Dip Pen Nanolithography: A Desktop Nanofabrication Approach Using High-Throughput Flexible Nanopatterning

Dip Pen Nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope tip is used to transfer molecules to a surface via a solvent meniscus. This technique allows surface patterning on scales of under 100 nanometres. DPN is the nanotechnology analog of the dip pen (also called the quill pen), where the tip of an atomic force microscope cantilever acts as a “pen,” which is coated with a chemical compound or mixture acting as an “ink,” and put in contact with a substrate, the “paper.”DPN enables direct deposition of nanoscale materials onto a substrate in a flexible manner. The vehicle for deposition can include pyramidal scanning probe microscope tips, hollow tips, and even tips on thermally actuated cantilevers. Recent advances have demonstrated massively parallel patterning using two-dimensional arrays of 55,000 tips, depicted below. Applications of this technology currently range through chemistry, materials science, and the life sciences, and include such work as ultra high density biological nanoarrays, additive photomask repair, and brand protection for pharmaceuticals.

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A Study of the Photoelectric Effect Caused by a Laser Beam Used in a Beam Bounce Technique in a C-AFM System

ISTFA 2008: Conference Proceedings from the 34th International Symposium for Testing and Failure Analysis ◽

10.31399/asm.cp.istfa2008p0256 ◽

2008 ◽

Author(s):

Hung-Sung Lin ◽

Mong-Sheng Wu

Keyword(s):

Laser Beam ◽

Failure Analysis ◽

Atomic Force Microscope ◽

Photoelectric Effect ◽

Scanning Probe ◽

Nanometer Scale ◽

Electrical Characteristics ◽

Atomic Force ◽

Probe Microscope ◽

Probe Head

Abstract The use of a scanning probe microscope (SPM), such as a conductive atomic force microscope (C-AFM) has been widely reported as a method of failure analysis in nanometer scale science and technology [1-6]. A beam bounce technique is usually used to enable the probe head to measure extremely small movements of the cantilever as it is moved across the surface of the sample. However, the laser beam used for a beam bounce also gives rise to the photoelectric effect while we are measuring the electrical characteristics of a device, such as a pn junction. In this paper, the photocurrent for a device caused by photon illumination was quantitatively evaluated. In addition, this paper also presents an example of an application of the C-AFM as a tool for the failure analysis of trap defects by taking advantage of the photoelectric effect.

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Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

Proceedings ◽

10.3390/proceedings2020056034 ◽

2020 ◽

Vol 56 (1) ◽

pp. 34

Author(s):

Jaqueline Stauffenberg ◽

Ingo Ortlepp ◽

Christoph Reuter ◽

Mathias Holz ◽

Denis Dontsov ◽

...

Keyword(s):

Atomic Force Microscope ◽

Long Range ◽

Field Emission ◽

Scanning Probe ◽

Measuring System ◽

Scanning Probe Lithography ◽

Nano Fabrication ◽

Atomic Force

The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used especially for field-emission scanning probe lithography (FESPL). The NFM-100 has a positioning range of Ø 100 mm, which offers, in combination with the tip-based measuring system, the possibility to analyse structures over long ranges. Using different gratings, the accuracy and the reproducibility of the NFM-100 and the AFM-system will be shown.

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Design and Orthogonality Correction of a Planar Scanner for an Atomic Force Microscope

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.326-328.401 ◽

2006 ◽

Vol 326-328 ◽

pp. 401-404

Author(s):

Dong Yeon Lee ◽

Dae Gab Gweon

Keyword(s):

Atomic Force Microscope ◽

Open Loop ◽

Scanning Probe ◽

Total System ◽

Random Errors ◽

Element Analysis ◽

Loop Control ◽

Atomic Force ◽

Probe Microscope ◽

Small Feature

This paper shows a method of designing a nano-positioning planar scanner that can be used in a scanning probe microscope. The planar scanner is composed of flexure guides, piezoelectric actuators and feedback sensors. Furthermore, we used a motion amplifying mechanism in the piezoelectric actuator to achieve a large travel range. We theoretically determined the travel range of the total system and verified the range by using a program based on a finite element analysis. The maximum travel range of the planar scanner was greater than 120 μm. A planar scanner of an atomic force microscope can move samples with a few nm resolutions. To get stable AFM images of small feature samples, a closed loop control could not be used due to large random errors of the sensor. The orthogonality of a new planar scanner having a motion guide is measured and corrected by using a simple electronic circuit in the open loop scanning to reduce the scanner artifact.

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Crystal Scanner for Nano-Metrology Applications

Microscopy Today ◽

10.1017/s1551929500051403 ◽

2005 ◽

Vol 13 (2) ◽

pp. 12-17

Author(s):

Paul West ◽

Zhiqiang Peng ◽

Natalia Starostina

Keyword(s):

Atomic Force Microscope ◽

Surface Texture ◽

Force Sensor ◽

Scanning Probe ◽

Sensor Technology ◽

Nanometer Scale ◽

Particle Sizes ◽

Atomic Force ◽

Dimensional Measurements ◽

Probe Microscope

Traditionally a scanning probe microscope (SPM), such as the atomic force microscope (AFM), affords spectacular images of surfaces at the nanometer scale. With advanced developments in scanner design, probe manufacturing and force sensor technology it is now possible to make quantitative metrological measurements with an SPM. Quantitative metrological measurements that are possible include: a) dimensional measurements of micro/nano fabricated structures, b) surface texture of surfaces having RMS values of only a few angstroms, and c) measurements of the number of grains, and particles on a surface as well as grain and particle sizes, areas, volumes, and distributions.

