Electrochromic Property of Sputtered Amorphous NiO Films

2013 ◽  
Vol 690-693 ◽  
pp. 1685-1689
Author(s):  
Chih Ming Wang ◽  
Chih Yu Wen ◽  
Ying Chung Chen ◽  
Shih Yuan Lin ◽  
Shiu Ting Shiau
Keyword(s):  
Cyclic Voltammograms ◽  
Electrochromic Property ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Coloration Efficiency ◽  
Glass Substrates ◽  
Ito Glass ◽  
Optical Density Change ◽  
Nio Films

Nickel oxide (NiO) thin films were deposited on ITO/glass substrates by radio frequency magnetron sputtering. The electrochromic property of NiO films was investigated using cyclic voltammograms (CV), performed on NiO films immersed in an electrolyte of 1 M LiClO4in propylene carbonate (PC). Optical, electrochemical and structural properties of the films, as a function of coloration–bleaching cycle, were characterized using an UV-Vis-NIR spectrophotometer, cyclic voltammetry (CV), X-ray diffraction(XRD) and a field emission scanning electron microscope (FE-SEM). The optimal electrochromic NiO film, with a thickness of 180 nm, exhibits a maximum transmittance variation (ΔT%) of 53.97 %, an optical density change (ΔOD) of 0.66, an intercalation charge (Q) of 14.65 mC/cm2, and a coloration efficiency (η) of 44.85 cm2/C between the colored and bleached states at a wavelength (λ) of 550 nm.

Electrodeposition and Properties of CuInS2 Thin Films

2013 ◽  
Vol 690-693 ◽  
pp. 1659-1663
Author(s):  
Hai Fang Zhou ◽  
Xiao Hu Chen
Keyword(s):  
Thin Films ◽  
Photocurrent Density ◽  
Enhancement Effect ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Ito Glass ◽  
Type Semiconductor ◽  
One Step ◽  
P Type

The preparation and characterization of CuInS2 thin films on ITO glass substrates prepared by one-step electrodeposition have been reported. Samples were characterized using X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX) and scanning electron microscopy (SEM). The results indicate that CuInS2 is the major phase for the film deposited at -1.0 V, after annealing at 550°C in sulfur atmosphere, and the sample is Cu-rich and p-type semiconductor. Additionally, the energy band gap and carrier concentration for the sample were found to be 1.43 eV and 4.20×1017 cm−3, respectively. Furthermore, the maximum photocurrent density of the sample was found to be -1.15 mA/cm2 under 255 lx illumination, the sample shows the photo-enhancement effect.

Characterization of the Thin Films Structures in Subwavelength Regime as Biosensing Materials

2015 ◽  
Vol 772 ◽  
pp. 62-66 ◽  
Author(s):  
R. Steigmann ◽  
N. Iftimie ◽  
A. Savin
Keyword(s):  
High Performance ◽  
Thermal Evaporation ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Thermal Evaporation Method ◽  
X Ray ◽  
Glass Substrates ◽  
Ito Glass ◽  
Metallic Strip

Zinc oxide nanostructured materials, such as films and nanoparticles, could provide a suitable platform for development of high performance biosensing material due to their unique fundamental material properties. This paper presents the characterization of ZnO thin film as biosensing material by metallic strip grating structure (MSG), for the real-time detection. In this work, high quality ZnO films were grown on ITO/glass substrates by vacuum thermal evaporation method. We characterized by X-ray diffraction (XRD) the film crystalline quality and by scanning electron microscopy (SEM) the film morphology.

scholarly journals STRUCTURAL AND OPTICAL PROPERTIES OF ZnO:Ga THIN FILMS DEPOSITED ON ITO/GLASS SUBSTRATES FOR OPTOELECTRONIC APPLICATIONS

2021 ◽  
Vol 20 (1) ◽  
pp. 84-93
Author(s):  
Dumitru Rusnac ◽  
◽  
Ion Lungu ◽  
Lidia Ghimpu ◽  
Gleb Colibaba ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Films ◽  
Annealing Atmosphere ◽  
X Ray Diffraction ◽  
Homogeneous Surface ◽  
X Ray ◽  
Glass Substrates ◽  
Nanostructured Thin Films ◽  
Ito Glass ◽  
Doped Zno

Doped (with GaCl 3 ), undoped ZnO and ITO/ZnO:Ga nanostructured thin films are synthesized using the spray pyrolysis method. The doped ZnO thin films are synthesized at the atomic ratio of Ga/Zn added in the starting solution fixed at 1, 2, 3, and 5. Gallium-doped ZnO films synthesized on glass/ITO substrates are annealed at 450C in different environments: vacuum, oxygen, and hydrogen. X-ray diffraction (XRD), Energy-dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and current–voltage (I–V) measurements are applied to characterize the structural properties, composition, surface morphology, and electrical properties of ZnO:Ga nanostructured thin films. X-ray diffraction analysis shows that ZnO:Ga films deposited on glass substrates have a dense and homogeneous surface with a hexagonal structure. The ZnO:Ga films deposited on glass/ITO substrates are composed of two phases, namely, hexagonal ZnO and cubic ITO. The I–V characteristics show the presence of good ohmic contacts between Al and In metals and ZnO:Ga thin films regardless of the nature of the substrate and the annealing atmosphere.

