Semiconductor-on-Polymer Wafer Level Chip Scale Packaging

2019 ◽  
Vol 2019 (DPC) ◽  
pp. 001232-001256
Author(s):  
Doug Hackler
Keyword(s):  
Flexible Electronics ◽  
Flip Chip ◽  
Electronic System ◽  
New Physics ◽  
Semiconductor Materials ◽  
Wafer Level ◽  
Test Procedures ◽  
Initial Development ◽  
Thin Semiconductor ◽  
Interconnect Technology

Cell phone boards are getting thinner. Labels and tags are getting smarter. Electronics is starting to bend. Consumers think thin is cool. Scaling thickness has and continues to be a key metric in packaging evolution. Chip Scale Packaging (CSP) defines the logical end of package scaling as package area and IC size converge. CSP, as well as the use of bare die, in Direct Chip Attach (DCA) integration pushes the limit of interconnect technology. CSP and implementation of direct interconnect attachment leads to the smallest packages possible. Technology and reliability advances in ultra-thin Semiconductor-on-Polymer (SoP) CSP and direct interconnect assembly is enabling flexible hybrid electronics and sensors today. SoP extends CSP package size reduction to less than 1.0X the die size. Semiconductor-on-Polymer (SoP) CSP results in ultra-thin semiconductor materials that are less than the thickness possible with bare die. SoP was initially introduced to the Flexible Electronics market; the technology has gained interest for conventional low profile, low-mid I/O, DCA type applications. Advanced SoP CSP is an ultra-thin packaging technology that is capable of complete die encapsulation using wafer level processing. Ultra-thin SoP CSP is new package technology. It is applied to fully characterized commercial devices, uses well know semiconductor materials and is generally “qualified by similarity” (QBS). Qualification for flexible applications supplement QBS with test procedures derived from established standards. The initial development of test methods and procedures was done with AFRL support in 2017. Initial reliability for the new flexibility tests will be presented. SoP CSP is undergoing further characterization for conventional applications. This includes testing that is typical of non-hermetic fully encapsulated parts. Flip-chip is the preferred method for assembly of SoP CSP. The ultra-thin package technology feature is fully utilized using Direct Interconnect (DI). Direct interconnect (DI) is defined as the die pad interconnect technology where the pad is connected directly to a board pad of equivalent size and spacing. Direct interconnect is common for low pad count devices such as RFID, NFC and other DCA applications. Direct interconnect is not typically considered for higher pin count devices…until now. This presentation shares the development of SoP CSP DI assembly that has progressed from 24 pin attachment to System-on-Chip assembly of DI pitch at <100um. The presentation also shows the technology roadmap for SoP CSP evolution. A case study of a SoP CSP application will be included with data from a fully assembled ultra-thin electronic system based on a SoP CSP SOC with total thickness less than 30um. The system includes on-board ultra-thin fully flexible sensors. A call to action will be made to embrace ultra-thin electronics. System Designers and IC Engineers will be encouraged to: BUILD! Create the vision for ultra-thin possibilities. Put electronics into places and things never before possible with, prototypes, testing, reporting, and introducing new thin concepts. Reliability Leaders will be encouraged to: TEST! Update test procedures and standards to include physical deformations and then report and challenge the industry to improve. Universities will be called to: CREATE! Generate new physics/models associated with deformations, develop interconnect innovations and advance new materials. In general, the presentation makes the case that hardware matters – Let's build some new technology.

