The Effect of PMMA Layer to the UV Properties of ZnO/PMMA Nanocomposite

2013 ◽  
Vol 832 ◽  
pp. 612-616
Author(s):  
Aadila Aziz ◽  
N.A.M. Asib ◽  
A.N. Afaah ◽  
R. Mohamed ◽  
Mohamad Rusop ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Optical Property ◽  
Spin Coating ◽  
Glass Substrate ◽  
Immersion Time ◽  
Layer By Layer ◽  
Immersion Method ◽  
Pmma Layer ◽  
Atomic Force ◽  
Surface Morphologies

Preparation of ZnO/PMMA nanocomposite has been reported by using the solution-immersion method. These studies involve depositing poly (methyl methacrylate) (PMMA) layer by layer on glass substrate using the spin coating technique. Surface morphologies deposited layer of PMMA on glass substrate was characterized using Atomic Force Microscope (AFM) and an optical property of ZnO/PMMA nanocomposite was characterized using UV-Vis Spectrometer. For AFM result, the highest surface roughness 0.048 nm represent layer of platinum due to its function as a seeded-catalyst followed by 1 layer of PMMA show surface roughness 0.015 nm. 4 hours immersion time show highest absorption for 5 layer of deposited PMMA at 279.21 nm. While, for 6 hours show highest absorption for 1 layer and 3 layer of PMMA with overlapped each other at 278.54 nm.

Structural and Optical Properties of ZnO/PMMA Nanocomposite

2013 ◽  
Vol 832 ◽  
pp. 602-606 ◽  
Author(s):  
Aadila Aziz ◽  
N.A.M. Asib ◽  
A.N. Afaah ◽  
R. Mohamed ◽  
Mohamad Rusop ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electron Microscope ◽  
Spin Coating ◽  
Glass Substrate ◽  
Layer By Layer ◽  
Structural And Optical Properties ◽  
Immersion Method ◽  
Nanocomposite Thin Films ◽  
Scanning Electron

UV filter is an interesting and challenging application in industries. Hence, ZnO-PMMA nanocomposite thin films have been chosen to achieve above mentioned characteristics [1]. In this study, fabrication of ZnO on PMMA glass substrate successfully prepared by using the solution-immersion method. Layer by layer of poly (methyl methacrylate) (PMMA) was deposited on a glass substrate using the spin coating technique by dissolving PMMA in toluene. Various layers of PMMA were varied to 1, 3, 5 and 7 layers. The structural and optical properties of ZnO/PMMA nanocomposite were then characterized by Field Emission Scanning Electron Microscope (FESEM) and Photoluminescene (PL) Spectroscopy. From FESEM result, shape of nanorod unclearly seen as the layer deposited of PMMA increase and from EDAX show oxygen element have highest atomic percentage 65.50 %. 7 layer of deposited PMMA show highest intensity compare to other layers in green region at 577.32 nm for PL measurement.

scholarly journals The Effects of Sn-Doping on a-Fe2O3 Nanostructures Properties

2018 ◽  
Vol 7 (3.11) ◽  
pp. 34
Author(s):  
W R.W. Ahmad ◽  
M H. Mamat ◽  
A S. Zoolfakar ◽  
Z Khusaimi ◽  
M M. Yusof ◽  
...  
Keyword(s):  
Optical Properties ◽  
Electrical Properties ◽  
Tin Oxide ◽  
Glass Substrate ◽  
Optical And Electrical Properties ◽  
Immersion Method ◽  
Coated Glass Substrate ◽  
Sn Doping ◽  
Sn Dopant ◽  
Surface Morphologies

In this study, undoped and Sn-doped hematite (α-Fe2O3) nanostructures with variation of Sn (0.5, 1, 2, 3 at. %) were deposited on fluorine doped tin oxide (FTO) coated glass substrate using sonicated immersion method. The effect of Sn-dopant on structural and crystallinity properties were investigated by characterizing FESEM and XRD respectively, while the optical properties were measured by UV-Vis-NIR spectrometer. The surface morphologies from FESEM have shown that the hematite nanostructures were grown uniformly in all samples. However, as the dopant atomic percentage increases, the amount of hematite nanostructure being grown on the FTO decreases. Results demonstrated that the amount of Sn-doping was undoubtedly influence the structural, optical and electrical properties of hematite nanostructures.  

scholarly journals Matt Polyurethane Coating: Correlation of Surface Roughness on Measurement Length and Gloss

