Comparison of processing parameter effects during magnetron sputtering and electrochemical anodization of TiO2 nanotubes on ITO/glass and glass substrates

2021 ◽  
Vol 63 (3) ◽  
pp. 245-252
Author(s):  
Emine Başalan ◽  
Mustafa Erol ◽  
Orkut Sancakoğlu ◽  
Tuncay Dikici ◽  
Erdal Çelik
Keyword(s):  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Indium Tin Oxide ◽  
Rf Magnetron Sputtering ◽  
Electrochemical Anodization ◽  
Processing Parameter ◽  
Crystalline Structures ◽  
Glass Substrates ◽  
Texture Coefficients ◽  
Ito Glass

Abstract Titanium thin films were deposited on glass and indium tin oxide (ITO) coated glass substrates by radio-frequency (RF) magnetron sputtering under varying sputtering parameters as: power, pressure, substrate temperature and target-substrate distance. The crystalline structure, crystallite size and texture coefficients of the films were evaluated in detail. As the evaluation points out, 100 W, 1.33 Pa ambient temperature and 70 mm were determined as the optimum sputtering parameters for intended crystalline structures. Subsequently, electrochemical anodization experiments were performed via varied electrolytes and under various anodization parameters (voltage, time and electrolyte type) in a two-electrode electrochemical cell using the films obtained through the optimized sputtering parameters. The anodized samples were annealed at 450 °C for 1 h in air in order to obtain anatase transformation and the desired crystalline structure. The surface morphologies and the crystalline structures of the anodized films were evaluated through x-ray diffractometer (XRD) and scanning electron microscope (SEM), respectively. Finally, the anodization parameters for the formation of TiO2 nanotube arrays were determined as: 35 V and 35 min. in an electrolyte composed of 0.3 wt.-% NH4F – 2 wt.-% water – ethylene glycol.

Electrical and Optical Properties of ZnO-Doped Zr0.8Sn0.2TiO4 Thin Films on ITO/Glass Substrates by RF Magnetron Sputtering

2011 ◽  
Vol 687 ◽  
pp. 70-74
Author(s):  
Cheng Hsing Hsu ◽  
His Wen Yang ◽  
Jenn Sen Lin
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Visible Region ◽  
Rf Magnetron Sputtering ◽  
Rf Power ◽  
Electrical And Optical Properties ◽  
Glass Substrates ◽  
Ito Glass

Electrical and optical properties of 1wt% ZnO-doped (Zr0.8Sn0.2)TiO4thin films prepared by rf magnetron sputtering on ITO/Glass substrates at different rf power and substrate temperature were investigated. The surface structural and morphological characteristics analyzed by X-ray diffraction (XRD) and atomic force microscope (AFM) were found to be sensitive to the deposition conditions, such as rf power and substrate temperature. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited ZST (111) orientation perpendicular to the substrate surface and the grain size as well as the deposition rate of the film increased with the increase in both the rf power and the substrate temperature. Optical transmittance spectroscopy further revealed high transparency (over 60%) in the visible region of the spectrum.

Transmittance Enhanced Properties of Novel Encapsulated ITO/Arc-TiO2 Antireflective TCO Substrate Prepared by RF Magnetron Sputtering

2013 ◽  
Vol 667 ◽  
pp. 573-582 ◽  
Author(s):  
Mohd Hanapiah Abdullah ◽  
Mohamad Hafiz Mamat ◽  
Mohamed Zahidi Musa ◽  
Mohamad Rusop Mahmood
Keyword(s):  
Magnetron Sputtering ◽  
Double Layer ◽  
Indium Tin Oxide ◽  
Rf Magnetron Sputtering ◽  
Antireflection Coating ◽  
Processing Temperature ◽  
Substrate Thickness ◽  
Thermally Stable ◽  
Electron Recombination ◽  
Ito Glass

