scholarly journals Astrometric Characteristics of the Abastumani Astrophysical Observatory 125 cm Reflector (AZT-11) of Ritchey-Cretien Optical System

1986 ◽  
Vol 109 ◽  
pp. 289-292
Author(s):  
G. N. Salukvadze
Keyword(s):  
Optical System ◽  
Lens System ◽  
Multiple Systems

Quite a number of instances are known when Schmidt, mirror-lens system telescopes and generally reflectors are used for solving the problems of photographic astrometry.This paper describes the use of the Ritchey-Cretien telescope (AZT-11) at the Abastumani Astrophysical Observatory for determining relative positions of the members of multiple systems.

A NEW METHOD OF LENS CENTERING IN THE OPTICAL SYSTEM BY USING SPECIAL MOUNT

2021 ◽  
pp. 137-144
Author(s):  
Bao Bui Dinh
Keyword(s):  
Optical System ◽  
Optical Axis ◽  
Assembly Process ◽  
Optical Surface ◽  
Lens System ◽  
High Quality ◽  
Manufacturing Equipment ◽  
Influence Coefficients ◽  
Process Solutions

Decentration in lens systems (for example objectives) significantly degrades the quality of image, such as the coma. In order to reduce lens decentration, the lenses are centered while manufacturing, while gluing, while attachment in the mounts. Significant decrease in the lenses decentering in the mounts is achieved by using a special manufacturing equipment, which allow combining the optical axis of the lens with the base axis of the mount in assembly process. Solutions for coma's alignment by shifting, tilting and rotation their components are also provided in the construction of high-quality objectives (microscopes [1-7], photolithographic, aerophotographic). For optimization of methods for such adjustment the influence coefficients of decentering of each optical surface of the lens system on the value and sign of coma must be calculated and taken into account. In this paper, we propose a special mounting which combined with the Opticentric of Trioptics device to center the lenses. The results show that the decentering is significantly reduced (0.9µm) compared to (44.2µm) with using a reference mount.

Applied Research on the Electric Wet Effect in Optical System Design

2011 ◽  
Vol 383-390 ◽  
pp. 4889-4894
Author(s):  
Zhi Qin Huang ◽  
Pei Ying Quan ◽  
Jin Li Zhang
Keyword(s):  
Optical System ◽  
Zoom Lens ◽  
Lens System ◽  
Optical Lens ◽  
The Past ◽  
Vision Correction ◽  
Past Half Century ◽  
Great Progress ◽  
Mechanical Movement ◽  
Past Half

In the past half century, the camera industry has developed very rapidly, which drove the optical lens and optical zoom technology to make great progress. The zoom lens’ technology principle of current mainstream optical zoom lens system is achieved by adjusting the relative position of the lens, objects and the focus. This paper takes the double-liquid zoom lens based on electric wet effect as the basis , the new zoom optical system is designed to achieve motor control without mechanical movement, then the vision correction is designed by using liquid lens, such as the correction of myopia and hyperopia, which can automatically identify the eyes degrees of myopia and hyperopia, avoid frequent replacement lens steps when optometry is done for eyes.

scholarly journals Design and Experimental Implementation of a Multi-Cloak Paraxial Optical System

Photonics ◽  
2021 ◽  
Vol 8 (9) ◽  
pp. 358
Author(s):  
Alicia Fresno-Hernández ◽  
Braulio García-Cámara ◽  
Juan Carlos Torres ◽  
José Manuel Sánchez-Pena
Keyword(s):  
Visual Field ◽  
Optical System ◽  
Mathematical Formalism ◽  
Transformation Optics ◽  
Lens System ◽  
Successful Operation ◽  
Naked Eye ◽  
Experimental Implementation ◽  
Simple Arrangement ◽  
Simple Systems

Electromagnetic cloaking has being continuously pursued using a large variety of approaches. In recent years, this effect has been observed using either complex devices based on the so-called Transformation Optics or simple systems based on conventional optics with proper characteristics. In the latter case, a simple arrangement of lenses working in the paraxial regime can provide broadband visible cloaking in a wide area. In this work, we analyzed and generalized this method by proposing a five-lens system producing at least three potential invisible regions with a large cloaked area (>90% of the visual field). In particular, we developed the mathematical formalism and show, both numerically and experimentally, the successful operation of the cloaking system with the naked eye.

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

Interpretation of irradiation-induced changes in electron diffractograms and images of extinction contours at low temperatures

1984 ◽  
Vol 42 ◽  
pp. 268-269
Author(s):  
E. Knapek ◽  
H. Formanek ◽  
G. Lefranc ◽  
I. Dietrich
Keyword(s):  
Low Temperatures ◽  
Carbon Films ◽  
Organic Crystals ◽  
Wide Spread ◽  
Lens System ◽  
Preparation Conditions ◽  
Thin Carbon ◽  
Electron Diffractograms ◽  
Diffraction Patterns ◽  
Induced Changes

A few years ago results on cryoprotection of L-valine were reported, where the values of the critical fluence De i.e, the electron exposure which decreases the intensity of the diffraction reflections by a factor e, amounted to the order of 2000 + 1000 e/nm2. In the meantime a discrepancy arose, since several groups published De values between 100 e/nm2 and 1200 e/nm2 /1 - 4/. This disagreement and particularly the wide spread of the results induced us to investigate more thoroughly the behaviour of organic crystals at very low temperatures during electron irradiation.For this purpose large L-valine crystals with homogenuous thickness were deposited on holey carbon films, thin carbon films or Au-coated holey carbon films. These specimens were cooled down to nearly liquid helium temperature in an electron microscope with a superconducting lens system and irradiated with 200 keU-electrons. The progress of radiation damage under different preparation conditions has been observed with series of electron diffraction patterns and direct images of extinction contours.

