Effect of X-Ray Irradiation on the Current of P-N Diode

2011 ◽  
Vol 695 ◽  
pp. 561-564 ◽  
Author(s):  
Itsara Srithanachai ◽  
Surada Ueamanapong ◽  
Poopol Rujanapich ◽  
Amporn Poyai ◽  
Surasak Niemcharoen ◽  
...  
Keyword(s):  
Room Temperature ◽  
Life Time ◽  
Electrical Characteristics ◽  
X Ray ◽  
Boron Doped ◽  
Characteristic Variation ◽  
Current Voltage ◽  
Before And After ◽  
Order Of Magnitude ◽  
Carrier Life Time

An effect induced by x-ray irradiation on Boron-doped crystalline Si at room temperature was closely investigated in this paper. Irradiation of X-ray energy of 40, 55 and 70keV has been performed on P-N junction diodes fabricated at Thai Microelectronics Center. Minority carrier life time of the device has been calculated before and after irradiation for comparison. The results show no significant change on the value between exposed and unexposed device. Therefore, any permanent lattice modified or any defects caused by X-ray in the device bulk seem to be unconfirmed in this range of energy. However, from this study, X-ray irradiation still effects on electrical characteristics of the diodes. Current-voltage (I-V) measurement has been carried out to study characteristic variation of the device. Biasing of the device was performed from -10 to 1 V and, after the exposure, the leakage current was obviously decreased by 25% and forward current was dramatically increased by 3 order of magnitude related to increment of X-ray energy.

scholarly journals The influence of CdCl2 layer and annealing process on the structural and electrical properties of CdTe films

2019 ◽  
Vol 11 (22) ◽  
pp. 8-13
Author(s):  
Mohammed A. Razooqi
Keyword(s):  
Room Temperature ◽  
Life Time ◽  
Hall Effect Measurement ◽  
X Ray Diffraction ◽  
X Ray ◽  
Structural And Electrical Properties ◽  
Evaporation Technique ◽  
Cdte Films ◽  
P Type ◽  
Carrier Life Time

A polycrystalline CdTefilms have been prepared by thermal evaporation technique on glass substrate at room temperature. The films thickness was about700±50 nm. Some of these films were annealed at 573 K for different duration times (60, 120 and 180 minutes), and other CdTe films followed by a layer of CdCl2 which has been deposited on them, and then the prepared CdTe films with CdCl2 layer have been annealed for the same conditions. The structures of CdTe films without and with CdCl2 layer have been investigated by X-ray diffraction. The as prepared and annealed films without and with CdCl2 layer were polycrystalline structure with preferred orientation at (111) plane. The better structural properties have been observed in presence of CdCl2 layer. The D.C conductivity for CdTe films with CdCl2 layershowed higher values. The electrical activation energy influenced with increasing duration times of annealing. Hall Effect measurement was indicated that all CdTe films are p-type. The carrier concentration, Hall mobility and the carrier life time wereaffected by increasing duration times of annealing.

Electrical and photoconductive properties of boron-doped potycrystalline diamond films

1995 ◽  
Vol 10 (9) ◽  
pp. 2350-2354 ◽  
Author(s):  
Wenjun Zhang ◽  
Bo Hu ◽  
Erqin Xie ◽  
Yafei Zhang ◽  
Li Han ◽  
...  
Keyword(s):  
Diamond Films ◽  
Annealing Process ◽  
Nuclear Reaction Analysis ◽  
Electrical Characteristics ◽  
Elastic Recoil ◽  
Hydrogen Atoms ◽  
Elastic Recoil Detection ◽  
Boron Doped ◽  
Current Voltage ◽  
Before And After

The current-voltage (I-V) characteristics and time-dependence photoconductivity of the undoped and B-doped diamond films (DF's) before and after annealing were investigated. The boron and hydrogen concentration in diamond films were measured by means of nuclear reaction analysis (NRA) and the elastic-recoil detection (ERD) technique, respectively. The results show that induced boron atoms and hydrogen atoms affect the electrical and photocoaductive properties of diamond films. During the annealing process, B concentration kept even, but H content decreased. For undoped diamond films, the escaping of H atoms has great effects on the electrical characteristics, but for B-doped samples, this effect decreases with the increase of B concentration.

scholarly journals Influence of Gas Annealing on Sensitivity of AlN/4H-SiC-Based Temperature Sensors

Materials ◽  
2021 ◽  
Vol 14 (3) ◽  
pp. 683
Author(s):  
Seung-Woo Jung ◽  
Myeong-Cheol Shin ◽  
Michael A. Schweitz ◽  
Jong-Min Oh ◽  
Sang-Mo Koo
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Temperature Sensor ◽  
Temperature Sensors ◽  
Electrical Characteristics ◽  
X Ray ◽  
Radio Frequency Sputtering ◽  
Current Voltage ◽  
Before And After ◽  
A Current

In this study, the physical and electrical characteristics of an AlN/4H-SiC Schottky barrier diode-based temperature sensor annealed in various gas atmospheres were investigated. An aluminum nitride (AlN) thin film was deposited on a 4H-SiC substrate via radio-frequency sputtering followed by annealing in N2 or O2 gas. The chemical composition of the film was determined by X-ray photoelectron spectroscopy (XPS) before and after annealing, and its electrical properties were evaluated by plotting a current–voltage (I–V) curve. The voltage–temperature (V–T) characteristics of the sensor were extracted from the current–voltage–temperature (I–V–T) plots constructed in the temperature range between 475 and 300 K in steps of 25 K. Sensitivities of 9.77, 9.37, and 2.16 mV/K were obtained for the as-grown, N2-annealed, and O2-annealed samples, respectively.

