Large-area, low-cost near-infrared meta-surface reflector based on a pixelated two-dimensional silicon disk array

AbstractAlthough solution-processed Cu(In,Ga)(S,Se)2 (CIGS) absorber layers can potentially enable the low-cost and large-area production of highly stable electronic devices, they have rarely been applied in photodetector applications. In this work, we present a near-infrared photodetector functioning at 980 nm based on solution-processed CIGS with a potassium-induced bandgap grading structure and chalcopyrite grain growth. The incorporation of potassium in the CIGS film promotes Se uptake in the bulk of the film during the chalcogenization process, resulting in a bandgap grading structure with a wide space charge region that allows improved light absorption in the near-infrared region and charge carrier separation. Also, increasing the Se penetration in the potassium-incorporated CIGS film leads to the enhancement of chalcopyrite crystalline grain growth, increasing charge carrier mobility. Under the reverse bias condition, associated with hole tunneling from the ZnO interlayer, the increasing carrier mobility of potassium-incorporated CIGS photodetector improved photosensitivity and particularly external quantum efficiency more than 100% at low light intensity. The responsivity and detectivity of the potassium-incorporated CIGS photodetector reach 1.87 A W−1 and 6.45 $$\times$$ × 1010 Jones, respectively, and the − 3 dB bandwidth of the device extends to 10.5 kHz under 980 nm near-infrared light.

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Fast large-area low-cost two-dimensional optical position sensor

10.1117/12.281319 ◽

1997 ◽

Author(s):

D. Avtabi ◽

E. Burstein ◽

Aryeh M. Weiss

Keyword(s):

Low Cost ◽

Position Sensor ◽

Two Dimensional ◽

Large Area ◽

Optical Position

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Fast and Low-Cost Synthesis of MoS2 Nanostructures on Paper Substrates for Near-Infrared Photodetectors

Applied Sciences ◽

10.3390/app11031234 ◽

2021 ◽

Vol 11 (3) ◽

pp. 1234

Author(s):

Neusmar J. A. Cordeiro ◽

Cristina Gaspar ◽

Maria J. de Oliveira ◽

Daniela Nunes ◽

Pedro Barquinha ◽

...

Keyword(s):

Near Infrared ◽

Low Cost ◽

Transition Metal Dichalcogenides ◽

Synthesis Method ◽

Infrared Photodetectors ◽

Two Dimensional ◽

X Ray Diffraction ◽

Synthesis Time ◽

Metal Dichalcogenides ◽

Paper Substrates

Recent advances in the production and development of two-dimensional transition metal dichalcogenides (2D TMDs) allow applications of these materials, with a structure similar to that of graphene, in a series of devices as promising technologies for optoelectronic applications. In this work, molybdenum disulfide (MoS2) nanostructures were grown directly on paper substrates through a microwave-assisted hydrothermal synthesis. The synthesized samples were subjected to morphological, structural, and optical analysis, using techniques such as scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman. The variation of synthesis parameters, as temperature and synthesis time, allowed the manipulation of these nanostructures during the growth process, with alteration of the metallic (1T) and semiconductor (2H) phases. By using this synthesis method, two-dimensional MoS2 nanostructures were directly grown on paper substrates. The MoS2 nanostructures were used as the active layer, to produce low-cost near-infrared photodetectors. The set of results indicates that the interdigital MoS2 photodetector with the best characteristics (responsivity of 290 mA/W, detectivity of 1.8 × 109 Jones and external quantum efficiency of 37%) was obtained using photoactive MoS2 nanosheets synthesized at 200 °C for 120 min.

