Fabrication and Applications of Long-Range Ordered Au Nanodisk Arrays

2008 ◽  
Author(s):  
Yue Bing Zheng ◽  
Bala Krishna Juluri ◽  
Tony Jun Huang
Keyword(s):  
Long Range ◽  
Large Scale ◽  
Focused Ion Beam ◽  
Low Cost ◽  
Ion Beam ◽  
Spatial Coherence ◽  
Surface Enhanced Raman Spectroscopy ◽  
Microfluidic System ◽  
Localized Surface Plasmon ◽  
Microfluidic Channels

Large-scale nanostructure arrays with spatial coherence are useful for many applications. Conventional nanofabrication techniques such as electron beam lithography and focused ion beam lithography are expensive and time-consuming. In this paper, long-range ordered Au nanodisk arrays were fabricated on glass substrates using nanosphere lithography (NSL) combined with reactive ion etching (RIE) techniques. The morphology and size distribution of the Au nanodisks were examined with scanning electron microscopy (SEM) and atomic force microscopy (AFM). The sensitivity of the localized surface plasmon resonance (LSPR) of the Au nanodisk arrays to change in the surroundings’ refractive index was evaluated by integrating the Au nanodisk arrays into microfluidic channels. The measured sensitivity was supported by discrete dipole approximation (DDA) calculations. Further, we designed and fabricated an all-optical plasmonic switch based on the Au nanodisk arrays and photoresponsive liquid crystals (LCs). The high-quality optical properties and high-degree spatial uniformity of the nanodisk arrays, together with simple, low-cost fabrication and easy integration with microfluidic system, suggest tremendous potential in using these nanostructures in many other applications, including biosensing and imaging, surface-enhanced Raman spectroscopy (SERS), and plasmonic tweezers.

To Eliminate Curtain Effect of FIB TEM Samples by a Combination of Sample Dicing and Backside Milling

2014 ◽  
Author(s):  
Jian-Shing Luo ◽  
Hsiu Ting Lee
Keyword(s):  
Sample Preparation ◽  
Focused Ion Beam ◽  
Preparation Method ◽  
Low Cost ◽  
Ion Beam ◽  
Sample Preparation Method ◽  
Site Specific ◽  
Dual Beam ◽  
Transmission Electron

Abstract Several methods are used to invert samples 180 deg in a dual beam focused ion beam (FIB) system for backside milling by a specific in-situ lift out system or stages. However, most of those methods occupied too much time on FIB systems or requires a specific in-situ lift out system. This paper provides a novel transmission electron microscopy (TEM) sample preparation method to eliminate the curtain effect completely by a combination of backside milling and sample dicing with low cost and less FIB time. The procedures of the TEM pre-thinned sample preparation method using a combination of sample dicing and backside milling are described step by step. From the analysis results, the method has applied successfully to eliminate the curtain effect of dual beam FIB TEM samples for both random and site specific addresses.

Cross-sectional microanalysis for tracking the effect of solvent on the morphological evaluation of PLA/AgNWs bionanocomposties

2021 ◽  
pp. 096739112110230
Author(s):  
Meltem Sezen ◽  
Busra Tugba Camic
Keyword(s):  
Focused Ion Beam ◽  
Silver Nanowires ◽  
Low Cost ◽  
Ion Beam ◽  
Lower Surface ◽  
Polymer Matrices ◽  
Elemental Distribution ◽  
Medical Sciences ◽  
Surface Area Ratio ◽  
Cross Sectional

The emphasis of biocompatible polymer applications in medical sciences and biotechnology has remarkably increased. Developing new low-cost, low-toxicity and lightweight composite forms of biopolymers has become even more attractive since the addition of new species into polymer matrices assist to improve biomedical activities of such materials to a higher extend. Developments in nanoscience and nanotechnology recently contribute to controlled fabrication and ultraprecise diagnosis of such materials. This study concerns the observation of solution processing effects in the fabrication of porous PLA/AGNWs bionanocomposite coatings using electron and ion processing based serial cross-sectioning and high-resolution imaging. The nanostructuring and characterization were both performed in a focused ion-beam-scanning electron microscope (FIB-SEM) platform. HR-SEM imaging was conducted on-site to track solvent based morphological property alterations of PLA and PLA/AgNWs structures. Simultaneous SEM-EDS analyses revealed the elemental distribution and the chemical composition along the cross-sectioned regions of the samples. Accordingly, it was observed that, in case of acetone dissolved materials, both pristine PLA and PLA/AgNWs samples sustained their foamy structure. When chloroform was used as the solvent, the porosity of the polymer matrices was less and the resulting structure was found to be denser than samples dissolved in acetone with a lower surface area ratio inside the material. This can be attributed to the rapid volatilization of acetone compared to chloroform, and hence the formation of interconnected pore network. For both nanocomposite biopolymers dissolved in acetone and chloroform, silver nanowires were homogeneously distributed throughout PLA matrices.

