scholarly journals Resolving the bias point for wide range of temperature applications in High-k/Metal Gate nanoscale DG-MOSFET

2014 ◽  
Vol 27 (4) ◽  
pp. 613-619 ◽  
Author(s):  
Sushanta Mohapatra ◽  
Kumar Pradhan ◽  
Prasanna Sahu
Keyword(s):  
Analog Circuit ◽  
Performance Metrics ◽  
Metal Gate ◽  
High K ◽  
Wide Range ◽  
Dg Mosfet ◽  
Bias Point ◽  
Output Conductance ◽  
Intrinsic Gain ◽  
Temperature Applications

This article investigates the Zero-Temperature-Coefficient (ZTC) bias point and its associated performance metrics of a High-k Metal Gate (HKMG) DG-MOSFET in nanoscale. The ZTC bias point is defined as the point at which the device parameters are independent of temperature. The discussion includes sub threshold slope (SS), drain induced barrier lowering (DIBL), on-off current ratio (Ion/Ioff), transconductance (gm), output conductance (gd) and intrinsic gain (AV). From the results, it is confirmed that there are two different ZTC bias points, one for IDS (ZTCIDS) and the other for gm (ZTCgm). The points are obtained as: ZTCIDS=0.552 V and ZTCgm =0.410 V, which will open important opportunities in analog circuit design for wide range of temperature applications.

Studies on electrical characteristics of HKMG MOS capacitor by high pressure annealing

2021 ◽  
Author(s):  
ASHISH KUMAR ◽  
pandi divya ◽  
Wen-Hsi lee ◽  
Y.L. Wang
Keyword(s):  
High Pressure ◽  
Low Temperature ◽  
Leakage Current ◽  
Annealing Process ◽  
Electrical Performance ◽  
Flat Band ◽  
Metal Gate ◽  
Mos Capacitor ◽  
High K ◽  
Wide Range

Abstract High pressure annealing technique at 6 atm over a wide range of temperature (200-450˚C) was introduced as post metal annealing on high-k/metal gate metal-oxide-semiconductor capacitor. To verify the ability of HPA in improving interface trap density, leakage issue the other MOS capacitor with same structure was annealed by MWA for comparison. The electrical performance of the capacitors under different etching mechanism was analyzed and the difference in characteristics such as flat-band voltage shift, oxide trapped charge, interface state density and leakage current were compared. The results show that high pressure annealing process is more effective to minimize the oxide trapped charged at low temperature than by high power MWA at 3000W, and the reduction in leakage current density after high pressure anneal at low temperature corresponds to the reduction in charge traps. High pressure annealing demonstrates great potential as the post-metallization annealing process for the high-k/metal gate structure .

scholarly journals Gene Expression Space Shapes the Bioprocess Trade-Offs among Titer, Yield and Productivity

2021 ◽  
Vol 11 (13) ◽  
pp. 5859
Author(s):  
Fernando N. Santos-Navarro ◽  
Yadira Boada ◽  
Alejandro Vignoni ◽  
Jesús Picó
Keyword(s):  
Gene Expression ◽  
Gene Transcription ◽  
Performance Metrics ◽  
Cell Mass ◽  
Gene Copy ◽  
Substrate Uptake ◽  
Promoter Strength ◽  
Expression Levels ◽  
Trade Offs ◽  
Wide Range

Optimal gene expression is central for the development of both bacterial expression systems for heterologous protein production, and microbial cell factories for industrial metabolite production. Our goal is to fulfill industry-level overproduction demands optimally, as measured by the following key performance metrics: titer, productivity rate, and yield (TRY). Here we use a multiscale model incorporating the dynamics of (i) the cell population in the bioreactor, (ii) the substrate uptake and (iii) the interaction between the cell host and expression of the protein of interest. Our model predicts cell growth rate and cell mass distribution between enzymes of interest and host enzymes as a function of substrate uptake and the following main lab-accessible gene expression-related characteristics: promoter strength, gene copy number and ribosome binding site strength. We evaluated the differential roles of gene transcription and translation in shaping TRY trade-offs for a wide range of expression levels and the sensitivity of the TRY space to variations in substrate availability. Our results show that, at low expression levels, gene transcription mainly defined TRY, and gene translation had a limited effect; whereas, at high expression levels, TRY depended on the product of both, in agreement with experiments in the literature.

scholarly journals Coverage Layout Design Rules and Insertion Utilities for CMP-Related Processes

