Residual Stress Effects in Ferroelectric Thin Films

2003 ◽  
Vol 784 ◽  
Author(s):  
T. A. Berfield ◽  
N. R. Sottos ◽  
R. J. Ong ◽  
D. A. Payne
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Residual Stresses ◽  
Sol Gel ◽  
Ferroelectric Thin Film ◽  
Thin Layers ◽  
Residual Tensile Stress ◽  
Film Performance ◽  
Si Substrates ◽  
Interface Effects

ABSTRACTRecent developments in soft lithographic patterning enable the integration of functional ceramic thin films on a chip, rather than by adding discrete components to the system. As integrated device applications push the characteristic length scale of materials smaller and smaller, surface and interface effects play an important role, producing significant scientific challenges to the characterization of mechanical properties, performance and reliability. In this paper, we investigate the complex roles of microstructure, interface effects and residual stresses on ferroelectric thin film performance. Pb(Zr0.53Ti0.47)O3 films ranging in thickness from 190 nm to 500 nm were deposited by a sequential build up of sol-gel derived thin layers onto platinized Si substrates. Residual stresses in the films after thermal processing were observed and calculated from laser reflectance measurements of wafer curvature. Field-induced displacements were then measured by interferometric methods for films with well-characterized residual stress states. Results indicate significant increases in film performance with a decrease in measured residual tensile stress.

Refractory Thin-Film Metallizations with Controlled Stress and Electrical Resistivity

2001 ◽  
Vol 699 ◽  
Author(s):  
Ilan Golecki ◽  
Margaret Eagan
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Electrical Resistivity ◽  
Physical Vapor Deposition ◽  
Ion Beam ◽  
Residual Tensile Stress ◽  
Si Substrates ◽  
Chemical Inertness ◽  
Temperature Deposition ◽  
Beam Parameters

AbstractRhodium and iridium are refractory metals which possess intrinsically high electrical conductivity, and their chemical inertness enables their use at relatively high temperatures in microelectronics. However, due to the high Young's modulus of these materials, a residual tensile stress of hundreds of MPa is measured in evaporated thin films. New data is presented, demonstrating control over both the magnitude and the sign of the residual stress in such refractory thin films formed by means of ion-beam-enhanced physical vapor deposition on oxidized Si substrates. The electrical resistivity and stress are determined by controlling the substrate temperature, deposition rate and ion beam parameters. Thicker films are achieved in this manner, including films with near-zero residual stress.

Phase transition and piezoelectricity of sol–gel-processed Sm-doped BiFeO3 thin films on Pt(111)/Ti/SiO2/Si substrates

2015 ◽  
Vol 3 (9) ◽  
pp. 2115-2122 ◽  
Author(s):  
Wei Sun ◽  
Jing-Feng Li ◽  
Qi Yu ◽  
Li-Qian Cheng
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Sol Gel ◽  
Orthorhombic Phase ◽  
High Quality ◽  
Si Substrates ◽  
Bifeo3 Thin Films ◽  
Gel Processing

We prepared high-quality Bi1−xSmxFeO3 films on Pt(111)/Ti/SiO2/Si substrates by sol–gel processing and found rhombohedral–orthorhombic phase transition with enhanced piezoelectricity.

Preferred Orientations for Sol-Gel Derived Plzt Thin Layers

1993 ◽  
Vol 310 ◽  
Author(s):  
Toshihiko Tani ◽  
Zhengkui Xu ◽  
David A. Payne
Keyword(s):  
Heat Treatment ◽  
Surface Energy ◽  
Sol Gel ◽  
Nucleation And Growth ◽  
Thin Layers ◽  
Energy Conditions ◽  
Chemical Characteristics ◽  
Interfacial Chemistry ◽  
Si Substrates

AbstractPLZT thin layers were deposited onto various substrates by sol-gel methods, and crystallized under different conditions and substrate treatments. Relationships are given for the chemical characteristics of the substrate's surface and the preferred orientations which develop on heat treatment. A preferred (111) orientation always developed for perovskite crystallized on Pt layers which contained Ti on the surface. This was attributed to the formation of Pt3Ti and the role of heteroepitaxial nucleation and growth sites. In addition, a preferred (100) orientation was also obtained on unannealed Pt/Ti/SiO2/Si substrates which were free of Ti on the surface. This was attributed to self-textured growth with flat faces striving for minimum surface energy conditions. The results are discussed in terms of the importance of interfacial chemistry on the control of texture for crystallization of PLZT thin layers on coated substrates.

