scholarly journals A Near-Infrared CMOS Silicon Avalanche Photodetector with Ultra-Low Temperature Coefficient of Breakdown Voltage

Micromachines ◽  
2021 ◽  
Vol 13 (1) ◽  
pp. 47
Author(s):  
Daoqun Liu ◽  
Tingting Li ◽  
Bo Tang ◽  
Peng Zhang ◽  
Wenwu Wang ◽  
...  

Silicon avalanche photodetector (APD) plays a very important role in near-infrared light detection due to its linear controllable gain and attractive manufacturing cost. In this paper, a silicon APD with punch-through structure is designed and fabricated by standard 0.5 μm complementary metal oxide semiconductor (CMOS) technology. The proposed structure eliminates the requirements for wafer-thinning and the double-side metallization process by most commercial Si APD products. The fabricated device shows very low level dark current of several tens Picoamperes and ultra-high multiplication gain of ~4600 at near-infrared wavelength. The ultra-low extracted temperature coefficient of the breakdown voltage is 0.077 V/K. The high performance provides a promising solution for near-infrared weak light detection.

Author(s):  
Sunil Kumar ◽  
Balwinder Raj

In Complementary Metal-Oxide-Semiconductor (CMOS) technology, scaling has been a main key for continuous progress in silicon-based semiconductor industry over the past four decades. However, as the technology advancement on nanometer scale regime for the purpose of building ultra-high density integrated electronic computers and extending performance, CMOS devices are facing fundamental problems such as increased leakage currents, large process parameter variations, short channel effects, increase in manufacturing cost, etc. The new technology must be energy efficient, dense, and enable more device function per unit area and time. There are many novel nanoscale semiconductor devices, this book chapter introduces and summarizes progress in the development of the Tunnel Field-Effect Transistors (TFETs) for low power design. Tunnel FETs are interesting devices for ultra-low power applications due to their steep sub-threshold swing (SS) and very low OFF-current. Tunnel FETs avoid the limit 60mv/decade by using quantum-mechanical Band-to-Band Tunneling (BTBT).


2006 ◽  
Vol 934 ◽  
Author(s):  
Ali Serpengüzel

ABSTRACTSilicon microspheres with high quality factors morphology dependent resonances are used for resonant detection and filtering in the near-infrared. The near-infrared light is coupled to the silicon microsphere with optical fiber half couplers. The observed morphology dependent resonances have quality factors of 100000. The experimentally measured quality factors are limited by the sensitivity of the experimental setup. These optical resonances provide the necessary narrow linewidths that are needed for high resolution optical filtering, Raman lasers, modulators, complementary metal oxide semiconductor (CMOS) compatible detectors in the near-infrared. The silicon microsphere shows promise as a building block for silicon microphotonics, a complementary technology to the already well established CMOS based microelectronics technology for the realization of future microelectrophotonic integration.


The decoders are widely used in the logical circuits, data transfer circuits and analog to digital conversions. A mixed logic design methods for the line decoders are used to combining the transmission gate logic, pass transistor logic, and complementary metal-oxide semiconductor (CMOS) technology provides desired operation and performance. A novel topology is presented for the 2 to 4 decoder requires a fourteen transistor topology aiming on reducing the transistor count and operating power and a fifteen transistor topology aiming on high power and low delay performance. The standard and inverting decoders are designed in each of the case, gives a total of four new designs circuits. All the proposed decoders have compact transistor count compared to their conservative CMOS technologies. Finally, a variety of proposed designs present a noteworthy improvement in operating power and propagation delay, outperforming CMOS in almost all the cases.


2019 ◽  
Vol 16 (10) ◽  
pp. 4179-4187
Author(s):  
Amanpreet Sandhu ◽  
Sheifali Gupta

The Conventional Complementary Metal oxide semiconductor (CMOS) technology has been revolutionized from the past few decades. However, the CMOS circuit faces serious constraints like short channel effects, quantum effects, doping fluctuations at the nanoscale which limits them to further scaling down at nano meter range. Among various existing nanotechnologies, Quantum dot Cellular Automata (QCA) provides new solution at nanocircuit design. The technical advancement of the paper lies in designing a high performance RAM cell with less QCA cells, less occupational area and lower power dissipation characteristics. The design occupies 12.5% lower area, 16.6% lower input to output delay, and dissipates 18.26% lesser energy than the designs in the literature. The proposed RAMcell is robust due to lesser noise variations. Also it has less fabrication cost due to absence of rotated cells.


Electronics ◽  
2019 ◽  
Vol 8 (5) ◽  
pp. 477 ◽  
Author(s):  
Mohammad Arif Sobhan Bhuiyan ◽  
Md Torikul Islam Badal ◽  
Mamun Bin Ibne Reaz ◽  
Maria Liz Crespo ◽  
Andres Cicuttin

Power amplifiers (PAs) are among the most crucial functional blocks in the radio frequency (RF) frontend for reliable wireless communication. PAs amplify and boost the input signal to the required output power. The signal is amplified to make it sufficiently high for the transmitter to propagate the required distance to the receiver. Attempted advancements of PA have focused on attaining high-performance RF signals for transmitters. Such PAs are expected to require low power consumption while producing a relatively high output power with a high efficiency. However, current PA designs in nanometer and micrometer complementary metal–oxide semiconductor (CMOS) technology present inevitable drawbacks, such as oxide breakdown and hot electron effect. A well-defined architecture, including a linear and simple functional block synthesis, is critical in designing CMOS PA for various applications. This article describes the different state-of-the art design architectures of CMOS PA, including their circuit operations, and analyzes the performance of PAs for 2.4 GHz ISM (industrial, scientific, and medical) band applications.


