Laser Induced Phase Transformations in Thin Insb Films

1993 ◽  
Vol 311 ◽  
Author(s):  
L.L. Chou ◽  
M.M. Kuo
Keyword(s):  
Phase Transformations ◽  
Laser Power ◽  
Room Temperature ◽  
Flash Evaporation ◽  
Glass Substrates ◽  
Grain Sizes ◽  
Transmission Electron ◽  
Average Grain Size ◽  
Migration Mechanism ◽  
20 Nm

ABSTRACTThin In46Sb54 films have been prepared on glass substrates by flash evaporation. Films of 1000 Å were deposited at room temperature. After 7 mins' thermal annealing at 450ºC, an average grain size increased from 20 nm to 200 nm. Under exposure to a Fraunhofer diffracted pulsed Nd-YAG laser beam, the films showed different microstructures for different applied laser power. In general, five regions are identified: ablation region, regions with grain sizes less than 20 nm, grain sizes ranging from 400 to 1000 nm, grain sizes ranging from 200 to 400 nm and unchanged region. The previous five regions are counted from the center of the exposed area outward. The pulse duration is 16 ns. In this paper, an atomic migration mechanism is proposed to explain the power dependent microstructures changes. Transmission electron microscopy was mainly used to characterize the films. The application of this type of phase transformations in the phase change optical storage is also discussed.

Characteristics of nanophase TiAl produced by inert gas condensation

1992 ◽  
Vol 7 (11) ◽  
pp. 2962-2970 ◽  
Author(s):  
H. Chang ◽  
C.J. Altstetter ◽  
R.S. Averback
Keyword(s):  
Electron Microscopy ◽  
Room Temperature ◽  
Large Fraction ◽  
Inert Gas ◽  
Full Density ◽  
Indentation Creep ◽  
Small Component ◽  
Grain Sizes ◽  
Transmission Electron ◽  
20 Nm

Nanophase TiAl, with grain sizes in the range of 10–20 nm, was synthesized by magnetron sputtering in an inert gas atmosphere and consolidated, in situ, under vacuum. The properties of the powders and sintered compacts were studied by transmission electron microscopy, scanning electron microscopy, calorimetry, Rutherford backscattering, and x-ray diffraction. Samples compacted at 1.0 GPa at room temperature had a large fraction of amorphous phase, while samples compacted at the same pressure and 250 °C were predominantly the equilibrium γ phase. An enthalpy change of 22 kJ/g-atom was measured during a DSC scan over the temperature range 125–450 °C, which is approximately the range over which crystallization occurs. Nearly full density could be achieved by sintering at 450 °C without significant, concomitant grain growth. The Vickers microhardness of these samples at room temperature and at −30 °C revealed an inverse Hall–Petch relationship at small grain sizes, 10–30 nm, and the usual Hall–Petch behavior at larger grain sizes. A small component of indentation creep was also observed. The maximum hardness is 4 times larger than that of a cast TiAl specimen of the same composition. The Vickers hardness was also observed to decrease rapidly with temperature above 200 °C.

SURFACE CHARACTERIZATION AND GRAIN SIZE CALCULATION OF SILVER FILMS DEPOSITED BY THERMAL EVAPORATION

2005 ◽  
Vol 12 (05n06) ◽  
pp. 759-766 ◽  
Author(s):  
MUHAMMAD MAQBOOL ◽  
TAHIRZEB KHAN
Keyword(s):  
Grain Size ◽  
Surface Characterization ◽  
Room Temperature ◽  
Thermal Evaporation ◽  
Xrd Analysis ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Average Grain Size ◽  
20 Nm

Thin films of pure silver were deposited on glass substrate by thermal evaporation process at room temperature. Surface characterization of the films was performed using X-ray diffraction (XRD) and Atomic Force Microscopy (AFM). Thickness of the films varied between 20 nm and 60 nm. XRD analysis provided a sharp peak at 38.75° from silver. These results indicated that the films deposited on glass substrates at room temperature are crystalline. 3D and top view pictures of the films were obtained by AFM to study the grain size and its dependency on various factors. Grain sizes were calculated using the XRD results and Scherer's formula. Average grain size increased with the thickness of the deposited films. A minimum grain size of 8 nm was obtained for 20 nm thick films, reaching a maximum value of 41.9 nm when the film size reaches 60 nm. We could not find any sequential variation in the grain size with the growth rate.

