Properties of Yttrium Oxide Thin Films on Silicon (100) Prepared by Evaporation of Yttrium in Atomic Oxygen

1994 ◽  
Vol 341 ◽  
Author(s):  
J. Hudner ◽  
H. Ohlsén ◽  
E. Fredriksson
Keyword(s):  
Atomic Oxygen ◽  
Oxygen Plasma ◽  
Rutherford Backscattering Spectrometry ◽  
Thin Layers ◽  
Force Microscopy ◽  
Intermediate Layers ◽  
Activated Reactive Evaporation ◽  
Film Substrate ◽  
Surface Morphologies ◽  
Substrate Temperatures

AbstractThin layers of Y2O3 have been prepared on silicon (100) by an activated reactive evaporation process involving evaporation of metal Y in an atomic oxygen plasma. The presence of the oxygen plasma was found to be crucial for the formation of homogeneous Y2O3 films on Si. The formation of Y2O3 films on Si (100) at different substrate temperatures was investigated. X-ray diffraction analysis showed that Y2O3 films formed between 300 °C and 650 °C were (111) textured while Y2O3 prepared at lower substrate temperatures (80 °C) exhibited mixed orientations. Rutherford backscattering spectrometry indicated that films were stoichiometric. No pronounced channeling was observed in films grown at 350 °C, suggesting polycrystalline film structures. Atomic force microscopy revealed very smooth surface morphologies with average surface roughness < 20 Å for films 700 Å thick deposited at 350 °C. Secondary ion mass spectroscopy indicated the abundance of intermediate layers in the film-substrate interface.

Structural and Magnetotransport Properties of NiMnSb/Cu and NiMnSb/Ag Multilayers

1997 ◽  
Vol 475 ◽  
Author(s):  
J.A. Caballero ◽  
F. Petroff ◽  
A. Cabbibo ◽  
Y.D. Park ◽  
J.R. Childress
Keyword(s):  
Layer Thickness ◽  
Thin Layers ◽  
Crystalline Quality ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Spacer Layer ◽  
Spin Polarized ◽  
The Relationship ◽  
Substrate Temperatures

ABSTRACTWe report on the integration of the predicted half-metallic (100% spin-polarized) ferromagnetic Heusler alloy NiMnSb into NiMnSb/Cu and NiMnSb/Ag multilayer structures, and on their magnetic, microstructural and magnetotransport properties. The NiMnSb layer thickness was fixed at 30Å and those of Cu and Ag were varied from 5 to 60Å. The multilayers were characterized using x-ray diffraction (XRD), four-wire resistivity measurements, atomic force microscopy, SQUID magnetometry and magnetotransport measurements. Moderate substrate temperatures (250°C) are shown to be sufficient to produce stochiometric Clb-structured NiMnSb. XRD data confirm that the NiMnSb ultra-thin layers retain their crystalline quality and texture. SQUID measurements shows that the bulk saturation magnetization (∼740 emu/cm3) is maintained and that it is strongly sensitive to interlayer diffusion and roughness. AFM studies show that the surface roughness, which can be as low as 4Å, depends on the choice of spacer layer, layer thickness and substrate temperature. The relationship between the measured magnetoresistance, NiMnSb crystalline quality, magnetic properties and interfacial roughness are discussed.

Ge/Si(100) Island and Wetting Layer Composition

2002 ◽  
Vol 749 ◽  
Author(s):  
Yangting Zhang ◽  
Jeff Drucker
Keyword(s):  
Rutherford Backscattering Spectrometry ◽  
Water Soluble ◽  
Wetting Layer ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After ◽  
Substrate Temperatures ◽  
Water Etching ◽  
Layer Composition

