Comparative Analysis of the Nucleation and Growth of Copper on Different Low-k Polymers
Keyword(s):
Ion Beam
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ABSTRACTIn this work we present investigations of the nucleation and growth of evaporated copper on several low-k polymers. The evolving interfaces were characterized using transmission electron microscopy (TEM), x-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results were compared between the PMDA/ODA polyimide, Teflon AF 1601 and Silk®. A diffusion coefficient for copper atoms in Silk® determined by low energy ion-beam depth profiling in conjunction with XPS is reported.