scholarly journals Effect of Low-Frequency Alternative-Current Magnetic Susceptibility inNi80Fe20Thin Films

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Yuan-Tsung Chen ◽  
S. H. Lin ◽  
Y. C. Lin
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Susceptibility ◽  
Resonance Frequency ◽  
Low Frequency ◽  
Annealing Treatment ◽  
Face Centered Cubic ◽  
Low Frequencies ◽  
Post Annealing ◽  
Alternative Current

X-ray diffraction (XRD) results indicate that the NiFe thin films had a face-centered cubic (FCC) structure. Post-annealing treatment increased the crystallinity of NiFe films over those at room temperature (RT), suggesting that NiFe crystallization yields FCC (111) texturing. Post-annealing treatments increase crystallinity over that obtained at RT. This paper focuses on the maximum alternative-current magnetic susceptibility(χac)value of NiFe thin films with resonance frequency(fres)at low frequencies from 10 Hz to 25000 Hz. These results demonstrate that theχacof NiFe thin films increased with post-annealing treatment and increasing thickness. The NiFe (111) texture suggests that the relationship between magneto-crystalline anisotropy and the maximumχacvalue with optimal resonance frequency(fres)increased spin sensitivity at optimalfres. The results obtained under the three conditions revealed that the maximumχacvalue and optimalfresof a 1000 Å-thick NiFe thin film are 3.45 Hz and 500 Hz, respectively, following postannealing atTA=250°C for 1 h. This suggests that a 1000 Å NiFe thin film post-annealed atTA=250°C is suitable for gauge sensor and transformer applications at low frequencies.

Thermochromic VO2 Thin Film Prepared by Post Annealing Treatment of V2O5 Thin Film

2009 ◽  
Vol 79-82 ◽  
pp. 747-750 ◽  
Author(s):  
Dong Qing Liu ◽  
Wen Wei Zheng ◽  
Hai Feng Cheng ◽  
Hai Tao Liu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Phase Transition ◽  
Photoelectron Spectroscopy ◽  
Sol Gel ◽  
Annealing Treatment ◽  
Simple Method ◽  
X Ray ◽  
Post Annealing ◽  
Vo2 Thin Films

Thermochromic vanadium dioxide (VO2) exhibits a semi-conducting to metallic phase transition at about 68°C, involving strong variations in electrical and optical properties. A simple method was proposed to prepare VO2 thin films from easily gained V2O5 thin films. The detailed thermodynamic calculation was done and the results show that V2O5 will decompose to VO2 when the post annealing temperature reaches 550°C at the atmospheric pressure of less than 0.06Pa. The initial V2O5 films were prepared by sol-gel method on fused-quartz substrates. Different post annealing conditions were studied. The derived VO2 thin film samples were characterized using X-ray diffraction and X-ray photoelectron spectroscopy. The electrical resistance and infrared emissivity of VO2 thin films under different temperatures were measured. The results show that the VO2 thin film derived from the V2O5 thin film annealed at 550°C for 10 hours is pure dioxide of vanadium without other valences. It was observed that the resistance of VO2 thin film with thickness about 600nm can change by 4 orders of magnitude and the 7.5-14μm emissivity can change by 0.6 during the phase transition.

scholarly journals Determining Contact Angle and Surface Energy of Co60Fe20B20Thin Films by Magnetron Sputtering

2011 ◽  
Vol 2011 ◽  
pp. 1-4 ◽  
Author(s):  
S. K. Wang ◽  
Yuan-Tsung Chen ◽  
S. R. Jian
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Contact Angle ◽  
Surface Energy ◽  
Room Temperature ◽  
Annealing Treatment ◽  
Test Liquid ◽  
X Ray Diffraction ◽  
X Ray ◽  
Post Annealing