GROWTH OF RF SPUTTERED NiO FILMS ON DIFFERENT SUBSTRATES — A COMPARATIVE STUDY

2017 ◽  
Vol 24 (07) ◽  
pp. 1750096 ◽  
Author(s):  
ANAS A. AHMED ◽  
MUTHARASU DEVARAJAN ◽  
NAVEED AFZAL
Keyword(s):  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
The Other ◽  
Reflection Spectroscopy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Glass Substrates ◽  
Structural Surface ◽  
Nio Films

This work explores the structural, surface and optical properties of NiO films grown on Si, GaAs, PET and glass substrates. The NiO films were deposited on these substrates under same conditions by using radiofrequency (RF) magnetron sputtering of NiO target at 100[Formula: see text]C. The structural study by X-ray diffraction (XRD) showed the existence of (200) and (220) oriented NiO peaks on all the substrates. The preferred orientation of NiO films on Si, GaAs and glass was along (200) plane whereas the film grown on PET was observed to be oriented along (220) plane. The crystallite size of NiO on GaAs was the largest among the other substrates. The RMS surface roughness on PET was higher as compared to the other substrates. The band gap of NiO films grown on glass and PET was estimated from UV–Vis transmittance spectroscopy whereas the UV–Vis reflection spectroscopy was carried out to find out the band gap of NiO grown on GaAs and Si substrates. The band gap of NiO on PET was higher than its band gap obtained on other substrates. The results obtained on properties of NiO films on different substrates were correlated with each other.

Electrodeposition of Cu2O Particles by Using Electrolyte Solution Containing Glucopone as Surfactant

2009 ◽  
Vol 1 (2) ◽  
pp. 18-20
Author(s):  
Dahyunir Dahlan
Keyword(s):  
Indium Tin Oxide ◽  
Pulse Current ◽  
Platinum Electrode ◽  
Saturated Calomel Electrode ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Continuous Current ◽  
Oxide Particles ◽  
Cupric Sulphate

Copper oxide particles were electrodeposited onto indium tin oxide (ITO) coated glass substrates. Electrodeposition was carried out in the electrolyte containing cupric sulphate, boric acid and glucopone. Both continuous and pulse currents methods were used in the process with platinum electrode, saturated calomel electrode (SCE) and ITO electrode as the counter, reference and working electrode respectively. The deposited particles were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). It was found that, using continuous current deposition, the deposited particles were mixture of Cu2O and CuO particles. By adding glucopone in the electrolyte, particles with spherical shapes were produced. Electrodeposition by using pulse current, uniform cubical shaped Cu2O particles were produced

X- ray diffraction and dielectric properties of PbSe thin films

2019 ◽  
Vol 15 (34) ◽  
pp. 1-14
Author(s):  
Bushra A. Hasan
Keyword(s):  
Thin Films ◽  
Thermal Activation ◽  
Thermal Evaporation ◽  
Thermal Activation Energy ◽  
Dielectric Constants ◽  
Conductivity Measurements ◽  
X Ray Diffraction ◽  
Thermal Evaporation Method ◽  
X Ray ◽  
Glass Substrates

Lead selenide PbSe thin films of different thicknesses (300, 500, and 700 nm) were deposited under vacuum using thermal evaporation method on glass substrates. X-ray diffraction measurements showed that increasing of thickness lead to well crystallize the prepared samples, such that the crystallite size increases while the dislocation density decreases with thickness increasing. A.C conductivity, dielectric constants, and loss tangent are studied as function to thickness, frequency (10kHz-10MHz) and temperatures (293K-493K). The conductivity measurements confirm confirmed that hopping is the mechanism responsible for the conduction process. Increasing of thickness decreases the thermal activation energy estimated from Arhinus equation is found to decrease with thickness increasing. The increase of thickness lead to reduce the polarizability α while the increasing of temperature lead to increase α.

