Room-temperature oxidation of ultrathin TiB2 films

2002 ◽  
Vol 17 (4) ◽  
pp. 805-813 ◽  
Author(s):  
Feng Huang ◽  
W. J. Liu ◽  
J. F. Sullivan ◽  
J. A. Barnard ◽  
M. L. Weaver
Keyword(s):  
Magnetic Recording ◽  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Oxide Thickness ◽  
Temperature Oxidation ◽  
X Ray ◽  
Force Microscopy ◽  
Application Potential ◽  
New Perspective ◽  
Protective Overcoats

Titanium diboride has been claimed as a very promising candidate material for protective applications in the magnetic recording. Its oxidation resistance at room temperature is a critical criterion in assessing this application potential. In this paper, the oxidation characteristics of ultrathin TiB2 thin films, such as overcoat erosion and oxide thickness, are investigated via a combination of x-ray reflectivity, x-ray photoelectron spectroscopy (XPS), and atomic force microscopy. It was found that a <2-h exposure to air at room temperature led to the formation of approximately 15-Å-thick, well-defined oxides at the expense of an approximately 9-Å erosion of the TiB2 overcoats, coupled with the existence of a sharp oxide/TiB2 interface. XPS studies confirmed the existence of the oxides. Considering the decreasing allowable thickness for such protective overcoats, oxidation and the resultant thickness gain negate such a potential of ultrathin TiB2 films. The results in our current report provide a new perspective on its potential as protective overcoats in magnetic recording.

Morphology of Silver Thin Films Deposited on TiO2(110) Surfaces

1998 ◽  
Vol 05 (01) ◽  
pp. 387-392 ◽  
Author(s):  
D. Abriou ◽  
D. Gagnot ◽  
J. Jupille ◽  
F. Creuzet
Keyword(s):  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Oxygen Vacancies ◽  
Two Dimensional ◽  
Silver Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Silver Deposits ◽  
Silver Thin Films

The growth mode of silver films deposited at room temperature on TiO 2(110) surfaces has been examined by means of atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions, On clean vacancy-free TiO 2(110) surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved, furthermore, the influence of surface oxygen vacancies on the growth of Ag/TiO 2(110) is evidenced by well-characterized differences in the morphology of 9-nm-thick silver deposits.

Interaction of salicylic acid with zirconium diphosphate and its reactivity toward uranium (VI)

2018 ◽  
Vol 106 (4) ◽  
pp. 291-300
Author(s):  
Nidia García-González ◽  
Eduardo Ordoñez-Regil ◽  
María Guadalupe Almazán-Torres ◽  
Eric Simoni
Keyword(s):  
Salicylic Acid ◽  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Analytical Techniques ◽  
Batch Method ◽  
Sorption Data ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Surface Modified

AbstractThe interaction of salicylic acid with zirconium diphosphate surface and its reactivity toward uranium (VI) was investigated. The interaction of salicylic acid with zirconium diphosphate was firstly studied using several analytical techniques including atomic force microscopy, scanning electron microscopy and X-ray photoelectron spectroscopy. The sorption of uranium (VI) onto surface-modified zirconium diphosphate was evaluated by the classical batch method at room temperature. This study showed that the uranium (VI) sorption onto zirconium diphosphate is influenced by the presence of salicylic acid. A fluorescence spectroscopy study revealed the presence of a uranyl specie onto the modified solid surface. The spectroscopy results were then used to restrain the modeling of experimental sorption data, which are interpreted in terms of a constant capacitance model using the FITEQL code. The results indicated that interaction between the uranium (VI) and the surface of zirconium diphosphate modified with salicylic acid leads to the formation of a ternary surface complex.

Oxidation Behavior of Pd-Si Compounds

1982 ◽  
Vol 18 ◽  
Author(s):  
A. Cros ◽  
R. A. Pollak ◽  
K. N. Tu
Keyword(s):  
Chemical Analysis ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Room Temperature ◽  
Oxidation Behavior ◽  
Spillover Effect ◽  
Photoemission Spectroscopy ◽  
Temperature Oxidation ◽  
X Ray ◽  
Oxygen Dissociation

The room temperature oxidation of PdSi, Pd2Si and Pd4Si has been studied using X-ray photoelectron spectroscopy (X-ray photoemission spectroscopy or electron spectroscopy for chemical analysis). We find that only silicon atoms in these silicides are oxidized and the oxidation of Pd4Si surfaces is enhanced compared with that of Pd2Si and PdSi, as is evidenced by both a higher silicon oxidation state and thicker oxide films. This behavior is discussed in terms of silicide stability and a spillover effect where palladium atoms catalyze molecular oxygen dissociation.