2020 ◽  
Vol 11 (1) ◽  
pp. 2
Author(s):  
Eitan N. Shauly ◽  
Sagee Rosenthal
Keyword(s):  
Integrated Circuit ◽  
Thermal Effects ◽  
Process Integration ◽  
Proximity Effects ◽  
Published Data ◽  
Metal Gate ◽  
Comprehensive Description ◽  
Advanced Technologies ◽  
High K ◽  
Rf Devices

The continuous scaling needed for higher density and better performance has introduced some new challenges to the planarity processes. This has resulted in new definitions of the layout coverage rules developed by the foundry and provided to the designers. In advanced technologies, the set of rules considers both the global and the local coverage of the front-end-of line (FEOL) dielectric layers, to the back-end-of-line (BEOL) Cu layers and Al layers, to support high-k/Metal Gate process integration. For advance technologies, a new set of rules for dummy feature insertion was developed by the integrated circuit (IC) manufacturers in order to fulfill coverage limits. New models and utilities for fill insertion were developed, taking into consideration the design coverage, thermal effects, sensitive signal line, critical analog and RF devices like inductors, and double patterning requirements, among others. To minimize proximity effects, cell insertion was also introduced. This review is based on published data from leading IC manufacturers with a careful integration of new experimental data accumulated by the authors. We aim to present a typical foundry perspective. The review provides a detailed description of the chemical mechanical polishing (CMP) process and the coverage dependency, followed by a comprehensive description of coverage rules needed for dielectric, poly, and Cu layers used in advanced technologies. Coverage rules verification data are then presented. RF-related aspects of some rules, like the size and the distance of dummy features from inductors, are discussed with additional design-for-manufacturing layout recommendations as developed by the industry.

scholarly journals Validation and standardization of DNA extraction and library construction methods for metagenomics-based human fecal microbiome measurements

Microbiome ◽  
2021 ◽  
Vol 9 (1) ◽  
Author(s):  
Dieter M. Tourlousse ◽  
Koji Narita ◽  
Takamasa Miura ◽  
Mitsuo Sakamoto ◽  
Akiko Ohashi ◽  
...  
Keyword(s):  
Dna Extraction ◽  
High Throughput Sequencing ◽  
Performance Metrics ◽  
Collaborative Study ◽  
Human Microbiome ◽  
Second Phase ◽  
Intermediate Precision ◽  
Fecal Microbiome ◽  
Library Construction ◽  
Wide Range

Abstract Background Validation and standardization of methodologies for microbial community measurements by high-throughput sequencing are needed to support human microbiome research and its industrialization. This study set out to establish standards-based solutions to improve the accuracy and reproducibility of metagenomics-based microbiome profiling of human fecal samples. Results In the first phase, we performed a head-to-head comparison of a wide range of protocols for DNA extraction and sequencing library construction using defined mock communities, to identify performant protocols and pinpoint sources of inaccuracy in quantification. In the second phase, we validated performant protocols with respect to their variability of measurement results within a single laboratory (that is, intermediate precision) as well as interlaboratory transferability and reproducibility through an industry-based collaborative study. We further ascertained the performance of our recommended protocols in the context of a community-wide interlaboratory study (that is, the MOSAIC Standards Challenge). Finally, we defined performance metrics to provide best practice guidance for improving measurement consistency across methods and laboratories. Conclusions The validated protocols and methodological guidance for DNA extraction and library construction provided in this study expand current best practices for metagenomic analyses of human fecal microbiota. Uptake of our protocols and guidelines will improve the accuracy and comparability of metagenomics-based studies of the human microbiome, thereby facilitating development and commercialization of human microbiome-based products.

scholarly journals Design and Evaluation of Large-Scale IoT-Enabled Healthcare Architecture

2021 ◽  
Vol 11 (8) ◽  
pp. 3623
Author(s):  
Omar Said ◽  
Amr Tolba
Keyword(s):  
Packet Loss ◽  
Large Scale ◽  
Performance Metrics ◽  
Medical System ◽  
Healthcare Data ◽  
High Altitude Platforms ◽  
Wide Range ◽  
Simulation Results ◽  
Healthcare Architecture ◽  
The Internet Of Things

Employment of the Internet of Things (IoT) technology in the healthcare field can contribute to recruiting heterogeneous medical devices and creating smart cooperation between them. This cooperation leads to an increase in the efficiency of the entire medical system, thus accelerating the diagnosis and curing of patients, in general, and rescuing critical cases in particular. In this paper, a large-scale IoT-enabled healthcare architecture is proposed. To achieve a wide range of communication between healthcare devices, not only are Internet coverage tools utilized but also satellites and high-altitude platforms (HAPs). In addition, the clustering idea is applied in the proposed architecture to facilitate its management. Moreover, healthcare data are prioritized into several levels of importance. Finally, NS3 is used to measure the performance of the proposed IoT-enabled healthcare architecture. The performance metrics are delay, energy consumption, packet loss, coverage tool usage, throughput, percentage of served users, and percentage of each exchanged data type. The simulation results demonstrate that the proposed IoT-enabled healthcare architecture outperforms the traditional healthcare architecture.

