Quality of the Seam in Welding under Flux by Means of Barium–Strontium Carbonatite

2018 ◽  
Vol 48 (2) ◽  
pp. 82-86
Author(s):  
N. A. Kozyrev ◽  
R. E. Kryukov ◽  
A. A. Usol’tsev ◽  
O. D. Prokhorenko ◽  
V. G. Aimatov
Keyword(s):  
Barium Strontium

scholarly journals Peculiarities of application of natural and man-caused materials for steel alloying and modifying

2019 ◽  
Vol 75 (8) ◽  
pp. 944-954
Author(s):  
O. I. Nokhrina ◽  
I. D. Rozhikhina ◽  
V. I. Dmitrienko ◽  
I. E. Proshunin ◽  
M. A. Golodova
Keyword(s):  
Vanadium Slag ◽  
Industrial Testing ◽  
Manganese Ores ◽  
Manganese Alloys ◽  
Barium Strontium ◽  
Steel Alloying ◽  
Economic Indices ◽  
Final Steel ◽  
Deoxidizing Agent

Considerable reserves of improvement of steel quality and reduction of costs of its production are concealed in a possibility of active and purposeful formation their structure and the properties by introduction into the melt modifiers, alloying and microalloying additives. Due to the task of decreasing costs, studies on alloying and modifying of metal by natural and man-caused materials are very actual. Thermodynamic regularities of steel alloying and modifying processes by natural and man-caused materials, including manganese ores of various structures, BOF vanadium slag, barium- strontium modifier, obtained from the complex ores containing barium and strontium considered. Possibilities of wide application of various structure manganese ores for steel alloying by manganese without use of standard manganese alloys as well as vanadium slag for microalloying by vanadium demonstrated. Metallurgical properties barium-strontium natural modifier obtained and the possible mechanism of the modifying impact of barium and strontium on quality of metal studied. It was determined, that the effect of modifying by barium can revealed in steels, deoxidized only by silicon, and for modifying by strontium or joint modifying by barium and strontium it is necessary to apply aluminum as deoxidizing agent. Industrial testing of the above-stated materials showed reliability of studies, accomplished at thermodynamic modeling and laboratory studies of calculations and conclusions. Recommendations on optimization of technologies of steel alloying and modifying made. It was proved that use of the materials of the study allows to improve technical and economic indices of the process of production of steels and to increase considerably quality of final steel products. Conclusions on significant expansion of natural and man-caused materials prospects worded.

Direct inkjet printing of composite thin barium strontium titanate films

2003 ◽  
Vol 18 (12) ◽  
pp. 2820-2825 ◽  
Author(s):  
T. Kaydanova ◽  
A. Miedaner ◽  
C. Curtis ◽  
J. Alleman ◽  
J.D. Perkins ◽  
...  
Keyword(s):  
Strontium Titanate ◽  
Barium Strontium Titanate ◽  
Inkjet Printing ◽  
Root Mean Square Roughness ◽  
Metal Electrodes ◽  
Barium Strontium ◽  
Direct Current Bias ◽  
Metal Organic ◽  
Tan Δ

Composite Ba0.6Sr0.4TiO3/MgO thin films with 60% tuning and tan [H9254] of 0.007 at 2 GHz were deposited using metal organic decomposition inks by spin coating on single crystal MgO substrates. The films with approximately 1 mol% MgO in Ba0.6Sr0.4TiO3 had a better tuning/loss ratio than either the 0 or the 10 mol% MgO substituted films. Crystalline Ba0.5Sr0.5TiO3 films were produced on both MgO and alumina substrates by inkjet printing of metalorganic precursors with subsequent thermal decomposition followed by annealing at 900°C. Barium strontium titanate lines as narrow as 100 μm were printed on the alumina substrates. The inkjet-printed films were predominantly (100) oriented on MgO and (110) oriented on alumina. The crystalline quality of the inkjet-printed films was improved by annealing at 1100°C for 3 h in oxygen. Both the printed and the spin-coated films had smooth surfaces (300 Å root-mean-square roughness) as required for subsequent deposition of high-resolution metal electrodes. An inkjet-printed Ba0.5Sr0.5TiO3 film (3500 Å) on MgO annealed at 1100°C had 20% tunability of the dielectric constant (ε) at 9.1 V/μm direct current bias and tan δ < 0.002 at 1 MHz.

scholarly journals STUDY OF THE QUALITY OF WELD SEAM OBTAINED BY WELDING WITH BARIUM-STRONTIUM CARBONATITE FLUX

2018 ◽  
Vol 61 (2) ◽  
pp. 108-113
Author(s):  
N. A. Kozyrev ◽  
R. E. Kryukov ◽  
A. A. Usol’tsev ◽  
O. D. Prokhorenko ◽  
V. G. Aimatov
Keyword(s):  
Weld Seam ◽  
Barium Strontium

Immunoferritin localization of intracellular antigens in positively stained frozen sections

1978 ◽  
Vol 36 (2) ◽  
pp. 168-169
Author(s):  
K. T. Tokuyasu
Keyword(s):  
Surface Tension ◽  
Water Surface ◽  
Thin Layers ◽  
The Other ◽  
Positive Staining ◽  
Frozen Sections ◽  
The Past ◽  
Ultrathin Frozen Sections ◽  
Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

Observability of Very Thick Specimen by Using Transmission Scanning Electron Microscope

1971 ◽  
Vol 29 ◽  
pp. 26-27
Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike
Keyword(s):  
Electron Microscope ◽  
Image Quality ◽  
Scanning Electron Microscope ◽  
Chromatic Aberration ◽  
Image Contrast ◽  
Objective Lens ◽  
Thick Specimen ◽  
Transmission Electron ◽  
Scanning Electron

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.

The Current Situation in Chemical Stabilization of Biological Materials

1972 ◽  
Vol 30 ◽  
pp. 132-133
Author(s):  
John H. Luft
Keyword(s):  
Electron Microscopy ◽  
Electron Microscope ◽  
Osmium Tetroxide ◽  
Molecular Level ◽  
Cross Linking ◽  
Chemical Stabilization ◽  
Specimen Preparation ◽  
Sufficient Condition ◽  
Radio Telescopes

With information processing devices such as radio telescopes, microscopes or hi-fi systems, the quality of the output often is limited by distortion or noise introduced at the input stage of the device. This analogy can be extended usefully to specimen preparation for the electron microscope; fixation, which initiates the processing sequence, is the single most important step and, unfortunately, is the least well understood. Although there is an abundance of fixation mixtures recommended in the light microscopy literature, osmium tetroxide and glutaraldehyde are favored for electron microscopy. These fixatives react vigorously with proteins at the molecular level. There is clear evidence for the cross-linking of proteins both by osmium tetroxide and glutaraldehyde and cross-linking may be a necessary if not sufficient condition to define fixatives as a class.

Resistance Monitor and Control for Vacuum Evaporation of Metals and Carbon

1976 ◽  
Vol 34 ◽  
pp. 572-573
Author(s):  
Russell L. Steere ◽  
Eric F. Erbe ◽  
J. Michael Moseley
Keyword(s):  
Electronic Device ◽  
Point Sources ◽  
High Contrast ◽  
Variable Resistor ◽  
Quality Of Results ◽  
Low Contrast ◽  
Evaporation Source ◽  
And Control ◽  
At Will

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.

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