Marginal Failure Diagnosed with LADA—Case Studies

2014 ◽  
Author(s):  
Sukho Lee ◽  
Keonil Kim ◽  
Yunwoo Lee ◽  
Euncheol Lee ◽  
Yojoung Kim ◽  
...  
Keyword(s):  
Case Studies ◽  
Design Methodology ◽  
Fault Location ◽  
Process Development ◽  
Early Stage ◽  
Process Technology ◽  
Root Cause ◽  
Direct Indication ◽  
Scan Chain ◽  
Device Sensitivity

Abstract During the early stage of process development, the major activities are yield ramp up with DFT test such as Memory BIST and SCAN test. There are plenty of commercial and inhouse diagnostics tools for DFT so in case of failure FA procedures are rather simple and standardized: run EDA tool, get fail location, perform pFA then feedback to process engineering. However in the case of marginal failure FA procedures are generally more complicated. FA engineer should consider many different scenarios to find the root cause. The marginal voltage fail is caused by many different reasons. The analysis of marginal fail is of course very important to screen out healthy devices and detect any problem of process technology or design methodology. In this paper, the authors deal with three marginal voltage fail case studies: scan chain fail, digital function fail and analog function fail. Throughout these case studies, LADA was successfully used to define the fault location. The reason of device alteration was well explained with further study. It is obvious that LADA is a very effective way to analyze marginal failures in cases where the FA engineer doesn’t have much design information because the results are very intuitive and clear. There is little doubt of LADA results accuracy because LADA is utilizing the tester to make an accurate Pass/Fail decision. LADA results are direct indication of device sensitivity to parametric changes, in our case voltage margin.

Interpreting Laser-Based Fault Localization Results: Case Studies

2019 ◽  
Author(s):  
Sukho Lee ◽  
John van den Biggelaar ◽  
Marc van Veenhuizen
Keyword(s):  
Case Studies ◽  
Circuit Design ◽  
High Sensitivity ◽  
Failure Behavior ◽  
Process Technology ◽  
Resistance Change ◽  
Voltage Imaging ◽  
Root Cause ◽  
First Case ◽  
Proper Interpretation

Abstract Laser-based dynamic analysis has become a very important tool for analyzing advanced process technology and complex circuit design. Thus, many good reference papers discuss high resolution, high sensitivity, and useful applications. However, proper interpretation of the measurement is important as well to understand the failure behavior and find the root cause. This paper demonstrates this importance by describing two insightful case studies with unique observations from laser voltage imaging/laser voltage probing (LVP), optical beam induced resistance change, and soft defect localization (SDL) analysis, which required an in-depth interpretation of the failure analysis (FA) results. The first case is a sawtooth LVP signal induced by a metal short. The second case, a mismatched result between an LVP and SDL analysis, is a good case of unusual LVP data induced by a very sensitive response to laser light. The two cases provide a good reference on how to properly explain FA results.

Stomatologic complications of eating disorders

2012 ◽  
Vol 153 (45) ◽  
pp. 1779-1786 ◽  
Author(s):  
Mária Resch ◽  
Ágnes Nagy
Keyword(s):  
Eating Disorders ◽  
Oral Cavity ◽  
Oral Hygiene ◽  
Early Stage ◽  
Multidisciplinary Treatment ◽  
Young Generation ◽  
Systemic Diseases ◽  
Root Cause ◽  
Multidisciplinary Nature ◽  
International Experts

Since the 1990s numerous international experts have reported about the somatic complications of eating disorders including those having a dental and stomatological nature. Several reports emphasised that deformations in the oral cavity resulting from this grave nutritional disease typical of the young generation could already appear in the early stage and, therefore, dentists are among the first to diagnose them. Dentists are still often unaware of the importance of their role in multidisciplinary treatment. Even if they knew what the disease was about and recognised it on the basis of deformations in the oral cavity in time, their advice that their patients should brush their teeth more often would fail to eliminate the root cause of the problem. Not only the earliest possible treatment of the complications of the bingeing-purging mechanism and the maintenance of oral hygiene are important, but controlling and curing pathological habits with active participation of psychiatrists are also required to ensure full recovery. Due to the multidisciplinary nature of the disease, manifold communication is required. For this reason, publishing the dental ramifications of organic and systemic diseases at dental conferences and in technical journals, as well as providing information about oral complications of eating disorders for general practitioners and specialists are particularly important. Orv. Hetil., 2012, 153, 1779–1786.

