High temperature millisecond silicide anneal for contact resistivity < 10−8 Ωcm2
1997 ◽
Vol 12
(9)
◽
pp. 2249-2254
◽
1973 ◽
Vol 31
◽
pp. 184-185
1974 ◽
Vol 32
◽
pp. 472-473
1977 ◽
Vol 35
◽
pp. 114-115
1970 ◽
Vol 28
◽
pp. 444-445
1970 ◽
Vol 28
◽
pp. 440-441
1969 ◽
Vol 27
◽
pp. 422-423
◽
1973 ◽
Vol 31
◽
pp. 18-19