Post-Deposition Sulfur Incorporation into CuInSe2 Thin Films

2001 ◽  
Vol 668 ◽  
Author(s):  
Jochen Titus ◽  
Hans-Werner Schock ◽  
Robert W. Birkmire ◽  
William N. Shafarman ◽  
Udai P. Singh
Keyword(s):  
Thin Films ◽  
Borosilicate Glass ◽  
Phenomenological Model ◽  
Film Surface ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Film Composition ◽  
Initial Film ◽  
Surface Phases ◽  
Post Deposition

ABSTRACTThe effect of initial film composition and substrate in the sulfurization of CuInSe2 was investigated. CuInSe2 films deposited on either soda-lime glass (SL) or Corning 7059® borosilicate glass (7059) substrates were reacted in flowing H2S for times from 1 to 8 hours. Films with Cu-rich composition, Cu/In > 1, reacted for 1 hour had nearly all the Se replaced by S. For Cu-poor films the incorporation of S was significantly reduced. In addition, in Cu-poor films on SL glass CuInS2 and NaInS2 were found at the film surface. These phases were not detected in films on 7059 substrates or in Cu-rich films. A phenomenological model is proposed to explain the formation of segregated surface phases in Cu-poor films on SL substrates.

Hydrophilic Properties of TiO2-Al2O3 Composite Thin Films

2005 ◽  
Vol 475-479 ◽  
pp. 3897-3900
Author(s):  
Qing Ju Liu ◽  
Jin Zhang ◽  
Zhongqi Zhu ◽  
Yingxia Jin ◽  
Qing Hui Wang
Keyword(s):  
Thin Films ◽  
Doping Concentration ◽  
Sol Gel ◽  
Composite Films ◽  
Film Surface ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Composite Thin Films ◽  
Al2o3 Composite ◽  
Al2o3 Doping

TiO2-Al2O3 composite thin films were fabricated on soda-lime glass with sol-gel technology. By measuring the contact angle of water with the film surface and the analysis of the XRD and XPS, we studied the influence of Al2O3 doping concentration and film thickness on the hydrophilicity of the composite films. The results indicate that the doping of Al2O3 into TiO2 and the relatively large thickness of the films can improve their hydrophilicity.

scholarly journals Preparation and Characterization ofSb2Te3Thin Films by Coevaporation

2010 ◽  
Vol 2010 ◽  
pp. 1-4 ◽  
Author(s):  
Bin Lv ◽  
Songbai Hu ◽  
Wei Li ◽  
Xia Di ◽  
Lianghuan Feng ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Photoelectron Spectroscopy ◽  
Electrical Transport ◽  
Film Surface ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Conductivity Measurements ◽  
X Ray ◽  
Thin Film Surface

Deposition ofSb2Te3thin films on soda-lime glass substrates by coevaporation of Sb and Te is described in this paper.Sb2Te3thin films were characterized by x-ray diffraction (XRD), x-ray fluorescence (XRF), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), electrical conductivity measurements, and Hall measurements. The abnormal electrical transport behavior occurred fromin situelectrical conductivity measurements. The results indicate that as-grownSb2Te3thin films are amorphous and undergo an amorphous-crystalline transition after annealing, and the posttreatment can effectively promote the formation of Sb-Te bond and prevent oxidation of thin film surface.

Investigation on the Properties of Sb-Doped CdTe Thin Films

2013 ◽  
Vol 275-277 ◽  
pp. 2018-2022 ◽  
Author(s):  
Song Feng ◽  
Rong Ping Li ◽  
Lei Tian ◽  
Kai Zou ◽  
Yong Sheng Liu
Keyword(s):  
Thin Films ◽  
Optical Absorption ◽  
Film Surface ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Preferential Growth ◽  
Cubic Crystal ◽  
Glass Substrates ◽  
Cdte Thin Films ◽  
Preferential Growth Orientation

Pure CdTe thin films and metal Sb-doped CdTe thin films are prepared on soda lime glass substrates by vacuum evaporation method. The prepared films have a cubic crystal structure with a preferential growth orientation along CdTe (111) crystal orientation. The experimental results show that the film surface doped Sb is more compact and uniform. And doping Sb in pure CdTe thin films significantly enhance the optical absorption and reduce the width of the band gap, which means that the optical absorption range of CdTe thin films can be widened. Finally, on the aspect of electrical properties, the resistivity of the thin films has significantly been lower.