Polymers ◽  
2020 ◽  
Vol 12 (2) ◽  
pp. 326
Author(s):  
Qiwen Yong ◽  
Jinming Chang ◽  
Qi Liu ◽  
Feng Jiang ◽  
Daidong Wei ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Incident Angle ◽  
Three Dimensional ◽  
Polyurethane Coating ◽  
Force Microscopy ◽  
Atomic Force ◽  
Different Dimensions ◽  
Surface Morphologies ◽  
Modified Epoxy ◽  
Phenolic Epoxy Resin

Matt polyurethane coating was successfully prepared through the synergistic effect of castor oil and phenolic epoxy resin into polyurethane backbone. The formation mechanism may be ascribed to the modulus mismatch between the partially modified epoxy polyurethane and partially unmodified polyurethane. Scanning electron microscopy (SEM) was used to observe the micro-rough surface morphologies. Atomic force microscopy (AFM) and three-dimensional (3D) surface profilometer were applied to calculate a series of surface roughness parameters in different dimensions, such as Sa, Sq, Sp, Sv, Sz, Sku, Ssk, etc. The exciting results of this paper—the correlation of surface roughness on measurement length and gloss—are explored in detail. It reveals the extrinsic property of measured roughness with measurement length and provides guidance for what kind of incident angle gloss meters (20°, 60°, and 85°) best describe the gloss of matt polyurethane coating.

Polishing Silicon Wafers with the Nanodiamond Abrasive Tools Prepared by Sol-Gel Technique

2011 ◽  
Vol 496 ◽  
pp. 1-6 ◽  
Author(s):  
Guang Qiu Hu ◽  
Jing Lu ◽  
Xi Peng Xu
Keyword(s):  
Surface Roughness ◽  
Silicon Wafer ◽  
Sol Gel ◽  
Optical Microscope ◽  
Mirror Surface ◽  
Atomic Force ◽  
Polishing Pad ◽  
Gel Technique ◽  
Abrasive Tools ◽  
Surface Morphologies

In this paper, in order to avoid aggregate of nanodiamonds and reduce the damage problem caused by the hard abrasives during polishing, a kind of ultra-fine nanodiamond abrasive polishing pad was fabricated by means of sol-gel technology. The polishing pad was then used to polish silicon wafer on a nano-polishing machine. The surface morphologies and roughness were measured by both optical microscope and atomic force microscope (AFM). It is found that it was easy to machine the silicon wafer to mirror surface after polishing with the nanodiamond pad. And the surface roughness of the silicon wafer was reduced to 0.402 nm.

Structural, morphology and electrical properties of layered copper selenide thin film

Open Physics ◽  
2009 ◽  
Vol 7 (2) ◽  
Author(s):  
J. Ying Chyi Liew ◽  
Zainal Talib ◽  
W. Mahmood ◽  
M. Yunus ◽  
Zulkarnain Zainal ◽  
...  
Keyword(s):  
Electrical Conductivity ◽  
Surface Roughness ◽  
Grain Size ◽  
Copper Selenide ◽  
Layer By Layer ◽  
Structural Morphology ◽  
Force Microscopy ◽  
Atomic Force ◽  
Average Grain Size ◽  
Evaporation Technique

AbstractThin films of copper selenide (CuSe) were physically deposited layer-by-layer up to 5 layers using thermal evaporation technique onto a glass substrate. Various film properties, including the thickness, structure, morphology, surface roughness, average grain size and electrical conductivity are studied and discussed. These properties are characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), ellipsometer and 4 point probe at room temperature. The dependence of electrical conductivity, surface roughness, and average grain size on number of layers deposited is discussed.

SiC Coatings Deposited by RF Magnetron Sputtering

2007 ◽  
Vol 280-283 ◽  
pp. 1309-1312 ◽  
Author(s):  
Hui Dong Tang ◽  
Shou Hong Tan ◽  
Zheng Ren Huang
Keyword(s):  
Surface Roughness ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Rf Magnetron Sputtering ◽  
Rf Power ◽  
Force Microscopy ◽  
Atomic Force ◽  
Amorphous Sic ◽  
Surface Morphologies ◽  
Sic Coatings

Amorphous SiC coatings were deposited by RF magnetron sputtering from a sintered SiC target onto Si(100) substrate at room temperature. The influence of RF power on the surface morphology and the RMS surface roughness of the resulting SiC coatings was studied by using atomic force microscopy. Two types of surface morphologies were obtained. The corresponding forming mechanisms were also discussed.