In this work, a thermally stable multilayered transparent conducting oxide (TCO) utilizing TiO2 antireflection thin film (arc-TiO2) encapsulated under indium tin oxide (ITO) glass has been prepared by RF magnetron sputtering. The novel tri-functional conducting substrate with blocking layer capabilities has been designed via step-down interference coating structure of double layer antireflection coating (DLAR). The mixed-oriented type between the strongest ITO peak at (222) and a weak TiO2 peaks at (101) orientations have been observed under XRD analysis. The antireflection properties of double-layer ITO/arc-TiO2 is evidence with the existence of two maximum peaks around 410 nm and 750 nm. While, the corresponding reduction in reflectance of about 8% and 2% compared to bare ITO was achieved. The ITO/arc-TiO2 blocking layers conserves the low resistivity of ITO at 2.05 x 10-4 Ω cm, even after oxidizing during air annealing process above 400 °C. These results demonstrate that the multilayered ITO/arc-TiO2 with tailored refractive index by means of annealing treatment is a promising approach to realize a substrate which (a): electrically and thermally stable against processing temperature, (b): sustains the higher transmittance of the substrate even there is increase in total substrate thickness and (c): prevents electron recombination process occurring at the interface between the redox electrolytes and the TCO surface. The stable properties are found to be beneficial for use as TCOs in DSSCs.

Ferroelectric and Physical Characteristic of the La and V Doped on Bi4Ti3O12 Thin Film Prepared by RF Magnetron Sputtering Method

2012 ◽  
Vol 512-515 ◽  
pp. 1321-1324
Author(s):  
Shih Fang Chen ◽  
Kai Huang Chen ◽  
Chien Min Cheng
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Electrical Characteristics ◽  
Rf Power ◽  
Xrd Pattern ◽  
Glass Substrates ◽  
Crystallization Surface ◽  
Ito Glass ◽  
Effect Of Oxygen

In this study, the effects of La and V doping on Bi4Ti3O12(BLTV) ferroelectric thin films deposited on ITO/glass substrates using rf magnetron sputtering were produced and investigated. The effect of oxygen concentration and RF power on the physical and electrical characteristics of BLTV thin films was determined. The physical characteristics of BLTV thin films were obtained by the XRD pattern, SEM and AFM. The variations of crystallization, surface roughness and thickness of BLTV thin films were discussed. The electrical properties of BLTV thin films deposited under various parameters were measured by the HP4156C.

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

scholarly journals Microwave Spectroscopic Detection of Human Hsp70 Protein on Annealed Gold Nanostructures on ITO Glass Strips

Biosensors ◽  
2018 ◽  
Vol 8 (4) ◽  
pp. 118
Author(s):  
Rodica Ionescu ◽  
Raphael Selon ◽  
Nicolas Pocholle ◽  
Lan Zhou ◽  
Anna Rumyantseva ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Stress Disorders ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Conductive Glass ◽  
Hsp70 Protein ◽  
Atomic Force ◽  
Ito Glass ◽  
First Time ◽  
Human Heat Shock Protein

Conductive indium-tin oxide (ITO) and non-conductive glass substrates were successfully modified with embedded gold nanoparticles (AuNPs) formed by controlled thermal annealing at 550 °C for 8 h in a preselected oven. The authors characterized the formation of AuNPs using two microscopic techniques: scanning electron microscopy (SEM) and atomic force microscopy (AFM). The analytical performances of the nanostructured-glasses were compared regarding biosensing of Hsp70, an ATP-driven molecular chaperone. In this work, the human heat-shock protein (Hsp70), was chosen as a model biomarker of body stress disorders for microwave spectroscopic investigations. It was found that microwave screening at 4 GHz allowed for the first time the detection of 12 ng/µL/cm2 of Hsp70.

scholarly journals Residual Oxygen Effects on the Properties of MoS2 Thin Films Deposited at Different Temperatures by Magnetron Sputtering

Crystals ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1183
Author(s):  
Peiyu Wang ◽  
Xin Wang ◽  
Fengyin Tan ◽  
Ronghua Zhang
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Deposition Temperature ◽  
Energy Dispersive Spectrometer ◽  
Rf Magnetron Sputtering ◽  
Glass Substrates ◽  
Different Temperatures ◽  
Oxygen Atoms

