Si-Ge heterojunction bipolar technology for high-speed integrated circuits

1996 ◽  
Vol 74 (S1) ◽  
pp. 159-166
Author(s):  
D. C. Ahlgren ◽  
S. J. Jeng ◽  
D. Nguyen-Ngoc ◽  
K. Stein ◽  
D. Sunderland ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
High Speed ◽  
High Performance ◽  
Full Range ◽  
Low Noise ◽  
Low Noise Amplifiers ◽  
Voltage Controlled Oscillators ◽  
Sige Hbt ◽  
Trade Offs ◽  
Scale Integration

This review discusses the fundamentals of SiGe epitaxial base heterojunction bipolar transistor (HBT) technology that have been developed for use in analog and mixed-signal applications in the 1–20 GHz range. The basic principles of operation of the graded base SiGe HBT are reviewed. These principles are then used to explore the design optimization for analog applications. Device results are presented that illustrate some important trade-offs in device design. A discussion of the use of UHV/CVD for the deposition of the epitaxial base profile is followed by an overview of the integrated process. This process, which has been installed on 200 mm wafers in IBM's Advanced Semiconductor Technology Center in Hopewell Junction, N.Y., also includes a full range of support devices. The process has demonstrated SiGe HBT performance, reliability, and yield in a CMOS fabrication with the addition of only one tool for UHV/CVD deposition of the epi-base and, with minimal additional process steps, can be used to fabricate full BiCMOS designs. This paper concludes with a discussion of high-performance circuits fabricated to date, including ECL ring'oscillators, power amplifiers, low-noise amplifiers, voltage-controlled oscillators, and finally a 12-bit DAC that features nearly 3000 SiGe HBT devices demonstrating medium-scale integration.

scholarly journals State-of-the-art photodetectors for optoelectronic integration at telecommunication wavelength

Nanophotonics ◽  
2015 ◽  
Vol 4 (3) ◽  
pp. 277-302 ◽  
Author(s):  
Png Ching Eng ◽  
Sun Song ◽  
Bai Ping
Keyword(s):  
Integrated Circuits ◽  
High Speed ◽  
High Performance ◽  
Low Noise ◽  
Theoretical Modelling ◽  
Critical Position ◽  
Large Bandwidth ◽  
Material Systems ◽  
Optoelectronic Integration ◽  
Review State

AbstractPhotodetectors hold a critical position in optoelectronic integrated circuits, and they convert light into electricity. Over the past decades, high-performance photodetectors (PDs) have been aggressively pursued to enable high-speed, large-bandwidth, and low-noise communication applications. Various material systems have been explored and different structures designed to improve photodetection capability as well as compatibility with CMOS circuits. In this paper, we review state-of-theart photodetection technologies in the telecommunications spectrum based on different material systems, including traditional semiconductors such as InGaAs, Si, Ge and HgCdTe, as well as recently developed systems such as low-dimensional materials (e.g. graphene, carbon nanotube, etc.) and noble metal plasmons. The corresponding material properties, fundamental mechanisms, fabrication, theoretical modelling and performance of the typical PDs are presented, including the emerging directions and perspectives of the PDs for optoelectronic integration applications are discussed.

TEM study of phosphorus-implanted pseudomorphic Si0.88Ge0.12 on Si(100)

1995 ◽  
Vol 53 ◽  
pp. 468-469
Author(s):  
N. David Theodore ◽  
Donald Y.C Lie ◽  
J. H. Song ◽  
Peter Crozier
Keyword(s):  
Integrated Circuits ◽  
Heterojunction Bipolar Transistors ◽  
Integrated Circuit ◽  
High Speed ◽  
Room Temperature ◽  
Strain Relaxation ◽  
Bipolar Transistors ◽  
Sige Hbt ◽  
Integrated Circuit Manufacturing ◽  
Microstructural Behavior

SiGe is being extensively investigated for use in heterojunction bipolar-transistors (HBT) and high-speed integrated circuits. The material offers adjustable bandgaps, improved carrier mobilities over Si homostructures, and compatibility with Si-based integrated-circuit manufacturing. SiGe HBT performance can be improved by increasing the base-doping or by widening the base link-region by ion implantation. A problem that arises however is that implantation can enhance strain-relaxation of SiGe/Si.Furthermore, once misfit or threading dislocations result, the defects can give rise to recombination-generation in depletion regions of semiconductor devices. It is of relevance therefore to study the damage and anneal behavior of implanted SiGe layers. The present study investigates the microstructural behavior of phosphorus implanted pseudomorphic metastable Si0.88Ge0.12 films on silicon, exposed to various anneals.Metastable pseudomorphic Si0.88Ge0.12 films were grown ~265 nm thick on a silicon wafer by molecular-beam epitaxy. Pieces of this wafer were then implanted at room temperature with 100 keV phosphorus ions to a dose of 1.5×1015 cm-2.

