A SELF-RECTIFYING BIPOLAR RRAM DEVICE BASED ON Ni/HfO2/n+-Si STRUCTURE
Keyword(s):
The Self
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A bipolar RRAM device based on Ni / HfO 2/n+- Si structure with self-rectifying characteristics is demonstrated for high density cross-bar memory application. Experimental results indicate that Ni conductive filament generated at LRS plays an important role in resistive switching, resulting in the formation of a Schottky junction at the Ni -CF/n+- Si interface which determines the self-rectifying behavior at LRS. These results are very important from the point of view of understanding the self-rectifying switching mechanism and improving the resistive switching characteristics of self-rectifying RRAM devices.
Keyword(s):
2013 ◽
Vol 685
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pp. 201-206
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2015 ◽
Vol 2015
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pp. 1-7
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2020 ◽
Vol 34
(28)
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pp. 2050267