A FIVE-AXIS ARM-MANIPULATOR LASER SYSTEM AND AN ALGORITHM FOR DIGITAL PROCESSING OF OUTPUT DATA FOR RECORDING AND MORPHO-TOPOLOGICAL IDENTIFICATION OF CELL AND TISSUE STRUCTUR

One of the challenges regarding widespread use of parts made from alloy steel is their time-consuming polishing process. A rough freeform surface of part has been often expected to be polished rapidly up to a smooth surface finish. The focus of this study is to develop a fast polishing method of freeform surface by using dual-beam lasers. The dual-beam laser system consists of continuous laser (CW) and pulsed laser based on a five-axis CNC device. In this study, a series of experiments of CW laser polishing present the effects of different spot irradiation on surface topography, then the combination trajectory of zigzag and square waveform of pulsed laser is explored to realize a “melting peak for filling into valley” (MPFV) method. The polishing experiment on a semisphere of S136H steel polished by dual-beam shows that a rough semisphere surface was rapidly polished from initial state value of Sa (=877 nm) to post-polished value of Sa (=142 nm), and the polishing efficiency is as high as 2890 cm2/H.

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A method to measure pores and fissures in geologic materials under S.E.M. by digital image processing

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100108209 ◽

1978 ◽

Vol 36 (1) ◽

pp. 212-213

Author(s):

L. Montoto ◽

M. Montoto ◽

A. Bel-Lan

Keyword(s):

Image Processing ◽

Optical Microscopy ◽

Digital Image Processing ◽

Digital Image ◽

Digital Processing ◽

Free Surfaces ◽

Geologic Materials ◽

Automatic Information ◽

Detector Output ◽

Rock Specimens

INTRODUCTION.- The physical properties of rock masses are greatly influenced by their internal discontinuities, like pores and fissures. So, these need to be measured as a basis for interpretation. To avoid the basic difficulties of measurement under optical microscopy and analogic image systems, the authors use S.E.M. and multiband digital image processing. In S.E.M., analog signal processing has been used to further image enhancement (1), but automatic information extraction can be achieved by simple digital processing of S.E.M. images (2). The use of multiband image would overcome difficulties such as artifacts introduced by the relative positions of sample and detector or the typicals encountered in optical microscopy.DIGITAL IMAGE PROCESSING.- The studied rock specimens were in the form of flat deformation-free surfaces observed under a Phillips SEM model 500. The SEM detector output signal was recorded in picture form in b&w negatives and digitized using a Perkin Elmer 1010 MP flat microdensitometer.

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Digital Processing of STEM Images

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100097752 ◽

1981 ◽

Vol 39 ◽

pp. 236-237

Author(s):

A. V. Crewe ◽

M. Ohtsuki

Keyword(s):

High Resolution ◽

Low Dose ◽

Assembly Language ◽

Processing System ◽

Principal Component ◽

Digital Processing ◽

Image Analysis System ◽

Black And White ◽

Analysis System ◽

Dose Imaging

We have assembled an image processing system for use with our high resolution STEM for the particular purpose of working with low dose images of biological specimens. The system is quite flexible, however, and can be used for a wide variety of images.The original images are stored on magnetic tape at the microscope using the digitized signals from the detectors. For low dose imaging, these are “first scan” exposures using an automatic montage system. One Nova minicomputer and one tape drive are dedicated to this task.The principal component of the image analysis system is a Lexidata 3400 frame store memory. This memory is arranged in a 640 x 512 x 16 bit configuration. Images are displayed simultaneously on two high resolution monitors, one color and one black and white. Interaction with the memory is obtained using a Nova 4 (32K) computer and a trackball and switch unit provided by Lexidata.The language used is BASIC and uses a variety of assembly language Calls, some provided by Lexidata, but the majority written by students (D. Kopf and N. Townes).

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Digital differential hysteresis iimage processing displays what the microscope acquires but the eye can't see

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100139585 ◽

1995 ◽

Vol 53 ◽

pp. 642-643

Author(s):

Klaus-Ruediger Peters

Keyword(s):

Image Processing ◽

Visual System ◽

High Precision ◽

Image Data ◽

Processing Technology ◽

Output Data ◽

Contrast Resolution ◽

Pixel Intensity ◽

Data Reading ◽

Hysteresis Properties

Differential hysteresis processing is a new image processing technology that provides a tool for the display of image data information at any level of differential contrast resolution. This includes the maximum contrast resolution of the acquisition system which may be 1,000-times higher than that of the visual system (16 bit versus 6 bit). All microscopes acquire high precision contrasts at a level of <0.01-25% of the acquisition range in 16-bit - 8-bit data, but these contrasts are mostly invisible or only partially visible even in conventionally enhanced images. The processing principle of the differential hysteresis tool is based on hysteresis properties of intensity variations within an image.Differential hysteresis image processing moves a cursor of selected intensity range (hysteresis range) along lines through the image data reading each successive pixel intensity. The midpoint of the cursor provides the output data. If the intensity value of the following pixel falls outside of the actual cursor endpoint values, then the cursor follows the data either with its top or with its bottom, but if the pixels' intensity value falls within the cursor range, then the cursor maintains its intensity value.