New Stacked Die Interconnect Technology for High-Performance and Low-Cost FPGA

2015 ◽  
Vol 12 (3) ◽  
pp. 111-117
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Integration ◽  
Cost Effective ◽  
Design Rule ◽  
Innovative Technology ◽  
Wind Condition ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This article introduces the first comprehensive demonstration of new innovative technology comprising multiple key technologies for highly cost-effective and high-performance Xilinx field programmable gate array (FPGA), which is so-called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex®-7 2000T FPGA product with chip-to-wafer stacking, wafer-level flux cleaning, microbump underfilling, mold encapsulation, and backside silicon removal. Of all technology elements, both full silicon removal process with faster etching and no dielectric layer damage and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. To manage the wafer warpage after full Si removal, a couple of knobs are identified and used such as top reinforcement layer, microbump underfill properties tuning, die thickness, die-to-die space, and total thickness adjustments. It is also discussed in the article how the wafer warpage behaves and how the wafer warpage is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ∼ −40 μm at room temperature (25°C) for 25 mm × 31 mm in size and +20 μm ∼ +25 μm at reflow temperature (250°C). Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T flip-chip ball grid array (FC-BGA) package using through silicon via interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

Parametric Design and Reliability Analysis of Wire Interconnect Technology Wafer Level Packaging

2002 ◽  
Vol 124 (3) ◽  
pp. 234-239 ◽  
Author(s):  
Y. T. Lin ◽  
C. T. Peng ◽  
K. N. Chiang
Keyword(s):  
Reliability Analysis ◽  
Flip Chip ◽  
Material Selection ◽  
New Technology ◽  
Rapid Expansion ◽  
Wafer Level ◽  
Good Reliability ◽  
Wafer Level Packaging ◽  
Reliability Characteristics ◽  
Interconnect Technology

The demands for electronic packages with lower profile, lighter weight, and higher input/output (I/O) density have led to rapid expansion in flip chip, chip scale package (CSP) and wafer level packaging (WLP) technologies. The urgent demand high I/O density and good reliability characteristics have led to the evolution of ultra high-density non-solder interconnection, such as wire interconnect technology (WIT). New technology, which uses copper posts to replace the solder bumps as interconnections, has improved reliability. Moreover, this type of wafer level package produces higher I/O density, as well as ultra fine pitch. This research focuses on the reliability analysis, material selection and structural design of WIT packaging. This research employs finite element method (FEM) to analyze the physical behavior of packaging structures under thermal cycling conditions to compare the reliability characteristics of conventional wafer level and WIT packages. Parametric studies of specific parameters will be performed, and the plastic and temperature-dependent material properties will be applied to all models.

A Sample Preparation on Decapsulation Methodology for Effective Failure Analysis on Thin Small Leadless (TSLP) Flip Chip Package with Copper Pillar (CuP) Bump Interconnect Technology

2014 ◽  
Author(s):  
Gwee Hoon Yen ◽  
Ng Kiong Kay
Keyword(s):  
Sample Preparation ◽  
Failure Analysis ◽  
Flip Chip ◽  
Fault Localization ◽  
Cost Effective ◽  
Fault Isolation ◽  
Voltage Contrast ◽  
Interconnect Technology

Abstract Today, failure analysis involving flip chip [1] with copper pillar bump packaging technologies would be the major challenges faced by analysts. Most often, handling on the chips after destructive chemical decapsulation is extremely critical as there are several failure analysis steps to be continued such as chip level fault localization, chip micro probing for fault isolation, parallel lapping [2, 3, 4] and passive voltage contrast. Therefore, quality of sample preparation is critical. This paper discussed and demonstrated a quick, reliable and cost effective methodology to decapsulate the thin small leadless (TSLP) flip chip package with copper pillar (CuP) bump interconnect technology.

Effect of Design Parameters on Drop Test Performance of Wafer Level Chip Scale Packages (WLCSP)

2011 ◽  
Author(s):  
Pushkraj Tumne ◽  
Vikram Venkatadri ◽  
Santosh Kudtarkar ◽  
Michael Delaus ◽  
Daryl Santos ◽  
...  
Keyword(s):  
Flip Chip ◽  
Bulk Solder ◽  
Consumer Electronics ◽  
Drop Test ◽  
Design Parameters ◽  
Mechanical Shock ◽  
Wafer Level ◽  
Cross Sectional ◽  
Right Censored Data ◽  
Solder Balls