Resolution in photoelectron microscopy

1991 ◽  
Vol 49 ◽  
pp. 458-459
Author(s):  
G. F. Rempfer
Keyword(s):  
Electron Microscopy ◽  
Electric Field ◽  
Ultraviolet Light ◽  
Uniform Field ◽  
Virtual Image ◽  
Lens System ◽  
Photoemission Electron Microscopy ◽  
Planar Electrode ◽  
Electron Lens ◽  
Photoemission Electron

In photoelectron microscopy (PEM), also called photoemission electron microscopy (PEEM), the image is formed by electrons which have been liberated from the specimen by ultraviolet light. The electrons are accelerated by an electric field before being imaged by an electron lens system. The specimen is supported on a planar electrode (or the electrode itself may be the specimen), and the accelerating field is applied between the specimen, which serves as the cathode, and an anode. The accelerating field is essentially uniform except for microfields near the surface of the specimen and a diverging field near the anode aperture. The uniform field forms a virtual image of the specimen (virtual specimen) at unit lateral magnification, approximately twice as far from the anode as is the specimen. The diverging field at the anode aperture in turn forms a virtual image of the virtual specimen at magnification 2/3, at a distance from the anode of 4/3 the specimen distance. This demagnified virtual image is the object for the objective stage of the lens system.

Slow-Scan CCD Observation of Backscattering Patterns in SEM

1992 ◽  
Vol 50 (2) ◽  
pp. 1308-1309
Author(s):  
F. Ouyang ◽  
D. A. Ray ◽  
O. L. Krivanek
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Dynamic Range ◽  
High Sensitivity ◽  
Lens System ◽  
Wide Dynamic Range ◽  
Peltier Cooler ◽  
Diffraction Patterns ◽  
Scanning Electron

Electron backscattering Kikuchi diffraction patterns (BKDP) reveal useful information about the structure and orientation of crystals under study. With the well focused electron beam in a scanning electron microscope (SEM), one can use BKDP as a microanalysis tool. BKDPs have been recorded in SEMs using a phosphor screen coupled to an intensified TV camera through a lens system, and by photographic negatives. With the development of fiber-optically coupled slow scan CCD (SSC) cameras for electron beam imaging, one can take advantage of their high sensitivity and wide dynamic range for observing BKDP in SEM.We have used the Gatan 690 SSC camera to observe backscattering patterns in a JEOL JSM-840A SEM. The CCD sensor has an active area of 13.25 mm × 8.83 mm and 576 × 384 pixels. The camera head, which consists of a single crystal YAG scintillator fiber optically coupled to the CCD chip, is located inside the SEM specimen chamber. The whole camera head is cooled to about -30°C by a Peltier cooler, which permits long integration times (up to 100 seconds).

Information and estimation in image processing

1987 ◽  
Vol 45 ◽  
pp. 14-17
Author(s):  
B. Roy Frieden
Keyword(s):  
Image Processing ◽  
Optical System ◽  
Large Amplitude ◽  
Communication Theory ◽  
Image Data ◽  
Direct Approach ◽  
Ill Posed

Despite the skill and determination of electro-optical system designers, the images acquired using their best designs often suffer from blur and noise. The aim of an “image enhancer” such as myself is to improve these poor images, usually by digital means, such that they better resemble the true, “optical object,” input to the system. This problem is notoriously “ill-posed,” i.e. any direct approach at inversion of the image data suffers strongly from the presence of even a small amount of noise in the data. In fact, the fluctuations engendered in neighboring output values tend to be strongly negative-correlated, so that the output spatially oscillates up and down, with large amplitude, about the true object. What can be done about this situation? As we shall see, various concepts taken from statistical communication theory have proven to be of real use in attacking this problem. We offer below a brief summary of these concepts.

Comparison of freeze-fractured yeast replicas using conventional TEM and low-voltage field-emission SEM

1989 ◽  
Vol 47 ◽  
pp. 74-75
Author(s):  
William P. Wergin ◽  
Eric F. Erbe ◽  
Terrence W. Reilly
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Field Emission ◽  
Low Voltage ◽  
Objective Lens ◽  
Specimen Preparation ◽  
Lens System ◽  
Air Drying ◽  
Preparation Techniques ◽  
Scanning Electron

Although the first commercial scanning electron microscope (SEM) was introduced in 1965, the limited resolution and the lack of preparation techniques initially confined biological observations to relatively low magnification images showing anatomical surface features of samples that withstood the artifacts associated with air drying. As the design of instrumentation improved and the techniques for specimen preparation developed, the SEM allowed biologists to gain additional insights not only on the external features of samples but on the internal structure of tissues as well. By 1985, the resolution of the conventional SEM had reached 3 - 5 nm; however most biological samples still required a conductive coating of 20 - 30 nm that prevented investigators from approaching the level of information that was available with various TEM techniques. Recently, a new SEM design combined a condenser-objective lens system with a field emission electron source.

Performance Evaluation of a Novel Type of Low-Energy Electron Microscope

1990 ◽  
Vol 48 (1) ◽  
pp. 354-355
Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Field Strength ◽  
Numerical Aperture ◽  
Low Energy ◽  
Energy Electron ◽  
High Resolution Imaging ◽  
Lens System ◽  
Resolution Imaging ◽  
Low Energy Electron

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.

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