Micromachines ◽  
2018 ◽  
Vol 9 (11) ◽  
pp. 579 ◽  
Author(s):  
Martín Riverola ◽  
Francesc Torres ◽  
Arantxa Uranga ◽  
Núria Barniol

In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm CMOS technology. Three different contact materials are studied to discriminate which is the most adequate as a mechanical relay. The robustness of the relay is proved, and its main characteristics as a relay for the three different contact interfaces are provided. The seesaw relay is capable of a double hysteretic switching cycle, providing compactness for mechanical logic processing. The low contact resistance achieved with the TiN/W mechanical contact with high cycling life time is competitive in comparison with the state-of-the art.


2019 ◽  
Vol 7 (17) ◽  
pp. 5019-5027 ◽  
Author(s):  
Li Wang ◽  
Jing-Jing Li ◽  
Qi Fan ◽  
Zheng-Feng Huang ◽  
Ying-Chun Lu ◽  
...  

Light detection in the near-infrared (NIR) region is of particular importance due to its wide application for both military and civil purposes.


Micromachines ◽  
2019 ◽  
Vol 10 (6) ◽  
pp. 368 ◽  
Author(s):  
Giulia Santoro ◽  
Giovanna Turvani ◽  
Mariagrazia Graziano

Processing systems are in continuous evolution thanks to the constant technological advancement and architectural progress. Over the years, computing systems have become more and more powerful, providing support for applications, such as Machine Learning, that require high computational power. However, the growing complexity of modern computing units and applications has had a strong impact on power consumption. In addition, the memory plays a key role on the overall power consumption of the system, especially when considering data-intensive applications. These applications, in fact, require a lot of data movement between the memory and the computing unit. The consequence is twofold: Memory accesses are expensive in terms of energy and a lot of time is wasted in accessing the memory, rather than processing, because of the performance gap that exists between memories and processing units. This gap is known as the memory wall or the von Neumann bottleneck and is due to the different rate of progress between complementary metal–oxide semiconductor (CMOS) technology and memories. However, CMOS scaling is also reaching a limit where it would not be possible to make further progress. This work addresses all these problems from an architectural and technological point of view by: (1) Proposing a novel Configurable Logic-in-Memory Architecture that exploits the in-memory computing paradigm to reduce the memory wall problem while also providing high performance thanks to its flexibility and parallelism; (2) exploring a non-CMOS technology as possible candidate technology for the Logic-in-Memory paradigm.


2020 ◽  
Vol 17 (1) ◽  
pp. 1-8
Author(s):  
Lei Fu ◽  
Milind Bhagavat ◽  
Cheryl Selvanayagam ◽  
Ken Leong ◽  
Ivor Barber

Abstract Power, performance, and area gains are important metrics driving the complementary metal–oxide–semiconductor (CMOS) technology from older nodes to newer ones. Over past several decades, a steady downscaling of feature sizes of CMOS technology has been a leading force enabling continual improvement in circuit speeds and cost per functionality. Increase in functionality drives larger number of inputs/outputs (I/Os), and the scaling-driven small intellectual property (IP) block sizes force these larger number of I/Os to be accommodated by reduction of I/O pitches. The result is an unrelenting pressure to reduce bump pitches from one generation of CMOS to another. In contrast to 14-nm/16-nm nodes which used 150-um bump pitch coming out of a die, for 7-nm node, the industry is targeting 130-um bump pitch for high performance devices. With this pitch reduction, conventional tin/silver (SnAg) solder bumps face limitations in terms of bridging. Cu pillar bumps are the best candidate for smaller bump pitches. However, for large die sizes prevalent in high-performance computing (HPC), the Cu pillar bumps will induce higher stress on the silicon resulting in higher risks of extremely low K (ELK) cracking. If copper pillar bumps are not properly developed, then there is a risk of marginal reliability in terms of chip package interaction. The situation becomes even more dire in large die sizes, where coefficient of thermal expansion mismatch between silicon and laminate substrate magnifies the stress. The present article discusses successful development of Cu pillar bumps for 7-nm technology. The development program included a 2-step development path. In the first step, extensive thermomechanical modeling was carried out to find optimal design of copper pillar bump for robustness of interactions with 7-nm back end of line ELK layers. In the second step, a 460-mm2 7-nm Silicon test vehicle was fabricated, and its assembly process was optimized to characterize the copper pillar bumps and prove their extended reliability on 7-nm silicon. As a result of this development, copper pillar technology has been qualified on Advanced Micro Devices (AMD) products. Today, copper pillar is a fully integral part of AMD's ever-growing 7-nm product offering in HPC.


Sensors ◽  
2019 ◽  
Vol 20 (1) ◽  
pp. 116 ◽  
Author(s):  
Sanggwon Lee ◽  
Keita Yasutomi ◽  
Masato Morita ◽  
Hodaka Kawanishi ◽  
Shoji Kawahito

In this paper, a back-illuminated (BSI) time-of-flight (TOF) sensor using 0.2 µm silicon-on-insulator (SOI) complementary metal oxide semiconductor (CMOS) technology is developed for long-range laser imaging detection and ranging (LiDAR) application. A 200 µm-thick bulk silicon in the SOI substrate is fully depleted by applying high negative voltage at the backside for higher quantum efficiency (QE) in a near-infrared (NIR) region. The proposed SOI-based four-tap charge modulator achieves a high-speed charge modulation and high modulation contrast of 71% in a NIR region. In addition, in-pixel drain function is used for short-pulse TOF measurements. A distance measurement up to 27 m is carried out with +1.8~−3.0% linearity error and range resolution of 4.5 cm in outdoor conditions. The measured QE of 55% is attained at 940 nm which is suitable for outdoor use due to the reduced spectral components of solar radiation.


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