The Influence of Read Field Intensity on The Retrieval Efficiency and Entanglement Quality of Atom-Photon Entanglement Source

The problem of exposure, which is associated with the quality of coverage, is a basic issue faced in wireless sensor networks. Search for the Minimum Exposure Path (MEP) is one among the crucial problems in Wireless Sensor Networks (WSNs). The exposure with respect to the MEP is one of the indicators used for measuring the coverage quality of a WSN, depicting the efficiency with which the monitoring of a mobile target is done all along the sensing field. The available hybrid technique does not have sufficient accuracy to get the MEP, which is too complicated, and is not suitable to networks having heterogeneous sensor nodes, or in large number, or an all-sensor field intensity function. In order to get over these problems, an Improved Artificial Bee Colony (IABC) model is introduced for the MEP problem associated with getting the optimal shortest path in this research work. The IABC model exhibits an extensive use of energy and data congestion will happen. In order to have an efficient resolution to the data congestion problem, Prim’s algorithm has introduced the link level congestion scenario. Also for effective solving of this issue, in accordance with the features of the node, a semi Hidden Markov Model is developed to solve the problem of energy efficiency in WSN model. A number of experiments were carried out, and the results show that the proposed model and the designed IABC can help in increasing the solution accuracy and can be useful to not just the heterogeneous sensors’ case but also the scenario in where there are a big number of sensor nodes and also an all-sensor field intensity function.

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Investigation of Electrospinning With Multi-Spinneret Array

First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B ◽

10.1115/mnc2007-21494 ◽

2007 ◽

Author(s):

Yongyang Zhu ◽

Xuexian Wang ◽

Dezhi Wu ◽

Daoheng Sun

Keyword(s):

Electric Field ◽

Field Intensity ◽

Applied Voltage ◽

Electric Field Intensity ◽

Voltage Threshold ◽

Set Up ◽

Matrix Shape

The influences of different applied voltages on spinnerets and distance between spinnerets are investigated when the spinnerets are arrayed in matrix shape in electrospinning. The models of one, two, three and nine spinnerets were set up and the electric field intensity was simulated and analyzed. By experiments, the voltage thresholds of ejection at different distance, the nanofibers electrospun by different distances between the spinnerets and different voltages were explored. The experiment results show that, in some extent of distance, the electric field intensity will decrease gradually with the distance between spinnerets rising. If the tips of multi-spinneret array are in the same distance to the collector, the voltage threshold of the center spinneret is extremely high and the solution is difficult to be ejected. If the same voltage is applied on multi-spinneret array, the quality of spinning becomes worse with the applied voltage increasing, that is, the nanofibers become more chaos and their diameters increase.

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Near-Replicas of Web Pages Eliminating Repetitive Algorithms Based on MD5

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.532-533.1752 ◽

2012 ◽

Vol 532-533 ◽

pp. 1752-1756 ◽

Cited By ~ 1

Author(s):

Jun Ya Yan ◽

Xiao Hui Ma ◽

Wen Juan Zhao

Keyword(s):

Search Engine ◽

Exponential Growth ◽

Good Effect ◽

The Internet ◽

Web Pages ◽

Network Information ◽

Retrieval Efficiency ◽

The Web

The development of the internet and exponential growth of network information produce a large number of duplicated pages on the network, reducing the retrieval of recall and precision and affecting the retrieval efficiency. The accuracy of the web, therefore, influences the quality of search engine. On the basis of the structural text description, this paper proposes an improved eliminating repetitive algorithm method, which is based on MD5 of Near-replicas. It proves that the method has a good effect on improving the recall and the precision through experiment.

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Annotation: Class Size and the Quality of Educational Outcomes

Journal of Child Psychology and Psychiatry ◽

10.1017/s0021963098002819 ◽

1998 ◽

Vol 39 (6) ◽

pp. 797-804 ◽

Cited By ~ 8

Author(s):

Neville Bennett

Keyword(s):

Educational Outcomes ◽

Class Size

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Immunoferritin localization of intracellular antigens in positively stained frozen sections

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010008170x ◽

1978 ◽

Vol 36 (2) ◽

pp. 168-169

Author(s):

K. T. Tokuyasu

Keyword(s):

Surface Tension ◽

Water Surface ◽

Thin Layers ◽

The Other ◽

Positive Staining ◽

Frozen Sections ◽

The Past ◽

Ultrathin Frozen Sections ◽

Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

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Lithography below 100 nm

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100074367 ◽

1983 ◽

Vol 41 ◽

pp. 96-99

Author(s):

L. D. Jackel

Keyword(s):

Spatial Distribution ◽

Electron Beam ◽

Electron Scattering ◽

Electron Beam Lithography ◽

Substrate Material ◽

Local Electron ◽

Electron Dose ◽

Positive Resist ◽

Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

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Convergent Beam Electron Diffraction

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100070072 ◽

1978 ◽

Vol 36 (3) ◽

pp. 304-315

Author(s):

G. Lehmpfuhl

Keyword(s):

Electron Diffraction ◽

Diffraction Pattern ◽

Crystal Surface ◽

Diffraction Spot ◽

Crystal Thickness ◽

Large Area ◽

Electron Microscopic ◽

Additional Information ◽

Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

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Observability of Very Thick Specimen by Using Transmission Scanning Electron Microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100064189 ◽

1971 ◽

Vol 29 ◽

pp. 26-27

Author(s):

K. Shibatomi ◽

T. Yamanoto ◽

H. Koike

Keyword(s):

Electron Microscope ◽

Image Quality ◽

Scanning Electron Microscope ◽

Chromatic Aberration ◽

Image Contrast ◽

Objective Lens ◽

Thick Specimen ◽

Transmission Electron ◽

Scanning Electron

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.

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The Current Situation in Chemical Stabilization of Biological Materials

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100093912 ◽

1972 ◽

Vol 30 ◽

pp. 132-133

Author(s):

John H. Luft

Keyword(s):

Electron Microscopy ◽

Electron Microscope ◽

Osmium Tetroxide ◽

Molecular Level ◽

Cross Linking ◽

Chemical Stabilization ◽

Specimen Preparation ◽

Sufficient Condition ◽

Radio Telescopes

With information processing devices such as radio telescopes, microscopes or hi-fi systems, the quality of the output often is limited by distortion or noise introduced at the input stage of the device. This analogy can be extended usefully to specimen preparation for the electron microscope; fixation, which initiates the processing sequence, is the single most important step and, unfortunately, is the least well understood. Although there is an abundance of fixation mixtures recommended in the light microscopy literature, osmium tetroxide and glutaraldehyde are favored for electron microscopy. These fixatives react vigorously with proteins at the molecular level. There is clear evidence for the cross-linking of proteins both by osmium tetroxide and glutaraldehyde and cross-linking may be a necessary if not sufficient condition to define fixatives as a class.

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