scholarly journals Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

2021 ◽  
Author(s):  
Kirsten Bobzin ◽  
Christian Kalscheuer ◽  
Parisa Hassanzadegan Aghdam
Keyword(s):  
Gas Flow ◽  
Impact Resistance ◽  
Pulsed Dc

Characterization of the Remote Plasma Generated in a Pulsed-DC Gas-Flow Hollow-Cathode Discharge

2007 ◽  
Vol 35 (3) ◽  
pp. 527-533 ◽  
Author(s):  
Cristian Paduraru ◽  
Kurt H. Becker ◽  
Abe Belkind ◽  
Jose L. Lopez ◽  
Y. Aranda Gonzalvo
Keyword(s):  
Hollow Cathode ◽  
Gas Flow ◽  
Hollow Cathode Discharge ◽  
Remote Plasma ◽  
Pulsed Dc

scholarly journals Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering

Coatings ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 608
Author(s):  
Guang Li ◽  
Yi Xu ◽  
Yuan Xia
Keyword(s):  
Magnetron Sputtering ◽  
Emission Intensity ◽  
Gas Flow ◽  
Optical Emission ◽  
Scratch Test ◽  
Deposition Process ◽  
Plasma Emission ◽  
Cross Sectional ◽  
Pulsed Dc ◽  
Plasma Emission Intensity

A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process.

Strain Rate Effects in Porous Materials

1998 ◽  
Vol 521 ◽  
Author(s):  
J. Lankford ◽  
K. A. Dannemann
Keyword(s):  
Strain Rate ◽  
Gas Flow ◽  
Split Hopkinson Pressure Bar ◽  
Impact Resistance ◽  
Hopkinson Pressure Bar ◽  
Porous Metals ◽  
Strain Rate Effects ◽  
Open Cell ◽  
Rate Dependent ◽  
The Impact

ABSTRACTThe behavior of metal foams under rapid loading conditions is assessed. Dynamic loading experiments were conducted in our laboratory using a split Hopkinson pressure bar apparatus and a drop weight tester; strain rates ranged from 45 s−1 to 1200 s−1. The implications of these experiments on open-cell, porous metals, and closed- and open-cell polymer foams are described. It is shown that there are two possible strain-rate dependent contributors to the impact resistance of cellular metals: (i) elastic-plastic resistance of the cellular metal “skeleton,” and (ii) the gas pressure generated by gas flow within distorted open cells. A theoretical basis for these implications is presented.

Microstructure Analysis of TaN/Cu Nanocomposite Coatings Deposited by Pulsed DC Magnetron Sputtering

2010 ◽  
Vol 123-125 ◽  
pp. 427-430
Author(s):  
T. Elangovan ◽  
D. Mangalaraj ◽  
K. Prabakar ◽  
P. Kuppusami ◽  
Shabana Khan ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Substrate Temperature ◽  
Flow Rate ◽  
Gas Flow ◽  
Xrd Analysis ◽  
Morphological Properties ◽  
Constant Flow Rate ◽  
Pulsed Dc ◽  
Transmission Electron ◽  
Thin Film Resistors

TaN-Cu nanocomposite thin films used as materials for thin-film resistors (TFR) were prepared by magnetron pulsed dc reactive sputtering. Structural and morphological properties of films deposited on (100) Si as a function of nitrogen flow rate and substrate temperature is investigated. With the introduction of N2 gas flow indicated with different phases of nanocrystalline h-Ta, Ta2N, TaN, Ta4N5 and Cu. XRD analysis of the films deposited with increasing substrate temperature at constant flow rate of nitrogen 10 sccm indicated that the nanocrystalline with bi-phasic (fcc-TaN and fcc-Cu). The microstructure of the films was investigated by scanning electron microscopy and high-resolution transmission electron microscopy.

Fabrication of Anatase TiO2 Thin Film Using Pulsed DC Magnetron Sputtering

2004 ◽  
Vol 848 ◽  
Author(s):  
Ibrahim A. Al-Homoudi ◽  
Linfeng Zhang ◽  
Erik F. McCullen ◽  
Changhe Huang ◽  
L. Rimai ◽  
...  
Keyword(s):  
Substrate Temperature ◽  
Gas Flow ◽  
Conductivity Measurement ◽  
Temperature Dependent ◽  
Electrical Conductivity Measurement ◽  
Growth Pressure ◽  
Glass Substrates ◽  
Pulsed Dc ◽  
Oxygen Gas ◽  
Pulsed Dc Magnetron Sputtering

