scholarly journals Structure and Properties of Zr-Mo-Si-B-(N) Hard Coatings Obtained by d.c. Magnetron Sputtering of ZrB2-MoSi2 Target

Materials ◽  
2021 ◽  
Vol 14 (8) ◽  
pp. 1932
Author(s):  
Philipp Kiryukhantsev-Korneev ◽  
Alina Sytchenko ◽  
Yuriy Pogozhev ◽  
Stepan Vorotilo ◽  
Anton Orekhov ◽  
...  

Coatings in a Zr-Mo-Si-B-N system were deposited by the magnetron sputtering of ZrB2-MoSi2 targets in argon and nitrogen. The structure of the coatings was investigated using scanning electron microscopy, X-ray diffraction, energy-dispersive spectroscopy, and glow-discharge optical emission spectroscopy. Mechanical and tribological properties were measured using nanoindentation and pin-on-disc testing. Oxidation resistance and oxidation kinetics were estimated via annealing in air at 1000–1500 °C and precision weight measurements. We found that the coatings deposited in Ar demonstrate a superior combination of properties, including hardness of 36 GPa, elastic recovery of 84%, a friction coefficient of 0.6, and oxidation resistance at temperatures up to 1200 °C. High oxidation resistance is realized due to the formation of the protective (SiO2 + ZrO2)/SiO2 oxide layer, which inhibits the diffusion of oxygen into the coating.

Coatings ◽  
2020 ◽  
Vol 10 (10) ◽  
pp. 946
Author(s):  
Ph. V. Kiryukhantsev-Korneev ◽  
A. D. Sytchenko ◽  
S. A. Vorotilo ◽  
V. V. Klechkovskaya ◽  
V. Yu. Lopatin ◽  
...  

Coatings in the Ta-Zr-Si-B-C-N system were produced by magnetron sputtering of a TaSi2-Ta3B4-(Ta,Zr)B2 ceramic target in the Ar medium and Ar-N2 and Ar-C2H4 gas mixtures. The structure and composition of coatings were studied using scanning electron microscopy, glow discharge optical emission spectroscopy, energy-dispersion spectroscopy, and X-ray diffraction. Mechanical and tribological properties of coatings were determined using nanoindentation and pin-on-disk tests using 100Cr6 and Al2O3 balls. The oxidation resistance of coatings was evaluated by microscopy and X-ray diffraction after annealing in air at temperatures up to 1200 °C. The reactively-deposited coatings containing from 30% to 40% nitrogen or carbon have the highest hardness up to 29 GPa and elastic recovery up to 78%. Additionally, coatings with a high carbon content demonstrated a low coefficient of friction of 0.2 and no visible signs of wear when tested against 100Cr6 ball. All coatings except for the non-reactive ones can resist oxidation up to a temperature of 1200 °C thanks to the formation of a protective film based on Ta2O5 and SiO2 on their surface. Coatings deposited in Ar-N2 and Ar-C2H4 demonstrated superior resistance to thermal cycling in conditions 20-T−20 °C (where T = 200–1000 °C). The present article compares the structure and properties of reactive and “standard-inert atmosphere” deposited coatings to develop recommendations for optimizing the composition.


2009 ◽  
Vol 75 ◽  
pp. 37-42
Author(s):  
P.L. Tam ◽  
Zhi Feng Zhou ◽  
P.W. Shum ◽  
K.Y. Li

Quaternary CrTiAlN hard coatings were deposited by closed field unbalanced magnetron sputtering ion plating technique onto steel substrates, and their structural, mechanical, and tribological properties after heat treatment in air at different temperatures (500-900 oC) were studied and compared by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), micro-indentation, and pin-on-disc (POD) tribometer, etc. The onset temperature of oxidation was determined by thermogravimetric analyser (TGA). The compositional depth profiles before and after the heat treatments were examined by X-ray photoelectron spectroscopy (XPS) in order to study the oxidation mechanism. The experimental results indicate that the CrTiAlN coatings have excellent oxidation resistance and thermal stability, and outperform the traditional hard coatings like TiN and TiAlN in terms of higher oxidation temperature, hardness, adhesion, and wear resistance. It is expected that the CrTiAlN coatings with superior properties should have better performance in dry high speed machining.


