Characterization of Cobalt Films on X-Ray Lithographic Micropillars

2011 ◽  
Vol 335-336 ◽  
pp. 1000-1003
Author(s):  
Patchara Sukonrat ◽  
Chanwut Sriphung ◽  
Watcharee Rattanasakulthong ◽  
Chitnarong Sirisathitkul
Keyword(s):  
Magnetic Field ◽  
Cross Section ◽  
Rf Sputtering ◽  
Anisotropic Behavior ◽  
Synchrotron Source ◽  
X Ray ◽  
Cobalt Films ◽  
Out Of Plane ◽  
Dimensional Errors

Arrays of SU-8 photoresist pillars (10 μm ×10 μm × 50 μm) on copper substrates were fabricated by X-ray lithography. The photoresist-coated substrates were irradiated by X-ray from a synchrotron source through patterned silver dots on a graphite mask. After the resist development, the chemically stable and mechanically hardened SU-8 pillars exhibited smooth vertical sidewalls and cross section with up to 10 % dimensional errors from the designated pattern. Cobalt of thickness ranging from 50 to 80 nm was then deposited on these patterned substrates by RF sputtering. These cobalt films on SU-8 pillars showed a lower in-plane magnetization than that of continuous cobalt films because of their smaller grain size. The measurement with out-of-plane magnetic field gave rise to a higher magnetization and this anisotropic behavior was observed only in cobalt-coated pillars.

High-Precision Characterization of Super-Multiperiod AlGaAs/GaAs Superlattices Using X-Ray Reflectometry on a Synchrotron Source

2021 ◽  
Author(s):  
L. I. Goray ◽  
E. V. Pirogov ◽  
M. V. Svechnikov ◽  
M. S. Sobolev ◽  
N. K. Polyakov ◽  
...  
Keyword(s):  
High Precision ◽  
Synchrotron Source ◽  
X Ray

Morphology and Crystallographic Characterization of Nickel Nanowires—Influence of Magnetic Field and Current Density During Synthesis

2014 ◽  
Vol 5 (2) ◽  
Author(s):  
Mahendran Samykano ◽  
Ram Mohan ◽  
Shyam Aravamudhan
Keyword(s):  
Magnetic Field ◽  
Current Density ◽  
Quality Data ◽  
Synthesis Process ◽  
X Ray Diffraction ◽  
X Ray ◽  
Nickel Nanowires ◽  
Helium Ion ◽  
Sem Imaging

This paper presents results and discussion from a comprehensive morphological and crystallographic characterization of nickel nanowires synthesized by template-based electrodeposition method. In particular, the influence of magnetic and electric field (current density) conditions during the synthesis of nickel nanowires was studied. The structure and morphology of the synthesized nanowires were studied using Helium ion microscopy (HIM) and scanning electron microscopy (SEM) methods. The HIM provided higher quality data and resolution compared to conventional SEM imaging. The crystallographic properties of the grown nanowires were also studied using X-ray diffraction (XRD). The results clearly indicated that the morphological and crystallographic properties of synthesized nickel nanowires were strongly influenced by the applied magnetic field and current density intensity during the synthesis process.

Determination of Argon in RF Sputtered SiO2 by X-Ray Emission

1968 ◽  
Vol 12 ◽  
pp. 601-611
Author(s):  
J. Charles Lloyd
Keyword(s):  
Magnetic Field ◽  
Weight Loss ◽  
Rf Sputtering ◽  
Rf Power ◽  
Helium Atmosphere ◽  
X Ray ◽  
Argon Concentration ◽  
The Magnetic Field ◽  
Absolute Basis

AbstractArgon is commonly used as the sputtering medium for RF sputtering of insulators and is entrapped in the deposits. X-ray emission determination of argon in RF sputtered SiO2 was required as part of a study of the relationships between argon concentration in the deposits and their electrical and physical properties.Concentrations ranging from 0.05 to 7.4 weight % argon were measured in deposits 0.5 to 5μ thick. Two techniques were used for standardization: (1) weight loss of deposits heated for several hours in a helium atmosphere at 600°C; (2) potassium Kα and chlorine Kα measurements on a KCl film of known thickness to infer argon mass/argon Kα net counts. Calibrations made using these procedures agreed to within 10% and are reliable to about ±25% on an absolute basis. Absorption of radiation by the deposits was taken into account and used to correct measured argon intensities for absorption.Sputtering parameters which had major effects on argon concentration were the substrate temperature and the magnetic field applied during sputtering. Argon pressure and RF power were found to have lesser effects.