The chiral coating on an achiral nanostructure by the secondary effect in focused ion beam induced deposition

2021 ◽  
Author(s):  
Chen Fang ◽  
Qing Chai ◽  
Ye Chen ◽  
Yan Xing ◽  
Zai-fa Zhou
Keyword(s):  
Circular Dichroism ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Polarized Light ◽  
Localized Surface Plasmon ◽  
Light Illumination ◽  
Secondary Effect ◽  
Circularly Polarized Light ◽  
Optical Metamaterials ◽  
Circular Dichroïsm

Abstract Optical metamaterials are widely used in electromagnetic wave modulation due to their sub-wavelength feature sizes. In this paper, a method to plate an achiral nanopillar array with chiral coating by the secondary effect in focused ion beam induced deposition is proposed. Guided by the pattern defined in a bitmap with variable residence time, the beam scan strategy suppresses the interaction between adjacent nanostructures. A uniform chiral coating is formed on the target nanostructure without affecting the adjacent nanostructure, under carefully selected beam parameters and the rotation angle of the sample stage. Energy Dispersive X-Ray Spectroscopy results show that the chiral film has high purity metal, which enables the generation of localized surface plasmon resonances and causes the circular dichroism under circularly polarized light illumination. Finally, the tailorable circular dichroism spectrum of the coated array is verified by the Finite Difference Time Domain method.

Fabrication of large area nanogap electrodes for sensing applications

2013 ◽  
Vol 1530 ◽  
Author(s):  
A. Bendavid ◽  
L. Wieczorek ◽  
R. Chai ◽  
J. S. Cooper ◽  
B. Raguse
Keyword(s):  
Large Scale ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Current ◽  
Fabrication Method ◽  
Large Area ◽  
Sensor Applications ◽  
Sensing Applications ◽  
Lift Off ◽  
Nanogap Electrodes

ABSTRACTA large area nanogap electrode fabrication method combinig conventional lithography patterning with the of focused ion beam (FIB) is presented. Lithography and a lift-off process were used to pattern 50 nm thick platinum pads having an area of 300 μm × 300 μm. A range of 30-300 nm wide nanogaps (length from 300 μm to 10 mm ) were then etched using an FIB of Ga+ at an acceleration voltage of 30 kV at various beam currents. An investigation of Ga+ beam current ranging between 1-50 pA was undertaken to optimise the process for the current fabrication method. In this study, we used Monte Carlo simulation to calculate the damage depth in various materials by the Ga+. Calculation of the recoil cascades of the substrate atoms are also presented. The nanogap electrodes fabricated in this study were found to have empty gap resistances exceeding several hundred MΩ. A comparison of the gap length versus electrical resistance on glass substrates is presented. The results thus outline some important issues in low-conductance measurements. The proposed nanogap fabrication method can be extended to various sensor applications, such as chemical sensing, that employ the nanogap platform. This method may be used as a prototype technique for large-scale fabrication due to its simple, fast and reliable features.

scholarly journals Sensitive and Reproducible Gold SERS Sensor Based on Interference Lithography and Electrophoretic Deposition

Sensors ◽  
2018 ◽  
Vol 18 (11) ◽  
pp. 4076 ◽  
Author(s):  
June Hwang ◽  
Minyang Yang
Keyword(s):  
Gold Nanoparticle ◽  
Electrophoretic Deposition ◽  
Large Scale ◽  
Surface Enhanced Raman Spectroscopy ◽  
Localized Surface Plasmon ◽  
Interference Lithography ◽  
Metal Nanostructures ◽  
Nanoparticle Array ◽  
Laser Ablation In Liquid ◽  
Label Free Detection