WAVELET ANALYSIS OF SURFACE MORPHOLOGIES OF MAGNETRON SPUTTERED Al-Cu THIN FILMS

2009 ◽  
Vol 07 (01) ◽  
pp. 59-74
Author(s):  
GAURAV BHATNAGAR ◽  
R. JAYAGANTHAN ◽  
BALASUBRAMANIAN RAMAN
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Deposition Time ◽  
Signal Decomposition ◽  
Dc Magnetron Sputtering ◽  
Force Microscopy ◽  
Atomic Force ◽  
Experimental Values ◽  
Surface Morphologies ◽  
Wavelet Technique

Al - Cu thin films were deposited by DC magnetron sputtering. The films are characterized by atomic force microscopy and its surface morphologies are analyzed by wavelet technique. Multiresolution signal decomposition wavelet technique was employed to extract the surface roughness from the AFM images of Al - Cu thin films. It is observed that the Al - Cu thin films exhibit higher surface roughness value with increasing deposition time. The calculated surface roughness of the thin films, using wavelet technique, is comparable with that of its experimental values.

Observation of the Early Stages of B-Axis Oriented Prba2Cu3O7-x Thin Film Growth by AFM

1995 ◽  
Vol 388 ◽  
Author(s):  
Gun Yong Sung ◽  
Jeong Dae Suh ◽  
Sang-Don Jung
Keyword(s):  
Surface Roughness ◽  
Film Growth ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Growth Mode ◽  
Layer By Layer ◽  
Oriented Growth ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Conditions

AbstractThe initial stages of the growth of b-axis oriented PrBa2Cu3O7-x (PBCO) films on LaSrGaO4 (100) substrates were investigated by atomic force microscopy to follow the growth of the thin films. Series of films with thickness ranging between 0.34 nm and 100 nm were prepared under identical pulsed laser deposition conditions. No sprial-topped or flat-topped islands were observed and the scale of the surface roughness was lower than that of the c-axis oriented growth mode. the 300 nm-thick in-plane aligned a-axis oriented YBCO films have the root mean square (RMS) surface roughness of 2 nm. It is considered that the b-axis oriented PBCO films on LaSrGaO4 (100) substrates were nucleated and grown by layer-by-layer like growth mode.

Reactive Ion Etching Parameter Effect on Aluminum Bond Pad Surface Morphology

2014 ◽  
Vol 925 ◽  
pp. 140-143
Author(s):  
Moganraj Palianysamy ◽  
Zaliman Sauli ◽  
Uda Hashim ◽  
Vithyacharan Retnasamy ◽  
Steven Taniselass ◽  
...  
Keyword(s):  
Experimental Study ◽  
Surface Roughness ◽  
Surface Morphology ◽  
Gas Flow ◽  
Reactive Ion Etching ◽  
Important Process ◽  
Ion Etching ◽  
Argon Gas ◽  
Atomic Force ◽  
Surface Morphologies

Reactive Ion Etching (RIE) is an important process in fabrication of semiconductor devices. Design Of Experiment (DOE) has been used to study the effect of Reactive Ion Etch (RIE) towards surface morphology of aluminum bond pad. Important RIE factors involved in this experimental study are ratio of Tetrafluoromethane (CF4), Argon gas flow, BIAS, and ICP power. Different combinations of these factors produces different results of surface morphologies which was obtained using Atomic Force Microscopic (AFM). Produced results shows that overall surface roughness of the pad is affected by RIE and DOE offers a better way to optimize the desired outcome.

AFM Study on the Surface Dissolution of Hydroxyapatite

2007 ◽  
Vol 336-338 ◽  
pp. 1553-1555 ◽  
Author(s):  
Dong Seok Seo ◽  
Hwan Kim ◽  
Jong Kook Lee
Keyword(s):  
Surface Roughness ◽  
Immersion Time ◽  
Distilled Water ◽  
Force Microscopy ◽  
Atomic Force ◽  
Hydroxyapatite Powder ◽  
Hydroxyapatite Ceramics ◽  
Initial Stage ◽  
Moisture Protection ◽  
Scanning Electron

The surface dissolution of hydroxyapatite ceramics in distilled water was investigated by using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The disks made of hydroxyapatite powder were sintered at 1200oC for 2 h in air with under moisture protection. After sintering, the disks were polished to smoothness using 1 μm diamond and they were soaked in 40 ml of pH 7.4 distilled water at 37oC for certain period of time. The morphological change of hydroxyapatite surface, specifically at the initial stage of immersion, and related surface roughness were observed with immersion time. The present study suggested that an artificial fact like surface scratch in this case initiated to be eliminated prior to the surface dissolution along grain boundary. That is, the surface roughness decreased at the initial stage of immersion, and then increased due to the surface dissolution.

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