Early yielding and stress recovery in (111) and (100) texture components in Cu thin films determined using synchrotron x-ray diffraction

2003 ◽  
Vol 795 ◽  
Author(s):  
D. E. Nowak ◽  
S. P. Baker
Keyword(s):  
Thin Films ◽  
Thermomechanical Behavior ◽  
Stress Recovery ◽  
X Ray Diffraction ◽  
Thermal Cycles ◽  
Yield Behavior ◽  
X Ray ◽  
Barrier Layers ◽  
Si Substrates ◽  
Plane Film

ABSTRACTSynchrotron x-ray diffraction experiments were used to study the thermomechanical behavior of individual texture components in passivated Cu thin films. Films were deposited to a thickness of 500 nm on SiNx barrier layers on Si substrates and then passivated with SiNx. The films were highly textured with grains having (111) or (100) planes parallel to the plane of the film. In-plane film stresses were determined separately in the two texture components as a function of temperature during thermal cycles and also during isothermal holds at 140°C. The results are compared to models of yield behavior and anelastic recovery.

Reactive Sputtering Growth and Characterizations of InN Thin Films on Si Substrates

2012 ◽  
Vol 545 ◽  
pp. 290-293
Author(s):  
Maryam Amirhoseiny ◽  
Hassan Zainuriah ◽  
Ng Shashiong ◽  
Mohd Anas Ahmad
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Rf Magnetron Sputtering ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Nitrogen Gas ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force

We have studied the effects of deposition conditions on the crystal structure of InN films deposited on Si substrate. InN thin films have been deposited on Si(100) substrates by reactive radio frequency (RF) magnetron sputtering method with pure In target at room temperature. The nitrogen gas pressure, applied RF power and the distance between target and substrate were 2×10-2 Torr, 60 W and 8 cm, respectively. The effects of the Ar–N2 sputtering gas mixture on the structural properties of the films were investigated by using scanning electron microscope, energy-dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction techniques.

Structural, Magnetic, and Electrical Properties of BiFe1-xMnxO3 Thin Films

2009 ◽  
Vol 1199 ◽  
Author(s):  
Danilo G Barrionuevo ◽  
Surinder P Singh ◽  
Maharaj S. Tomar
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Magnetic Measurements ◽  
Sol Gel ◽  
Ion Concentration ◽  
Ferromagnetic Phase ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Sol Gel Process

AbstractWe synthesized BiFe1-xMnxO3 (BFMO) for various compositions by sol gel process and thin films were deposited by spin coating on platinum Pt/Ti/SiO2/Si substrates. X-ray diffraction shows all the diffraction planes corresponding to rhombohedrally distorted perovskite BiFeO3 structure. The absence of any impurity phase in the films suggests the incorporation Mn ion preferentially to Fe site in the structure for low concentration. Magnetic measurements reveal the formation of ferromagnetic phase at room temperature with increased Mn substitution. On the other hand, ferroelectric polarization decreases with increasing Mn ion concentration. Raman studies suggest the dopant induced structural distortion.

Ferroelectric and Ferromagnetic Properties of Co-doped BiFeO3 Thin Films

2010 ◽  
Vol 1256 ◽  
Author(s):  
Danilo G Barrionuevo ◽  
Surinder P Singh ◽  
Ram S Katiyar ◽  
Maharaj S. Tomar
Keyword(s):  
Thin Films ◽  
Magnetic Coupling ◽  
Partial Replacement ◽  
Material System ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Solution Route ◽  
Diffraction Patterns ◽  
Novel Devices

AbstractMaterials which possess electrical and magnetic coupling are of great interest for novel devices. Bi(Fe1-xCox)O3 (BFCO) material system was synthesized by solution route for various compositions and thin films were prepared by spin coating on Pt (Pt/Ti/SiO2/Si) substrates. Structural properties of the films were investigated by x-ray diffraction and Raman spectroscopy. X-ray diffraction patterns confirms intense (110) in BiFeO3 and Bi(Fe1-xCox)O3 with rhombohedra distorted perovskite structure without impure phase. Bi(Fe1-xCox)O3 films show week ferroelectric polarization and ferromagnetism at room temperature. Ferroelectric and ferromagnetic coupling could be attributed to the elimination of oxygen vacancies and increased stress in the crystal structure by partial replacement of Fe2+ ion by Co2+ ion.

