Fabrication of Large Area, 70 nm Pitch Nanograting Patterns by Nanoimprint Lithography Using Flexible Polymer Stamp

2011 ◽  
Vol 483 ◽  
pp. 48-52
Author(s):  
Fan Tao Meng ◽  
Jin Kui Chu ◽  
Gang Luo ◽  
Zhi Tao Han ◽  
Zhi Wen Wang
Keyword(s):  
Nanoimprint Lithography ◽  
Low Cost ◽  
Industrial Applications ◽  
Inorganic Materials ◽  
Attractive Alternative ◽  
Large Area ◽  
Good Shape ◽  
Low Surface Energy ◽  
Flexible Polymer ◽  
Size Uniformity

Flexible polymer stamps are considered as an attractive alternative to rigid, brittle and expensive stamps made of inorganic materials because of their low cost and ease of fabrication. In this paper, we present a nanoimprint process to fabricate large area, high-resolution nanograting patterns using flexible polymer stamp made from fluoropolymer. The flexibility and low surface energy of polymer stamp provide a clean release without fracture or deformation of the stamp and of the replicated nanograting. Large-area, high-density nanograting patterns with good shape homogeneity and size uniformity have been successfully fabricated using the flexible polymer stamp with advantages of its good conformal contact and low adhesion. Using flexible polymer stamps can resolve many serious issues in NIL and therefore can bring it to real industrial applications.

scholarly journals Reshaping Hybrid Perovskites Emission with Flexible Polymer Microcavities

2020 ◽  
Vol 230 ◽  
pp. 00006
Author(s):  
Paola Lova ◽  
Paolo Giusto ◽  
Francesco Di Stasio ◽  
Giovanni Manfredi ◽  
Giuseppe M. Paternò ◽  
...  
Keyword(s):  
Thin Films ◽  
Photonic Crystals ◽  
Low Cost ◽  
Scale Production ◽  
Large Area ◽  
Light Emitting Devices ◽  
Flexible Polymer ◽  
Hybrid Perovskite ◽  
Wide Range ◽  
Solution Processable

Thanks to versatile optoelectronic properties solution processable perovskites have attracted increasing interest as active materials in photovoltaic and light emitting devices. However, the deposition of perovskite thin films necessitates wide range solvents that are incompatible with many other solution-processable media, including polymers that are usually dissolved by the perovskite solvents. In this work, we demonstrate that hybrid perovskite thin films can be coupled with all polymer planar photonic crystals with different approaches to achieve emission intensity enhancement and reshaping using different approaches. The possibility to control and modify the emission spectrum of a solution processable perovskite via a simple spun-cast polymer structure is indeed of great interest in optoelectronic applications requiring high color purity or emission directionality. Furthermore, thanks to the ease of fabrication and scalability of solution-processed photonic crystals, this approach could enable industrial scale production of low-cost, large area, lightweight and flexible polymer-perovskite lighting devices, which may be tuned without resorting to compositional engineering.

Electroactive Organic Materials

MRS Bulletin ◽  
2002 ◽  
Vol 27 (6) ◽  
pp. 441-445 ◽  
Author(s):  
Zhenan Bao ◽  
Vladimir Bulovic ◽  
Andrew B. Holmes
Keyword(s):  
Organic Materials ◽  
Molecular Design ◽  
Low Cost ◽  
Organic Thin Films ◽  
Inorganic Materials ◽  
Material Structure ◽  
Active Components ◽  
Large Area ◽  
Organic Solids ◽  
Design And Synthesis

AbstractThis brief article describes the content of the June 2002 issue of MRS Bulletin focusing on Electroactive Organic Materials. These materials are now being considered as the active components in displays, electronic circuits, solar cells, chemical and biological sensors, actuators, lasers, memory elements, and fuel cells. The flexibility of their molecular design and synthesis makes it possible to fine-tune the physical properties and material structure of organic solids to meet the requirements of technologically significant applications. In contrast to inorganic materials, active organic thin films can be deposited at much lower substrate temperatures (less than 120°C) in low-vacuum or atmospheric-pressure environments. It has been demonstrated that low-cost deposition techniques such as solution spin-coating, casting, and even printing can be used for the deposition of solution-soluble organic materials. These processing advantages, together with the natural abundance of organic solids, make electroactive organic materials attractive for large-area and low-cost applications.

