scholarly journals Estimation of Write Noise Margin for 6t SRAM Cell in CMOS 45nm technology.

2021 ◽  
Vol 23 (05) ◽  
pp. 211-215
Author(s):  
Hima Bindu Katikala ◽  
◽  
G. Ramana Murthy ◽  
P. Raja Rajeswari ◽  
P. Sai Charan ◽  
...  
Keyword(s):  
High Speed ◽  
Random Access ◽  
Cmos Technology ◽  
Propagation Delay ◽  
Noise Margin ◽  
Sram Cell ◽  
Scaling Process ◽  
Memory Architectures ◽  
Margin Analysis ◽  
Static Noise

For high speed application the static random access memory is mostly demandable. Such kind of device should possess additive parameters that can withstand during transistor scaling process. Their exist static noise margin (SNM) which degrades the device performance of memory architectures, majorly observed at write and read operation create write noise margin (WNM) and read noise margin (RNM). In this paper we discuss about the basic design of 6 transistor SRAM (6T SRAM) using 180nm and 45nm CMOS technology in Cadence Virtuoso with write noise margin analysis. The propagation delay, power dissipation, WNM are measured for both the technologies and observed that WNM is relatively low in 45nm.

Design and Analysis of SRAM Cell using Negative Bit-Line Write Assist Technique and Separate Read Port for High-Speed Applications

2021 ◽  
pp. 2150270
Author(s):  
Jitendra Kumar Mishra ◽  
Lakshmi Likhitha Mankali ◽  
Kavindra Kandpal ◽  
Prasanna Kumar Misra ◽  
Manish Goswami
Keyword(s):  
Power Dissipation ◽  
High Speed ◽  
Random Access ◽  
Random Access Memory ◽  
Access Memory ◽  
Static Noise Margin ◽  
Semiconductor Memory ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Noise

The present day electronic gadgets have semiconductor memory devices to store data. The static random access memory (SRAM) is a volatile memory, often preferred over dynamic random access memory (DRAM) due to higher speed and lower power dissipation. However, at scaling down of technology node, the leakage current in SRAM often increases and degrades its performance. To address this, the voltage scaling is preferred which subsequently affects the stability and delay of SRAM. This paper therefore presents a negative bit-line (NBL) write assist circuit which is used for enhancing the write ability while a separate (isolated) read buffer circuit is used for improving the read stability. In addition to this, the proposed design uses a tail (stack) transistor to decrease the overall static power dissipation and also to maintain the hold stability. The comparison of the proposed design has been done with state-of-the-art work in terms of write static noise margin (WSNM), write delay, read static noise margin (RSNM) and other parameters. It has been observed that there is an improvement of 48%, 11%, 19% and 32.4% in WSNM while reduction of 33%, 39%, 48% and 22% in write delay as compared to the conventional 6T SRAM cell, NBL, [Formula: see text] collapse and 9T UV SRAM, respectively.

scholarly journals A Comparative Study of 6T and 8T SRAM Cell With Improved Read and Write Margins in 130 nm CMOS Technology

2020 ◽  
Vol 19 ◽  
Keyword(s):  
Comparative Analysis ◽  
Random Access ◽  
Cmos Technology ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Random Access Memories ◽  
Node Voltage ◽  
Improve Stability ◽  
Static Noise ◽  
Better Than

This paper examines the factors that affect the Static Noise Margin (SNM) of a Static Random Access memories which focus on optimizing Read and Write operation of 8T SRAM cell which is better than 6T SRAM cell Using Swing Restoration for Dual Node Voltage. The read and Write time and improve Stability. New 8T SRAM technique on the circuit or architecture level is required. In this paper Comparative Analysis of 6T and 8T SRAM Cells with Improved Read and Write Margin is done for 130 nm Technology with Cadence Virtuoso schematics Tool.

scholarly journals SRAM CELL 6T AND 8T PARAMETRIC STABILITY ANALYSIS

2021 ◽  
Vol I (I) ◽  
Author(s):  
Bharathabau K
Keyword(s):  
Stability Analysis ◽  
High Speed ◽  
Memory Cell ◽  
Parametric Stability ◽  
Static Noise Margin ◽  
Noise Margin ◽  
Sram Cell ◽  
Margin Analysis ◽  
Static Noise ◽  
Technology Advances

As technology advances, the need for SRAM cells that may be utilised in high-speed applications grows. SRAM cells' static noise margin (SNM) is one of the most important variables to consider when designing a memory cell, and it is the main predictor of SRAM cell speed. The static noise margin will have an impact on the read and write margins. When it comes to the SRAM Cell's stability, the SNM is very important. For high-speed SRAMs, read/write margin analysis is critical since it affects how much data can be read and written. The simulation was run using Mentor Graphics' IC Station, which utilised 350nm technology rather than 180nm technology.

