scholarly journals The Design of Oxygen Concentration and Flowrate in CPAP

Author(s):  
Ade Putra ◽  
Tri Bowo Indrato ◽  
Liliek Soetjiatie

Measuring oxygen concentration and measuring the flow of oxygen is a tool used to measure the percentage of oxygen content and oxygen flow rate in CPAP. This tool uses the OCS-03F sensor, with Arduino NANO processors then displayed on the 2X16 character LCD. Measuring the percentage of oxygen content and oxygen flow rate is carried out on CPAP for 5 measurements. The research and manufacture of this module uses the Pre-experimental method with the After Only Design design, which examines the "Oxygen Analyzer", which results in measurements compared to the traced tools to obtain high accuracy values. Based on the results of measurements on the CPAP tool at Dr. Soetomo Surabaya Hospital with oxygen level settings of 21%, 30%, 40%, 50% 60%, 70%, 80%, 90%, 100% while setting the oxygen measurement rate 1L/m, 2L /m, 3L/m, 4L/m, 5L/m, 6L/m, 7L//m, 8L/m, 9L/m 10L/m. Each measurement was carried out 5 times. For the measurement of oxygen levels the biggest error value is 5% and the smallest -0,06% while for the measurement of oxygen flow rate the biggest error value is 4% and the smallest is 0%. Based on the results of the analysis of the manufacture of oxygen levels and oxygen flow rates, it can be concluded that the manufacture of oxygen concentration measuring instruments and oxygen flow rate can work well.

1980 ◽  
Vol 8 (1) ◽  
pp. 44-51 ◽  
Author(s):  
D. F. Woolner ◽  
J. Larkin

The theoretical performance of the Hudson Multivent mask is considered. A method is described of determining the flow-weighted mean inspired oxygen concentration produced by the mask. Using this method, it was found that the inspired oxygen concentration was predictable only at the 24% setting using the recommended flow rates, but that increasing the supplied-oxygen flow rates above the recommended levels resulted in the return of predictable function. At settings above 30% predictable function was found to be unlikely, whatever the supplied oxygen flow rate. Recommendations are made regarding the use of this device.


2015 ◽  
Vol 773-774 ◽  
pp. 657-661
Author(s):  
S.A. Abdullah ◽  
Nayan Nafarizal ◽  
Mohd Zainizan Sahdan

—Tungsten Oxide (WO3) thin films were deposited using 99.9% pure tungsten target onto ITO substrate using RF magnetron sputtering in the range oxygen flow rates of 30-50%. The influence of the oxygen flow rate on characteristic of WO3 thin films has been investigated. The transmittance, resistivity, crystallite, roughness, and surface morphology were measured by UV-Vis, 2-point probe, X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), and Field Emission Scanning Electron Microscopy (FE-SEM) respectively. Experimental result showed that the deposition rate of WO3 thin films decreased by increasing oxygen flow rate. A poor crystalinity or more too amorphous of WO3 thin films produces by using various oxygen content. A higher optical transmittance spectrum detected at 30% oxygen content about 86% at wavelength 550nm. Keywords—TungstenOxide(WO3);RFsputtering,sputteringoxygen


1997 ◽  
Vol 495 ◽  
Author(s):  
Karl F. Schoch ◽  
Theodore R. Vasilow

ABSTRACTFormation of ferrites from aqueous solution of metal salts is a well known process involving precipitation of metal hydroxides followed by oxidation of the resulting gel. The purpose of the present work was to determine the effects oxygen flow rate on the progress of the reaction and on the structure and properties of the resulting precipitate. The reaction was carried out at 70°C with pH of 10.5 and oxygen flow rate of 2,4, or 8 standard liters per hour. The progress of the reaction was monitored by following the oxidation-reduction potential of the solution, which changes dramatically after the Fe(II) is consumed. The reaction rate increased with increasing oxygen flow rate. The Mg content of the precipitate was lower than that of the reaction mixture, possibly because of the pH of the reaction mixture. X-ray diffraction and infrared spectroscopy confirmed formation of a ferrite under these conditions.