2015 ◽  
Vol 642 ◽  
pp. 184-189
Author(s):  
Yan Liang Su ◽  
Yueh Feng Lin

W(100-x)%Cx% coatings with different tungsten and carbon contents were deposited by unbalanced magnetron sputtering. The microstructures and mechanical properties of the W(100-x)%C x% coatings was characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), nanoindentation and adhesion testing techniques. The tribological performance of the coatings was investigated using a pin-on-disc trobometer under dry conditions. Experimental results indicated that coating microstructure, mechanical properties and wear resistance varied according to the tungsten and carbon contents of the coatings. The W72%C28% coating had the highest hardness/elastic modulus (H/E) ratio. In the ball-on-disc wear tests, it was found that the W72%C28% coating exhibited the best wear resistance.


2013 ◽  
Vol 20 (03n04) ◽  
pp. 1350040 ◽  
Author(s):  
C. ESCOBAR ◽  
M. VILLARREAL ◽  
J. C. CAICEDO ◽  
J. ESTEVE ◽  
P. PRIETO

HfN and VN thin films were deposited onto silicon and 4140 steel substrates with r.f. reactive magnetron sputtering by using Hf and V metallic targets with 4-inch diameter and 99.9% purity in argon/nitrogen atmosphere, applying a substrate temperature of 250°C and a pressure of 1.2 × 10-3 mbar. In order to evaluate the structural, chemical, morphological, mechanical and tribological properties, we used X-ray diffraction (XRD), transmission electron microscopy (TEM), energy dispersive X-ray analysis (EDX), atomic force microscopy (AFM), scanning electron microscopy (SEM), nanoindentation, pin-on-disc and scratch tests. Film structure determined by XRD showed that FCC ( NaCl -type) films are formed in both the cases by δ- HfN and δ- VN phases. Hardness and elastic modulus values obtained for both the films were 21 and 224 GPa for the HfN film and 19 and 205 GPa for the VN film, respectively. Additionally, the films showed low friction coefficient of 0.44 for HfN and 0.62 for VN when these films were evaluated against 100 Cr 6 steel, and finally the critical load was found at 41 N for the HfN film and 34 N for the VN film.


2012 ◽  
Vol 581-582 ◽  
pp. 540-543
Author(s):  
Jin Long Jiang ◽  
Di Chen ◽  
Wei Jun Zhu

Quaternary Ti-Si-C-N films were deposited Si wafer by middle frequency magnetron sputtering Ti80Si20 twin-targets in mixture atmosphere of Ar, CH4 and N2. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) results indicate that the films present an amorphous structure with no columnar structure. These films are quite uniform and dense without large particles. The film deposited at 10 sccm CH4 and 10 sccm N2 flow rates exhibits a maximum hardness of 18.9 GPa and high elastic recovery of 97%.


Author(s):  
F. V. Kiryukhantsev-Korneev ◽  
A. Yu. Potanin

Magnetron sputtering was used to obtain single-layer MoSi2, MoSiB and multilayer MoSiB/SiBC coatings. Coating structures were studied using X-ray phase analysis, scanning electron microscopy and glow discharge optical emission spectroscopy. Mechanical properties of the coatings were determined by nanoindentation. The coatings were tested for oxidation resistance and thermal stability at temperatures between 600 °С and 1200 °С. It was found that single-layer MoSiB coatings have a hardness of 27 GPa, elasticity modulus of 390 GPa and elastic recovery of 48 % and exhibit short-term oxidation resistance up to 1500 °С inclusive due to a SiO2-based protective film formed on their surfaces. MoSi2coatings have hardness comparable to that of MoSiB but slightly lower oxidation resistance. Multilayer MoSiB/SiBC coatings feature 23–27 GPa hardness and oxidation resistance limited to 1500 °С, but at the same time they have higher elastoplastic properties as compared to MoSiB.