Surface-enhanced Raman spectroscopy (SERS) is a promising analytical tool due to its label-free detection ability and superior sensitivity, which enable the detection of single molecules. Since its sensitivity is highly dependent on localized surface plasmon resonance, various methods have been applied for electric field-enhanced metal nanostructures. Despite the intensive research on practical applications of SERS, fabricating a sensitive and reproducible SERS sensor using a simple and low-cost process remains a challenge. Here, we report a simple strategy to produce a large-scale gold nanoparticle array based on laser interference lithography and the electrophoretic deposition of gold nanoparticles, generated through a pulsed laser ablation in liquid process. The fabricated gold nanoparticle array produced a sensitive, reproducible SERS signal, which allowed Rhodamine 6G to be detected at a concentration as low as 10−8 M, with an enhancement factor of 1.25 × 105. This advantageous fabrication strategy is expected to enable practical SERS applications.

scholarly journals Lead Selenide Polycrystalline Coatings Sensitized Using Diffusion and Ion Beam Methods for Uncooled Mid-Infrared Photodetection

Coatings ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 444 ◽  
Author(s):  
Hao Yang ◽  
Xiaojiang Li ◽  
Guodong Wang ◽  
Jianbang Zheng
Keyword(s):  
High Speed ◽  
Large Scale ◽  
Low Cost ◽  
Ion Beam ◽  
Lead Selenide ◽  
Cmos Technology ◽  
Oxide Semiconductor ◽  
Recombination Suppression ◽  
Mid Infrared ◽  
Physical Effects

Polycrystalline lead selenide material that is processed after a sensitization technology offers the additional physical effects of carrier recombination suppression and carrier transport manipulation, making it sufficiently sensitive to mid-infrared radiation at room temperature. Low-cost and large-scale integration with existing electronic platforms such as complementary metal–oxide–semiconductor (CMOS) technology and multi-pixel readout electronics enable a photodetector based on polycrystalline lead selenide coating to work in high-speed, low-cost, and low-power consumption applications. It also shows huge potential to compound with other materials or structures, such as the metasurface for novel optoelectronic devices and more marvelous properties. Here, we provide an overview and evaluation of the preparations, physical effects, properties, and potential applications, as well as the optoelectronic enhancement mechanism, of lead selenide polycrystalline coatings.

ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW

2005 ◽  
Vol 04 (03) ◽  
pp. 269-286 ◽  
Author(s):  
F. WATT ◽  
A. A. BETTIOL ◽  
J. A. VAN KAN ◽  
E. J. TEO ◽  
M. B. H. BREESE
Keyword(s):  
Mass Production ◽  
Large Scale ◽  
Focused Ion Beam ◽  
Extreme Ultraviolet ◽  
Ion Beam ◽  
Large Area ◽  
Near Surface ◽  
X Ray ◽  
Projection Lithography ◽  
New Generation

To overcome the diffraction constraints of traditional optical lithography, the next generation lithographies (NGLs) will utilize any one or more of EUV (extreme ultraviolet), X-ray, electron or ion beam technologies to produce sub-100 nm features. Perhaps the most under-developed and under-rated is the utilization of ions for lithographic purposes. All three ion beam techniques, FIB (Focused Ion Beam), Proton Beam Writing (p-beam writing) and Ion Projection Lithography (IPL) have now breached the technologically difficult 100 nm barrier, and are now capable of fabricating structures at the nanoscale. FIB, p-beam writing and IPL have the flexibility and potential to become leading contenders as NGLs. The three ion beam techniques have widely different attributes, and as such have their own strengths, niche areas and application areas. The physical principles underlying ion beam interactions with materials are described, together with a comparison with other lithographic techniques (electron beam writing and EUV/X-ray lithography). IPL follows the traditional lines of lithography, utilizing large area masks through which a pattern is replicated in resist material which can be used to modify the near-surface properties. In IPL, the complete absence of diffraction effects coupled with ability to tailor the depth of ion penetration to suit the resist thickness or the depth of modification are prime characteristics of this technique, as is the ability to pattern a large area in a single brief irradiation exposure without any wet processing steps. p-beam writing and FIB are direct write (maskless) processes, which for a long time have been considered too slow for mass production. However, these two techniques may have some distinct advantages when used in combination with nanoimprinting and pattern transfer. FIB can produce master stamps in any material, and p-beam writing is ideal for producing three-dimensional high-aspect ratio metallic stamps of precise geometry. The transfer of large scale patterns using nanoimprinting represents a technique of high potential for the mass production of a new generation of high area, high density, low dimensional structures. Finally a cross section of applications are chosen to demonstrate the potential of these new generation ion beam nanolithographies.