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The new CM-Series TEMs: integration of a five-axis motorized, fully computer-controlled goniometer

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100147132 ◽

1993 ◽

Vol 51 ◽

pp. 258-259

Author(s):

Marc J.C. de Jong ◽

P. Emile S.J. Asselbergs ◽

Max T. Otten

Keyword(s):

Mechanical Design ◽

Computer Control ◽

Objective Lens ◽

Access Port ◽

Vibration Stability ◽

Transmission Electron ◽

Computer Controlled ◽

High Degree ◽

Five Axis ◽

Five Axes

A new step forward in Transmission Electron Microscopy has been made with the introduction of the CompuStage on the CM-series TEMs: CM120, CM200, CM200 FEG and CM300. This new goniometer has motorization on five axes (X, Y, Z, α, β), all under full computer control by a dedicated microprocessor that is in communication with the main CM processor. Positions on all five axes are read out directly - not via a system counting motor revolutions - thereby providing a high degree of accuracy. The CompuStage enters the octagonal block around the specimen through a single port, allowing the specimen stage to float freely in the vacuum between the objective-lens pole pieces, thereby improving vibration stability and freeing up one access port. Improvements in the mechanical design ensure higher stability with regard to vibration and drift. During stage movement the holder O-ring no longer slides, providing higher drift stability and positioning accuracy as well as better vacuum.

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{10} edge dislocations in YSZ films grown on (100)MgO by PLD

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100170384 ◽

1994 ◽

Vol 52 ◽

pp. 530-531

Author(s):

Jason R. Heffelfinger ◽

C. Barry Carter

Keyword(s):

Thin Films ◽

Semiconductor Lasers ◽

Vapor Deposition ◽

Substrate Surface ◽

Laser System ◽

Average Energy ◽

Target Material ◽

Chemical Vapor ◽

Buffer Layers ◽

Organic Chemical

Yttria-stabilized zirconia (YSZ) is currently used in a variety of applications including oxygen sensors, fuel cells, coatings for semiconductor lasers, and buffer layers for high-temperature superconducting films. Thin films of YSZ have been grown by metal-organic chemical vapor deposition, electrochemical vapor deposition, pulse-laser deposition (PLD), electron-beam evaporation, and sputtering. In this investigation, PLD was used to grow thin films of YSZ on (100) MgO substrates. This system proves to be an interesting example of relationships between interfaces and extrinsic dislocations in thin films of YSZ.In this experiment, a freshly cleaved (100) MgO substrate surface was prepared for deposition by cleaving a lmm-thick slice from a single-crystal MgO cube. The YSZ target material which contained 10mol% yttria was prepared from powders and sintered to 85% of theoretical density. The laser system used for the depositions was a Lambda Physik 210i excimer laser operating with KrF (λ=248nm, 1Hz repetition rate, average energy per pulse of 100mJ).

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Routine Digital Processing of Microscope Images

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100181506 ◽

1990 ◽

Vol 48 (1) ◽

pp. 550-551

Author(s):

E. Wisse ◽

A. Geerts ◽

R.B. De Zanger

Keyword(s):

Operating System ◽

Digital Processing ◽

Hard Disks ◽

The Sun ◽

Tape Drive ◽

High Definition ◽

Fluorescent Microscope ◽

Microscope Images ◽

Helical Scan ◽

Ethernet Connection

The slowscan and TV signal of the Philips SEM 505 and the signal of a TV camera attached to a Leitz fluorescent microscope, were digitized by the data acquisition processor of a Masscomp 5520S computer, which is based on a 16.7 MHz 68020 CPU with 10 Mb RAM memory, a graphics processor with two frame buffers for images with 8 bit / 256 grey values, a high definition (HD) monitor (910 × 1150), two hard disks (70 and 663 Mb) and a 60 Mb tape drive. The system is equipped with Imaging Technology video digitizing boards: analog I/O, an ALU, and two memory mapped frame buffers for TV images of the IP 512 series. The Masscomp computer has an ethernet connection to other computers, such as a Vax PDP 11/785, and a Sun 368i with a 327 Mb hard disk and a SCSI interface to an Exabyte 2.3 Gb helical scan tape drive. The operating system for these computers is based on different versions of Unix, such as RTU 4.1 (including NFS) on the acquisition computer, bsd 4.3 for the Vax, and Sun OS 4.0.1 for the Sun (with NFS).

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Recent Progress and Plans in Computer-Controlled High Resolution Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010017952x ◽

1990 ◽

Vol 48 (1) ◽

pp. 154-155

Author(s):

W.J. de Ruijter ◽

Peter Rez ◽

David J. Smith

Keyword(s):

Electron Microscopy ◽

Digital Processing ◽

High Resolution Electron Microscopy ◽

Objective Lens ◽

Linear Filter ◽

Contrast Transfer Function ◽

Image Displacement ◽

Spatially Resolved ◽

Wide Range ◽

On Line

Digital computers are becoming widely recognized as standard accessories for electron microscopy. Due to instrumental innovations the emphasis in digital processing is shifting from off-line manipulation of electron micrographs to on-line image acquisition, analysis and microscope control. An on-line computer leads to better utilization of the instrument and, moreover, the flexibility of software control creates the possibility of a wide range of novel experiments, for example, based on temporal and spatially resolved acquisition of images or microdiffraction patterns. The instrumental resolution in electron microscopy is often restricted by a combination of specimen movement, radiation damage and improper microscope adjustment (where the settings of focus, objective lens stigmatism and especially beam alignment are most critical). We are investigating the possibility of proper microscope alignment based on computer induced tilt of the electron beam. Image details corresponding to specimen spacings larger than ∼20Å are produced mainly through amplitude contrast; an analysis based on geometric optics indicates that beam tilt causes a simple image displacement. Higher resolution detail is characterized by wave propagation through the optical system of the microscope and we find that beam tilt results in a dispersive image displacement, i.e. the displacement varies with spacing. This approach is valid for weak phase objects (such as amorphous thin films), where transfer is simply described by a linear filter (phase contrast transfer function) and for crystalline materials, where imaging is described in terms of dynamical scattering and non-linear imaging theory. In both cases beam tilt introduces image artefacts.

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