Transient Thermodynamic Modelling and Experimental Validation of an Antagonistic SMA Actuator

2008 ◽  
Author(s):  
Anupam Pathak ◽  
Diann Brei ◽  
Jonathan Luntz
Keyword(s):  
Low Cost ◽  
High Energy ◽  
Industrial Applications ◽  
High Yield ◽  
Attractive Alternative ◽  
Driving Frequency ◽  
Physically Based ◽  
Antagonistic Actuation ◽  
High Production ◽  
Key Aspects

Modern developments in Shape Memory Alloys (SMA) has positioned the material as an attractive alternative actuation for high yield, low cost industries which stand to benefit from the materials simple form, light weight, and high energy densities. However, the speed and predictability still remain as a barrier to its acceptance and usage. The robotics community has shown promising results with antagonistic actuation architectures to increase the cyclic speed and produce controlled motions; however, such control-based approaches generally require sensing and feedback implementations and tuning that are undesirable for high production products. This paper presents a simple but effective physically-based thermodynamic model for generic antagonistic actuation architecture. The model is derived from three sets of equations: differential equations describing the thermomechanical phase transformation behavior of the material, compatibility equations specific to the antagonistic configuration relating stresses and strains in the two wires to each other, and heat transfer equations involving the thermal properties of both the environment and the wire material. This model takes into consideration several key-aspects of real devices such as the wires becoming slack or localalized boiling conditions. This model was experimentally validated and studied under a range of conditions including variations in driving frequency (0.3–10 Hz), duty cycle (10%–45%), amplitude (50%–100% transformation), and wire diameter (8–20 mil). The correlation over these widely varying conditions indicates the model’s accuracy and potential for use in the design process of future antagonistic actuators and their controllers for industrial applications.

Sub-100nm Hybrid Stamp Fabrication by Hot Embossing

2006 ◽  
Vol 510-511 ◽  
pp. 462-465 ◽  
Author(s):  
Sung Hoon Hong ◽  
Ki Yeon Yang ◽  
Heon Lee
Keyword(s):  
Cost Effectiveness ◽  
Surface Energy ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Hot Embossing ◽  
Fabrication Process ◽  
Structured Materials ◽  
Mechanical Hardness ◽  
Low Surface Energy ◽  
Uv Transmittance

The fabrication of nano-structured materials using nanoimprint lithography has become more prevalent in recent years, due to its cost effectiveness and readiness. However, One of the biggest drawback of this technique is the fabrication of the imprinting stamp, which is expensive and difficult to fabricate. This paper describes a method of replication original Si or quartz made imprinting template into a polymer stamp which has many advantages, such as the simplicity and low cost of the fabrication process and the flexibility of the resulting stamp. Using the hot embossing method, PVC based imprint stamp with sub 100nm patterns can be fabricated. Due to its high UV transmittance, reasonable mechanical hardness and low surface energy, PVC based nanosized template can be used as a stamp for UV-NIL and sub 100nm patterns were successfully transferred by the UV-NIL process with PVC based imprint stamp.

Hologram Images Patterned in Shrink BOPP Film by Large-Area Roller Nanoimprint Lithography

2013 ◽  
Vol 873 ◽  
pp. 503-506 ◽  
Author(s):  
Meng Lin Jiang ◽  
Shi Wei Lin ◽  
Wen Kai Jiang
Keyword(s):  
Formation Mechanism ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Nanometer Scale ◽  
Flexible Substrates ◽  
Large Area ◽  
Biaxially Oriented Polypropylene ◽  
Oriented Polypropylene ◽  
Lithography Technique

Thermal roller nanoimprint lithography with the ability of larger area micro-to nanometer-scale patterning on flexible substrates possesses the advantages of low cost and high throughput, and is widely being practiced in industry. Hologram images have been successfully embossed in shrink biaxially oriented polypropylene films by the large-area roller nanoimprint lithography technique. The defects which occur during embossing processes have been studied in order to identify the underlying formation mechanism.