A131 Nano-scale sputtering behavior in Focused Ion Beam Processing via Large-Scale Molecular Dynamics Simulation

2006 ◽  
Vol 2006 (0) ◽  
pp. 17-18
Author(s):  
Shin-ichi Satake ◽  
Natsuki Inoue ◽  
Jun Taniguchi ◽  
Masahiko Shibahara ◽  
Tomoyuki Tsuchida ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Large Scale ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Dynamics Simulation ◽  
Nano Scale

scholarly journals Localized Surface Plasmons Enhanced Light Transmission into c-Silicon Solar Cells

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Y. Premkumar Singh ◽  
Amit Jain ◽  
Avinashi Kapoor
Keyword(s):  
Solar Cells ◽  
Metallic Nanoparticles ◽  
Large Scale ◽  
Light Transmission ◽  
Low Cost ◽  
Incident Light ◽  
Solar Spectrum ◽  
Localized Surface Plasmon ◽  
Plasmonic Nanostructures ◽  
Al Nanoparticles

The paper investigates the light incoupling into c-Si solar cells due to the excitation of localized surface plasmon resonances in periodic metallic nanoparticles by finite-difference time-domain (FDTD) technique. A significant enhancement of AM1.5G solar radiation transmission has been demonstrated by depositing nanoparticles of various metals on the upper surface of a semi-infinite Si substrate. Plasmonic nanostructures located close to the cell surface can scatter incident light efficiently into the cell. Al nanoparticles were found to be superior to Ag, Cu, and Au nanoparticles due to the improved transmission of light over almost the entire solar spectrum and, thus, can be a potential low-cost plasmonic metal for large-scale implementation of solar cells.

scholarly journals Polymer micro-lenses as an long-coupling-distance interfacing layer in low-cost optical coupling solution between optical fibers and photonic integrated waveguide circuits

2019 ◽  
Vol 11 (4) ◽  
pp. 121
Author(s):  
Andrzej Kaźmierczak ◽  
Mateusz Słowikowski ◽  
Krystian Pavłov ◽  
Maciej Filipiak ◽  
Ryszard Piramidowicz
Keyword(s):  
Optical Fiber ◽  
Focused Ion Beam ◽  
Low Cost ◽  
Ion Beam ◽  
Single Mode ◽  
Optical Fiber Communication ◽  
Japanese Journal ◽  
Spot Size ◽  
Optical Signal ◽  
Silicon On Insulator

We present a low-cost scheme for non-permanent optical signal coupling for prospective application in single use photonic integrated chips. The proposed scheme exploits the use of polymer kinoform microlenses. The feasibility of the proposed solution is demonstrated by the experimental investigation of the optical signal coupling from single mode optical fiber (SMF) to the test structure of SixNy integrated waveguide. Full Text: PDF ReferencesM. Smit et al., "An introduction to InP-based generic integration technology," Semiconductor Science and Technology, 29 (8), 083001, 2014 CrossRef R. Baets et al., "Silicon Photonics: silicon nitride versus silicon-on-insulator," in Optical Fiber Communication Conference, OSA Technical Digest (online) (Optical Society of America, 2016), paper Th3J.1. CrossRef K. Shiraishi et al., "A silicon-based spot-size converter between single-mode fibers and Si-wire waveguides using cascaded tapers," Appl. Phys. Lett. 91, 141120 (2007) CrossRef Y. Sobu et al., "GaInAsP/InP waveguide dual core spot size converter for optical fiber,"IEEE Photonic Society 24th Annual Meeting, 469-470, (2011). CrossRef F. Van Laere et al., "Compact and Highly Efficient Grating Couplers Between Optical Fiber and Nanophotonic Waveguides," Journal of Lightwave Technology, vol. 25, no. 1, pp. 151-156, Jan. 2007. CrossRef A. Kaźmierczak et al., "Light coupling and distribution or Si3N4/SiO2 integrated multichannel single mode sensing system," Opt. Eng. 48, 2009, pp. 014401 CrossRef M. Rossi et al., "Arrays of anamorphic phase-matched Fresnel elements for diode-to-fiber coupling," Appl. Opt. 34, 2483-2488 (1995) CrossRef M. Prasciolu et al, "Fabrication of Diffractive Optical Elements On-Fiber for Photonic Applications by Nanolitography," Japanese Journal of Applied Physics, Volume 42, (2003) CrossRef F.Schiappelli et al., "Efficient fiber-to-waveguide coupling by a lens on the end of the optical fiber fabricated by focused ion beam milling" Microelectronic Engineering Volumes 73-74, pp.397-404 (2004) CrossRef

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