ABSTRATCTEtching water soluble Ge-oxides was used to investigate Si interdiffusion into epitaxial Ge / Si(100) samples. The Ge coverage, θGe, was measured using Rutherford backscattering spectrometry (RBS) before and after water etching of samples grown at substrate temperatures between 400 °C and 650 °C. θGewas correlated with sample morphology determined using atomic force microscopy (AFM). The local Ge concentration was qualitatively assessed using energy dispersive x-ray (EDX) analysis. For samples grown at T=400 °C, water completely dissolves the islands and no Ge is detected by RBS. For samples grown at T=600 and 650 °C, AFM detects no change in the surface morphology and RBS indicates that θGedecreases by about 3 monolayers (ML). These results suggest that for growth at T=400 °C, both the islands and wetting layer are relatively pure Ge while for growth at T≥600 °C, the wetting layer is Ge rich compare to the SiGe alloy islands. EDX confirms this conclusion detecting no Ge signal between islands for etched samples grown at T≥600 °C. Our results suggest that for growth at T≥600 °C, Si interdiffusion into islands is through the region underneath the islands instead of from the wetting layer.

A Structural Comparison of Si(100) Oxidized by Atomic and Molecular Oxygen

2002 ◽  
Vol 751 ◽  
Author(s):  
Maja Randjelovic ◽  
Judith C. Yang
Keyword(s):  
Electron Microscopy ◽  
Molecular Oxygen ◽  
Photoelectron Spectroscopy ◽  
Atomic Oxygen ◽  
Rutherford Backscattering Spectrometry ◽  
Structural Characteristics ◽  
Silica Layer ◽  
Force Microscopy ◽  
Transmission Electron ◽  
Detonation Method

ABSTRACTWe compared the structural characteristics of a silica layer formed on Si(100) by oxidation in hyperthermal atomic oxygen and molecular oxygen at 493K. The laser detonation method was used to create primarily neutral atomic oxygen with kinetic energy of 5.1eV. The silicon oxides were characterized by High Resolution Transmission Electron Microscopy (HRTEM), Atomic Force Microscopy (AFM), Rutherford Backscattering Spectrometry (RBS), Scanning Electron Microscopy (SEM) and X-ray Photoelectron Spectroscopy (XPS). We determined that atomic oxygen forms amorphous silica that is almost twice as thick and nearly double the surface roughness as compared to molecular oxygen - formed silica at the same temperature and time conditions.

Influence of Oxygen Plasma Treatment on Properties of Polyester Fabrics Coated with Copper Films

2012 ◽  
Vol 189 ◽  
pp. 193-196 ◽  
Author(s):  
Ling Ling Meng ◽  
Qu Fu Wei ◽  
Yue Li Li
Keyword(s):  
Oxygen Plasma ◽  
Fiber Surface ◽  
Oxygen Plasma Treatment ◽  
Polyester Fabrics ◽  
Cu Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Plasma Pretreatment ◽  
Effect Of Oxygen ◽  
Surface Morphologies

A lab radio frequency (RF) magnetron sputter coating system was used to deposit the nanoscale copper (Cu) films onto the surface of polyester plain fabric at room temperature. In this study,the polyester fabrics were treated under different duration with low temperature plasma.The effect of oxygen plasma pretreatment on surface morphologies,antistatic properties,mechanical properties of the copper-coated polyester fabrics is investigated. The surface morphology of modified polyester fabrics was characterized by atomic force microscopy (AFM).The AFM observations revealled the obvious corrasion was formed on the fiber surface,the sputtered copper particles were hard to cluster and uniformly distributed on the fiber surface with longer duration of plasma treatment.The antistatic properties of the copper-coated polyester fabrics was greatly improved after the oxygen plasma treatment.The hydrophobic behavior of the coated samples was also significantly improved .