ATOMIC FORCE MICROSCOPY AND XRD ANALYSIS OF SILVER FILMS DEPOSITED BY THERMAL EVAPORATION

2006 ◽  
Vol 20 (02) ◽  
pp. 217-231 ◽  
Author(s):  
MUHAMMAD MAQBOOL ◽  
TAHIRZEB KHAN
Keyword(s):  
Atomic Force Microscopy ◽  
Grain Size ◽  
Surface Characterization ◽  
Room Temperature ◽  
Thermal Evaporation ◽  
Xrd Analysis ◽  
Force Microscopy ◽  
Atomic Force ◽  
Average Grain Size ◽  
20 Nm

Thin films of pure silver were deposited on glass substrate by thermal evaporation process at room temperature. Surface characterization of the films was performed using X-ray diffraction (XRD) and atomic force microscopy (AFM). Thickness of the films varied between 20 nm and 72.8 nm. XRD analysis provided a sharp peak at 38.75° from silver. These results indicated that the films deposited on glass substrates at room temperature are crystalline. Three-dimension and top view pictures of the films were obtained by AFM to study the grain size and its dependency on various factors. Average grain size increased with the thickness of the deposited films. A minimum grain size of 8 nm was obtained for 20 nm thick films, reaching 41.9 nm when the film size reaches 60 nm. Grain size was calculated from the information provided by the XRD spectrum and averaging method. We could not find any sequential variation in the grain size with the growth rate.

A Facile Fynthesis of ZnS Nanostructures via Liquid-Solid Reactions

2014 ◽  
Vol 979 ◽  
pp. 184-187
Author(s):  
Weerachon Phoohinkong ◽  
Thitinat Sukonket ◽  
Udomsak Kitthawee
Keyword(s):  
Electron Microscopy ◽  
Room Temperature ◽  
Inorganic Salts ◽  
Chloride Salt ◽  
X Ray ◽  
Commercial Grade ◽  
Transmission Electron ◽  
Salt Addition ◽  
20 Nm ◽  
Scanning Electron

Zinc sulfide (ZnS) nanostructures are important materials for many technologies such as sensors, infrared windows, transistors, LED displays, and solar cells. However, many methods of synthesizing ZnS nanostructures are complex and require expensive equipment. In this study, a liquid-solid chemical reaction without surfactant was used to synthesize ZnS at room temperature. In addition, commercial grade zinc oxide (ZnO) particles were used as a precursor. The effect of the addition of acids and inorganic salts were investigated. The products were characterized by field emission scanning electron microscopy (FESEM) coupled with energy-dispersive X-ray spectroscopy (EDX), and transmission electron microscopy (TEM). The results show that the nanoparticles of ZnS were obtained in hydrochloric acid and acetic acid addition. The diameters were in the range of 10 to 20 nm and 50 to 100 nm, respectively. In the case of a sodium chloride salt addition, a ZnS structure was obtained with a particle size of approximately 5 nm and a flake-like morphology.

AlSb THIN FILMS PREPARED BY DC MAGNETRON SPUTTERING AND ANNEALING

2008 ◽  
Vol 22 (14) ◽  
pp. 2275-2283 ◽  
Author(s):  
WEIDONG CHEN ◽  
LIANGHUAN FENG ◽  
ZHI LEI ◽  
JINGQUAN ZHANG ◽  
FEFE YAO ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Efficiency ◽  
Dark Conductivity ◽  
Aluminum Antimonide ◽  
Dc Magnetron Sputtering ◽  
Glass Substrates ◽  
Average Grain Size ◽  
P Type ◽  
20 Nm