ABSTRACTTiO2 thin films (500 – 1000 nm in thickness) were deposited using pulsed DC magnetron reactive sputtering, on glass substrates. The depositions used a Ti source in an Ar+O2 gas mixture with different parameters of power (350 - 500W), substrate temperature (no additional heat - 400°C), growth pressure (3.0 - 5.0 mTorr) and oxygen gas flow rate (6.0 - 8.0 sccm). The x-ray diffractions (XRD) show amorphous and/or anatase phases depending on the deposition conditions. The films were found to be amorphous at lower substrate temperature and at lower powers. The sample with 4 mTorr, 400W of power, a substrate temperature of 250 C with 7.0 sccm of oxygen flow has the best crystalline quality. The temperature dependent electrical conductivity measurement in air for the above films shows an exponential increase in conductivity with temperature.

scholarly journals Properties of TiC Coating by Pulsed DC PACVD

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Mahboobeh Azadi ◽  
Alireza Sabour Rouhaghdam ◽  
Shahrokh Ahangarani
Keyword(s):  
Mechanical Properties ◽  
Surface Roughness ◽  
Wear Resistance ◽  
Flow Rate ◽  
Gas Flow ◽  
High Hardness ◽  
Grazing Incidence ◽  
Knoop Hardness ◽  
Flow Rate Ratio ◽  
Pulsed Dc

In the PACVD technique, temperature and gas flow rate are two important parameters affecting the coating characteristics. Effect of these parameters on mechanical behaviors of TiC coating that was deposited on hot work tool steel (H13) was investigated in this paper. We analyzed TiC coating composition and structure with grazing incidence X-ray diffraction (GIXRD) and Fourier transformation infrared spectroscopy (FTIR). The mechanical properties of the coatings, such as microhardness, wear resistance, and surface roughness, were studied with Knoop hardness indentation, pin on disk wear tests, and atomic force microscopy, respectively. When the deposition temperature decreased from 490°C to 450°C and the CH4 to TiCl4 flow rate ratio was also increased from 1.5 to 6, TiC coating color changed from dark gray to silver. The best mechanical properties such as a high hardness (27 GPa), wear resistance, and low surface roughness were related to the coating that was deposited at 450°C.

scholarly journals Compositional, Optical and Electrical Characteristics of SiOx Thin Films Deposited by Reactive Pulsed DC Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 468 ◽  
Author(s):  
Joaquim O. Carneiro ◽  
Filipe Machado ◽  
Luis Rebouta ◽  
Mikhail I. Vasilevskiy ◽  
Senen Lanceros-Méndez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Gas Flow ◽  
Silicon Oxide ◽  
Rutherford Backscattering Spectrometry ◽  
Electrical Characteristics ◽  
Dc Magnetron Sputtering ◽  
Hydrogen Electrode ◽  
Pulsed Dc

The influence of O2 flow rate on the compositional, optical and electrical characteristics of silicon oxide (SiOx) thin films (x < 2) were studied in this work. The SiOx thin films were obtained by pulsed direct current (DC) magnetron sputtering (PMS) onto n-type Si wafers (and also on glass substrates) at a vacuum of 3 × 10−3 Pa. Rutherford backscattering spectrometry (RBS) was used to check the compositional elements of deposited films and its oxidized states were analysed via Fourier-transform infrared (FTIR) spectroscopy. The optical properties of as-deposited SiOx thin films were investigated from transmittance measurements at room temperature in the wavelength range of 250–800 nm. The obtained data reveal that the Urbach energy (a measure of the band tail extension, Eu) decreased from about 523 to 172 meV as the rate of oxygen gas flow increased. On the contrary, the optical energy band-gap (Eg) increased from 3.9 to 4.2 eV. Conduction and valance band positions (relative to the normal hydrogen electrode) were also evaluated. The observed behavior is probably associated with the degree of disorder and defects presented in the as-deposited SiOx thin films, probably due to the presence of newly inserted oxidized OnSiHy species resulting from some contamination with water vapor desorbed from the walls of the deposition vacuum chamber. After deposition of a gold top electrode, the electrical characteristics of the fabricated Au/SiOx/n-Si system (i.e., a metal/insulator/semiconductor structure—MIS) were studied via characteristic I-V curves and their dependence upon the O2 flow rate are reported. It was observed that the Au/SiOx/n-Si structure behaves like a Schottky-diode exhibiting a very good diode rectifying performance with a rectification ratio of at least 300 and up to 104, which refers to the samples produced with the lower and higher O2 flow rates, respectively. It was also found that the O2 flow rate influences the rectifying performance of the SiOx/n-structures since both the diode ideality factor, n, and the diode series-resistance, RS decreases with the increase of O2 content, possibly reflecting a closer approximation to a full stoichiometric condition.