Application of KOH Electrochemical Etch and Passive Voltage Contrast Techniques for Deep Sub-Micron CMOS Leaky Gate Detection

2000 ◽  
Author(s):  
Fred Y. Chang ◽  
Victer Chan
Keyword(s):  
Case Studies ◽  
Detection Technique ◽  
Cobalt Silicide ◽  
Process Technology ◽  
Process Flow ◽  
Voltage Contrast ◽  
Emission Detection ◽  
Wet Etch ◽  
Direct Confirmation

Abstract This paper describes a novel de-process flow by combining cobalt silicide / nitride wet etch with KOH electrochemical wet etch (ECW) to identify leaky gate in silicided deep sub-micron process technology. Traditionally, leaky gate identification requires direct confirmation by gate level electrical or emission detection technique. Ohtani [1] used KOH electrochemical etch application to identify nonsilicided leaky gate capacitor in DRAM without using the above confirmation. The result of the case study demonstrates the expanded application of ECW etch to both silicided 0.18um logic and SRAM devices. Voltage contrast at metal 1 to assist leaky gate localization is also proposed. By combining both techniques, the possibility for isolating gate related defects are greatly enhanced. Case studies also show the advantages of the proposed technique over conventional poly level voltage contrast in leaky gate identification especially with devices that use local interconnect and nitride liner process.

Contamination Troubleshooting Approach from Problem to Solution

2019 ◽  
Author(s):  
Victor K. F. Chia ◽  
Hugh E. Gotts ◽  
Fuhe Li ◽  
Mark Camenzind
Keyword(s):  
Case Studies ◽  
Semiconductor Devices ◽  
Analytical Techniques ◽  
General Knowledge ◽  
Contamination Source ◽  
Root Cause ◽  
Sources Of Contamination

Abstract Semiconductor devices are sensitive to contamination that can cause product defects and product rejects. There are many possible types and sources of contamination. Root cause resolution of the contamination source can improve yield. The purpose of contamination troubleshooting is to identify and eliminate major yield limiters. This requires the use of a variety of analytical techniques[1]. Most important, it requires an understanding of the principle of contamination troubleshooting and general knowledge of analytical tests. This paper describes a contamination troubleshooting approach with case studies as examples of its application.

SEM-Based Nanoprobing on 40, 32 and 28 nm CMOS Devices Challenges for Semiconductor Failure Analysis

2013 ◽  
Author(s):  
Erik Paul ◽  
Holger Herzog ◽  
Sören Jansen ◽  
Christian Hobert ◽  
Eckhard Langer
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Failure Analysis ◽  
Case Studies ◽  
State Of The Art ◽  
Root Cause ◽  
Highly Efficient ◽  
Technology Nodes ◽  
Scanning Electron

Abstract This paper presents an effective device-level failure analysis (FA) method which uses a high-resolution low-kV Scanning Electron Microscope (SEM) in combination with an integrated state-of-the-art nanomanipulator to locate and characterize single defects in failing CMOS devices. The presented case studies utilize several FA-techniques in combination with SEM-based nanoprobing for nanometer node technologies and demonstrate how these methods are used to investigate the root cause of IC device failures. The methodology represents a highly-efficient physical failure analysis flow for 28nm and larger technology nodes.

Application of AFP in Resolving Systematic Issue in Wafer Fabrication

2013 ◽  
Author(s):  
Hui Peng Ng ◽  
Ghim Boon Ang ◽  
Chang Qing Chen ◽  
Alfred Quah ◽  
Angela Teo ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Case Studies ◽  
Failure Mechanisms ◽  
Critical Role ◽  
Electrical Characterization ◽  
Process Technology ◽  
Atomic Force ◽  
Defect Localization ◽  
Non Volatile Memory ◽  
Visual Failure

Abstract With the evolution of advanced process technology, failure analysis is becoming much more challenging and difficult particularly with an increase in more erratic defect types arising from non-visual failure mechanisms. Conventional FA techniques work well in failure analysis on defectively related issue. However, for soft defect localization such as S/D leakage or short due to design related, it may not be simple to identify it. AFP and its applications have been successfully engaged to overcome such shortcoming, In this paper, two case studies on systematic issues due to soft failures were discussed to illustrate the AFP critical role in current failure analysis field on these areas. In other words, these two case studies will demonstrate how Atomic Force Probing combined with Scanning Capacitance Microscopy were used to characterize failing transistors in non-volatile memory, identify possible failure mechanisms and enable device/ process engineers to make adjustment on process based on the electrical characterization result. [1]

Respect for the Environment is Part of Competitiveness - Best Available Technology Applied to an Old Pulp Mill at Kaskinen