Microstructure of YBa2Cu3O7-x thin films deposited by dc sputtering

1989 ◽  
Vol 47 ◽  
pp. 172-173
Author(s):  
O. Eibl ◽  
G. Gieres ◽  
H. Behner
Keyword(s):  
Thin Films ◽  
Cross Sections ◽  
Intermediate Layer ◽  
Amorphous State ◽  
Critical Currents ◽  
Dc Sputtering ◽  
State Process ◽  
Diffraction Patterns ◽  
Film Substrate ◽  
Substrate Temperatures

The microstructure of high-Tc YBa2Cu3O7-X thin films deposited by DC-sputtering on SrTiO3 substrates was analysed by TEM. Films were either (i) deposited in the amorphous state at substrate temperatures < 450°C and crystallised by a heat treatment at 900°C (process 1) or (ii) deposited at around 740°C in the crystalline state (process 2). Cross sections were prepared for TEM analyses and are especially useful for studying film substrate interdiffusion (fig.1). Films deposited in process 1 were polycristalline and the grain size was approximately 200 nm. Films were porous and the size of voids was approximately 100 nm. Between the SrTiO3 substrate and the YBa2Cu3Ox film a densly grown crystalline intermediate layer approximately 150 nm thick covered the SrTiO3 substrate. EDX microanalyses showed that the layer consisted of Sr, Ba and Ti, however, did not contain Y and Cu. Crystallites of the layer were carefully tilted in the microscope and diffraction patterns were obtained in five different poles for every crystallite. These patterns were consistent with the phase (Ba1-XSrx)2TiO4. The intermediate layer was most likely formed during the annealing at 900°C. Its formation can be understood as a diffusion of Ba from the amorphously deposited film into the substrate and diffusion of Sr from the substrate into the film. Between the intermediate layer and the surface of the film the film consisted of YBa2Cu3O7-x grains. Films prepared in process 1 had Tc(R=0) close to 90 K, however, critical currents were as low as jc = 104A/cm2 at 77 K.

Study on Structure and Properties of Polysulfone Membranes Using Ionic Liquid [n-C16mim][BF4] as a New Structure-Controlled Additive

2013 ◽  
Vol 561 ◽  
pp. 125-129 ◽  
Author(s):  
Ying Ying Ding ◽  
Ya Mei Zhao ◽  
Chang Zheng Zheng ◽  
Dong Huai Tu
Keyword(s):  
Ionic Liquid ◽  
Cross Sections ◽  
Retention Rate ◽  
Contact Angles ◽  
Asymmetric Structure ◽  
Polysulfone Membrane ◽  
Force Microscopy ◽  
Wet Phase Inversion ◽  
Surface Morphologies ◽  
Polysulfone Membranes

Introducing ionic liquid [n-C16mim][BF4] as a new structure-controlled additive, Polysulfone (PSf) membranes were prepared by the wet-phase-inversion using [n-C16mim][BF4] into the casting solution (PSf/NMP). The scanning electron microscope and the atomic force microscopy were utilized to visualize the cross-sections of the membranes to gain more better understanding the structure-controlled ability of [n-C16mim][BF4] and surface morphologies of the membrane. The results indicate that the structures of the membranes were typical bilayer asymmetric finger-pores structure. [n-C16mim][BF4] has stronger ability of the pore-forming. Especially, at the 4:76 ratio of [n-C16mim][BF4]/NMP in the polymer solution ,the membrane has the asymmetric structure and good separation properties of the solution flux. The PSf membrane has the 0.45~0.65μm dimpling close to surface layer, and the retention rate and solution flux of the prepared membrane are 95.2% and 137.5 L•h-1•m-2. Meanwhile, [n-C16mim][BF4] partially retained in the prepared Polysulfone membrane reduced the contact angles of Polysulfone membranes, improving the hydrophilic properties of the membranes.

Mechanical Interlocking on Leadframe Surface for Bondability of Au Wedge Bond

2016 ◽  
Vol 857 ◽  
pp. 79-82
Author(s):  
Roslina Ismail ◽  
Fuaida Harun ◽  
Azman Jalar ◽  
Shahrum Abdullah
Keyword(s):  
Optical Microscope ◽  
Bonding Process ◽  
Mechanical Interlocking ◽  
Average Roughness ◽  
Force Microscopy ◽  
Atomic Force ◽  
Surface Morphologies ◽  
Scanning Electron ◽  
Effect Of Surface

