scholarly journals Structure and Tribo-Mechanical Properties of MoSx:N:Mo Thin Films Synthesized by Reactive dcMS/HiPIMS

2021 ◽  
Author(s):  
Wolfgang Tillmann ◽  
Alexandra Wittig ◽  
Dominic Stangier ◽  
Carl-Arne Thomann ◽  
Jörg Debus ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Solid Lubricant ◽  
Tribological Behavior ◽  
Sliding Contact ◽  
High Wear Resistance ◽  
Film Material ◽  
Low Friction ◽  
Property Profile

AbstractModifying MoS2 thin films by additional elements shows great potential in order to adjust the property profile and to meet the increasing requirements regarding high wear resistance and low friction properties of industrial components. Within that context, MoSx:N:Mo thin films were deposited by a reactive hybrid dcMS/HiPIMS process. By systematically increasing the Mo target cathode power, an investigation of the structural and the mechanical properties was conducted to understand the evolution of the tribological behavior. A low Mo target cathode power of 1 kW is related to the formation of the preferential (002) MoS2 basal-plane and thus a low friction with µ = 0.2. With an increasing amount of Mo, the film loses its solid lubricant MoS2 properties and a nitride constitution of the thin film is developing due to the formation of crystalline Mo and MoN phases. Related to this transformation, the hardness and elastic modulus are increased, but the adhesion and the tribological properties are impaired. The film loses its plasticity and the generated film material is directly removed from the contact area during the sliding contact.

The Optical Properties of Thin Films Tin Oxide with Triple Doping (Aluminum, Indium, and Fluorine) for Electronic Device

2021 ◽  
Vol 317 ◽  
pp. 477-482
Author(s):  
Aris Doyan ◽  
Susilawati ◽  
Muhammad Taufik ◽  
Syamsul Hakim ◽  
Lalu Muliyadi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Activation Energy ◽  
Optical Properties ◽  
Tin Oxide ◽  
Electronic Device ◽  
Film Material ◽  
Mass Percentage ◽  
Gap Energy ◽  
As Doping

Tin oxide (SnO2) thin film is a form of modification of semiconductor material in nanosize. The thin film study aims to analyze the effect of triple doping (Aluminum, Indium, and Fluorine) on the optical properties of SnO2: (Al + In + F) thin films. Aluminum, Indium, and Fluorine as doping SnO2 with a mass percentage of 0, 5, 10, 15, 20, and 25% of the total thin-film material. The addition of Al, In, and F doping causes the thin film to change optical properties, namely the transmittance and absorbance values ​​changing. The transmittance value is 67.50, 73.00, 82.30, 87.30, 94.6, and 99.80 which is at a wavelength of 350 nm for the lowest to the highest doping percentage, respectively. The absorbance value increased with increasing doping percentage at 300 nm wavelength of 0.52, 0.76, 0.97, 1.05, 1.23, and 1.29 for 0, 5, 10, 15, 20, and 25% doping percentages, respectively. The absorbance value is then used to find the gap energy of the SnO2: (Al + In + F) thin film of the lowest doping percentage to the highest level i.e. 3.60, 3.55, 3.51, 3.47, 3.42, and 3.41 eV. Thin-film activation energy also decreased with values of 2.27, 2.04, 1.85, 1.78, 1.72, and 1.51 eV, respectively for an increasing percentage of doping. The thin-film SnO2: (Al + In + F) which experiences a gap energy reduction and activation energy makes the thin film more conductive because electron mobility from the valence band to the conduction band requires less energy and faster electron movement as a result of the addition of doping.

Mechanical deflection of cantilever microbeams: A new technique for testing the mechanical properties of thin films

1988 ◽  
Vol 3 (5) ◽  
pp. 931-942 ◽  
Author(s):  
T. P. Weihs ◽  
S. Hong ◽  
J. C. Bravman ◽  
W. D. Nix
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Single Layer ◽  
Beam Theory ◽  
New Technique ◽  
Young’S Moduli ◽  
Silicon Micromachining ◽  
A New Technique

The mechanical deflection of cantilever microbeams is presented as a new technique for testing the mechanical properties of thin films. Single-layer microbeams of Au and SiO2 have been fabricated using conventional silicon micromachining techniques. Typical thickness, width, and length dimensions of the beams are 1.0,20, and 30 μm, respectively. The beams are mechanically deflected by a Nanoindenter, a submicron indentation instrument that continuously monitors load and deflection. Using simple beam theory and the load-deflection data, the Young's moduli and the yield strengths of thin-film materials that comprise the beams are determined. The measured mechanical properties are compared to those obtained by indenting similar thin films supported by their substrate.