A 32 nm Read Disturb-free 11T SRAM Cell with Improved Write Ability

2019 ◽  
Vol 29 (05) ◽  
pp. 2050067
Author(s):  
S. R. Mansore ◽  
R. S. Gamad ◽  
D. K. Mishra
Keyword(s):  
High Performance ◽  
Model Simulation ◽  
Random Access ◽  
Leakage Power ◽  
Access Memory ◽  
Static Noise Margin ◽  
Noise Margin ◽  
Sram Cell ◽  
Operation Characteristics ◽  
Static Noise

Data stability, write ability and leakage power are major concerns in submicron static random access memory (SRAM) cell design. This paper presents an 11T SRAM cell with differential write and single-ended read. Proposed cell offers improved write ability by interrupting its ground connection during write operation. Separate read buffer provides disturb-free read operation. Characteristics are obtained from HSPICE simulation using 32[Formula: see text]nm high-performance predictive technology model. Simulation results show that the proposed cell achieves 4.5[Formula: see text] and 1.06[Formula: see text] higher read static noise margin (RSNM) as compared to conventional 6T (C6T) and PNN-based 10T cells, respectively, at 0.4[Formula: see text]V. Write static noise margin (WSNM) of the proposed design is 1.65[Formula: see text], 1.71[Formula: see text] and 1.77[Formula: see text] larger as compared to those of C6T, PPN-based 10T and PNN-based 10T cells, respectively, at 0.4V. Write “1” delay of the proposed cell is 0.108[Formula: see text] and 0.81[Formula: see text] as those of PPN10T and PNN10T cells, respectively. Proposed circuit consumes 1.40[Formula: see text] lesser read power as compared to PPN10T cell at 0.4[Formula: see text]V. Leakage power of the proposed cell is 0.35[Formula: see text] of C6T cell at 0.4[Formula: see text]V. Proposed 11T cell occupies 1.65[Formula: see text] larger area as compared to that of conventional 6T.

A Read-Static-Noise-Margin-Free SRAM Cell for Low-VDD and High-Speed Applications

2006 ◽  
Vol 41 (1) ◽  
pp. 113-121 ◽  
Author(s):  
K. Takeda ◽  
Y. Hagihara ◽  
Y. Aimoto ◽  
M. Nomura ◽  
Y. Nakazawa ◽  
...  
Keyword(s):  
High Speed ◽  
Static Noise Margin ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Noise

scholarly journals VARIABILITY ANALYSIS OF 6T AND 7T SRAM CELL IN SUB-45NM TECHNOLOGY

2011 ◽  
Vol 12 (1) ◽  
pp. 13-30 ◽  
Author(s):  
Aminul Islam ◽  
Mohd. Hasan
Keyword(s):  
Random Access ◽  
Memory Cell ◽  
Static Random Access Memory ◽  
Access Time ◽  
Access Memory ◽  
Static Noise Margin ◽  
Noise Margin ◽  
Sram Cell ◽  
Pvt Variations ◽  
Static Noise

This paper analyses standard 6T and 7T SRAM (static random access memory) cell in light of process, voltage and temperature (PVT) variations to verify their functionality and robustness. The 7T SRAM cell consumes higher hold power due to its extra cell area required for its functionality constraint. It shows 60% improvement in static noise margin (SNM), 71.4% improvement in read static noise margin (RSNM) and 50% improvement in write static noise margin (WSNM). The 6T cell outperforms 7T cell in terms of read access time (TRA) by 13.1%. The write access time (TWA) of 7T cell for writing "1" is 16.6 x longer than that of 6T cell. The 6T cell proves it robustness against PVT variations by exhibiting narrower spread in TRA (by 1.2 x) and Twa (by 3.4x). The 7T cell offers 65.6% saving in read power (RPWR) and 89% saving in write power (WPWR). The RPWR variability indicates that 6T ell is more robust against process variation by 3.9x. The 7T cell shows 1.3x wider write power (WPWR) variability indicating 6T cell's robustness against PVT variations. All the results are based on HSPICE simulation using 32 nm CMOS Berkeley Predictive Technology Model (BPTM).