AFM Study of Surface Morphology of Aluminum Nitride Thin Films

1995 ◽  
Vol 388 ◽  
Author(s):  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura ◽  
Shigekazu Hirayama ◽  
Yuusaku Naota
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Substrate Temperature ◽  
Single Crystal ◽  
Room Temperature ◽  
Ion Beam ◽  
Soda Lime ◽  
Silicon Single Crystal ◽  
Soda Lime Glass ◽  
Average Roughness

AbstractAluminum nitride (AlN) thin films have been synthesized by ion-beam assisted deposition method. Film deposition has been performed on the substrates of silicon single crystal, soda-lime glass and alumin A. the influence of the substrate roughness on the film roughness is studied. the substrate temperature has been kept at room temperature and 473K and the kinetic energy of the incident nitrogen ion beam and the deposition rate have been fixed to 0.5 keV and 0.07 nm/s, respectively. the microstructure of the synthesized films has been examined by X-ray diffraction (XRD) and the surface morphology has been observed by atomic force microscopy(AFM). IN the XRD patterns of films synthesized at both room temperature and 473K, the diffraction line indicating the alN (10*0) can be discerned and the broad peak composed of two lines indicating the a1N (00*2) and a1N (10*1) planes is also observed. aFM observations for 100 nm films reveal that (1) the surface of the films synthesized on the silicon single crystal and soda-lime glass substrates is uniform and smooth on the nanometer scale, (2) the average roughness of the films synthesized on the alumina substrate is similar to that of the substrate, suggesting the evaluation of the average roughness of the film itself is difficult in the case of the rough substrate, and (3) the average roughness increases with increasing the substrate temperature.

scholarly journals Origin of Mangetotransport Properties in APCVD Deposited Tin Oxide Thin Films

Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5182
Author(s):  
Krunoslav Juraić ◽  
Davor Gracin ◽  
Matija Čulo ◽  
Željko Rapljenović ◽  
Jasper Rikkert Plaisier ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Tin Oxide ◽  
Texture Coefficient ◽  
Chemical Vapour ◽  
Visible Spectrum ◽  
Soda Lime ◽  
Fine Tuning ◽  
Soda Lime Glass ◽  
Charge Carrier Density

Transparent conducting oxides (TCO) with high electrical conductivity and at the same time high transparency in the visible spectrum are an important class of materials widely used in many devices requiring a transparent contact such as light-emitting diodes, solar cells and display screens. Since the improvement of electrical conductivity usually leads to degradation of optical transparency, a fine-tuning sample preparation process and a better understanding of the correlation between structural and transport properties is necessary for optimizing the properties of TCO for use in such devices. Here we report a structural and magnetotransport study of tin oxide (SnO2), a well-known and commonly used TCO, prepared by a simple and relatively cheap Atmospheric Pressure Chemical Vapour Deposition (APCVD) method in the form of thin films deposited on soda-lime glass substrates. The thin films were deposited at two different temperatures (which were previously found to be close to optimum for our setup), 590 °C and 610 °C, and with (doped) or without (undoped) the addition of fluorine dopants. Scanning Electron Microscopy (SEM) and Grazing Incidence X-ray Diffraction (GIXRD) revealed the presence of inhomogeneity in the samples, on a bigger scale in form of grains (80–200 nm), and on a smaller scale in form of crystallites (10–25 nm). Charge carrier density and mobility extracted from DC resistivity and Hall effect measurements were in the ranges 1–3 × 1020 cm−3 and 10–20 cm2/Vs, which are typical values for SnO2 films, and show a negligible temperature dependence from room temperature down to −269 °C. Such behaviour is ascribed to grain boundary scattering, with the interior of the grains degenerately doped (i.e., the Fermi level is situated well above the conduction band minimum) and with negligible electrostatic barriers at the grain boundaries (due to high dopant concentration). The observed difference for factor 2 in mobility among the thin-film SnO2 samples most likely arises due to the difference in the preferred orientation of crystallites (texture coefficient).

