A 10T Cell Design without Half Select Problem for Bit-Interleaving Architecture in 65nm CMOS

2013 ◽  
Vol 373-375 ◽  
pp. 1607-1611
Author(s):  
Hong Gang Zhou ◽  
Shou Biao Tan ◽  
Qiang Song ◽  
Chun Yu Peng
Keyword(s):  
Error Correction ◽  
Low Voltage ◽  
Cmos Technology ◽  
Soft Error ◽  
Error Correction Codes ◽  
Cell Design ◽  
Low Voltage Operation ◽  
Sram Cell ◽  
Simulation Results ◽  
Nanometer Regime

With the scaling of process technologies into the nanometer regime, multiple-bit soft error problem becomes more serious. In order to improve the reliability and yield of SRAM, bit-interleaving architecture which integrated with error correction codes (ECC) is commonly used. However, this leads to the half select problem, which involves two aspects: the half select disturb and the additional power caused by half-selected cells. In this paper, we propose a new 10T cell to allow the bit-interleaving array while completely eliminating the half select problem, thus allowing low-power and low-voltage operation. In addition, the RSNM and WM of our proposed 10T cell are improved by 21% and nearly one times, respectively, as compared to the conventional 6T SRAM cell in SMIC 65nm CMOS technology. We also conduct a comparison with the conventional 6T cell about the leakage simulation results, which show 14% of leakage saving in the proposed 10T cell.

Sub-Volt Fully Balanced Differential Difference Amplifier

2014 ◽  
Vol 24 (01) ◽  
pp. 1550005 ◽  
Author(s):  
Fabian Khateb ◽  
Montree Kumngern ◽  
Spyridon Vlassis ◽  
Costas Psychalinos ◽  
Tomasz Kulej
Keyword(s):  
Low Voltage ◽  
Input Voltage ◽  
Cmos Technology ◽  
Floating Gate ◽  
Voltage Range ◽  
State Variable ◽  
Low Voltage Operation ◽  
Differential Difference Amplifier ◽  
Simulation Results ◽  
State Variable Filter

This paper presents a new CMOS structure for a fully balanced differential difference amplifier (FB-DDA) designed to operate from a sub-volt supply. This structure employs the bulk-driven quasi-floating-gate (BD-QFG) technique to achieve the capability of an ultra-low voltage operation and an extended input voltage range. The proposed BD-QFG FB-DDA is suitable for ultra-low-voltage low-power applications. The circuit is designed with a single supply of 0.5 V and consumes only 357 nW of power. The proposed circuit was simulated in a 0.18-μm TSMC CMOS technology and the simulation results prove its functionality and attractive parameters. An application example of a state variable filter is also presented to confirm the usefulness of the proposed BD-QFG FB-DDA.

A New 10T SRAM Cell with Improved Read/Write Margin and No Half Select Disturb for Bit-Interleaving Architecture

2012 ◽  
Vol 263-266 ◽  
pp. 9-14 ◽  
Author(s):  
Hong Gang Zhou ◽  
Qiang Song ◽  
Chun Yu Peng ◽  
Shou Biao Tan
Keyword(s):  
Great Improvement ◽  
Error Rate ◽  
Cmos Technology ◽  
Soft Error ◽  
Dynamic Power ◽  
Soft Error Rate ◽  
Sram Cell ◽  
Simulation Results ◽  
The Cross

A new 10T SRAM cell is proposed in this paper for simultaneously addressing the half select problem and improving the read/write stability. Without the half select condition, the proposed 10T cell allows efficient bit-interleaving to provide soft error rate protection and the dynamic power is also decreased significantly due to the reduction in the number of bitlines discharged and charged during the read and write operation. In the new 10T SRAM cell, one side of the cross-coupled inverters cuts off the pull up path or pull down path through adding two gated transistors according to the write ‘0’ or ‘1’ operation. It brings a great improvement for write stability without considering the half select disturb during the write operation. The simulation results indicate that the RSNM and WM of the proposed SRAM cell are enhanced by 130% and 58%, respectively, as compared to the conventional 6T SRAM cell in SMIC 65nm CMOS technology.