This study examined the deposition of CoFeB thin films on a glass substrate at room temperature (RT), as well as the effects of conducting postannealing at heat annealingTA=150°C for 1 h. The thickness (tf) of the CoFeB thin films ranged from 100 Å to 500 Å. The microstructure, average contact angle, and surface energy properties were also investigated. X-ray diffraction (XRD) revealed that CoFeB films are nanocrystalline at RT and that post-annealing treatment increases in conjunction with the crystallinity. The surface energy of the CoFeB thin films is related to adhesive strength. The CoFeB films form a contact angle of larger than90∘with water as a test liquid. This finding demonstrates that the CoFeB film is hydrophobic. Astfincreases from 100 Å to 500 Å, the surface energy at RT decreases from 40 mJ/mm2to 32 mJ/mm2. During post-annealing treatment, the surface energy increases from 32 mJ/mm2to 35 mJ/mm2, astfincreases from 100 Å to 300 Å; then it decreases to 31 mJ/mm2, astfincreases from 300 Å to 500 Å. The surface energy of the as-deposited CoFeB thin films exceeds that during post-annealing treatment at thicknesses of 100 Å and 200 Å, suggesting that as-deposited CoFeB thin film increases the adhesion.

Deposition and Characterization of Eu:Y2O3 Red Phosphor Thin Films

1997 ◽  
Vol 471 ◽  
Author(s):  
S. L. Jones ◽  
D. Kumar ◽  
Rajiv K. Singh ◽  
P. H. Holloway
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Annealing Treatment ◽  
Powder Materials ◽  
Flat Panel ◽  
Red Phosphor ◽  
Post Annealing ◽  
Field Emission Displays ◽  
Effect Of Surface

ABSTRACTThin film phosphors are very promising for the fabrication of flat panel field emission displays (FEDs). In the present paper we have reported the growth and characterization of Eu:Y2O3 phosphor thin films. The effect of surface roughness and crystallinity on the brightness of phosphor films have been studied. A post annealing treatment of the films have been found to result in the realization of Eu:Y2O3 films with 70% brightness compared to powder materials.

scholarly journals Optimizing the Properties of La0.8Sr0.2CrO3 Thin Films through Post-Annealing for High-Temperature Sensing

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1802
Author(s):  
Dan Liu ◽  
Peng Shi ◽  
Yantao Liu ◽  
Yijun Zhang ◽  
Bian Tian ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Annealing Temperature ◽  
Rf Sputtering ◽  
Maximum Size ◽  
Cross Sectional ◽  
Post Annealing ◽  
Maximum Conductivity ◽  
Different Temperatures ◽  
Post Annealing Temperature

La0.8Sr0.2CrO3 (0.2LSCO) thin films were prepared via the RF sputtering method to fabricate thin-film thermocouples (TFTCs), and post-annealing processes were employed to optimize their properties to sense high temperatures. The XRD patterns of the 0.2LSCO thin films showed a pure phase, and their crystallinities increased with the post-annealing temperature from 800 °C to 1000 °C, while some impurity phases of Cr2O3 and SrCr2O7 were observed above 1000 °C. The surface images indicated that the grain size increased first and then decreased, and the maximum size was 0.71 μm at 1100 °C. The cross-sectional images showed that the thickness of the 0.2LSCO thin films decreased significantly above 1000 °C, which was mainly due to the evaporation of Sr2+ and Cr3+. At the same time, the maximum conductivity was achieved for the film annealed at 1000 °C, which was 6.25 × 10−2 S/cm. When the thin films post-annealed at different temperatures were coupled with Pt reference electrodes to form TFTCs, the trend of output voltage to first increase and then decrease was observed, and the maximum average Seebeck coefficient of 167.8 µV/°C was obtained for the 0.2LSCO thin film post-annealed at 1100 °C. Through post-annealing optimization, the best post-annealing temperature was 1000 °C, which made the 0.2LSCO thin film more stable to monitor the temperatures of turbine engines for a long period of time.