Today’s consumer market demands electronics that are smaller, faster and cheaper. To cater to these demands, novel materials, new designs, and new packaging technologies are introduced frequently. Wafer Level Chip Scale Package (WLCSP) is one of the emerging package technologies that have the key advantages of reduced cost and smaller footprint. The portable consumer electronics are frequently dropped; hence the emphasis of reliability is shifting towards study of effects of mechanical shock loading increasingly. Mechanical loading typically induces brittle fractures (also known as intermetallic failures) between the solder bumps and bond pads at the silicon die side. This type of failure mechanism is typically characterized by the board level drop test. WLCSP is a variant of the flip-chip interconnection technique. In WLCSPs, the active side of the die is inverted and connected to the PCB by solder balls. The size of these solder balls is typically large enough (300μm pre-reflow for 0.5mm pitch and 250μm pre-reflow for 0.4mm pitch) to avoid use of underfill that is required for the flip-chip interconnects. Several variations are incorporated in the package design parameters to meet the performance, reliability, and footprint requirements of the package assembly. The design parameters investigated in this effort are solder ball compositions with different Silver (Ag) content, backside lamination with different thickness, WLCSP type –Direct and Re-Distribution Layer (RDL), bond pad thickness, and sputtered versus electroplated Under Bump Metallurgy (UBM) deposition methods for 8×8, 9×9, and 10×10 array sizes. The test vehicles built using these design parameters were drop tested using JEDEC recommended test boards and conditions as per JESD22-B11. Cross sectional analysis was used to identify, confirm, and classify the intermetallic, and bulk solder failures. The objective of this research was to quantify the effects and interactions of WLCSP design parameters through drop test. The drop test data was collected and treated as a right censored data. Further, it was analyzed by fitting empirical distributions using the grouped and un-grouped data approach. Data analysis showed that design parameters had a significant effect on the drop performance and played a vital role in influencing the package reliability.

Parametric Design and Reliability Analysis of WIT Wafer Level Packaging

2000 ◽  
Author(s):  
Y. T. Lin ◽  
P. J. Tang ◽  
K. N. Chiang
Keyword(s):  
Reliability Analysis ◽  
Flip Chip ◽  
Parametric Design ◽  
Material Selection ◽  
New Technology ◽  
Rapid Expansion ◽  
Wafer Level ◽  
Good Reliability ◽  
Wafer Level Packaging ◽  
Wafer Level Package

Abstract The demands of electronic packages toward lower profile, lighter weight, and higher density of I/O lead to rapid expansion in the field of flip chip, chip scale package (CSP) and wafer level packaging (WLP) technologies. The urgent needs of high I/O density and good reliability characteristic lead to the evolution of the ultra high-density type of non-solder interconnection such as the wire interconnect technology (WIT). The new technology using copper posts to replace the solder bumps as interconnections shown a great improvement in the reliability life. Moreover, this type of wafer level package could achieve higher I/O density, as well as ultra fine pitch. This research will focus on the reliability analysis of the WIT package structures in material selection and structural design, etc. This research will use finite element method to analyze the physical behavior of packaging structures under thermal cycling condition to compare the reliability characteristics of conventional wafer level package and WIT packages. Parametric studies of specific parameters will be performed, and the plastic and temperature dependent material properties will be applied to all of the models.