Low Power FGSRAM Cell Using Sleepy and LECTOR Technique

2016 ◽  
Vol 4 (2) ◽  
pp. 333 ◽  
Author(s):  
Kanan Bala Ray ◽  
Sushanta Kumar Mandal ◽  
Shivalal Patro
Keyword(s):  
Low Power ◽  
Power Supply ◽  
High Stability ◽  
Supply Voltage ◽  
Cmos Technology ◽  
Floating Gate ◽  
Power Supply Voltage ◽  
Operation Analysis ◽  
Sram Cell ◽  
Simulation Results

<em>In this paper floating gate MOS (FGMOS) along with sleep transistor technique and leakage control transistor (LECTOR) technique has been used to design low power SRAM cell. Detailed investigation on operation, analysis and result comparison of conventional 6T, FGSRAM, FGSLEEPY, FGLECTOR and FGSLEEPY LECTOR has been done. All the simulations are done in Cadence Virtuoso environment on 45 nm standard CMOS technology with 1 V power supply voltage. Simulation results show that FGSLEEPY LECTOR SRAM cell consumes very low power and achieves high stability compared to conventional FGSRAM Cell</em>

New Schmitt Trigger with Controllable Hysteresis using Dual Control Gate-Floating Gate Transistor (DCG-FGT)

2013 ◽  
Vol 2 (1) ◽  
pp. 49
Author(s):  
Abderrezak Marzaki ◽  
V. Bidal ◽  
R. Laffont ◽  
W. Rahajandraibe ◽  
J-M. Portal ◽  
...  
Keyword(s):  
Low Voltage ◽  
Schmitt Trigger ◽  
Cmos Technology ◽  
Floating Gate ◽  
Dual Control ◽  
Switching Voltage ◽  
Voltage Range ◽  
Rail To Rail ◽  
Floating Gate Transistor ◽  
Simulation Results

This paper presents different low voltage adjustable CMOS Schmitt trigger using DCG-FGT transistor. Simple circuits are introduced to provide flexibility to program the hysteresic threshold in this paper. The hysteresis can be controlled accurately at a large voltage range. The proposed Schmitt trigger have been designed using 90nm 1.2V CMOS technology and simulated using Eldo with PSP device models. The simulation results show rail-to-rail operation and adjustable switching voltages <em>V<sub>TH- </sub></em>(low switching voltage) and <em>V<sub>TH+ </sub></em>(high switching voltage).

A High-Linear CMOS Down Conversion Mixer Using Adjusting the Second and Third-Order Harmonic in Transconductance Stage

2014 ◽  
Vol 24 (01) ◽  
pp. 1550002 ◽  
Author(s):  
Mina Amiri ◽  
Adib Abrishamifar
Keyword(s):  
Low Voltage ◽  
Supply Voltage ◽  
Circuit Simulation ◽  
Cmos Technology ◽  
Conversion Gain ◽  
Third Order ◽  
Cmos Mixer ◽  
Simulation Results ◽  
Down Conversion ◽  
Pmos Transistor

In this paper a new high-linear CMOS mixer is proposed. A well-known low voltage CMOS multiplier structure is used for mixer application in this paper and its linearity is provided by adjusting the value of a resistor, sizing the aspect ratio of a PMOS transistor and adding a proper value of inductor at the input stage. In simulation, a supply voltage as low as 1 V is applied to the circuit. Simulation results of improved mixer in a 0.18-μm CMOS technology illustrate 14 dB increases in IIP3 and also an increase around 1.4 dB is obtained in conversion gain. Furthermore, additional components which are used for improving linearity would not increase the power consumption and area significantly.

scholarly journals Design, Implementation and Power Analysis of Low Voltage Heterojunction Tunnel Field Effect Transistor based Basic 6T SRAM Cell