Molybdenum disulfide (MoS2) thin films were deposited at different temperatures (150 °C, 225 °C, 300 °C, 375 °C, and 450 °C) on quartz glass substrates and silicon substrates using the RF magnetron sputtering method. The influence of deposition temperature on the structural, optical, electrical properties and deposition rate of the obtained thin films was investigated by X-ray diffraction (XRD), Energy Dispersive Spectrometer (EDS), Raman, absorption and transmission spectroscopies, a resistivity-measuring instrument with the four-probe method, and a step profiler. It was found that the MoS2 thin films deposited at the temperatures of 150 °C, 225 °C, and 300 °C were of polycrystalline with a (101) preferred orientation. With increasing deposition temperatures from 150 °C to 300 °C, the crystallization quality of the MoS2 thin films was improved, the Raman vibrational modes were strengthened, the deposition rate decreased, and the optical transmission and bandgap increased. When the deposition temperature increased to above 375 °C, the molecular atoms were partially combined with oxygen atoms to form MoO3 thin film, which caused significant changes in the structural, optical, and electrical properties of the obtained thin films. Therefore, it was necessary to control the deposition temperature and reduce the contamination of oxygen atoms throughout the magnetron sputtering process.

scholarly journals Opto-Electronic Properties of Epoxy/Silicone Blend Based Thin Films

2021 ◽  
Author(s):  
Younes Ziat ◽  
Hamza Belkhanchi ◽  
Maryama Hammi ◽  
Charaf Laghlimi ◽  
A Moutcine
Keyword(s):  
Thin Films ◽  
Indium Tin Oxide ◽  
Optical Transition ◽  
Sol Gel ◽  
Glass Substrates ◽  
Nanostructured Thin Films ◽  
Ito Glass ◽  
Potential Applications ◽  
Optical Applications ◽  
Nitrogen Doped Carbon

Abstract Recently, the rise of two dimensional amorphous nanostructured thin films have ignited a big interest because of their intriguingly isotropic structural and physical properties leading to potential applications in the nano-optoelectronics. However, according to literature, most of optoelectronic properties are investigated on chalcogenides related heterostructures. This has motivated the present work aiming to provide a new platform for the fabrication, examination of the properties and the applications of 2D nanostructured thin films based on epoxy/silicone blend. Thin films of Epoxy/Silicone loaded with nitrogen doped carbon nanotubes (N-CNTs) were prepared by sol-gel method and deposited on Indium Tin Oxide (ITO) glass substrates at room temperature. Further examination of optical properties aimed the investigation of optical pseudo-gap and Urbach energy and enabled the determination of processed films thickness based on Manifacier and Swanepol method. The results indicated that the unloaded thin films have a direct optical transition with a value of 3.61 eV followed by noticeable shift towards narrowing gaps depending on the loading rate. Urbach's energy is 0.19 eV for the unloaded thin films, and varies from 0.43 to 1.33 eV for the loaded thin films with increasing the rate of N-CNTs. It is inversely variable with the optical pseudo-gap. Finally, Epoxy/Silicone loaded with N-CNTs nanocomposites films can be developed as active layers with specific optical characteristics, giving the possibility to be used in electro-optical applications.

Properties of Indium Tin Oxide Films Prepared by Two-Targets Magnetron Sputtering

2014 ◽  
Vol 997 ◽  
pp. 337-340
Author(s):  
Jian Guo Chai
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Optical Transmittance ◽  
Visible Range ◽  
Glass Substrates ◽  
Optimized Conditions ◽  
Tin Oxide Films ◽  
Ito Films

Indium tin oxide (ITO) films were deposited on glass substrates by magnetron sputtering. Properties of ITO films showed a dependence on substrate temperature. With an increasing in substrate temperature, the intensity of XRD peak increased and the grain size showed an evident increasing. The results show that increasing substrate temperature remarkably improves the characteristics of the films. The sheet resistance of 10 Ω/sq and the maximum optical transmittance of 90% in the visible range with optimized conditions can be achicved. The results of experiment demonstrate that high-quality films have been achieved by this technique.

Sign in / Sign up

Export Citation Format

Share Document