High-performance Ka-band and V-band HEMT low-noise amplifiers

1988 ◽  
Vol 36 (12) ◽  
pp. 1598-1603 ◽  
Author(s):  
K.H.G. Duh ◽  
Pane-Chane Chao ◽  
P.M. Smith ◽  
L.F. Lester ◽  
B.R. Lee ◽  
...  
Keyword(s):  
High Performance ◽  
Low Noise ◽  
Low Noise Amplifiers ◽  
Ka Band ◽  
V Band

Ultra-low Residue Flux Applications in RF Front-End Packages

2020 ◽  
Vol 2020 (1) ◽  
pp. 000125-000130
Author(s):  
Leo Hu ◽  
Sze Pei Lim
Keyword(s):  
Integrated Circuits ◽  
Flip Chip ◽  
Low Noise ◽  
Low Noise Amplifiers ◽  
Reflow Process ◽  
Reliability Study ◽  
Rf Switches ◽  
Front End ◽  
Rf Front End ◽  
Package Reliability

Abstract With the leap into the 5G era, the demand for improvements in the performance of mobile phones is on the rise. This is also true for the quantity of radio frequency (RF) front-end integrated circuits (ICs), especially for RF switches and low noise amplifiers (LNA). It is well-known that improvements in performance depend on the combination of new design, package technology, and choice of materials. Ultra-low residue (ULR) flux is an innovative, truly no-clean, flip-chip bonding material. By using ULR flux, the typical water-wash cleaning process can be removed and, in some instances, package reliability can be improved as well. This simplified assembly process will help to reduce total packaging costs. This paper will discuss the application of ULR fluxes on land grid arrays (LGAs) and quad-flat no-leads/dual-flat no-leads (QFN/DFN) packages for RF front-end ICs, as well as the reflow process. The solder joint strength and reliability study will be shared as well.

Passive Components for RF-ICs

2012 ◽  
pp. 189-214
Author(s):  
Gianluca Cornetta ◽  
David J. Santos ◽  
José Manuel Vázquez
Keyword(s):  
Integrated Circuits ◽  
Quality Factor ◽  
Silicon Substrate ◽  
Supply Voltage ◽  
Magnetic Behavior ◽  
Low Noise ◽  
Low Noise Amplifiers ◽  
Fully Integrated ◽  
Core Elements ◽  
Low Supply Voltage

The modern wireless communication industry is demanding transceivers with a high integration level operating in the gigahertz frequency range. This, in turn, has prompted intense research in the area of monolithic passive devices. Modern fabrication processes now provide the capability to integrate onto a silicon substrate inductors and capacitors, enabling a broad range of new applications. Inductors and capacitors are the core elements of many circuits, including low-noise amplifiers, power amplifiers, baluns, mixers, and oscillators, as well as fully-integrated matching networks. While the behavior and the modeling of integrated capacitors are well understood, the design of an integrated inductor is still a challenging task since its magnetic behavior is hard to predict accurately. As the operating frequency approaches the gigahertz range, device nonlinearities, coupling effects, and skin effect dominate, making difficult the design of critical parameters such as the self-resonant frequency, the quality factor, and self and mutual inductances. However, despite the parasitic effects and the low quality-factor, integrated inductors still allow for the implementation of integrated circuits with improved performances under low supply voltage. In this chapter, the authors review the technology behind monolithic capacitors and inductors on silicon substrate for high-frequency applications, with major emphasis on physical implementation and modeling.

Bipolar device technology challenge and opportunity

1985 ◽  
Vol 63 (6) ◽  
pp. 683-692 ◽  
Author(s):  
H. D. Barber
Keyword(s):  
Integrated Circuits ◽  
High Speed ◽  
Low Cost ◽  
Chemical Vapor ◽  
Low Noise ◽  
Isolation Techniques ◽  
Propagation Delays ◽  
Technological Barriers ◽  
On Chip ◽  
Bipolar Device

Silicon bipolar device technologies provided 65% of the world's integrated circuits in 1983. Where low noise, high current, low or high voltage, high speed or low cost are required, bipolar technologies are used. This paper will review the present status of bipolar device technologies, which make possible 100-ps gate-propagation delays, 150-μm2 gate areas, 1-GHz bandwidth amplifiers, on-chip control of over 1-A, 350-V operation, 14-GHz fT's and 10-ns. analogue-to-8-bit digital conversion. These devices are realized because of advances in isolation techniques, chemical-vapor deposition, photolithography, diffusion, ion implantation, conductor–contact interconnection technology, etching processes, and materials preparation. This paper will discuss some of the fundamental problems, modelling difficulties, and technological barriers that will impact the future development of bipolar integrated circuits.

A High-Performance Interface ASIC for Quartz Rate Sensor

2011 ◽  
Vol 483 ◽  
pp. 471-474
Author(s):  
Wei Ping Chen ◽  
Qing Yi Wang ◽  
Liang Yin ◽  
Zhi Ping Zhou
Keyword(s):  
Integrated Circuits ◽  
Power Consumption ◽  
High Performance ◽  
Low Noise ◽  
Stable Operation ◽  
Cmos Process ◽  
Test Results ◽  
Bias Stability ◽  
Output Noise ◽  
Rate Sensor

In this work, an ASIC interface for quartz rate sensor (QRS) is introduced. Based on 0.6μm 18V N-well CMOS process, it is the first to be realized in the domestic. This chip has a minimized size of 5×4.4mm2. Compared with traditional interface constructed by separate devices, such interface implemented with integrated circuits is advantageous in size and power consumption. This satisfies the requirements of miniature and low power consumption in space industry and military domain. The test results show that this interface features low noise, high linearity, and stable operation. Integrated with the sensor, the entire system presents high performance in short term bias stability, nonlinearity, output noise, bias variation over temperature, and power consumption.

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