2019 ◽  
Vol 8 (11) ◽  
pp. 2898-2903 ◽  
Keyword(s):  
Low Voltage ◽  
Electronic Device ◽  
Average Power ◽  
Cmos Technology ◽  
Subthreshold Swing ◽  
Semiconductor Memory ◽  
Energy Applications ◽  
Sram Cell ◽  
Memory Applications ◽  
Mobile Electronic Device

The battery-powered mobile devices limited energy process by MOSFET's due to subthreshold swing and underneath 60mV/dec for ultra fewer energy applications. This research introduces the layout and execution of a mobile electronic device full-on-presence, extended Miller potential, and reduced HETT subthreshold swing effectiveness has been compared with MOSFET's Gate oxide blending on source can increase channel tunneling in this work. To enhance transistor line, Miller capacitance impact can be decreased by using low band offset equipment and small power product of metals such as Ge or SiGe. This, in turn, leads to stronger transistor efficiency features. The proposed layout and execution of HETT includes manufacturing of mutually NHETT and PHETT and efficiency analyzes of both NHETT and PHETT. Concerning the fundamental and skeletal distinctions among MOSFET and HETT to promote the utilization of MOSFET instead of HETT, the benefits and constraints of both NHETT and PHETT have been detailed. HETT's construction process is by no means entirely different, suitable for the scheme of MOS method and suitable for transportable motorized applications. HETT provides the 6T SRAM cell electricity evaluation and the output was reviewed using standard SRAM cell. The average power, maximum power and minimum power of SRAM by using both MOSFET and HETT are obtained and compared. The mask layers of HETT fabrication is not that much difference than MOSFET and hence CMOS MOSFET fabrication is friendly to HETT fabrication. In future, the combination of both CMOS MOSFET and HETT are used, CMOS technology for digital logic and HETT for semiconductor memory applications.

scholarly journals A Fast ALU Design in CMOS for Low Voltage Operation

VLSI Design ◽  
2002 ◽  
Vol 14 (4) ◽  
pp. 315-327 ◽  
Author(s):  
A. Srivastava ◽  
D. Govindarajan
Keyword(s):  
Delay Time ◽  
High Speed ◽  
Low Voltage ◽  
Cmos Technology ◽  
Substrate Bias ◽  
Back Gate ◽  
Low Voltage Operation ◽  
Logical Operations ◽  
Ripple Carry Adder ◽  
Speed Advantage

A high-speed 4-bit ALU has been designed for 1 V operation to demonstrate the usefulness of the back-gate forward substrate bias (BGFSB) method in 1.2 μm N-well CMOS technology. The 4-bit ALU employs a ripple carry adder and is capable of performing eight operations - four arithmetic and four logical operations. The BGFSB voltage has been limited to |0.4| V. Delay time measurements are taken for all operations from the SPICE simulations with and without the back-gate forward substrate bias. A speed advantage of a factor of about 2–2.5 is obtained with BGFSB over the conventional design.

scholarly journals A design of low voltage OPAMP using split-length transistors

2014 ◽  
Vol 17 (1) ◽  
pp. 62-70
Author(s):  
Khanh Trung Le ◽  
Tu Trong Bui ◽  
Hung Duc Le ◽  
Kha Cong Pham
Keyword(s):  
High Performance ◽  
Low Voltage ◽  
Supply Voltage ◽  
Cmos Technology ◽  
Feedback Systems ◽  
Advanced Technique ◽  
Low Voltage Operation ◽  
Feedback Compensation ◽  
Indirect Feedback ◽  
Low Supply Voltage

In the paper, we present a design of a low voltage Operation Amplifier (OPAMP) circuit using split-length transistors. Indirect feedback compensation is an advanced technique used to stabilize the operation of an OPAMP. Cascode transistors are usually implemented for indirect feedback systems. However, these transistors are not suitable for low voltage design. In this study, we have taken advantage of split-length transistors and indirect feedback compensation technique to design a high performance OPAMP. As a result, the OPAMP operates not only at low supply voltage but also at high frequency. The OPAMP has been designed and fabricated in a 0.18um CMOS technology. This OPAMP achieves 100 dB gain, 90 MHz unity gain frequency and 60 degrees phase margin at 2 V supply voltage.

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