Low Temperature Wafer Level Bonding Using Benzocyclobutene Adhesive Polymers

2012 ◽  
Vol 2012 (DPC) ◽  
pp. 1-24
Author(s):  
Michael Gallagher ◽  
Jong-Uk Kim ◽  
Eric Huenger ◽  
Kai Zoschke ◽  
Christina Lopper ◽  
...  
Keyword(s):  
Low Temperature ◽  
Wafer Bonding ◽  
Flip Chip ◽  
Bonding Temperature ◽  
Bonding Process ◽  
Curing Temperature ◽  
Wafer Level ◽  
Mechanical Adhesion ◽  
3D Stacking ◽  
Dry Etch

3D stacking, one of the 3D integration technologies using through silicon vias (TSVs), is considered as a desirable 3D solution due to its cost effectiveness and matured technical background. For successful 3D stacking, precisely controlled bonding of the two substrates is necessary, so that various methods and materials have been developed over the last decade. Wafer bonding using polymeric adhesives has advantages. Surface roughness, which is critical in direct bonding and metal-to-metal bonding, is not a significant issue, as the organic adhesive can smooth out the unevenness during bonding process. Moreover, bonding of good quality can be obtained using relatively low bonding pressure and low bonding temperature. Benzocyclobutene (BCB) polymers have been commonly used as bonding adhesives due to their relatively low curing temperature (~250 °C), very low water uptake (<0.2%), excellent planarizing capability, and good affinity to Cu metal lines. In this study, we present wafer bonding with BCB at various conditions. In particular, bonding experiments are performed at low temperature range (180 °C ~ 210 °C), which results in partially cured state. In order to examine the effectiveness of the low temperature process, the mechanical (adhesion) strength and dimensional changes are measured after bonding, and compared with the values of the fully cured state. Two different BCB polymers, dry-etch type and photo type, are examined. Dry etch BCB is proper for full-area bonding, as it has low degree of cure and therefore less viscosity. Photo-BCB has advantages when a pattern (frame or via open) is to be structured on the film, since it is photoimageable (negative tone), and its moderate viscosity enables the film to sustain the patterns during the wafer bonding process. The effect of edge beads at the wafer rim area and the soft cure (before bonding) conditions on the bonding quality are also studied. Alan/Rey ok move from Flip Chip and Wafer Level Packaging 1-6-12.

Active and Passive Devices Embedded in Laminate-Based Multilayer Board

2012 ◽  
Vol 2012 (DPC) ◽  
pp. 001253-001283
Author(s):  
Satoshi Okude ◽  
Kazushisa Itoi ◽  
Masahiro Okamoto ◽  
Nobuki Ueta ◽  
Osamu Nakao
Keyword(s):  
High Temperature ◽  
Thermal Cycling ◽  
Flip Chip ◽  
Wafer Level ◽  
Active Device ◽  
Electrical Connection ◽  
Passive Devices ◽  
High Temperature Storage ◽  
Circuit Resistance ◽  
Temperature Storage

We have developed active and passive devices embedded multilayer board utilizing our laminate-based WLCSP embedding technology. The proposed embedded board is realized by laminating plural circuit formed polyimide films together by adhesive with thin devices being arranged in between those polyimide layers. The electrical connection via has a filled via structure composed of the alloy forming conductive paste which ensures high reliable connection. The embedded active device is WLCSP which has no solder bump on its pads therefore the thickness of the die is reduced to 80 microns. The embedded passive device is a chip resistor or capacitor whose thickness is 150 microns with copper electrodes. The electrical connection between components and board's circuits are made by same conductive paste vias. The thin film based structure and low profile devices yields the 260 microns thickness board which is the thinnest embedded of its kind in the world. To confirm the reliability of the embedded board, we have performed several reliability tests on the WLCSP and resistors embedded TEG board of 4 polyimide/5 copper circuit layers. As environmental tests, we performed a moisture reflow test compliant to JEDEC MSL2 followed by a thermal cycling test (−55 deg.C to 125 deg.C, 1000cycles) and a high temperature storage test (150 deg.C). All tested samples passed the moisture reflow test and showed no significant change of circuit resistance after the thermal cycling/high temperature storage tests. Moreover, mechanical durability of the board was also confirmed by bending the devices embedded portion. The embedded device was never broken and the circuit resistance change was also within acceptable range. The proposed embedded board will open up a new field of device packaging. Alan/Rey ok move from Flip Chip and Wafer Level Packaging 1-3-12.

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