1999 ◽  
Vol 40 (11-12) ◽  
pp. 201-206
Author(s):  
I. Reilama ◽  
N. Ilomäki
Keyword(s):  
Process Development ◽  
Continuous Production ◽  
Production Capacity ◽  
Pulp Mill ◽  
Process Technology ◽  
Line Production ◽  
Nutrient Emissions ◽  
Best Available Technology ◽  
Available Technology ◽  
Process Solutions

Oy Metsä-Botnia Ab's Kaskinen mill produces ECF and TCF bleached softwood and hardwood pulp on a single continuous production line. Production capacity has been raised from 250,000 tonnes to 420,000 tonnes a year after the commission in 1977. The basic process solutions date mainly from the 1970s. However, process technology has been gradually modernised. With systematic and well-timed process development investments the mill has remained competitive and among frontrunners in terms of environmental protection. Today, Kaskinen represent the best available technology (BAT) applicable to old mills. Effluent loading in general and nutrient emissions in particular has diminished during the development projects of the mill. Comparison to other mills shows that as far as effluent emissions are concerned, Kaskinen is one of the best pulp mills in Finland and Scandinavia. In this presentation, Kaskinen is also compared to Metsä-Rauma, the first greenfield TCF mill in the world, which was started up in 1996. Kaskinen's pioneering work on TCF technology was used as a basis for process solutions in the Rauma greenfield project.

Introduction

2017 ◽  
Author(s):  
Penny Farfan
Keyword(s):  
Case Studies ◽  
Early Stage ◽  
Sexual Norms ◽  
Sexual Identities ◽  
Precise Understanding ◽  
Central Argument ◽  
Late Nineteenth ◽  
The Well Of Loneliness

This introduction sets forth the book’s central argument and establishes the historical, theoretical, and critical context for its case studies. In the late nineteenth and early twentieth centuries, modern sexual identities emerged into view while at the same time being rendered invisible, as in Oscar Wilde’s 1895 trial on charges of gross indecency and the 1928 obscenity trial of Radclyffe Hall’s The Well of Loneliness. Early stage representations of homosexuality were typically coded or censored, yet the majority of the works considered in this book were highly visible in their subversions of conventional gender and sexual norms. Queer readings of these plays and performances establish connections across high and popular cultural domains, demonstrating that some of traditional modernism’s perceived failures, rejects, and outliers were modernist through their sexual dissidence. These insights in turn contribute to a more precise understanding of how modernity was mediated and how such mediations enacted change.

New Product Development Practices and Early-Stage Firms: Two In-Depth Case Studies

2012 ◽  
Vol 29 (4) ◽  
pp. 639-654 ◽  
Author(s):  
Tucker J. Marion ◽  
John H. Friar ◽  
Timothy W. Simpson
Keyword(s):  
Product Development ◽  
Case Studies ◽  
New Product Development ◽  
Early Stage ◽  
New Product

scholarly journals High-throughput microbioreactor provides a capable tool for early stage bioprocess development

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Mathias Fink ◽  
Monika Cserjan-Puschmann ◽  
Daniela Reinisch ◽  
Gerald Striedner
Keyword(s):  
High Throughput ◽  
Process Development ◽  
Early Stage ◽  
Explanatory Power ◽  
Batch Mode ◽  
E Coli ◽  
Speed Up ◽  
Bioreactor System ◽  
Cell Densities ◽  
Microbial Systems

AbstractTremendous advancements in cell and protein engineering methodologies and bioinformatics have led to a vast increase in bacterial production clones and recombinant protein variants to be screened and evaluated. Consequently, an urgent need exists for efficient high-throughput (HTP) screening approaches to improve the efficiency in early process development as a basis to speed-up all subsequent steps in the course of process design and engineering. In this study, we selected the BioLector micro-bioreactor (µ-bioreactor) system as an HTP cultivation platform to screen E. coli expression clones producing representative protein candidates for biopharmaceutical applications. We evaluated the extent to which generated clones and condition screening results were transferable and comparable to results from fully controlled bioreactor systems operated in fed-batch mode at moderate or high cell densities. Direct comparison of 22 different production clones showed great transferability. We observed the same growth and expression characteristics, and identical clone rankings except one host-Fab-leader combination. This outcome demonstrates the explanatory power of HTP µ-bioreactor data and the suitability of this platform as a screening tool in upstream development of microbial systems. Fast, reliable, and transferable screening data significantly reduce experiments in fully controlled bioreactor systems and accelerate process development at lower cost.

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