scholarly journals Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Surfaces ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 106-114
Author(s):  
Yannick Hermans ◽  
Faraz Mehmood ◽  
Kerstin Lakus-Wollny ◽  
Jan P. Hofmann ◽  
Thomas Mayer ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Fast Method ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Post Annealing ◽  
Rf Signal ◽  
First Time

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO4 thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO4 thin films.

scholarly journals Effects of Thermal Annealing on the Properties of Zirconium-Doped MgxZn1−XO Films Obtained through Radio-Frequency Magnetron Sputtering

Membranes ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 373
Author(s):  
Wen-Yen Lin ◽  
Feng-Tsun Chien ◽  
Hsien-Chin Chiu ◽  
Jinn-Kong Sheu ◽  
Kuang-Po Hsueh
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Free Electrons ◽  
X Ray ◽  
Mg Content

Zirconium-doped MgxZn1−xO (Zr-doped MZO) mixed-oxide films were investigated, and the temperature sensitivity of their electric and optical properties was characterized. Zr-doped MZO films were deposited through radio-frequency magnetron sputtering using a 4-inch ZnO/MgO/ZrO2 (75/20/5 wt%) target. Hall measurement, X-ray diffraction (XRD), transmittance, and X-ray photoelectron spectroscopy (XPS) data were obtained. The lowest sheet resistance, highest mobility, and highest concentration were 1.30 × 103 Ω/sq, 4.46 cm2/Vs, and 7.28 × 1019 cm−3, respectively. The XRD spectra of the as-grown and annealed Zr-doped MZO films contained MgxZn1−xO(002) and ZrO2(200) coupled with Mg(OH)2(101) at 34.49°, 34.88°, and 38.017°, respectively. The intensity of the XRD peak near 34.88° decreased with temperature because the films that segregated Zr4+ from ZrO2(200) increased. The absorption edges of the films were at approximately 348 nm under 80% transmittance because of the Mg content. XPS revealed that the amount of Zr4+ increased with the annealing temperature. Zr is a potentially promising double donor, providing up to two extra free electrons per ion when used in place of Zn2+.

Optical properties of anatase TiO2 films modified by N ion implantation

2012 ◽  
Vol 90 (1) ◽  
pp. 39-43 ◽  
Author(s):  
X. Xiang ◽  
D. Chang ◽  
Y. Jiang ◽  
C.M. Liu ◽  
X.T. Zu
Keyword(s):  
Thin Films ◽  
Ion Implantation ◽  
Photoelectron Spectroscopy ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Atomic Force ◽  
Light Region ◽  
Uv Visible ◽  
Substrate Temperatures

Anatase TiO2 thin films are deposited on K9 glass samples at different substrate temperatures by radio frequency magnetron sputtering. N ion implantation is performed in the as-deposited TiO2 thin films at ion fluences of 5 × 1016, 1 × 1017, and 5 × 1017 ions/cm2. X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy (XPS), and UV–visible spectrophotometer are used to characterize the films. With increasing N ion fluences, the absorption edges of anatase TiO2 films shift to longer wavelengths and the absorbance increases in the visible light region. XPS results show that the red shift of TiO2 films is due to the formation of N–Ti–O compounds. As a result, photoactivity is enhanced with increasing N ion fluence.

Synthesis and Electrochemical Properties of a LiNi0.7Co0.3O1.9Cl0.1 Cathode Material for Lithium-Ion Battery

2007 ◽  
Vol 336-338 ◽  
pp. 463-465 ◽  
Author(s):  
Xin Lu Li ◽  
Fei Yu Kang ◽  
Yong Ping Zheng ◽  
Xiu Juan Shi ◽  
Wan Ci Shen
Keyword(s):  
Hexagonal Lattice ◽  
Lithium Ion ◽  
Reversible Capacity ◽  
Constant Current ◽  
Cyclic Voltammograms ◽  
X Ray Diffraction ◽  
X Ray ◽  
Constant Current Charge ◽  
Initial Cycle ◽  
Partial Oxygen

Partial oxygen in LiNi0.7Co0.3O2 was replaced by chlorine to form LiNi0.7Co0.3O1.9Cl0.1. Phase structure of LiNi0.7Co0.3O1.9Cl0.1 was identified as a pure hexagonal lattice of α-NaFeO2 type by X-ray diffraction. Discharge capacity of LiNi0.7Co0.3O1.9Cl0.1 was 202 mAh/g in initial cycle at 15 mA/g current density in 2.5- 4.3 V potential window. The constant current charge/discharge experiments and cyclic voltammograms showed that chlorine addition was effective to improve reversible capacity and cycle stability of LiNi0.7Co0.3O2.

Sign in / Sign up

Export Citation Format

Share Document