Synthesis and Characterization of Cobalt-Nickel Nanowires Formed under External Magnetic Field

2015 ◽  
Vol 799-800 ◽  
pp. 120-124 ◽  
Author(s):  
Mary Donnabelle L. Balela ◽  
Lalaine M. Dulin ◽  
Erica A. Garcia ◽  
M. Janelle H. Tica
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Face Centered Cubic ◽  
X Ray Diffraction ◽  
X Ray ◽  
Hexagonal Close Packed ◽  
Cobalt Nickel ◽  
Nickel Nanowires ◽  
Face Centered

Cobalt-nickel (Co-Ni) nanowires were formed by electroless deposition in ethylene glycol under external magnetic field. The effects of initial Co (II) and Ni (II) concentration on the surface and morphology of the synthesized nanowires were investigated by x-ray diffraction (XRD) and scanning electron microscope (SEM) respectively. An increase in the Co (II) concentration resulted in increase in diameter of the nanowires. However, the length of nanowires was observed to decrease. Higher Co (II) concentration resulted in a mixture of hexagonal close-packed and face-centered cubic Co-Ni nanowires. X-ray diffraction revealed that crystal growth occurred when the nanowires are annealed at 653 K for 10h.

scholarly journals Combined elastic strain and macroscopic stress characterization in polycrystalline Cu thin films

2006 ◽  
Vol 21 (1) ◽  
pp. 25-29 ◽  
Author(s):  
E. Eiper ◽  
K. J. Martinschitz ◽  
J. Keckes
Keyword(s):  
Thin Films ◽  
Simple Approach ◽  
Synchrotron Source ◽  
Rocking Curve ◽  
X Ray ◽  
Macroscopic Stress ◽  
Substrate Curvature ◽  
Stoney Formula ◽  
Elastic Strains

This work introduces a new simple approach to determine experimental X-ray elastic constants (XECs) of thin films by coupling the sin2ψ method and the substrate curvature technique. The approach is demonstrated on polycrystalline Cu thin films with the thickness 200, 800, and 2400 nm deposited on Si(100) substrates. Applying synchrotron radiation, the elastic strains in the films are determined using sin2ψ method while the macroscopic stresses are assessed by measuring the substrate curvature. The stresses are calculated using the Stoney formula from the radius of substrate curvature determined by the rocking curve measurement of substrate 400 reflection at different sample positions. Results show that the magnitude of the macroscopic stress in the films is proportional to the magnitude of the slope in the sin2ψ plots. On the basis of this observation, XECs of the films were calculated showing no dependence on the film thickness. The characterization of the samples was performed at the synchrotron source Hasylab.

scholarly journals Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film

2017 ◽  
Vol 68 (7) ◽  
pp. 58-61
Author(s):  
Jaroslav Kováč ◽  
Martin Florovič ◽  
Andrej Vincze ◽  
Edmund Dobročka ◽  
Ivan Novotný ◽  
...  
Keyword(s):  
Rf Sputtering ◽  
Depth Profiling ◽  
Si Substrate ◽  
Electrical And Optical Properties ◽  
X Ray ◽  
Vis Spectroscopy ◽  
Fabrication And Characterization ◽  
Sims Depth Profiling ◽  
Structure Properties

AbstractThe present work reports the fabrication of p-Si/SiO2/TiO2and p-Si/SiO2/TiO2/ZnO heterostructures deposited by RF sputtering on p-Si substrate. The structural properties of the heterostructures were characterized by X-ray reflectivity and SIMS depth profiling. The electrical and optical properties of the heterostructures were investigated byI − V, C-V measurements and VIS spectroscopy, respectively. The measurements reveal thatI − Vcharacteristics in dark show semiconductor-insulator-semiconductor (SIS) structure properties. TheI − Vcharacteristics under illumination exhibit changes with significant increase of photocurrent due to photoassisted tunnelling and injection through SiO2/TiO2interlayer.

scholarly journals Analysis of candidates for interacting galaxy clusters

2018 ◽  
Vol 611 ◽  
pp. A78 ◽  
Author(s):  
Elizabeth Johana Gonzalez ◽  
Martín de los Rios ◽  
Gabriel A. Oio ◽  
Daniel Hernández Lang ◽  
Tania Aguirre Tagliaferro ◽  
...  
Keyword(s):  
Galaxy Clusters ◽  
Cross Section ◽  
Dark Matter Particle ◽  
Dynamical Study ◽  
X Ray ◽  
Mass Distributions ◽  
Body Model ◽  
Cluster Candidate ◽  
Merger Event