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Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source

Review of Scientific Instruments ◽

10.1063/1.2742623 ◽

2007 ◽

Vol 78 (6) ◽

pp. 063703 ◽

Cited By ~ 14

Author(s):

Markus Hund ◽

Hans Herold

Keyword(s):

Atomic Force Microscope ◽

Inductively Coupled Plasma ◽

Plasma Source ◽

Scanning Probe Microscope ◽

Scanning Probe ◽

Sample Treatment ◽

Inductively Coupled ◽

Atomic Force ◽

Probe Microscope

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Nanoscale Inking, Melting, and Soldering With a Heated Atomic Force Microscope Cantilever Tip

Electronic and Photonic Packaging, Electrical Systems Design and Photonics, and Nanotechnology ◽

10.1115/imece2004-59126 ◽

2004 ◽

Author(s):

William P. King ◽

Brent A. Nelson ◽

Tanya L. Wright ◽

Paul A. Sheehan ◽

Lloyd J. Whitman

Keyword(s):

Atomic Force Microscope ◽

Local Control ◽

Room Temperature ◽

Nanometer Scale ◽

High Melting ◽

Atomic Force Microscope Cantilever ◽

Atomic Force ◽

High Melting Temperature ◽

Force Microscope Cantilever ◽

Dip Pen Nanolithography

Thermal dip pen nanolithography (tDPN) is a nanolithography technique that leverages previous advances in dip pen nanolithography and the design and fabrication of heated atomic force microscope cantilevers. In tDPN a heated atomic force microscope cantilever tip deposits high-melting temperature materials from the tip onto a surface. This technique is distinct from conventional DPN in that the ink molecules are not mobile at room temperature, allowing local control of deposition allowing the tip to be used for metrology of written features without contamination. tDPN represents an advancement in nanometer-scale lithography and manufacturing, which could enable the rapid prototyping and economical manufacture of nanodevices.

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Быстродействующая атомно-силовая и сканирующая капиллярная микроскопия в решении задач материаловедения, биологии и медицины

Nanoindustry Russia ◽

10.22184/1993-8578.2020.13.3-4.222.228 ◽

2020 ◽

Vol 13 (3-4) ◽

pp. 222-228

Author(s):

И.В. Яминский ◽

А.И. Ахметова

Keyword(s):

Antibiotic Resistance ◽

Early Detection ◽

Biomedical Research ◽

Drug Screening ◽

Targeted Delivery ◽

High Speed ◽

Scanning Probe ◽

Biological Processes ◽

Atomic Force ◽

Probe Microscope

Разработка высокоэффективных режимов быстродействующего сканирующего зондового микроскопа, в первую очередь атомно-силовой и сканирующей капиллярной микроскопии, представляет особый интерес для успешного проведения биомедицинских исследований: изучения биологических процессов и морфологии биополимеров, определения антибиотикорезистентности бактерий, адресной доставки биомакромолекул, скринингу лекарств, раннему обнаружению биологических агентов (вирусов и бактерий) и др. The development of highly efficient modes of a high-speed scanning probe microscope, primarily atomic force and scanning capillary microscopy, is of particular interest for successful biomedical research: studying biological processes and the morphology of biopolymers, determining antibiotic resistance of bacteria, targeted delivery of biomacromolecules, drug screening, early detection agents (viruses and bacteria), etc.

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Investigations on the positioning accuracy of the Nano Fabrication Machine (NFM-100)

tm - Technisches Messen ◽

10.1515/teme-2021-0079 ◽

2021 ◽

Vol 0 (0) ◽

Author(s):

Jaqueline Stauffenberg ◽

Ingo Ortlepp ◽

Ulrike Blumröder ◽

Denis Dontsov ◽

Christoph Schäffel ◽

...

Keyword(s):

Target Position ◽

Repeated Measurements ◽

Scanning Probe ◽

Measuring System ◽

Direct Drive ◽

Positioning Accuracy ◽

Scanning Probe Lithography ◽

Nano Fabrication ◽

Atomic Force ◽

Acceleration And Deceleration

Abstract This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

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SCANNING PROBE MICROSCOPY BASED NANOSCALE PATTERNING AND FABRICATION

COSMOS ◽

10.1142/s0219607707000207 ◽

2007 ◽

Vol 03 (01) ◽

pp. 1-21 ◽

Cited By ~ 2

Author(s):

XIAN NING XIE ◽

HONG JING CHUNG ◽

ANDREW THYE SHEN WEE

Keyword(s):

Integrated Circuits ◽

Scanning Probe Microscopy ◽

Scanning Probe ◽

Scanning Tunneling ◽

Tunneling Microscopy ◽

Force Microscopy ◽

Nanoscale Patterning ◽

Atomic Force ◽

Probe Microscope ◽

Molecular Manipulation

Nanotechnology is vital to the fabrication of integrated circuits, memory devices, display units, biochips and biosensors. Scanning probe microscope (SPM) has emerged to be a unique tool for materials structuring and patterning with atomic and molecular resolution. SPM includes scanning tunneling microscopy (STM) and atomic force microscopy (AFM). In this chapter, we selectively discuss the atomic and molecular manipulation capabilities of STM nanolithography. As for AFM nanolithography, we focus on those nanopatterning techniques involving water and/or air when operated in ambient. The typical methods, mechanisms and applications of selected SPM nanolithographic techniques in nanoscale structuring and fabrication are reviewed.

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