not change and amounted to 200 %.


2016 ◽  
Vol 6 (9) ◽  
pp. 3182-3196 ◽  
Author(s):  
E. Skrzyńska ◽  
S. Zaid ◽  
A. Addad ◽  
J.-S. Girardon ◽  
M. Capron ◽  
...  

A series of silver supported catalysts have been developed and proposed for mild oxidation of glycerol in the liquid phase. High selectivity to glycolic acid, stability in both continuous-flow and periodic mode of reaction, and good resistance to crude glycerol impurities have been achieved.


Author(s):  
K. A. Al-Shiblavi ◽  
◽  
A. A. Pasko ◽  
V. F. Pershin ◽  
◽  
...  

Author(s):  
N.V. Belov ◽  
U.I. Papiashwili ◽  
B.E. Yudovich

It has been almost universally adopted that dissolution of solids proceeds with development of uniform, continuous frontiers of reaction.However this point of view is doubtful / 1 /. E.g. we have proved the active role of the block (grain) boundaries in the main phases of cement, these boundaries being the areas of hydrate phases' nucleation / 2 /. It has brought to the supposition that the dissolution frontier of cement particles in water is discrete. It seems also probable that the dissolution proceeds through the channels, which serve both for the liquid phase movement and for the drainage of the incongruant solution products. These channels can be appeared along the block boundaries.In order to demonsrate it, we have offered the method of phase-contrast impregnation of the hardened cement paste with the solution of methyl metacrylahe and benzoyl peroxide. The viscosity of this solution is equal to that of water.


Author(s):  
C.D. Humphrey ◽  
T.L. Cromeans ◽  
E.H. Cook ◽  
D.W. Bradley

There is a variety of methods available for the rapid detection and identification of viruses by electron microscopy as described in several reviews. The predominant techniques are classified as direct electron microscopy (DEM), immune electron microscopy (IEM), liquid phase immune electron microscopy (LPIEM) and solid phase immune electron microscopy (SPIEM). Each technique has inherent strengths and weaknesses. However, in recent years, the most progress for identifying viruses has been realized by the utilization of SPIEM.


Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.


Author(s):  
J. Drennan ◽  
R.H.J. Hannink ◽  
D.R. Clarke ◽  
T.M. Shaw

Magnesia partially stabilised zirconia (Mg-PSZ) ceramics are renowned for their excellent nechanical properties. These are effected by processing conditions and purity of starting materials. It has been previously shown that small additions of strontia (SrO) have the effect of removing the major contaminant, silica (SiO2).The mechanism by which this occurs is not fully understood but the strontia appears to form a very mobile liquid phase at the grain boundaries. As the sintering reaches the final stages the liquid phase is expelled to the surface of the ceramic. A series of experiments, to examine the behaviour of the liquid grain boundary phase, were designed to produce compositional gradients across the ceramic bodies. To achieve this, changes in both silica content and furnace atmosphere were implemented. Analytical electron microscope techniques were used to monitor the form and composition of the phases developed. This paper describes the results of our investigation and the presentation will discuss the work with reference to liquid phase sintering of ceramics in general.


Author(s):  
Mahesh Chandramouli

Magnetization reversal in sintered Fe-Nd-B, a complex, multiphase material, occurs by nucleation and growth of reverse domains making the isolation of the ferromagnetic Fe14Nd2B grains by other nonmagnetic phases crucial. The magnets used in this study were slightly rich in Nd (in comparison to Fe14Nd2B) to promote the formation of Nd-oxides at multigrain junctions and incorporated Dy80Al20 as a liquid phase sintering addition. Dy has been shown to increase the domain wall energy thus making nucleation more difficult while Al is thought to improve the wettability of the Nd-oxide phases.Bulk polished samples were examined in a JEOL 35CF scanning electron microscope (SEM) operated at 30keV equipped with a Be window energy dispersive spectrometer (EDS) detector in order to determine the phase distribution.


Author(s):  
N.A. Bert ◽  
A.O. Kosogov

The very thin (<100 Å) InGaAsP layers were grown not only by molecular beam epitaxy and metal-organic chemical vapor deposition but recently also by simple liquid phase epitaxy (LPE) technique. Characterization of their thickness, interfase abruptness and lattice defects is important and requires TEM methods to be used.The samples were InGaAsP/InGaP double heterostructures grown on (111)A GaAs substrate. The exact growth conditions are described in Ref.1. The salient points are that the quarternary layers were being grown at 750°C during a fast movement of substrate and a convection caused in the melt by that movement was eliminated. TEM cross-section specimens were prepared by means of conventional procedure. The studies were conducted in EM 420T and JEM 4000EX instruments.The (200) dark-field cross-sectional imaging is the most appropriate TEM technique to distinguish between individual layers in 111-v semiconductor heterostructures.


Author(s):  
F. Banhart ◽  
F.O. Phillipp ◽  
R. Bergmann ◽  
E. Czech ◽  
M. Konuma ◽  
...  

Defect-free silicon layers grown on insulators (SOI) are an essential component for future three-dimensional integration of semiconductor devices. Liquid phase epitaxy (LPE) has proved to be a powerful technique to grow high quality SOI structures for devices and for basic physical research. Electron microscopy is indispensable for the development of the growth technique and reveals many interesting structural properties of these materials. Transmission and scanning electron microscopy can be applied to study growth mechanisms, structural defects, and the morphology of Si and SOI layers grown from metallic solutions of various compositions.The treatment of the Si substrates prior to the epitaxial growth described here is wet chemical etching and plasma etching with NF3 ions. At a sample temperature of 20°C the ion etched surface appeared rough (Fig. 1). Plasma etching at a sample temperature of −125°C, however, yields smooth and clean Si surfaces, and, in addition, high anisotropy (small side etching) and selectivity (low etch rate of SiO2) as shown in Fig. 2.


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