scholarly journals A Novel concept on 8-Transistor Dynamic Feedback Control on Static RAM Cell Array

2018 ◽  
Vol 7 (2.20) ◽  
pp. 109
Author(s):  
S Renukarani ◽  
Bhavana Godavarthi ◽  
SK Bia Roshini ◽  
Mohammad Khadir
Keyword(s):  
Dynamic Control ◽  
Random Access ◽  
Memory Cell ◽  
Dynamic Feedback ◽  
Cell Array ◽  
Static Noise Margin ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Ram ◽  
Static Noise

A novel idea of 8-Transistor (8T) static random access memory cell with enhanced information stability, sub threshold operation may be outlined. Those prescribed novel built single-ended for dynamic control 8 transistors static RAM (SRAM) cell enhances the static noise margin (SNM) to grater low energy supply. The suggested 8T takes less read and write power supply compared to 6T. Those suggested 8T need higher static noise margin than that from 6T. The portable microprocessor chips need ultralow energy consuming circuits on use battery to more drawn out span. The power utilization might be minimized utilizing non-conventional gadget structures, new circuit topologies, and upgrading the architecture. Although, voltage scaling require of the operation completed over sub threshold for low power consumption, and there will be an inconvenience from exponential decrease in execution. However, to sub threshold regime, that data stability of SRAM cell might a chance to be a amazing issue and worsens for those scaling from claming MOSFET ought to sub-nanometer engineering technology.  

CNTFET-Based Memory Design

2020 ◽  
pp. 16-36
Author(s):  
Shashi Bala ◽  
Mamta Khosla ◽  
Raj Kumar
Keyword(s):  
Random Access ◽  
Complementary Metal Oxide Semiconductor ◽  
Cmos Technology ◽  
Oxide Semiconductor ◽  
Suitable Alternative ◽  
Memory Design ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Power ◽  
Effect Transistor

As the feature size of device has been scaling down for many decades, conventional CMOS technology-based static random access memory (SRAM) has reached its limit due to significant leakage power. Therefore, carbon nanotube field effect transistor (CNTFET) can be considered most suitable alternative for SRAM. In this chapter, the performance and stability of CNTFET-based SRAM cells have been analyzed. Numerous figures of merit (FOM) (e.g., read/write noise margin, power dissipation, and read/write delay) have been considered to analyze the performance of CNTFET-based. The static power consumption in CNTFET-based SRAM cell was compared with conventional complementary metal oxide semiconductor (CMOS)-based SRAM cell. Conventional CNTFET and tunnel CNTFET-based SRAMs have also been considered for comparison. From the simulation results, it is observed that tunnel CNTFET SRAM cells have shown improved FOM over conventional CNTFET 6T SRAM cells without losing stability.

scholarly journals Comparative Analysis of 6T, 7T, 8T, 9T, and 10T Realistic CNTFET Based SRAM

2017 ◽  
Vol 2017 ◽  
pp. 1-9 ◽  
Author(s):  
Shital Joshi ◽  
Umar Alabawi
Keyword(s):  
Power Consumption ◽  
Performance Metrics ◽  
Cmos Technology ◽  
Fundamental Limits ◽  
Technology Scaling ◽  
Electronic Application ◽  
Digital Devices ◽  
Noise Margin ◽  
Sram Cell ◽  
Static Noise

CMOS technology below 10 nm faces fundamental limits which restricts its applicability for future electronic application mainly in terms of size, power consumption, and speed. In digital electronics, memory components play a very significant role. SRAM, due to its unique ability to retain data, is one of the most popular memory elements used in most of the digital devices. With aggressive technology scaling, the design of SRAM is seriously challenged in terms of delay, noise margin, and stability. This paper compares the performance of various CNTFET based SRAM cell topologies like 6T, 7T, 8T, 9T, and 10T cell with respect to static noise margin (SNM), write margin (WM), read delay, and power consumption. To consider the nonidealities of CNTFET, variations in tube diameter and effect of metallic tubes are considered for various structures with respect to various performance metrics like SNM, WM, read delay, and power consumption.

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