2013 ◽  
Vol 750-752 ◽  
pp. 2092-2095 ◽  
Author(s):  
Guo Zheng Nie ◽  
Chun Liang Zhong ◽  
Lan E Luo ◽  
Ren Long Zhou ◽  
Qiang Liu

A series of TiN coatings were deposited by reactive magnetron sputtering with different target powers and different N2flows. The microstructure and oxidation resistance of TiN coatings were characterized by X-ray diffraction (XRD). The hardness of the thin films was characterized respectively with the nanoindentor. The effect of target powers and the N2flows on the microstructure, the hardness and oxidation resistance was studied. It was found that TiN coating deposited at different target powers and different N2flows exhibits a cubic structure with (1 1 1) preferred orientations, and the hardness of TiN coatings is 1200. The oxidation resistance of the TiN coatings is approximately 500°C.


2014 ◽  
Vol 488-489 ◽  
pp. 9-13
Author(s):  
Guang Xian ◽  
Hai Bo Zhao ◽  
Hong Yuan Fan ◽  
Hao Du

ZrAlYN films were prepared by magnetron sputtering at various N2/Ar flow ratio. The structure, composition and thermal properties were characterized by X-ray diffraction, scanning electron microscopy and energy dispersive X-ray spectrum. The results show that the deposited ZrAlN and ZrAlYN films possessed a single NaCl-type solid solution phase. The ZrAlN film was (200) strongly predominated. The (111) peak was prominently increased in ZrAlYN films and thus the preferred orientation changed to (111) and (200) co-predomination. The crystallinity of ZrAlYN films was gradually degraded with enhanced N2/Ar flow ratio. Both ZrAlN and ZrAlYN films were exhibited a featureless fracture microstructure. The thickness of ZrAlYN films was consistently reduced due to more nitride produced on the surface of targets at higher N2/Ar flow ratio. The ZrAlYN films deposited at 1:5 N2/Ar flow ratio was proved to be the best oxidation resistance under annealing at 1000°C for 2h in air. As N2/Ar flow ratio increased, the oxidation resistance of films was inversely deteriorated due to the decreased yttrium content in films.


Tribology ◽  
2005 ◽  
Author(s):  
Aditya Aryasomayajula ◽  
Mohit Kumar Gupta ◽  
Santhosh Kumar Janarthanaam

Tantalum nitride (TaN) thin films were coated at room temperature (30°C) on carbide turning inserts using DC magnetron sputtering technique. The mechanical properties like adhesion and hardness of these coating have been evaluated by Scratch tester; the thickness is estimated by Ball and Crater method. The properties of the films are studied by X-Ray diffraction (XRD) technique. The Optical Emission Spectroscopy (OES) has been employed to analyze the sputtering plasma to understand the reaction kinetics of tantalum nitride formation. The surface of the substrates: tools, glass and single crystal silicon, has been treated with plasma for better adhesion. A 2 μm thick TaN was deposited on the turning inserts. The coated inserts withstood a load of 20 N. The preliminary results reported are quite encouraging.


2011 ◽  
Vol 2011 ◽  
pp. 1-7 ◽  
Author(s):  
Can Xin Tian ◽  
Bing Yang ◽  
Jun He ◽  
Hong Jun Wang ◽  
De Jun Fu

CrNxcoatings were deposited on Si (100) and WC-Co substrates by a home-made medium-frequency magnetron sputtering system with and without thermal filament ion source assistance. The structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. The mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system showed a deposition rate of 3.88 μm/h, much higher than the value 2.2 μm/h without ion source assistance. The CrNxcoatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and adecrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance.


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