Author(s):  
Shaowu Liu ◽  
Michel Moliere ◽  
Hanlin Liao

Abstract In this work; a novel liquid fuel HVOF process fueled with ethanol was used to prepare 75wt%Cr3C2–25wt%NiCr coatings on AISI304 stainless steel substrate. Taguchi method was employed to optimize the spray parameters (ethanol flow rate; oxygen flow rate; powder feed rate and standoff distance) to achieve better erosion resistance at 90° impact angle. The results indicated that ethanol flow rate and oxygen flow rate were identified as the highly contributing parameters on the erosion wear loss. The important sequence of the spray parameter is ethanol flow rate > oxygen flow rate > standoff distance > powder feed rate. The optimal spray parameter (OSP) for minimum erosion wear loss was obtained under ethanol flow rate of 28slph; oxygen flow rate of 420slpm; powder feed rate of 76.7 g/min and standoff distance of 300mm. The phase composition; microstructure; hardness; porosities; and the erosion wear behaviors of the coatings have been studied in detail. Besides; erosion wear testing of the optimized coating was conducted at 30°; 60° and 90° impact angle using air jet erosion testing machine. The SEM images of the erodent samples were taken to analyze the erosion mechanism.


2021 ◽  
Vol 39 ◽  
pp. 43-53
Author(s):  
Divyeshkumar P. Dave ◽  
Akshay M. Patel ◽  
Kamlesh V. Chauhan ◽  
Sushant K. Rawal

The influence of oxygen flow rate is examined on structural, optical and tribological properties of molybdenum oxide films deposited by reactive magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscope (SEM), and contact angle measurement system. The optical properties of the films were measured by UV-Vis-NIR spectrophotometer and transmittance of ∼73% in the visible region of the spectrum was achieved. The band gap increases with increases in oxygen gas flow rate. AFM figure illustrates that the roughness of surface increases as oxygen flow rate increases. As oxygen increases wear rate and COF decreases while at the 18 sccm the lowest wear rate found.


2022 ◽  
Vol 40 (1) ◽  
pp. 013405
Author(s):  
Nilton Francelosi A. Neto ◽  
Cristiane Stegemann ◽  
Lucas J. Affonço ◽  
Douglas M. G. Leite ◽  
José H. D. da Silva

Coatings ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 517
Author(s):  
Pengfei Kong ◽  
Yunti Pu ◽  
Ping Ma ◽  
Jiliang Zhu

Scandium oxide (Sc2O3) thin films with different numbers of oxygen defects were prepared by ion-beam sputtering under different oxygen flow rates. The results showed that the oxygen defects heavily affected crystal phases, optical properties, laser-induced damage threshold (LIDT) and surface quality of Sc2O3 films. The thin film under 0 standard-state cubic centimeter per minute (sccm) oxygen flow rate had the largest number of oxygen defects, which resulted in the lowest transmittance, LIDT and the worst surface quality. In addition, the refractive index of 0 sccm Sc2O3 film could not be measured in the same way. When the oxygen flow rate was 15 sccm, the Sc2O3 film possessed the best transmittance, refractive index, LIDT and surface roughness due to the lowest number of oxygen defects. This work elucidated the relationship between oxygen defects and properties of Sc2O3 films. Controlling oxygen flow rate was an important step of limiting the number of oxygen defects, which is of great significance for industrial production.


2015 ◽  
Vol 73 (1) ◽  
Author(s):  
Jia Wei Low ◽  
Nafarizal Nayan ◽  
Mohd Zainizan Sahdan ◽  
Mohd Khairul Ahmad ◽  
Ali Yeon Md Shakaff ◽  
...  

Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir probe was employed to estimate the plasma density, electron temperature and ion flux. In present studies, reactive copper sputtering plasmas were produced at different oxygen flow rate of 0, 4, 8 and 16 sccm. The size of copper target was 3 inches. The dissipation rf power, Ar flow rate and working pressure were fixed at 400 W, 50 sccm and 22.5 mTorr, respectively. Since the substrate bias plays an important role to the thin film formation, the substrate bias voltages of 0, -40, -60 and -100 V were studied. Based on OES results, oxygen emission increased drastically when the oxygen flow rate above 8 sccm. On the other hand, copper and argon emission decreased gradually. In addition, Langmuir probe results showed a different ion flux when substrate bias voltage was applied. Based on these plasma diagnostic results, it has been concluded that the optimized parameter to produce copper oxide thin film are between -40 to -60 V of substrate bias voltage and between 8 to 12 sccm of oxygen flow rate.


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