Thermal Expansion Coefficients of 6H Silicon Carbide
2008 ◽
Vol 600-603
◽
pp. 517-520
◽
Keyword(s):
X Rays
◽
The thermal expansion of 6H Silicon Carbide with different dopant concentrations of aluminum and nitrogen was determined by lattice parameter measurements at temperatures from 300 K to 1575 K. All samples have a volume of at least 6 x 6 x 6 mm3 to ensure that bulk properties are measured. The measurements were performed with a triple axis diffractometer with high energy x-rays with a photon energy of 60 keV. The values for the thermal expansion coefficients along the a- and c-direction, α11 and α33, are in the range of 3·10-6 K-1 for 300 K and 6·10-6 K-1 for 1550 K. At high temperatures the coefficients for aluminum doped samples are approximately 0.5·10-6 K-1 lower than for the nitrogen doped crystal. α11 and α33 appear to be isotropic.
2006 ◽
Vol 317-318
◽
pp. 177-180
◽
2000 ◽
Vol 15
(8)
◽
pp. 1780-1785
◽
1985 ◽
Vol 49
(5)
◽
pp. 376-381
◽
2016 ◽
Vol 30
(11)
◽
pp. 1650127
◽