Deposition energy dependence in cluster-assembled thin film densities

2005 ◽  
Vol 908 ◽  
Author(s):  
Kristoffer Meinander ◽  
Tina Clauss ◽  
Kai Nordlund
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Molecular Dynamics ◽  
Energy Dependence ◽  
Computer Simulations ◽  
Cluster Atom ◽  
Cu Nanoclusters ◽  
Deposition Energy

AbstractMechanical properties of thin films grown by nanocluster deposition are highly dependent on the energy at which the clusters are deposited. Using molecular dynamics computer simulations we have quantitatively studied variations in the properties of copper thin films grown by deposition of Cu nanoclusters, at energies ranging from 5 meV to 10 eV per cluster atom, on a Cu (100) substrate.

Low friction states for thin solid lubricant film of MoS2

2018 ◽  
Vol 70 (4) ◽  
pp. 639-644 ◽  
Author(s):  
Kwang-Hua R. Chu
Keyword(s):  
Thin Films ◽  
Solid Lubricant ◽  
Activation Volume ◽  
High Vacuum ◽  
Low Friction ◽  
Friction Behavior ◽  
Stick Slip ◽  
Content Type ◽  
Term Operation

Purpose During the operation of Wendelstein 7-X (W7-X), any mechanical disturbance such as stick-slip may cause quenching of superconducting (SC) coils. The friction behavior of MoS2 lubrication (thin film) for narrow support elements between the SC coils in W7-X is rather important, as there is a design requirement for a coefficient of friction (COF) 0.05 between the sliding surfaces to control the stress contribution (from friction). Design/methodology/approach The author has carried out intensive calibrations or verifications using verified models considering previous friction tests on various samples which measured the COF in 4.2 K, 77 K and room temperature conditions (at high vacuum) to simulate the actual working condition. Findings The author has given useful explanations and diagnosis for previous anomalous scattered data. To improve the performance of MoS2, the author has predicted its better COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Originality/value In this paper, the author has adopted Eyring’s approach to predict the low COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Finally, some recent progresses about the possible few-layer MoS2 role in the electromagnetic loads have been provided.

Temperature Dependence of Friction Coefficient in Ultrahigh Vacuum for Hydrogenated Amorphous Carbon Coating

2005 ◽  
Author(s):  
Masanori Iwaki ◽  
Thierry Le Mogne ◽  
Julien Fontaine ◽  
Jean-Michel Martin
Keyword(s):  
Mechanical Properties ◽  
Friction Coefficient ◽  
Amorphous Carbon ◽  
Solid Lubricant ◽  
Tribological Behavior ◽  
Ultrahigh Vacuum ◽  
Effect Of Temperature ◽  
Friction Regime ◽  
Application Limit ◽  
Hydrogenated Amorphous

Among diamond-like carbon (DLC) coatings, hydrogenated amorphous carbon (a-C:H) coatings are of great interest since some of them may exhibit coefficients of friction in the millirange, so-called “superlow friction” in ultrahigh vacuum. However, there are still many points to be clarified and improved to employ them as solid lubricant for actual vacuum applications. For example, in space environment solid lubricants are required to function at both low and high temperature ranging from −150 to 100°C. To apply them as solid lubricant in such an extreme environment, it is necessary to know the evolution of the tribological behavior in temperature, leading to their application limit. Furthermore, tribological behavior of a-C:H coatings is known to depend on tribochemistry and on mechanical properties like viscoplasticity. Since both could be affected by temperature, a better understanding of superlow friction mechanisms is expected from experiments at various temperatures. In this present work, pin-on-disk reciprocating friction tests were conducted at various temperature conditions ranging from −130 to 300°C under ultrahigh vacuum (10−7Pa) to study the effect of temperature on the coefficient of friction of an a C:H coated flat mated against steel (AISI 52100) pins. For all temperatures, superlow friction regime could be reached, as it was observed usually at room temperature for this sample. However, an effect of temperature is evidenced on the duration of “running-in” phase, i.e. the number of cycles required to reach a superlow friction regime. The duration becomes shorter at higher temperatures and longer at lower temperatures. Also, the application limit in temperature is found between 200 and 300°C, at which the friction coefficient slowly increases after running-in, to reach values above 0.01. In light of these results, the mechanisms of superlow friction are discussed in terms of tribochemistry and mechanical properties of the coating.