scholarly journals Interfacial performance and impact resistance of argon plasma treated UHMWPE/STF inter-ply hybrid composites

2021 ◽  
Vol 16 ◽  
pp. 155892502110438
Author(s):  
Zixuan Liu ◽  
Keyi Wang ◽  
Huchen Wang ◽  
Letian Li ◽  
Huan Chen ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Flow Rate ◽  
Gas Flow ◽  
Treatment Time ◽  
Hybrid Composites ◽  
Impact Resistance ◽  
Gas Flow Rate ◽  
Water Contact ◽  
Ar Plasma ◽  
The Impact

This study explored the influence of low temperature glow discharged argon (Ar) plasma on interfacial performance and impact resistance of ultra-high molecular weight polyethylene (UHMWPE) inter-ply hybrid composites. The composites were composed of UHMWPE and meta-aramid plain woven laminates with shear thickening fluid (STF). Water contact angle and drop-weight resistance of the composites with various Ar plasma treatment parameters were tested to investigate the interfacial performance and impact properties of the composites. The tested treatment parameters of this study included treating time, treating power, and gas flow rate. It was found that the best interfacial adhesion of UHMWPE and the impact resistance of the composites was realized at the plasma treatment power of 100 W, treatment time of 150 s, and gas flow rate of 4 sccm. In the follow-up research, this study conducted ballistic test to further explore the bulletproof effect and application prospect of this material.

TEM evaluation of graded SixGe1-x heterolayers

1991 ◽  
Vol 49 ◽  
pp. 894-895
Author(s):  
N. David Theodore ◽  
Mamoru Tomozane ◽  
Ming Liaw
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Gas Flow ◽  
Field Effect Transistors ◽  
Chemical Vapor ◽  
Dark Field ◽  
Bipolar Transistors ◽  
Structural Quality ◽  
Weak Beam ◽  
Transmission Electron ◽  
And Behavior

There is extensive interest in SiGe for use in heterojunction bipolar transistors. SiGe/Si superlattices are also of interest because of their potential for use in infrared detectors and field-effect transistors. The processing required for these materials is quite compatible with existing silicon technology. However, before SiGe can be used extensively for devices, there is a need to understand and then control the origin and behavior of defects in the materials. The present study was aimed at investigating the structural quality of, and the behavior of defects in, graded SiGe layers grown by chemical vapor deposition (CVD).The structures investigated in this study consisted of Si1-xGex[x=0.16]/Si1-xGex[x= 0.14, 0.13, 0.12, 0.10, 0.09, 0.07, 0.05, 0.04, 0.005, 0]/epi-Si/substrate heterolayers grown by CVD. The Si1-xGex layers were isochronally grown [t = 0.4 minutes per layer], with gas-flow rates being adjusted to control composition. Cross-section TEM specimens were prepared in the 110 geometry. These were then analyzed using two-beam bright-field, dark-field and weak-beam images. A JEOL JEM 200CX transmission electron microscope was used, operating at 200 kV.

Electron Microscopy/Diffraction Study of the Ternary Mn-Er-S System

1990 ◽  
Vol 48 (1) ◽  
pp. 76-77
Author(s):  
A. R. Landa Canovas ◽  
L.C. Otero Diaz ◽  
T. White ◽  
B.G. Hyde
Keyword(s):  
Electron Microscopy ◽  
Gas Flow ◽  
Graphite Crucible ◽  
Nominal Composition ◽  
X Ray Diffraction ◽  
Alumina Crucible ◽  
X Ray ◽  
Intermediate Phases ◽  
Twin Band ◽  
Ar Gas

X-Ray diffraction revealed two intermediate phases in the system MnS+Er2S3,:MnEr2S4= MnS.Er2S3, and MnEr4S7= MnS.2Er2S3. Their structures may be described as NaCl type, chemically twinned at the unit cell level, and isostructural with CaTi2O4, and Y5S7 respectively; i.e. {l13} NaCl twin band widths are (4,4) and (4,3).The present study was to search for structurally-related (twinned B.) structures and or possible disorder, using the more sensitive and appropiate technigue of electron microscopy/diffraction.A sample with nominal composition MnEr2S4 was made by heating Mn3O4 and Er2O3 in a graphite crucible and a 5% H2S in Ar gas flow at 1500°C for 4 hours. A small amount of this material was thenannealed, in an alumina crucible, contained in sealed evacuated silica tube, for 24 days at 1100°C. Both samples were studied by X-ray powder diffraction, and in JEOL 2000 FX and 4000 EX microscopes.

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