Structure and Conductivity of Iodine-Doped C60 Thin Films

1994 ◽  
Vol 359 ◽  
Author(s):  
Jun Chen ◽  
Haiyan Zhang ◽  
Baoqiong Chen ◽  
Shaoqi Peng ◽  
Ning Ke ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Room Temperature ◽  
Conductivity Measurements ◽  
X Ray Diffraction ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
X Ray ◽  
Thermally Activated ◽  
Order Of Magnitude

ABSTRACTWe report here the results of our study on the properties of iodine-doped C60 thin films by IR and optical absorption, X-ray diffraction, and electrical conductivity measurements. The results show that there is no apparent structural change in the iodine-doped samples at room temperature in comparison with that of the undoped films. However, in the electrical conductivity measurements, an increase of more that one order of magnitude in the room temperature conductivity has been observed in the iodine-doped samples. In addition, while the conductivity of the undoped films shows thermally activated temperature dependence, the conductivity of the iodine-doped films was found to be constant over a fairly wide temperature range (from 20°C to 70°C) exhibiting a metallic feature.

Study on Schottky Diode Characteristics Improving by X-Ray Irradiation

2013 ◽  
Vol 717 ◽  
pp. 113-116
Author(s):  
Sani Klinsanit ◽  
Itsara Srithanachai ◽  
Surada Ueamanapong ◽  
Sunya Khunkhao ◽  
Budsara Nararug ◽  
...  
Keyword(s):  
Leakage Current ◽  
Schottky Diode ◽  
Room Temperature ◽  
The Other ◽  
Low Power Consumption ◽  
Initial Value ◽  
X Ray ◽  
Forward Current ◽  
Current Voltage ◽  
Current Voltage Characteristics

The effect of soft X-ray irradiation to the Schottky diode properties was analyzed in this paper. The built-in voltage, leakage current, and work function of Schottky diode were investigated. The current-voltage characteristics of the Schottky diode are measured at room temperature. After irradiation at 70 keV for 55 seconds the forward current and leakage current are increase slightly. On the other hand, the built-in voltage is decrease from the initial value about 0.12 V. Consequently, this method can cause the Schottky diode has low power consumption. The results show that soft X-ray can improve the characteristics of Schottky diode.

scholarly journals Temperature Dependence of Hall Mobility AndCarrier Concentration of pb0.55S0.45 Films

2009 ◽  
Vol 6 (1) ◽  
pp. 129-134
Author(s):  
Baghdad Science Journal
Keyword(s):  
Hall Mobility ◽  
Room Temperature ◽  
Annealing Temperature ◽  
High Vacuum ◽  
Life Time ◽  
Mean Free Path ◽  
Charge Carriers ◽  
Evaporation Technique ◽  
Carrier Life Time ◽  
Type Conduction

Measurements of Hall effect properties at different of annealing temperature have been made on polycrystalline Pb0.55S0.45 films were prepared at room temperature by thermal evaporation technique under high vacuum 4*10-5 torr . The thickness of the film was 2?m .The carrier concentration (n) was observed to decrease with increasing the annealing temperature. The Hall measurements showed that the charge carriers are electrons (i.e n-type conduction). From the observed dependence on the temperature, it is found that the Hall mobility (µH), drift velocity ( d) carrier life time ( ), mean free path (?) were increased with increasing annealing temperature

scholarly journals Production and Electrical Properties of a CuZnAlMn(SMA)/p-Si Diode

2021 ◽  
Author(s):  
EMINE ALDIRMAZ ◽  
M. Güler ◽  
E. Güler
Keyword(s):  
Room Temperature ◽  
Schottky Contact ◽  
Phase Identification ◽  
Frequency Interval ◽  
Electrical Measurements ◽  
X Ray ◽  
Current Voltage ◽  
Capacitance Voltage ◽  
Type Semiconductor ◽  
Diode Current

Abstract In this study, the Cu-23.37%Zn-13.73%Al-2.92%Mn (at.%) alloy was used. Phase identification was performed with the Scanning electron microscope (SEM), and energy-dispersive X-ray (EDX). We observed in the austenite phase in Cu-23.37%Zn-13.73%Al-2.92%Mn (at.%) alloy. To produce a new Schottky diode, CuZnAlMn alloy was exploited as a Schottky contact on p-type semiconductor silicon substrate. To calculate the characteristics of the produced diode, current-voltage (I-V), capacitance-voltage (C-V) and conductance-voltage (G-V) analyzes were taken at room temperature (300 K), in the dark and under various lights. Using electrical measurements, the diode's ideality factor (n), barrier height (Φb), and other diode parameters were calculated. Besides, the conductance / capacitance-voltage (G/C-V) characteristics of the diode were studied and in a wide frequency interval at room temperature. Also, the capacitance and conductance values strongly ​​ rely on the frequency. From the present experimental results, the obtained diode can be used for optoelectronic devices.