scholarly journals The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO2 Layers Produced by Means of the E-BEAM Technique

Materials ◽  
2021 ◽  
Vol 14 (19) ◽  
pp. 5863
Author(s):  
Katarzyna Jurek ◽  
Robert Szczesny ◽  
Marek Trzcinski ◽  
Arkadiusz Ciesielski ◽  
Jolanta Borysiuk ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Dielectric Films ◽  
X Ray ◽  
Force Microscopy ◽  
Titanium Dioxide Films ◽  
Transmission Electron ◽  
Two Phases ◽  
Beam Technique

Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, transmission electron microscopy, and spectroscopic ellipsometry. The applied experimental techniques allowed us to characterize the phase composition and the phase transformation of the fabricated TiO2 coatings. The films produced at room temperature are amorphous but after annealing consist of anatase crystallites. The layers fabricated at 227 °C contain both anatase and rutile phases. In this case the anatase crystallites are accumulated near the substrate interface whilst the rutile crystallites were formed closer to the surface of the TiO2 film. It should be emphasized that these two phases of TiO2 are distinctly separated from each other.

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Nitrogen (N2) Implantation to Suppress Growth of Interfacial Oxide in Mocvd Bst and Sputtered Bst Films

1999 ◽  
Vol 567 ◽  
Author(s):  
Renee Nieh ◽  
Wen-Jie Qi ◽  
Yongjoo Jeon ◽  
Byoung Hun Lee ◽  
Aaron Lucas ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Interfacial Layer ◽  
Gate Dielectric ◽  
Nitrogen Concentration ◽  
Chemical Vapor ◽  
Future Generation ◽  
Oxide Thickness ◽  
Layer Growth ◽  
X Ray ◽  
Bst Films

ABSTRACTBa0.5Sr0.5TiO3 (BST) is one of the high-k candidates for replacing SiO2 as the gate dielectric in future generation devices. The biggest obstacle to scaling the equivalent oxide thickness (EOT) of BST is an interfacial layer, SixOy, which forms between BST and Si. Nitrogen (N2) implantation into the Si substrate has been proposed to reduce the growth of this interfacial layer. In this study, capacitors (Pt/BST/Si) were fabricated by depositing thin BST films (50Å) onto N2 implanted Si in order to evaluate the effects of implant dose and annealing conditions on EOT. It was found that N2 implantation reduced the EOT of RF magnetron sputtered and Metal Oxide Chemical Vapor Deposition (MOCVD) BST films by ∼20% and ∼33%, respectively. For sputtered BST, an implant dose of 1×1014cm−;2 provided sufficient nitrogen concentration without residual implant damage after annealing. X-ray photoelectron spectroscopy data confirmed that the reduction in EOT is due to a reduction in the interfacial layer growth. X-ray diffraction spectra revealed typical polycrystalline structure with (111) and (200) preferential orientations for both films. Leakage for these 50Å BST films is on the order of 10−8 to 10−5 A/cm2—lower than oxynitrides with comparable EOTs.

scholarly journals Synthesis of Magnetic Ferrocene-Containing Polymer with Photothermal Effects for Rapid Degradation of Methylene Blue

Polymers ◽  
2021 ◽  
Vol 13 (4) ◽  
pp. 558
Author(s):  
Wenhui Zhu ◽  
Caiyun Zhang ◽  
Yali Chen ◽  
Qiliang Deng
Keyword(s):  
Methylene Blue ◽  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Degradation Rate ◽  
Model Compound ◽  
Vibrating Sample Magnetometer ◽  
Simulated Sunlight ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ft Ir

Photothermal materials are attracting more and more attention. In this research, we synthesized a ferrocene-containing polymer with magnetism and photothermal properties. The resulting polymer was characterized by Fourier-transform infrared (FT-IR), vibrating sample magnetometer (VSM), scanning electron microscope (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and thermogravimetric analysis (TGA). Its photo-thermocatalytic activity was investigated by choosing methylene blue (MB) as a model compound. The degradation percent of MB under an irradiated 808 nm laser reaches 99.5% within 15 min, and the degradation rate is 0.5517 min−1, which is 145 times more than that of room temperature degradation. Under irradiation with simulated sunlight, the degradation rate is 0.0092 min−1, which is approximately 2.5 times more than that of room temperature degradation. The present study may open up a feasible route to degrade organic pollutants.

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