Early Cretaceous crust–mantle interaction linked to rollback of the Palaeo-Pacific flat-subducting slab: constraints from the intermediate–felsic volcanic rocks of the northern Great Xing’an Range, NE China

2021 ◽  
pp. 1-22
Author(s):  
Jia-Hao Jing ◽  
Hao Yang ◽  
Wen-Chun Ge ◽  
Yu Dong ◽  
Zheng Ji ◽  
...  
Keyword(s):  
Early Cretaceous ◽  
Volcanic Rocks ◽  
Geochemical Data ◽  
Calc Alkaline ◽  
Ne China ◽  
Asthenospheric Mantle ◽  
High K ◽  
Wide Range ◽  
Great Xing’An Range ◽  
Subducting Slab

Abstract Late Mesozoic igneous rocks are important for deciphering the Mesozoic tectonic setting of NE China. In this paper, we present whole-rock geochemical data, zircon U–Pb ages and Lu–Hf isotope data for Early Cretaceous volcanic rocks from the Tulihe area of the northern Great Xing’an Range (GXR), with the aim of evaluating the petrogenesis and genetic relationships of these rocks, inferring crust–mantle interactions and better constraining extension-related geodynamic processes in the GXR. Zircon U–Pb ages indicate that the rhyolites and trachytic volcanic rocks formed during late Early Cretaceous time (c. 130–126 Ma). Geochemically, the highly fractionated I-type rhyolites exhibit high-K calc-alkaline, metaluminous to weakly peraluminous characteristics. They are enriched in light rare earth elements (LREEs) and large-ion lithophile elements (LILEs) but depleted in high-field-strength elements (HFSEs), with their magmatic zircons ϵHf(t) values ranging from +4.1 to +9.0. These features suggest that the rhyolites were derived from the partial melting of a dominantly juvenile, K-rich basaltic lower crust. The trachytic volcanic rocks are high-K calc-alkaline series and exhibit metaluminous characteristics. They have a wide range of zircon ϵHf(t) values (−17.8 to +12.9), indicating that these trachytic volcanic rocks originated from a dominantly lithospheric-mantle source with the involvement of asthenospheric mantle materials, and subsequently underwent extensive assimilation and fractional crystallization processes. Combining our results and the spatiotemporal migration of the late Early Cretaceous magmatic events, we propose that intense Early Cretaceous crust–mantle interaction took place within the northern GXR, and possibly the whole of NE China, and that it was related to the upwelling of asthenospheric mantle induced by rollback of the Palaeo-Pacific flat-subducting slab.

Removing W Polymer Residue from BEOL Structures Using DSP+ (Dilute Sulfuric-Peroxide-HF) Mixture – A Case Study

2012 ◽  
Vol 195 ◽  
pp. 128-131 ◽  
Author(s):  
Hun Hee Lee ◽  
Min Sang Yun ◽  
Hyun Wook Lee ◽  
Jin Goo Park
Keyword(s):  
High Speed ◽  
Semiconductor Device ◽  
Environmental Issues ◽  
Low Power Consumption ◽  
Device Performance ◽  
Metal Gate ◽  
Feature Size ◽  
High K ◽  
Removal Of Metal

As the feature size of semiconductor device shrinks continuously, various high-K metals for 3-D structures have been applied to improve the device performance, such as high speed and low power consumption. Metal gate fabrication requires the removal of metal and polymer residues after etching process without causing any undesired etching and corrosion of metals. The conventional sulfuric-peroxide mixture (SPM) has many disadvantages like the corrosion of metals, environmental issues etc., DSP+(dilute sulfuric-peroxide-HF mixture) chemical is currently used for the removal of post etch residues on device surface, to replace the conventional SPM cleaning [. Due to the increased usage of metal gate in devices in recent times, the application of DSP+chemicals for cleaning processes also increases [.

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