Enhancement of Aurivillius Phase Formation Kinetics in SBT Thin Films using Nanoparticle Seeding

2003 ◽  
Vol 784 ◽  
Author(s):  
Yun-Mo Sung ◽  
Woo-Chul Kwak ◽  
Se-Yon Jung ◽  
Seung-Joon Hwang
Keyword(s):  
Thin Films ◽  
Activation Energy ◽  
Phase Transformation ◽  
Phase Formation ◽  
X Ray Diffraction ◽  
Aurivillius Phase ◽  
X Ray ◽  
Si Substrates ◽  
Formation Kinetics ◽  
Kinetics Of

ABSTRACTPt/Ti/SiO2/Si substrates seeded by SBT nanoparticles (∼60–80 nm) were used to enhance the phase formation kinetics of Sr0.7Bi2.4Ta2O9 (SBT) thin films. The volume fractions of Aurivillius phase formation obtained through quantitative x-ray diffraction (Q-XRD) analyses showed highly enhanced kinetics in seeded SBT thin films. The Avrami exponents were determined as ∼1.4 and ∼0.9 for unseeded and seeded SBT films, respectively, which reveals different nucleation modes. By using Arrhenius–type plots the activation energy values for the phase transformation of unseeded and seeded SBT thin films were determined to be ∼264 and ∼168 kJ/mol, respectively. This gives a key reason to the enhanced kinetics in seeded films. Microstructural analyses on unseeded SBT thin films showed formation of randomly oriented needle-like crystals, while those on seeded ones showed formation of domains comprised of directionally grown worm-like crystals.

ZrC Thin Films Grown by Pulsed Laser Deposition

2003 ◽  
Vol 780 ◽  
Author(s):  
V. Craciun ◽  
D. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Photoelectron Spectroscopy ◽  
Pulsed Laser ◽  
Surface Region ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Crystalline Films

AbstractZrC thin films were grown on Si substrates by the pulsed laser deposition (PLD) technique. X- ray photoelectron spectroscopy, x-ray diffraction and reflectivity, variable angle spectroscopic ellipsometry, and four point probe measurements were used to investigate the composition, density, thickness, surface morphology, optical and electrical properties of the grown structures. It has been found that crystalline films could be grown only by using fluences above 6 J/cm2 and substrate temperatures in excess of 500 °C. For a fluence of 10 J/cm2 and a substrate temperature of 700 °C, highly (100)-textured ZrC films exhibiting a cubic structure (a=0.469 nm) and a density of 6.7 g/cm3 were deposited. The use of a low-pressure atmosphere of C2H2 had a beneficial effect on crystallinity and stoichiometry of the films. All films contained high levels of oxygen contamination, especially in the surface region, because of the rather reactive nature of Zr atoms.

scholarly journals Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

2010 ◽  
Vol 2010 ◽  
pp. 1-7 ◽  
Author(s):  
G. Biasotto ◽  
A. Z. Simões ◽  
C. S. Riccardi ◽  
M. A. Zaghete ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Polar Axis ◽  
Photoemission Spectroscopy ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
X Ray ◽  
Si Substrates ◽  
Transmission Electron ◽  
Coating Method ◽  
Retention Characteristics

CaBi4Ti4O15(CBTi144) thin films were grown on Pt/Ti/SiO2/Si substrates using a soft chemical solution and spin-coating method. Structure and morphology of the films were characterized by the X-ray Diffraction (XRD), Fourier-transform infrared spectroscopy (FT-IR), Raman analysis, X-ray photoemission spectroscopy (XPS), and transmission electron microscopy (TEM). The films present a single phase of layered-structured perovskite with polar axis orient. Thea/b-axis orientation of the ferroelectric film is considered to be associated with the preferred orientation of the Pt bottom electrode. XPS measurements were employed to understand the nature of defects on the retention behavior of CBTi144 films. We have observed that the main source of retention-free characteristic of the capacitors is the oxygen environment in the CBTi144 lattice.