scholarly journals Extending the resolution limits of nanoshape imprint lithography using molecular dynamics of polymer crosslinking

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Anshuman Cherala ◽  
Parth N. Pandya ◽  
Kenneth M. Liechti ◽  
S. V. Sreenivasan
Keyword(s):  
Nanoimprint Lithography ◽  
Random Access ◽  
Radius Of Curvature ◽  
Imprint Lithography ◽  
Simulation Framework ◽  
Resolution Limit ◽  
Large Area ◽  
Good Shape ◽  
Bridge Structures ◽  
Shape Retention

AbstractEmerging nanoscale applications in energy, electronics, optics, and medicine can exhibit enhanced performance by incorporating nanoshaped structures (nanoshape structures here are defined as shapes enabled by sharp corners with radius of curvature < 5 nm). Nanoshaped fabrication at high-throughput is well beyond the capabilities of advanced optical lithography. Although the highest-resolution e-beams and large-area e-beams have a resolution limit of 5 and 18 nm half-pitch lines or 20 nm half-pitch holes, respectively, their low throughput necessitates finding other fabrication techniques. By using nanoimprint lithography followed by metal-assisted chemical etching, diamond-like nanoshapes with ~3 nm radius corners and 100 nm half-pitch over large areas have been previously demonstrated to improve the nanowire capacitor performance (by ~90%). In future dynamic random-access memory (DRAM) nodes (with DRAM being an exemplar CMOS application), the implementation of nanowire capacitors scaled to <15 nm half-pitch is required. To scale nanoshape imprint lithography down to these half-pitch values, the previously established atomistic simulation framework indicates that the current imprint resist materials are unable to retain the nanoshape structures needed for DRAM capacitors. In this study, the previous simulation framework is extended to study improved shape retention by varying the resist formulations and by introducing novel bridge structures in nanoshape imprinting. This simulation study has demonstrated viable approaches to sub-10 nm nanoshaped imprinting with good shape retention, which are matched by experimental data.

High quality diffractive optical elements (DOEs) using SMILE imprint technique

2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Simon Drieschner ◽  
Fabian Kloiber ◽  
Marc Hennemeyer ◽  
Jan J. Klein ◽  
Manuel W. Thesen
Keyword(s):  
Soft Lithography ◽  
High Efficiency ◽  
Low Cost ◽  
Industrial Applications ◽  
Diffractive Optical Elements ◽  
Large Area ◽  
High Quality ◽  
Optical Elements ◽  
Uv Curable ◽  
Aspect Ratios

Abstract Augmented reality (AR) enhancing the existing natural environment by overlaying a virtual world is an emerging and growing market and attracts huge commercial interest into optical devices which can be implemented into head-mounted AR equipment. Diffractive optical elements (DOEs) are considered as the most promising candidate to meet the market’s requirements such as compactness, low-cost, and reliability. Hence, they allow building alternatives to large display headsets for virtual reality (VR) by lightweight glasses. Soft lithography replication offers a pathway to the fabrication of large area DOEs with high aspect ratios, multilevel features, and critical dimensions below the diffractive optical limit down to 50 nm also in the scope of mass manufacturing. In combination with tailored UV-curable photopolymers, the fabrication time can be drastically reduced making it very appealing to industrial applications. Here, we illustrate the key features of high efficiency DOEs and how the SMILE (SUSS MicroTec Imprint Lithography Equipment) technique can be used with advanced imprint photopolymers to obtain high quality binary DOEs meeting the market’s requirements providing a very versatile tool to imprint both nano- and microstructures.