Mechanical Properties and Wear Resistance of High Moment thin Film Head Materials

1994 ◽  
Vol 356 ◽  
Author(s):  
H. Deng ◽  
V. R. Inturi ◽  
J. A. Barnard
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Wear Resistance ◽  
Magnetic Thin Films ◽  
Mechanical And Tribological Properties ◽  
Sputtered Films ◽  
Recording Heads ◽  
High Density Recording ◽  
Worn Surface

AbstractMechanical and tribological properties of soft magnetic thin films with high permeability and low coercivity are very important for the application of these films in high-density recording heads. This paper reports our experimental observations on these important properties of FeTaN thin film head materials. Hardness(H) and Young’s modulus(E) for FeTaN sputtered films were determined by nanoindentation. Wear resistance of these films against commercial magnetic tapes was measured with a sphere-on-flat wear tester. The experimental results indicate that the FeTa films can be hardened when nitrogen is introduced. It was found in this study that the thermal stability of the mechanical properties such as hardness of thin films containing nitrogen is better than that of the film without nitrogen. However, our experiments also revealed that the wear resistance of FeTaN films decreases when the concentration of nitrogen increases and the hardness of the worn surface at a wear scar is lower than that of the unworn surface.

Ion Beam Processing of Optical Materials

1988 ◽  
Vol 129 ◽  
Author(s):  
F. L. Williams ◽  
L. L. Boyer ◽  
W. Reicher ◽  
J. J. McNally ◽  
G. A. Al-Jumaily ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Packing Density ◽  
Optical Materials ◽  
Ion Beam ◽  
Film Material ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Optical And Mechanical Properties ◽  
Deposition Techniques

ABSTRACTWe have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.

Characterization of Mechanical Properties of Thin Films by Nanoindentation Technique and Finite Element Simulation

2002 ◽  
Author(s):  
Zhaohui Shan ◽  
Suresh K. Sitaraman
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Finite Element ◽  
Strain Hardening Exponent ◽  
Plastic Properties ◽  
Titanium Thin Film ◽  
Nanoindentation Technique ◽  
Element Simulation ◽  
Titanium Thin Films

Titanium thin films have been widely used in microelectronics due to their good adhesion to substrates, such as Silicon wafer and Quartz. However, mechanical behavior of Titanium thin films has not been well characterized. This paper presents a methodology that combines the nanoindentation technique and finite element modeling to characterize the mechanical (elastic and plastic) properties of thin film with its application on Titanium thin film deposited on silicon substrate. The results show that the elastic properties (Young’s modulus) of the Titanium thin film does not change much from the bulk Titanium, and the plastic properties (yield stress and strain hardening exponent) of the Titanium thin film are higher than those of bulk Titanium. This method is also applicable for the study of mechanical properties of other thin films and small volume materials.

Tribological study of low friction DLC:Ti and MoS2 thin films

2018 ◽  
Vol 1 (89) ◽  
pp. 13-18
Author(s):  
A. Paradecka ◽  
K. Lukaszkowicz
Keyword(s):  
Thin Films ◽  
Friction Coefficient ◽  
New Technologies ◽  
Scratch Test ◽  
Substrate Material ◽  
High Wear Resistance ◽  
Research Information ◽  
Low Friction ◽  
Atomic Force ◽  
Intensive Development

Purpose: The purpose of this article is to characterize and compare the microstructure and tribological properties of low friction DLC:Ti and MoS2 thin films deposited on the austenitic steel X6CrNiMoTi17-12-2 substrate. Design/methodology/approach: In the research, the samples of the DLC:Ti and MoS2 thin films deposited by PACVD technology and magnetron sputtering method respectively were used. Observations of topography were made using atomic force microscope (AFM). Adhesion of the coating to the substrate material was verified by the scratch test. The friction coefficient and wear rate of the coating were determined in the ball-on-disc test. Findings: AFM as well as adhesion and friction coefficient tests confirmed low friction nature of MoS2 and DLC:Ti coatings. During the research information on the behaviour of coatings under tribological load was obtained. The investigated coating reveals high wear resistance and good adhesion to the substrate. Practical implications: The area of testing of low-friction thin films is widely studied due to their practical application. Intensive development of new technologies requires the introduction of corresponding layers of both full protective functions and reducing friction. Originality/value: Growing area of low-friction coatings with specific properties requires thorough tribological and topographical research, which is closely related to these properties.

Optimization of mechanical properties of thin free-standing metal films for RF-MEMS

2004 ◽  
Vol 820 ◽  
Author(s):  
Jaap M.J. den Toonder ◽  
Auke R. van Dijken
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Yield Strength ◽  
Rf Mems ◽  
High Yield ◽  
Film Material ◽  
X Ray Diffraction ◽  
Free Standing ◽  
Aluminum Films ◽  
Materials Used

AbstractThe mechanical properties of the thin film materials used in RF-MEMS are crucial for the reliability and proper functioning of the devices. In this paper we study a large number of aluminum alloys as possible RF-MEMS thin film materials. The yield strength and creep properties are measured using nano-indentation. The results show that the mechanical properties of thin aluminum films can be improved substantially by alloying elements. Of the alloys studied in this paper, AlCuMgMn in particular seems quite promising as a thin film material for RF MEMS, having both high yield strength and little creep. Using X-ray diffraction and electron microscopy, the observed effects are partly explained.

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