Morphology and I-V Characteristics of Electrochemically Deposited Zinc Oxide on Silicon

2021 ◽  
Vol 20 (3) ◽  
pp. 32-36
Author(s):  
Ahmad Bukhairi Md Rashid ◽  
Mastura Shafinaz Zainal Abidin ◽  
Shaharin Fadzli Abd Rahman ◽  
Amirjan Nawabjan
Keyword(s):  
Zinc Oxide ◽  
Electrochemical Deposition ◽  
Dark Current ◽  
Room Temperature ◽  
Volume Ratio ◽  
Deposition Process ◽  
X Ray ◽  
Current Voltage ◽  
Electrochemically Deposited ◽  
A Current

This paper reported on the electrochemical deposition of zinc oxide (ZnO) on p-silicon (p-Si) (100) substrate in the mixture of 0.1 M of zinc chloride (ZnCl2) and potassium chloride (KCl) electrolyte at a volume ratio of 1:1, 3:1 and 5:1 namely Sample A, B and C. The deposition process was done in room temperature with a current density of 10 mA/cm2 for 30 minutes. Prior to the experiment, all samples were treated by RCA cleaning steps. All samples were characterized using scanning electron microscopy (SEM) and energy dispersive X-ray (EDX). The results show that all samples have the same morphology of a flake-like structure with different Zn:O ratio that were 2.81, 2.35 and 2.49 for samples A, B and C. The current-voltage (I-V) characteristic graph was obtained by dark current measurement using Keithley SMU 2400 and the threshold voltage (Vth) values were determined at 2.21 V, 0.85 V and 1.22 V for sample A, B and C respectively which correspond with the Zn:O ratio where the highest value of Zn:O ratio can be found in sample A and the lowest in sample B. Based on these results, it shows that electrochemical deposition technique is capable of being used to deposit the flake-like structure ZnO on semiconductor material to form the p-n junction which behaves like a diode. The value of Vth seems to be depended on the ratio between Zn and O. Higher ratio of Zn and O will cause the higher value of intrinsic carrier concentration and built in potential which will increase the Vth value.

Effect of Hydrogen Treatment on Room -Temperature Electric-Field Induced Properties in Narrow-Gap ZnCdHgTe Thin Films

2004 ◽  
Vol 813 ◽  
Author(s):  
Galina M. Khlyap ◽  
Petro G. Sydorchuk ◽  
Jacek Polit
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Hydrogen Treatment ◽  
Narrow Gap ◽  
Glass Substrates ◽  
Semiconductor Thin Films ◽  
Visible Wavelength Range ◽  
Current Voltage ◽  
Before And After ◽  
First Time

ABSTRACTThe effect of hydrogen treatment on room temperature electric properties of narrow-gap semiconductor thin films ZnxCdyHg1−z−yTe (0 < x < 0.50, 0.20 < y < 0.40) is investigated for the first time. ZnCdHgTe films of 2 – 5 [.proportional]m thickness were grown on glass substrates by pulsed laser deposition technique. As-grown films were thermally treated in the flow of molecular H2 at 200°C during 24 hours. Comparison between electric characteristics measured before and after hydrogenation showed sufficient changes of the film resistance and appearance of photosensitivity in the visible wavelength range. Study of current-voltage characteristics of the films revealed appearance and significant change of diode-like properties.

X-Ray Diffraction Studies on the Titanium-Nickel System

1962 ◽  
Vol 6 ◽  
pp. 74-84
Author(s):  
John V. Gilfrich
Keyword(s):  
Heat Treatment ◽  
Room Temperature ◽  
Stoichiometric Composition ◽  
Physical Property ◽  
X Ray Diffraction ◽  
X Ray ◽  
Property Data ◽  
Before And After ◽  
Titanium Nickel ◽  
Physical Property Data

AbstractX-ray diffraction studies were made on the Ti–Ni system around the stoichiometric composition of the intermetallic compound TiNi to clarify some confusion which has existed about the phase diagram in this region, and to explain some anomalies in the physical properties of this material. Wrought and cast samples were examined at room temperature both before and after heat treatment and at temperatures both above and below ambient. The compound TiNi does exist at room temperature. The phase purity of the particular sample was found to be greatly affected by such factors as minor variations in composition, heat treatment, and method of sample preparation. Some confirming metallographlc and physical property data will also be presented.

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