Simulation of conductivity made by inkjet-printed silver tracks in E-textiles with different weave patterns

2016 ◽  
Vol 47 (2) ◽  
pp. 173-196 ◽  
Author(s):  
Mozhdeh Ghahremani ◽  
Masoud Latifi ◽  
Mohammadreza Babaei
Keyword(s):  
Electrical Conductivity ◽  
Surface Roughness ◽  
Low Cost ◽  
Electric Circuit ◽  
Contact Method ◽  
Large Area ◽  
Simple Method ◽  
Micro Particles ◽  
Flexible Polymer ◽  
Circuit Fabrication

The development of electric circuit fabrication on flexible polymer substrates has attracted a significant interest as a pathway to low-cost, comfortable movement, and large-area electronics among direct printing techniques. In this study, the inkjet printing technique was used as a simple method to chemically deposit silver nano and micro-particles (85–500 nm) to the polyester fabrics. It is done by the ejection of silver nitrate and ascorbic acid as a reducing agent to attain nano metals on the different weave patterns with different surface roughness to measure the conductivity variations. A four-contact method was used to measure the electrical conductivity of the deposited samples which is usually employed in the electrical assessment of films. COMSOL Multiphysics® modeling software is used in order to simulate the conductivity of printed silver tracks and finally the results of simulation and experimental works have been compared. The main purpose of this study is to evaluate the effect of surface roughness on the electrical conductivity of printed silver tracks.

scholarly journals Numerical Study on the Optimization of Roll-to-Roll Ultraviolet Imprint Lithography

Coatings ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 573
Author(s):  
Usama Tahir ◽  
Muhammad Ahmad Kamran ◽  
Myung Yung Jeong
Keyword(s):  
Numerical Model ◽  
Numerical Study ◽  
Low Cost ◽  
Industrial Applications ◽  
Contact Angles ◽  
Large Area ◽  
Flexible Displays ◽  
Roll To Roll ◽  
Area Functional ◽  
Uv Resin

Roll-to-roll ultraviolet (R2R-UV) imprinting is a low-cost and high-throughput method that includes the manufacturing of large-area functional films. However, the quality of the final product is obstructed by the bubble entrapment during the imprinting process. In this study, a multi-phase volume of fluid (VOF) numerical model was used to remove bubble entrapment during the R2R imprinting process, which covered all parameters. This new modified numerical model with open-channel boundary conditions was based on the single zone that contains the direct contact of UV resin with the imprinting mold during the filling process. In addition, this model simulated the UV resin filling into microcavities at the preceding and succeeding ends of the imprinting mold. Different patterns of imprinting mold were considered to enhance the fidelity of R2R-UV imprinting for the comprehensive analysis. The experimental results validated through numerical simulations revealed that the bubble entrapment can be controlled by varying various parameters such as speed of the imprinting system, viscosity, contact angles, and pattern shape. The proposed model may be useful for a continuous bubble-free R2R imprinting process in industrial applications that includes flexible displays and micro/nano-optics.

Roll-to-Roll Nanoimprinting Metamaterials

2012 ◽  
Vol 1412 ◽  
Author(s):  
Anton Greenwald ◽  
Jae Ryu ◽  
Yisi Liu ◽  
Rana Biswas ◽  
Jong Ok ◽  
...  
Keyword(s):  
Low Cost ◽  
Aluminum Layer ◽  
Large Area ◽  
Coated Substrate ◽  
Roll To Roll ◽  
Flexible Polymer ◽  
Fine Pattern ◽  
Polymer Mold ◽  
Continuous Fabrication ◽  
Flexible Polymer Substrate

ABSTRACTWe investigated continuous fabrication of a large area 2-D metamaterial comprising a metal dot array on a dielectric coated substrate. We demonstrated patterning of metal dots arrays of varying patterns and shapes with diameter of about 2.5 μm and metal-to-metal spacing from 0.3 to 2.5 μm using a nano-imprinting stamp on a roller. The pattern was first fabricated on a standard photolithography mask, reproduced onto a silicon wafer master mold, and then transferred to a flexible polymer mold that was wrapped around a metal roller. The method was used to pattern a thin Al layer on top of SiO2 on a flexible polymer substrate. The aluminum was coated with a resist and the roller moved over the substrate with adjustable speed and pressure to imprint the fine pattern into the resist. The resist was cured, and a very thin layer of residual resist was removed by RIE, followed by a standard etching treatment for patterning the aluminum layer.The as-etched pattern had very few defects and the optical properties of the metamaterial were excellent and correlated well with simulations. This work has shown that low cost, rapid roll-to-roll processing of 2-D metamaterial structures is possible.

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