Chemical Bath Deposition of Lead Sulphide (PbS) Thin Film and their Characterization

2013 ◽  
Vol 209 ◽  
pp. 111-115 ◽  
Author(s):  
Sandip V. Bhatt ◽  
M.P. Deshpande ◽  
Bindiya H. Soni ◽  
Nitya Garg ◽  
Sunil H. Chaki
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Raman Spectroscopy ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Excitation Wavelength ◽  
Face Centered Cubic ◽  
Phonon Modes ◽  
Lead Sulphide ◽  
X Ray

Thin film deposition of PbS is conveniently carried out by chemical reactions of lead acetate with thiourea at room temperature. Energy dispersive analysis of X-ray (EDAX), X-ray diffraction (XRD), selected area electron diffraction patterns (SAED), UV-Vis-NIR spectrophotometer, Scanning Electron Microscopy (SEM), Atomic force microscopy (AFM), Photoluminescence (PL) and Raman spectroscopy techniques are used for characterizing thin films. EDAX spectra shows that no impurity is present and XRD pattern indicates face centered cubic structure of PbS thin films. The average crystallite size obtained using XRD is about 15nm calculated using Scherrer’s formula and that determined from Hall-Williamson plot was found to be 18nm. SAED patterns indicate that the deposited PbS thin films are polycrystalline in nature. Blue shift due to quantum confinement was seen from the UV-Vis-NIR absorption spectra of thin film in comparison with bulk PbS. The Photoluminescence spectra obtained for thin film with different excitation sources shows sharp emission peaks at 395nm and its intensity of photoluminescence increases with increasing the excitation wavelength. Raman spectroscopy of deposited thin film was used to study the optical phonon modes at an excitation wavelength of 488nm using (Ar+) laser beam.

Electrodeposition of CuI Thin Film for Perovskite Solar Cells

2020 ◽  
Vol 979 ◽  
pp. 180-184
Author(s):  
I. Karuppusamy ◽  
K. Ramachandran ◽  
S. Karuppuchamy
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Solar Cells ◽  
Applied Voltage ◽  
Perovskite Solar Cells ◽  
Face Centered Cubic ◽  
Applied Potential ◽  
Cathodic Electrodeposition ◽  
Cubic Structure ◽  
Face Centered

The CuI thin film has been successfully prepared by using cathodic electrodeposition method. The synthesized film was characterized using advanced techniques such as XRD, SEM-EDX and UV measurements. The films are crystallized in face centered cubic structure. The crystallinity is increasing for the applied potential of-0.3 V and the crystallinity deteriorates on increasing the potential above - 0.3 V. It was also observed that the applied voltage plays an important role. Homogeneously distributed triangular faceted morphology was observed from SEM. This is consistent with the result of XRD that electrodeposited CuI thin films grow preferential orientation along the (111) crystal plane.

Influence of Materials on the Performance Limits of Microactuators

2007 ◽  
Vol 1052 ◽  
Author(s):  
Prasanna Srinivasan ◽  
S. Mark Spearing
Keyword(s):  
Thin Films ◽  
Shape Memory ◽  
High Performance ◽  
Low Frequency ◽  
Beam Theory ◽  
Performance Limits ◽  
Low Frequencies ◽  
Thermal Actuators ◽  
Work Volume ◽  
Selection Of

AbstractThe selection of actuators at the micro-scale requires an understanding of the performance limits of different actuation mechanisms governed by the optimal selection of materials. This paper presents the results of analyses for elastic bi-material actuators based on simple beam theory and lumped parameter thermal models. Comparisons are made among commonly employed actuation schemes (electro-thermal, piezoelectric and shape memory) at micro scales and promising candidate materials are identified. Polymeric films on Si subjected to electro-thermal heating are optimal candidates for high displacement, low frequency devices while ferroelectric thin films of Pb-based ceramics on Si/ DLC are optimal for high force, high frequency devices. The ability to achieve ∼10 kHz at scales < 100μm make electro-thermal actuators competitive with piezoelectric actuators considering the low work/volume obtained in piezoelectric actuation (∼ 10−8J.m−3.mV−2). Although shape memory alloy (SMA) actuators such as Ni-Ti on Si deliver larger work (∼ 1 J.m−3K−2) than electro-thermal actuators at relatively low frequencies (∼ 1 kHz), the critical scale associated with the cessation of the shape memory effect forms the bounding limit for the actuator design. The built-in compressive stress levels (∼ 1GPa) in thin films of Si and DLC could be exploited for realizing a high performance actuator by electro-thermal buckling.