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Advances in solution-processable near-infrared phototransistors

Journal of Materials Chemistry C ◽

10.1039/c8tc06078a ◽

2019 ◽

Vol 7 (13) ◽

pp. 3711-3729 ◽

Cited By ~ 17

Author(s):

Ning Li ◽

Zhaojue Lan ◽

Linfeng Cai ◽

Furong Zhu

Keyword(s):

Near Infrared ◽

Low Cost ◽

Health And Safety ◽

Safety Monitoring ◽

Large Area ◽

Promising Alternative ◽

High Performing ◽

Nir Light ◽

Inorganic Semiconductor ◽

Solution Processable

Solution processable near infrared (NIR) photodetectors provide a promising alternative due to their low cost, flexible design, adaptability to various fabrications, and large area manufacturability, removing the limitations of traditional wafer-based inorganic semiconductor techniques. High performing NIR photodetectors offer attractive options for applications in visualizing NIR light, health and safety monitoring.

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Silicon/2D-material photodetectors: from near-infrared to mid-infrared

Light Science & Applications ◽

10.1038/s41377-021-00551-4 ◽

2021 ◽

Vol 10 (1) ◽

Author(s):

Chaoyue Liu ◽

Jingshu Guo ◽

Laiwen Yu ◽

Jiang Li ◽

Ming Zhang ◽

...

Keyword(s):

Wavelength Range ◽

Silicon Photonics ◽

High Performance ◽

Near Infrared ◽

Low Cost ◽

Two Dimensional ◽

Wavelength Band ◽

Mid Infrared ◽

Two Dimensional Materials ◽

Flexible Integration

AbstractTwo-dimensional materials (2DMs) have been used widely in constructing photodetectors (PDs) because of their advantages in flexible integration and ultrabroad operation wavelength range. Specifically, 2DM PDs on silicon have attracted much attention because silicon microelectronics and silicon photonics have been developed successfully for many applications. 2DM PDs meet the imperious demand of silicon photonics on low-cost, high-performance, and broadband photodetection. In this work, a review is given for the recent progresses of Si/2DM PDs working in the wavelength band from near-infrared to mid-infrared, which are attractive for many applications. The operation mechanisms and the device configurations are summarized in the first part. The waveguide-integrated PDs and the surface-illuminated PDs are then reviewed in details, respectively. The discussion and outlook for 2DM PDs on silicon are finally given.

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TWO-DIMENSIONAL SILICON-BASED PHOTONIC CRYSTAL SLAB WITH PARTIAL AIR-BRIDGE

International Journal of Nanoscience ◽

10.1142/s0219581x06004991 ◽

2006 ◽

Vol 05 (06) ◽

pp. 683-687 ◽

Cited By ~ 1

Author(s):

JIE TIAN ◽

SHOU-ZHEN HAN ◽

BING-YING CHENG ◽

SHUAI FENG ◽

ZHI-YUAN LI ◽

...

Keyword(s):

Photonic Crystal ◽

Focused Ion Beam ◽

Near Infrared ◽

Ion Beam ◽

Fdtd Method ◽

Direct Write ◽

Silica Layer ◽

Two Dimensional ◽

Large Area ◽

Silicon Based

We describe a fabrication process of the near-infrared two-dimensional photonic crystal (PC) slab, which is sustained by part of the silica layer underneath the slab and forms a partly air-bridged type. The process involves focused ion beam (FIB) direct write following the selective wet etching of silicon on isolator (SOI) structures. By control the time of dissolving of silica layer in SOI, we successfully fabricated the sample and measured its transmittance spectrum. It is found that the observed spectrum is consistent with the theoretical band structure with FDTD method. For there is partly silica layer remained to support the air-bridge slab, the PC can be fabricated with a large area. If we change the support material under the slab, we might be able to fabricate PC laser with this kind of structure.

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Large-area flexible nanostripe electrodes featuring plasmon hybridization engineering

Nano Research ◽

10.1007/s12274-020-3125-x ◽

2020 ◽

Vol 14 (3) ◽

pp. 858-867

Author(s):

Carlo Mennucci ◽

Debasree Chowdhury ◽

Giacomo Manzato ◽

Matteo Barelli ◽

Roberto Chittofrati ◽

...