scholarly journals Characterization of MgO:Cd thin films grown by SILAR method

2018 ◽  
Vol 96 (7) ◽  
pp. 804-809 ◽  
Author(s):  
Harun Güney ◽  
Demet İskenderoğlu
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Soda Lime ◽  
Morphological Properties ◽  
Emission Region ◽  
Soda Lime Glass ◽  
Silar Method ◽  
Soda Lime Glass Substrate ◽  
X Ray ◽  
Cd Doping

The undoped and 1%, 2%, and 3% Cd-doped MgO nanostructures were grown by SILAR method on the soda lime glass substrate. X-ray diffractometer (XRD), ultraviolet–visible spectrometer, scanning electron microscope, photoluminescence (PL), and X-ray photoelectron spectroscopy measurements were taken to investigate Cd doping effects on the structural, optical, and morphological properties of MgO nanostructures. XRD measurements show that the samples have cubic structure and planes of (200), (220) of MgO and (111), (200), and (220) of CdO. It was observed that band gaps increase with rising Cd doping rate in MgO thin film. The surface morphology of samples demonstrates that MgO nanostructures have been affected by the Cd doping. PL measurements show that undoped and Cd-doped MgO thin films can radiate in the visible emission region.

Optical and Electrical Analyses of Thallium Sulphide Thin Films

2021 ◽  
Vol 14 (3) ◽  
pp. 249-253
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Soda Lime ◽  
High Energy ◽  
Window Layer ◽  
Soda Lime Glass ◽  
Energy Band Gap ◽  
Thallium Chloride ◽  
Light Region ◽  
Silicon And Germanium

Abstract: In this paper, suitability of thallium sulphide films were investigated as an alternative to conventional silicon and germanium that were used as window layers in solar cells. Thin films were deposited on soda lime glass (SLG) substrates in a chemical bath containing Thallium Chloride (TlCl2) and Thiourea (NH2)2CS which was conditioned at 80 ºC for about 5 hours to deposit the films. Effects of annealing on the film samples at 300 ºC and 350 ºC were studied respectively by use of UV-VIS Avantes electrophotometer and Four-Point-Probe (FPP) machine in the light region with wavelength range from 200 nm to 1000 nm. The results obtained suggest that the thin films obtained are good materials for optoelectronics. The absorption spectra exhibited a relatively high energy band-gap. Materials of this nature are good for window layers which serve as passage to the absorber layer where needed charge carriers are produced. Keywords: Thin film, Thallium Sulphide, Window layer, Optoelectronics, Solar cells.

Dielectric and I-V Characteristic of Lead Titanate Thin Films Prepared on ITO Glass Substrate

2015 ◽  
Vol 1109 ◽  
pp. 461-465 ◽  
Author(s):  
Nurbaya Zainal ◽  
Mohd Hafiz Wahid ◽  
Mohammad Rusop
Keyword(s):  
Thin Films ◽  
Lead Titanate ◽  
High Performance ◽  
Annealing Temperature ◽  
Low Cost ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Ito Glass

Performance of lead titanate, (PbTiO3) thin films have been successfully investigated on microstructural properties, I-V characteristic, dielectric properties, and ferroelectric properties. PbTiO3offers variety of application as transducer, ferroelectric random access memory, transistor, high performance capacitor, sensor, and many more due to its ferroelectric behavior. Preparation of the films are often discussed in order to improve the structural properties, like existence of grain boundaries, particle uniformity, presents of microcrack films, porosities, and many more. Yet, researchers still prepare PbTiO3thin films at high crystallization temperature, certainly above than 600 ̊C to obtain single crystal perovskite structure that would be the reason to gain high spontaneous polarization behavior. Although this will results to high dielectric constant value, the chances that leads to high leakage current is a major failure in device performance. Thus, preparation the thin films at low annealing temperature quite an essential study which is more preferable deposited on low-cost soda lime glass. The study focuses on low annealing temperature of PbTiO3thin films through sol-gel spin coating method and undergo for dielectric and I-V measurements.

Sign in / Sign up

Export Citation Format

Share Document