Context. Merging galaxy clusters allow for the study of different mass components, dark and baryonic, separately. Also, their occurrence enables to test the ΛCDM scenario, which can be used to put constraints on the self-interacting cross-section of the dark-matter particle.Aim. It is necessary to perform a homogeneous analysis of these systems. Hence, based on a recently presented sample of candidates for interacting galaxy clusters, we present the analysis of two of these cataloged systems.Methods. In this work, the first of a series devoted to characterizing galaxy clusters in merger processes, we perform a weak lensing analysis of clusters A1204 and A2029/A2033 to derive the total masses of each identified interacting structure together with a dynamical study based on a two-body model. We also describe the gas and the mass distributions in the field through a lensing and an X-ray analysis. This is the first of a series of works which will analyze these type of system in order to characterize them.Results. Neither merging cluster candidate shows evidence of having had a recent merger event. Nevertheless, there is dynamical evidence that these systems could be interacting or could interact in the future.Conclusions. It is necessary to include more constraints in order to improve the methodology of classifying merging galaxy clusters. Characterization of these clusters is important in order to properly understand the nature of these systems and their connection with dynamical studies.

Advanced characterization of ultra-low-k periodic porous silica films – pore size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure

2003 ◽  
Vol 766 ◽  
Author(s):  
N. Hata ◽  
C. Negoro ◽  
S. Takada ◽  
K. Yamada ◽  
Y. Oku ◽  
...  
Keyword(s):  
Pore Size Distribution ◽  
Pore Size ◽  
Size Distribution ◽  
Domain Structure ◽  
Pore Diameter ◽  
Porous Silica ◽  
Advanced Characterization ◽  
X Ray ◽  
Out Of Plane

AbstractWe have shown previously the results from out-of-plane and in-plane X-ray scattering /diffraction measurements together with transmission electron microscope and X-ray reflectance measurements and shown that they are effective in characterization of a periodic porous silica low-k film [1]. In the present work, we report the results on pore-size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure.

Sputter-deposition and characterization of paramelaconite

2003 ◽  
Vol 18 (7) ◽  
pp. 1535-1542 ◽  
Author(s):  
K. J. Blobaum ◽  
D. Van Heerden ◽  
A. J. Wagner ◽  
D. H. Fairbrother ◽  
T. P. Weihs
Keyword(s):  
Photoelectron Spectroscopy ◽  
Metastable Phase ◽  
Heat Of Formation ◽  
Sputter Deposition ◽  
Scanning Calorimetry ◽  
X Ray ◽  
Multilayer Foils ◽  
Out Of Plane ◽  
Processing Techniques

While processing techniques for deposition of CuOx/Al multilayer foils were being developed, a method for synthesizing paramelaconite (Cu4O3) was serendipitously discovered. These paramelaconite films were successfully synthesized by sputter-deposition from a CuO target. Milligram quantities of uncontaminated material were produced enabling new studies of the morphology, stoichiometry, and thermodynamics of this unique copper oxide. At moderate temperatures, equiaxed paramelaconite grains deposited with a strong out-of-plane texture; at lower temperatures the paramelaconite grains showed no texture but were columnar in geometry. X-ray photoelectron spectroscopy showed that the as-deposited Cu4O3 had a nonstoichiometric Cu:O ratio of 1.7:1; the ratio of Cu+ to Cu2+ was 1.8:1. On heating, this phase decomposed into CuO and Cu2O at temperatures ranging from 400 to 530 °C. Using differential scanning calorimetry, the heat of formation and Gibbs free energy for Cu4O3 were estimated to be −453 and −279 kJ/mol, respectively. On the basis of these calculations and our observations, we confirmed that Cu4O3 is a metastable phase.

Growth and Characterization of (012)- and (001)-Oriented Epitaxial Anatase Thin Films

2006 ◽  
Vol 46 ◽  
pp. 146-151
Author(s):  
Andriy Lotnyk ◽  
Stephan Senz ◽  
Dietrich Hesse
Keyword(s):  
Thin Films ◽  
Cross Section ◽  
Single Phase ◽  
Electron Beam Evaporation ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Transmission Electron

Single phase TiO2 thin films of anatase structure have been prepared by reactive electron beam evaporation. Epitaxial (012)- and (001)-oriented anatase films were successfully obtained on (110)- and (100)-oriented SrTiO3 substrates, respectively. X-ray diffraction and cross section transmission electron microscopy investigations revealed a good epitaxial quality of the anatase films grown on the SrTiO3 substrates.

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