Affirmative Action: The Quality of the Debate

2017 ◽  
pp. 263-269
Author(s):  
Sue Davis
Keyword(s):  
Affirmative Action

From Taxachusetts to the Massachusetts Miracle

2017 ◽  
Author(s):  
Lily Geismer
Keyword(s):  
Quality Of Life ◽  
Affirmative Action ◽  
Democratic Party ◽  
Bill Clinton ◽  
High Tech ◽  
High Tech Industry ◽  
Market Incentives ◽  
Deep Impact ◽  
Democratic Leadership

This chapter explores both Governor Michael Dukakis's career from the early 1970s to his presidential bid and the state's economic turnaround, dubbed the “Massachusetts Miracle,” which made the high-tech industry and skilled professionals ever more central to the state's economy and politics, and the Democratic Party. Despite Dukakis's loss, his platform of abortion rights, affirmative action, the environment, and other quality-of-life concerns coupled with an emphasis on using market incentives to stimulate high-tech growth had a deep impact. Dukakis's platform influenced the set of policies and approach adopted by the Democratic Leadership Council (DLC) and its leader, Bill Clinton, in their efforts to appeal to suburban voters and move the party closer toward the center. This agenda continued to disproportionately benefit postindustrial professionals, while also perpetuating forms of racial and economic inequality within metropolitan Boston and in the Democratic Party's priorities.

Affirmative Action and Access to Higher Education in Brazil: The Significance of Race and Other Social Factors

2016 ◽  
Vol 48 (2) ◽  
pp. 301-334 ◽  
Author(s):  
ALVARO ALBERTO FERREIRA MENDES JUNIOR ◽  
ALBERTO DE MELLO E SOUZA ◽  
FÁBIO DOMINGUES WALTENBERG
Keyword(s):  
Affirmative Action ◽  
Social Factors ◽  
Basic Education ◽  
Access To Higher Education ◽  
Quota System ◽  
Admissions Test ◽  
Action Programme ◽  
Education In Brazil ◽  
Socio Economic Factors

AbstractUsing recent data, this study examines the affirmative action programme of the Universidade do Estado do Rio de Janeiro (UERJ), the first Brazilian university to implement admissions quotas. The article analyses admissions records and finds that both the ratio of applications per place and minimum admission scores are considerably lower among quota students; scores in the admissions test are associated principally with socio-economic factors rather than racial ones; preparatory courses for the university's admissions tests do not appear to be a substitute for the quota system in terms of improving access; few quota applicants would be admitted in the absence of the system; and the applicants who displace others come from disadvantaged socio-economic backgrounds. The article concludes that it is necessary to improve the quality of basic education in Brazil in order to enable disadvantaged applicants to compete.

scholarly journals The Effect of Court-Ordered Hiring Quotas on the Composition and Quality of Police

2007 ◽  
Vol 97 (1) ◽  
pp. 318-353 ◽  
Author(s):  
Justin McCrary
Keyword(s):  
Affirmative Action ◽  
Police Department ◽  
Work Force ◽  
The United States ◽  
Police Departments ◽  
White Test ◽  
Municipal Police ◽  
Municipal Police Departments ◽  
Newly Hired

Arguably the most aggressive affirmative action program ever implemented in the United States was a series of court-ordered racial hiring quotas imposed on municipal police departments. My best estimate of the effect of court-ordered affirmative action on work-force composition is a 14-percentage-point gain in the fraction African American among newly hired officers. Evidence on police performance is mixed. Despite substantial black-white test score differences on police department entrance examinations, city crime rates appear unaffected by litigation. However, litigation lowers slightly both arrests per crime and the fraction black among serious arrestees. (JEL H76, J15, J78, K31)

Immunoferritin localization of intracellular antigens in positively stained frozen sections

1978 ◽  
Vol 36 (2) ◽  
pp. 168-169
Author(s):  
K. T. Tokuyasu
Keyword(s):  
Surface Tension ◽  
Water Surface ◽  
Thin Layers ◽  
The Other ◽  
Positive Staining ◽  
Frozen Sections ◽  
The Past ◽  
Ultrathin Frozen Sections ◽  
Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

Observability of Very Thick Specimen by Using Transmission Scanning Electron Microscope

1971 ◽  
Vol 29 ◽  
pp. 26-27
Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike
Keyword(s):  
Electron Microscope ◽  
Image Quality ◽  
Scanning Electron Microscope ◽  
Chromatic Aberration ◽  
Image Contrast ◽  
Objective Lens ◽  
Thick Specimen ◽  
Transmission Electron ◽  
Scanning Electron

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.

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