Keyword(s):

Near Infrared ◽

Low Cost ◽

Near Field ◽

Photovoltaic Devices ◽

Large Area ◽

Cross Sectional ◽

Additional Degree ◽

Photon Management ◽

Plasmon Resonances ◽

Localized Plasmon Resonances

AbstractMultifunctional flexible Au electrodes based on one-dimensional (1D) arrays of plasmonic gratings are nanofabricated over large areas with an engineered variant of laser interference lithography optimized for low-cost transparent templates. Au nanostripe (NS) arrays achieve sheet resistance in the order of 20 Ohm/square on large areas (∼ cm2) and are characterized by a strong and dichroic plasmonic response which can be easily tuned across the visible (VIS) to near-infrared (NIR) spectral range by tailoring their cross-sectional morphology. Stacking vertically a second nanostripe, separated by a nanometer scale dielectric gap, we form near-field coupled Au/SiO2/Au dimers which feature hybridization of their localized plasmon resonances, strong local field-enhancements and a redshift of the resonance towards the NIR range. The possibility to combine excellent transport properties and optical transparency on the same plasmonic metasurface template is appealing in applications where low-energy photon management is mandatory like e.g., in plasmon enhanced spectroscopies or in photon harvesting for ultrathin photovoltaic devices. The remarkable lateral order of the plasmonic NS gratings provides an additional degree of freedom for tailoring the optical response of the multifunctional electrodes via the excitation of surface lattice resonances, a Fano-like coupling between the broad localised plasmonic resonances and the collective sharp Rayleigh modes.

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Fabrication and Application of Nanostructures Using Gas-Assisted Hot Embossing and Self-Assembled Nanospheres

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.659.399 ◽

2015 ◽

Vol 659 ◽

pp. 399-403 ◽

Cited By ~ 1

Author(s):

Rong Hong Hong ◽

Cheng Cih ◽

To Chung Shu ◽

Sen Yeu Yang

Keyword(s):

Near Infrared ◽

Low Cost ◽

Hot Embossing ◽

Large Area ◽

Self Assembled Monolayer ◽

Glass Substrates ◽

Plasma Sputtering ◽

Nanostructure Arrays ◽

Self Assembled ◽

Better Than

We develop a simple and competitive fabrication of antireflective (AR) films with high-ordered nanostructure arrays on polycarbonate (PC) substrate by using gas-assisted hot embossing and a self-assembled technique. In this method, a self-assembled monolayer of polystyrene (PS) nanospheres is well-patterned on glass substrates as the first template. Subsequently, we use the plasma sputtering to deposit a conductive layer onto the surface of nanosphere (NS) patterned substrates, and then, electroforming is applied to fabricate a nickel mold with an inverse shape of nanospheres. In the last step, a unique glass transition is utilized to duplicate nanostructures on PC films via gas-assisted hot embossing. Not only in visible light but in near infrared, the optical properties of this AR film are similar or better than for other methods. This fabrication process also has great potential in industry, with its simplicity, large-area but low-cost.

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Large-Area Low-Cost Tunable Plasmonic Perfect Absorber in the Near Infrared by Colloidal Etching Lithography

Advanced Optical Materials ◽

10.1002/adom.201400545 ◽

2015 ◽

Vol 3 (3) ◽

pp. 398-403 ◽

Cited By ~ 54

Author(s):

Ramon Walter ◽

Andreas Tittl ◽

Audrey Berrier ◽

Florian Sterl ◽

Thomas Weiss ◽

...

Keyword(s):

Near Infrared ◽

Low Cost ◽

Perfect Absorber ◽

Large Area

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Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

The European Physical Journal Applied Physics ◽

10.1051/epjap/2020190250 ◽

2020 ◽

Vol 90 (3) ◽

pp. 30502

Author(s):

Alessandro Fantoni ◽

João Costa ◽

Paulo Lourenço ◽

Manuela Vieira

Keyword(s):

Amorphous Silicon ◽

High Throughput Screening ◽

Simulation Analysis ◽

Low Cost ◽

Deposition Process ◽

Large Area ◽

Sidewall Roughness ◽

Sensing Applications ◽

Fabrication Defects ◽

The Impact

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

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