Aluminum antimonide (AlSb) is thought to be a potential material for high efficiency solar cells. In this paper, AlSb thin films have been fabricated by DC magnetron sputtering on glass substrates. The sputtering target consists of aluminum and antimony, and the area ratio of Al to Sb is 7:3, which is derived from research into the relationship between the deposition rates of both the metals and sputtering power. XRD and AFM measurements show that the as-deposited films are amorphous, but become polycrystalline with an average grain size of about 20 nm after annealing in an argon atmosphere. From optical absorption measurements of annealed AlSb films, a band gap of 1.56 eV has been demonstrated. Hall measurements show that the films are p-type semiconductors. The temperature dependence of dark conductivity tested in vacuum displays a linear lnσ to 1/T curve, which indicates a conductivity activation energy of around 0.61 eV.

Low-Temperature Magnetic Hysteresis in Nd(Pr)-Fe-B Nanostructured Alloys with Nd2Fe14B Type Main Phase Composition

2018 ◽  
Vol 386 ◽  
pp. 125-130 ◽  
Author(s):  
Dmitriy Sergeevich Neznakhin ◽  
Galina Aleksandrovna Politova ◽  
Lev Aleksandrovich Ivanov ◽  
Aleksey Sergeevich Volegov ◽  
Denis Ivanovich Gorbunov ◽  
...  
Keyword(s):  
Room Temperature ◽  
Magnetic Energy ◽  
Magnetic Phase ◽  
Magnetic Hysteresis ◽  
Nanostructured Alloys ◽  
Grain Sizes ◽  
Energy Product ◽  
Magnetization Saturation ◽  
Average Grain Size ◽  
Hysteresis Properties

Magnetic hysteresis properties of nanostructured industrially manufactured Nd-Fe-B and Pr-Fe-B alloys on the base of a tetragonal Nd2Fe14B (2-14-1) hard magnetic phase (MQP-B, MQP-B+ and MQP-16-7 brands) have been investigated at 4.2 K in magnetic fields up to 58 T. The chemical composition of the alloys given in the certificates was defined more precisely. The grain sizes of the main 2-14-1 phase were determined. The average grain size is much smaller than a critical single domain diameter. Coercivity, remanence magnetization, saturation magnetization and maximal magnetic energy product were determined at 4.2 K and compared with those obtained at room temperature.

scholarly journals Photo-acoustic properties of nanoTiO2:Er

2016 ◽  
Vol 5 (4) ◽  
pp. 196
Author(s):  
R. Palomino-Merino ◽  
R. Lozada-Morales ◽  
J. Martínez-Juárez ◽  
G. Juárez-Díaz ◽  
J. Carmona-Rodriguez ◽  
...  
Keyword(s):  
Room Temperature ◽  
Sol Gel ◽  
Acoustic Properties ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Average Grain Size ◽  
Electron Dispersion ◽  
Er Doped ◽  
Spectroscopy Optical

Nanocrystalline Er-doped TiO2 was prepared by sol-gel at room temperature. X-ray diffraction, photoacoustic spectroscopy (optical absorption), transmission electron microscopy (TEM), and electron dispersion microscopy (EDS) were carried out on both as-prepared and thermally-annealed (air at 700 ºC) samples, revealing the anatase crystalline phase of TiO2. The samples exhibit an average grain size from 38 to 5.1 nm, as the nominal concentration of Er varies from 0 % to 7 %. The photoacoustic spectra evidence the absorption edge at 300 nm attributed to TiO2, as well as several electronic transitions which are atomic energy absorption-line levels characteristics of Er.