This work is a contribution towards the understanding of wire bond integrity and reliability in relation to their microstructural and mechanical properties in semiconductor packaging.The effect of surface roughness and hardness of leadframe on the bondability of Au wedge bond still requires detail analysis. Two type of leadframes namely leadframe A and leadframe B were chosen and scanning electron microscope (SEM) and optical microscope were used to inspect the surface morphology of leadframes and the quality of created Au wedge bond after wire bonding process. It was found that there were significant differences in the surface morphologies between these two leadframes. The atomic force microscopy (AFM) which was utilized to measure the average roughness, Ra of lead finger confirms that leadframe A has the highest Ra with value of 166.46 nm compared to that of leadframe B with value of 85.89 nm. While hardness value of different lead finger from the selected leadframe A and B obtained using Vicker microhardness tester are 180.9 VH and 154.2VH respectively.

scholarly journals Atomic Force Microscopy Applied to Atopic Dermatitis Study

2021 ◽  
Vol 18 (4) ◽  
pp. 21-28
Author(s):  
Simona Maria Ţîrcă ◽  
Ion Ţîrcă ◽  
Marius Sorin Ciontea ◽  
Florin Dumitru Mihălţan
Keyword(s):  
Atomic Force Microscopy ◽  
Atopic Dermatitis ◽  
Structural Integrity ◽  
Clinical Investigation ◽  
Normal Skin ◽  
Skin Lesions ◽  
Force Microscopy ◽  
Atomic Force ◽  
Child Patient ◽  
Surface Morphologies

Abstract Atopic dermatitis (AD)-the commonest inflammatory skin disease affects up to 25% of children and 2% to 5% of adults. Methods of the diagnostic provide expanded recommendations founded on available evidence. Morphological evaluation remains a principal feature of clinical investigation and the main criteria of diagnosis. Methods. We collected normal and affected skin from a 6-month child patient who was diagnosed through dermatologic examination. Clinical characteristics and the diagnosis of atopic dermatitis were in accordance with Hanifin and Rajka criteria. Morphology and structural integrity were investigated by Atomic Force Microscopy. Results. Optical and topography images indicate that in the case of AD skin lesions the cuticle structure was severely damaged and distorted with the flattening and grading of the plates, which have an irregular appearance. From the surface morphologies of the samples, we demonstrate that the shape of the corneocytes, with granular and elongated appearance, specific to normal skin is transformed by AD into broken and collapsed plates with discontinuous appearance. Conclusions. In the initial diagnosis of AD changes of the skin properties can be an indicator. Hanifin and Rajka criteria together with Atomic Force Microscopy can be a useful and necessary technique diagnosing cases of atopic dermatitis.

The Investigation of Thin Protecting Layers on Roughened Galvanized Steel Surfaces Produced by Different Coating Methods

2008 ◽  
Vol 589 ◽  
pp. 433-438 ◽  
Author(s):  
Péter Németh ◽  
Ágnes Csanády ◽  
Katalin Papp ◽  
Anna C. Pintér ◽  
László Szabó ◽  
...  
Keyword(s):  
Thickness Distribution ◽  
Thin Layers ◽  
Galvanized Steel ◽  
Photoemission Spectroscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Coating Methods ◽  
Chemical States ◽  
Steel Surfaces ◽  
Thickness Variations

Protective, chromate substitute thin layers on roughened galvanized surfaces produced at OCAS (Arcelor, Belgium) were characterized and compared using Scanning Electron Microscopy (SEM+EDS), Atomic Force Microscopy (AFM), Nanoindentation and X-ray Photoemission Spectroscopy (XPS). EDX maps, line scans and point analyses obtained at various places of the surfaces have shown differences between the CVD and silane nanolayers in the matter of thickness distribution and composition. At cross-section specimens the thickness of the layers could be shown. The hardness differences caused by layer thickness variations are hard to follow by nanoindentation as the penetration depth of the indenter is much larger than the thickness of the coatings. XPS measurements can distinguish between the chemical states of silicon in CVD and silane coatings.

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