scholarly journals High Strength and Deformation Mechanisms of Al0.3CoCrFeNi High-Entropy Alloy Thin Films Fabricated by Magnetron Sputtering

Entropy ◽  
2019 ◽  
Vol 21 (2) ◽  
pp. 146 ◽  
Author(s):  
Wei-Bing Liao ◽  
Hongti Zhang ◽  
Zhi-Yuan Liu ◽  
Pei-Feng Li ◽  
Jian-Jun Huang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
High Hardness ◽  
Deformation Mechanisms ◽  
High Entropy Alloy ◽  
Alloy Thin Film ◽  
Face Centered Cubic ◽  
High Entropy ◽  
Strength And Deformation

Recently, high-entropy alloy thin films (HEATFs) with nanocrystalline structures and high hardness were developed by magnetron sputtering technique and have exciting potential to make small structure devices and precision instruments with sizes ranging from nanometers to micrometers. However, the strength and deformation mechanisms are still unclear. In this work, nanocrystalline Al0.3CoCrFeNi HEATFs with a thickness of ~4 μm were prepared. The microstructures of the thin films were comprehensively characterized, and the mechanical properties were systematically studied. It was found that the thin film was smooth, with a roughness of less than 5 nm. The chemical composition of the high entropy alloy thin film was homogeneous with a main single face-centered cubic (FCC) structure. Furthermore, it was observed that the hardness and the yield strength of the high-entropy alloy thin film was about three times that of the bulk samples, and the plastic deformation was inhomogeneous. Our results could provide an in-depth understanding of the mechanics and deformation mechanism for future design of nanocrystalline HEATFs with desired properties.

scholarly journals Rapid and Scalable Wire-bar Strategy for Coating of TiO2 Thin-films: Effect of Post-Annealing Temperatures on Structures and Catalytic Dye-Degradation

Molecules ◽  
2020 ◽  
Vol 25 (7) ◽  
pp. 1683 ◽  
Author(s):  
P. Divya ◽  
S. Arulkumar ◽  
S. Parthiban ◽  
Anandarup Goswami ◽  
Tansir Ahamad ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dye Degradation ◽  
Window Glass ◽  
Visible Range ◽  
Large Area ◽  
Tio2 Thin Films ◽  
Water Contact ◽  
Annealing Temperatures ◽  
Post Annealing

Titanium dioxide (TiO2) thin films were rapidly coated on Corning glass substrates from the precursor solution using the wire-bar technique at the room temperature and then post-annealed at 400, 500 and 600 °C for 1 h under atmospheric conditions. The structural, morphological, optical, wettability and photocatalytic properties of the films were studied. X-ray diffraction analysis confirmed the formation of an anatase TiO2 structure irrespective of the post-annealing temperatures. The optical transparency of the films in the visible range was measured to be > 70%. A water contact angle (WCA) of ~0° was observed for TiO2 thin-film, post-annealed at 400 °C and 500 °C. However, WCA of 40.3° was observed for post-annealed at 600 °C. The photocatalytic dye-degradation using post-annealed thin-film was investigated indicating a steady improvement in the dye-degradation percentage (from 24.3 to 29.4%) with the increase of post-annealing temperature. The demonstrated TiO2 thin-films deposited by wire-bar coating technique showed promises for the manufacturing of large-area cost-effective self-cleaning window glass.

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