Synthesis and Ferroelectric Properties of Sol–Gel Derived Intergrowth-Superlattice-Structured SrBi4Ti4O15-Bi4Ti3O12 Thin Films

2011 ◽  
Vol 197-198 ◽  
pp. 1781-1784
Author(s):  
Hua Wang ◽  
Jian Li ◽  
Ji Wen Xu ◽  
Ling Yang ◽  
Shang Ju Zhou
Keyword(s):  
Thin Films ◽  
Remanent Polarization ◽  
Annealing Temperature ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Hysteresis Loops ◽  
Si Substrates ◽  
Gel Processing ◽  
Coercive Electric Field ◽  
Clockwise Hysteresis

Intergrowth-superlattice-structured SrBi4Ti4O15–Bi4Ti3O12(SBT–BIT) films prepared on p-Si substrates by sol-gel processing. Synthesized SBT–BIT films exhibit good ferroelectric properties. As the annealing temperature increases from 600°C to 700°C, the remanent polarization Prof SBT–BIT films increases, while the coercive electric field Ecdecreases. SBT–BIT films annealed at 700°C have a Prvalue of 18.9µC/cm2which is higher than that of SBT (16.8µC/cm2) and BIT (14.6µC/cm2), and have the lowest Ecof 142 kV/cm which is almost the same as that of SBT and BIT. The C-V curves of Ag/SBT-BIT/p-Si heterostructures show the clockwise hysteresis loops which reveal the memory effect due to the polarization. The memory window in C-V curve of Ag/SBT-BIT/p-Si is larger than that of Ag/SBT/p-Si heterostructure or Ag/BIT/p-Si heterostructure.

A Study on the Piezoelectric Properties of PZT and Doped PZT Thin Films by Sol-Gel Method

2010 ◽  
Vol 663-665 ◽  
pp. 650-653
Author(s):  
Jin Moo Byun ◽  
Jeong Sun Han ◽  
Jae Hyoung Park ◽  
Seong Eui Lee ◽  
Hee Chul Lee
Keyword(s):  
Thin Films ◽  
Piezoelectric Coefficient ◽  
Energy Harvester ◽  
Sol Gel ◽  
Pure Perovskite Structure ◽  
Pzt Thin Films ◽  
Gel Method ◽  
Sol Gel Method ◽  
Si Substrates ◽  
Pzt Thin Film

This study examined the effect of crystalline orientation and dopants such as Nb and Zn on the piezoelectric coefficient of sol-gel driven Pb1(Zr0.52Ti0.48)O3(PZT) and doped PZT thin films. Crack-free 1-μm-thick PZT and doped PZT thin films prepared by using 2-Methoxyethanol-based sol-gel method were fabricated on Pt/Ti/SiO2/Si substrates. The highly (111) oriented PZT thin films of pure perovskite structure could be obtained by controlling various parameters such as a PbTiO3 seed layer and a concentration of sol-gel solution. The Nb-Zn doped PZT thin films exhibited high piezoelectric coefficient which was about 50 % higher than that of undoped PZT thin film. The highest measured piezoelectric coefficient was 240 pC/N, which could be applicable to piezoelectrically operated MEMS actuator, sensor, or energy harvester devices.

Effects of Sputter-Deposited LaNiO3 Electrode on the Deposition and Properties of Ferroelectric Thin Films

1996 ◽  
Vol 433 ◽  
Author(s):  
T. B. Wu ◽  
J. M. Wu ◽  
C. M. Wu ◽  
M. J. Shyu ◽  
M. S. Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Perovskite Phase ◽  
Sol Gel ◽  
Processing Condition ◽  
Fatigue Property ◽  
Rf Magnetron Sputtering ◽  
Ferroelectric Films ◽  
Si Substrates ◽  
Sputter Deposited

AbstractHighly (100)-textured thin film of metallic LaNiO3 (LNO) was grown on the Pt/Ti/SiO2/Si substrates by rf magnetron sputtering at ˜300°C, which was used as a bottom electrode to prepare highly (100)-textured ferroelectric films. Examples on the deposition of PbTiO3, (Pbl−xLax)TiO3, Pb(Zr0.53Ti0.47)O3, Pb[(Mg1/3Nb2/3)1−xTix]O3, and (Ba1−xSrx)TiO3 thin films by rf magnetron sputtering or sol-gel method are shown. A reduction of temperature for perovskite phase formation can be achieved, especially for those difficult to crystallize. The surface roughness of the ferroelectric films is also improved as compared to that of films deposited on conventional Pt electrode. Although the electrical properties of the ferroelectric films are affected by the out-diffusion of LNO when a higher temperature was used in the preparation of the films, under an appropriate processing condition, the highly (100)-textured films can have satisfactory electrical characteristics for application. Moreover, the polarization-fatigue property can be also improved by the use of LNO electrode.

scholarly journals Dielectric tunable characteristics of compositional-gradient BaTi1−xSnxO3 thin films

2021 ◽  
Vol 11 (04) ◽  
pp. 2150019
Author(s):  
Chenjing Wu ◽  
Manwen Yao
Keyword(s):  
Thin Films ◽  
Impedance Matching ◽  
Sol Gel ◽  
Temperature Stability ◽  
Dielectric Behavior ◽  
Compositional Gradient ◽  
Dielectric Tunability ◽  
Temperature Range ◽  
Si Substrates ◽  
Low Leakage