Film Stress in Pd2Si Layers of Varying Thickness

1985 ◽  
Vol 47 ◽  
Author(s):  
Betty Coulman ◽  
Haydn Chen ◽  
Kenneth Ritz
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Film Stress ◽  
X Ray Diffraction ◽  
Double Crystal ◽  
X Ray ◽  
Si Substrates ◽  
Varying Thickness ◽  
Si Films ◽  
Low Coverage

ABSTRACTLittle is known about the development of film stresses in very thin films (thicknesses of the order of a few hundred Angstroms or less). As interest intensifies in the technological application of ever smaller quantities of materials, the behavior of very thin. films will undergo increasing scrutiny. In this study, the film stresses in evaporated Pd films and Pd2Si films formed by reaction with the Si substrates at 250°C were measured for thicknesses ranging from 7 to 107 nm. Stresses were calculated from the substrate radii of curvature determined by X-ray diffraction topography techniques (Lang and double crystal) and Stoney's equation. Because film continuity cannot be taken for granted at low coverage, the films were examined by electron microscopy in an attempt to correlate their morphology with the observed stresses.

FERROMAGNETISM IN Fe-DOPED ZnO THIN FILMS

2009 ◽  
Vol 23 (06) ◽  
pp. 815-824 ◽  
Author(s):  
R. B. ZHAO ◽  
D. L. HOU ◽  
Y. Y. WEI ◽  
Z. Z. ZHOU ◽  
C. F. PAN ◽  
...  
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Exchange Coupling ◽  
Room Temperature ◽  
Room Temperature Ferromagnetism ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
X Ray ◽  
Si Substrates ◽  
Fe Ions

Zn 1-x Fe x O (x = 0.04, 0.06, 0.08, 0.10, 0.12) thin films were grown on Si substrates using reactive magnetron sputtering. X-ray diffraction analyses show that the samples have wurtzite structures with the c-axis orientation. X-ray photoelectron spectroscopy results indicate that the Fe ions are in a +2 charge state in the films. Magnetization measurements indicate that room temperature ferromagnetism is present in films annealed in vacuum while films annealed in air were non-magnetic. The presence of oxygen vacancies in these films may mediate exchange coupling of the dopant ions, resulting in room temperature ferromagnetism.

Microstructure and properties of PbZr0.6Ti0.4O3 and PbZrO3 thin films deposited on template layers

2000 ◽  
Vol 15 (9) ◽  
pp. 1962-1971 ◽  
Author(s):  
R. E. Koritala ◽  
M. T. Lanagan ◽  
N. Chen ◽  
G. R. Bai ◽  
Y. Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Chemical Vapor ◽  
Dielectric Constants ◽  
Breakdown Field ◽  
X Ray Diffraction ◽  
Electrical Measurements ◽  
X Ray ◽  
Si Substrates ◽  
Antiferroelectric Phase

Polycrystalline Pb(ZrxTi1−x)O3 thin films with x = 0.6 and 1.0 were deposited at low temperatures (450–525 °C) on (111)Pt/Ti/SiO2/Si substrates by metalorganic chemical vapor deposition. The films were characterized by x-ray diffraction, electron microscopy, and electrical measurements. The texture of the films could be improved by using one of two template layers: PbTiO3 or TiO2. Electrical properties, including dielectric constants, loss tangents, polarization, coercive field, and breakdown field, were also examined. PbZrO3 films on Pt/Ti/SiO2/Si with a pseudocubic (110) orientation exhibited an electric-field-induced transformation from the antiferroelectric phase to the ferroelectric phase. The effect of varying processing conditions on the microstructure and electrical properties of the films is discussed.

Structural and dielectric proper ties of CaCu3Ti4O12 thin film. deposited using laser ablation.

2003 ◽  
Vol 785 ◽  
Author(s):  
V. Gupta ◽  
R.R. Das ◽  
A. Dixit ◽  
P. Bhattacharya ◽  
R.S. Katiyar
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Vibrational Modes ◽  
X Ray Diffraction ◽  
Metal Insulator ◽  
X Ray ◽  
Si Substrates ◽  
Micro Raman Spectroscopy

ABSTRACTCaCu3Ti4O12 (CCT) thin films were deposited on Pt/TiO2/SiO2/Si substrates using pulsed laser deposition technique. During the thin films deposition, the substrate temperature was varied in the range of 700–800 °C with a constant O2 pressure of 200 mTorr. X-ray diffraction showed the polycrystalline nature of the films. The dielectric properties of the films were studied in metal insulator configuration. Films grown at higher substrate temperature exhibited highest value of dielectric permittivity (∼2200). Micro Raman spectroscopy was used to study the vibrational modes of the CCT thin films in comparison with the bulk ceramics.

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