Dielectric Properties of Nanograined BaTiO3 Ceramics Fabricated by Aerosol Deposition Method

2011 ◽  
Vol 485 ◽  
pp. 183-186 ◽  
Author(s):  
Tsutomu Furuta ◽  
Saki Hatta ◽  
Yoichi Kigoshi ◽  
Takuya Hoshina ◽  
Hiroaki Takeda ◽  
...  
Keyword(s):  
Grain Size ◽  
Room Temperature ◽  
Annealing Treatment ◽  
Aerosol Deposition ◽  
Dielectric Measurement ◽  
Deposition Method ◽  
Grain Sizes ◽  
Average Grain Size ◽  
Aerosol Deposition Method ◽  
Polarization Electric Field

Freestanding BaTiO3 ceramics films were fabricated using the aerosol deposition (AD) method and the size effect of nanograined BaTiO3 ceramics was demonstrated. Dense BaTiO3 thick film fabricated by the AD method was crystallized and detached from substrate by an annealing treatment at 600 °C, and then the grain size was controlled by a reannealing treatment at various temperatures. As a result, freestanding BaTiO3 thick films with various grain sizes from 24 to 170 nm were successfully obtained. Polarization–electric field (P–E) measurement revealed that BaTiO3 ceramics with grain sizes of more than 58 nm showed ferroelectricity, whereas BaTiO3 ceramics with an average grain size of 24 nm showed paraelectricity at room temperature. Dielectric measurement indicated that the permittivity decreased with decreasing grain size in the range of 170 to 24 nm.

Characterization of pulsed laser deposited PbO/MoS2 by transmission electron microscopy

1994 ◽  
Vol 9 (1) ◽  
pp. 236-245 ◽  
Author(s):  
S.D. Walck ◽  
M.S. Donley ◽  
J.S. Zabinski ◽  
V.J. Dyhouse
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Sodium Chloride ◽  
Room Temperature ◽  
Film Growth ◽  
Composite Films ◽  
Pulsed Laser ◽  
Two Phase ◽  
Transmission Electron ◽  
20 Nm

Films of PbO/MoS2, grown by pulsed laser deposition, exhibit a significant improvement in tribological performance compared to MoS2 films grown by the same process. The microstructure and crystallography of PbO/MoS2 composite films were investigated using transmission electron microscopy (TEM) to identify the features responsible for this tribological improvement. Self-supporting samples were prepared from pulsed laser deposited, PbO/MoS2 thin films grown on single crystal sodium chloride substrates. Films deposited at room temperature exhibited a two-phase microstructure with one of the phases being amorphous. X-ray microanalysis results showed that the crystalline phase had significantly higher concentration ratios of Mo/Pb, Mo/S, and Pb/S than did the amorphous phase. Films grown at 300 °C were polycrystalline, with a grain size of about 20 nm, and had a NaCl type structure which was isomorphous to PbS. The grains had rectangular shape, and exhibited preferred orientation with the sodium chloride substrate. The concentration of S for these films was approximately 80% of the S concentration for films grown at room temperature. Both the high temperature and room temperature films had S concentrations which were higher than expected from the MoS2 in the target; this was attributed to gettering of the S in the vacuum chamber by Pb. The electron diffraction results, together with previously published results, suggest that the crystal structure of the phases in these films is not responsible for the improvement in tribological properties. However, the microstructural components formed during film growth do determine the wear-induced chemical reaction pathways.

Chemically disordered Ni3Al synthesized by high vacuum evaporation

1991 ◽  
Vol 6 (10) ◽  
pp. 2019-2021 ◽  
Author(s):  
S.R. Harris ◽  
D.H. Pearson ◽  
C.M. Garland ◽  
B. Fultz
Keyword(s):  
Liquid Nitrogen ◽  
Room Temperature ◽  
Single Phase ◽  
High Vacuum ◽  
Liquid Nitrogen Temperature ◽  
Vacuum Evaporation ◽  
Scanning Calorimetry ◽  
X Ray ◽  
Transmission Electron ◽  
Average Grain Size

Films of chemically disordered fcc Ni3Al were synthesized by the vacuum evaporation of Ni3Al onto room temperature and liquid nitrogen temperature substrates. X-ray diffractometry and transmission electron microscopy showed the material to be single phase with an average grain size of about 4 nm. The formation of the equilibrium L12 ordered phase occurred simultaneously with grain growth at temperatures above 350°C. Differential scanning calorimetry provided ordering enthalpies of 7 kJ/mole and 9 kJ/mole for material evaporated onto room temperature and liquid nitrogen temperature substrates, respectively.

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