Compositional-gradient [Formula: see text][Formula: see text]O3 thin films on Pt(100)/Ti/SiO2/Si substrates are fabricated with sol–gel using spin coating. All of the structures of the prepared thin films are of single-phase crystalline perovskite with a dense and crack-free surface morphology. BTS10/15/20 thin film exhibits enhanced temperature stability in its dielectric behavior. The temperature coefficient of capacitance [Formula: see text] in the temperature range from [Formula: see text]C to [Formula: see text]C is [Formula: see text]C and that of [Formula: see text] in the temperature range from [Formula: see text]C to [Formula: see text]C is [Formula: see text]C. Furthermore, the thin films show low leakage current density and dielectric loss. High and stable dielectric tunable performances are found in BTS10/15/20 thin films: the dielectric tunability of the thin films is around 20.1% under a bias voltage of 8 V at 1 MHz and the corresponding dielectric constant is in the range between 89 and 111, which is beneficial for impedance matching in circuits. Dielectric tunability can be obtained under a low tuning voltage, which helps ensure safety. The simulated resonant frequency of the compositional-gradient BTS thin films depends on the bias electric field, showing compositional-gradient BTS thin films could be used in electrically tunable components and devices. These properties make compositional-gradient BTS thin films a promising candidate for dielectric tuning.

Optical Thin Films of Metal Oxides Produced by the Sol-Gel Method for Photovoltaic Applications

2019 ◽  
Vol 293 ◽  
pp. 83-95
Author(s):  
Marek Szindler
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Light Transmission ◽  
Sol Gel ◽  
Thin Layers ◽  
Gel Method ◽  
Sol Gel Method ◽  
Wide Range

The use of thin films in optoelectronic and photovoltaic devices is aimed at improving the physical properties of the substrate material. The modification of the surface of the silicon substrate is thus one of the greatest challenges in research on photovoltaic materials, in order to achieve even greater efficiency or better adapt their properties depending on the application. The technologies of applying layers vary depending on the effect to be obtained and the material from which the layer is formed. In practice, the most common method is chemical vapor deposition and physical vapor deposition, and the most commonly applied optical materials are SiO2, TiO2 and Si3N4.This paper presents the results of investigations on morphology and optical properties of the prepared aluminium oxide thin films. Thin films were prepared with use of sol-gel spin coating method. Surface morphology studies were carried out using an atomic force microscope. To characterize the surface of the thin films, 3D images and histograms of the frequency of individual inequalities were made. In order to characterize the optical properties of Al2O3 thin films, the reflectance and light transmission tests were performed using a spectrophotometer. Optical constants were determined using a spectroscopic ellipsometer. Results and their analysis show that the sol-gel method allows the deposition of homogenous thin films of Al2O3 with the desired geometric characteristics and good optical properties. Uniform, continuous thin layers with a roughness not exceeding a few nanometres were deposited. Their deposition enabled to reduce the reflection of light from the polished substrate below 15% in a wide range (425-800nm) while maintaining high transparencies (over 90%). The obtained results causes that mentioned thin films are good potential material for optics, optoelectronics and photovoltaics.

Understanding of the development of in-plane residual stress in sol-gel-derived metal oxide thin films

2012 ◽  
Vol 111 (1) ◽  
pp. 014901 ◽  
Author(s):  
Kentaro Ohno ◽  
Hiroaki Uchiyama ◽  
Hiromitsu Kozuka
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Metal Oxide ◽  
Sol Gel ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

An Effective Way to Suppress the Pyrochlore Phase Formation in SBT Thin Films

2003 ◽  
Vol 784 ◽  
Author(s):  
Se-Yeon Jung ◽  
Woo-Chul Kwak ◽  
Seung-Joon Hwang ◽  
Yun-Mo Sung
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Seed Layer ◽  
Sol Gel ◽  
Pyrochlore Phase ◽  
Energy Difference ◽  
Ion Diffusion ◽  
Aurivillius Phase ◽  
Si Substrates ◽  
Coating Methods

ABSTRACTSr0.7Bi2.4Ta2O9 (SBT) thin films were deposited on Pt/Ti/SiO2/Si substrates with and without a seed layer of ∼40 nm thickness using sol-gel and spin coating methods. The influence of seed layer on the phase formation characteristics of SBT thin films was investigated using x-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses. Formation of pyrochlore as well as Aurivillius phase was observed in both the unseeded and seeded SBT films heated at 740°C. However, it was revealed that Aurivillius phase formation was enhanced in seeded SBT thin films and pyrochlore phase formation was highly suppressed. In this study, two possible mechanisms for the suppression of pyrochlore phase formation were proposed from the perspectives of activation energy difference for Aurivillius and pyrochlore phase formation and Bi-ion diffusion to pyrochlore phase.

Sign in / Sign up

Export Citation Format

Share Document