Advanced 3D eWLB-SiP (embedded Wafer Level Ball Grid Array – System in Package) Technology

2017 ◽  
Vol 2017 (DPC) ◽  
pp. 1-20
Author(s):  
Seung Wook Yoon
Keyword(s):  
Form Factor ◽  
Power Efficiency ◽  
High Performance ◽  
Electrical Characterization ◽  
Cost Effective ◽  
Electrical Performance ◽  
Wearable Electronics ◽  
Wafer Level ◽  
Low Profile ◽  
Line Spacing

FO-WLP (Fan-Out Wafer Level Packaging) has been established as one of the most versatile packaging technologies in the recent past and is already accounting for a market value of over 1 billion USD due to its unique advantages. The technology combines high performance, increased functionality with a high potential for heterogeneous integration and reduce the total form factor as well as cost-effectiveness. The emerging of advanced of silicon node technology down to 10 nanometer (nm) in support of higher performance, bandwidth and better power efficiency in mobile products pushes the boundaries of emerging packaging technologies to smaller form-factor packaging designs with finer line/spacing as well as improved thermal electrical/performance and integration of SiP or 3D capabilities. Advanced eWLB FO-WLP technology provides a versatile platform for the semiconductor industry's technology evolution from single or multi-die 2D package designs to 2.5D interposers and 3D System-in-Package (SiP) configurations. This paper reports developments that extend multi-die and 3D SiP applications with eWLB technology, including ultra thin devices or/and with an interposer substrate attachment. Test vehicles have been designed and fabricated to demonstrate and characterize integrated packaging solutions for network, mobile products including IoT and wearable electronics. The test vehicles have ranged from ~30mm2 to large sizes up to ~230mm2 and 0.4mm ball pitch. Assembly process details including 3D vertical interconnect, laser ablation, RDL processes and mechanical reliability characterizations are to be discussed with component and board level reliability results. In addition, warpage behavior and the PoP stacking process will also be presented. Innovative structure optimization that provides dual advantages of both height reduction and enhanced package reliability are reported. To enable higher interconnection density and signal routing, packages with multiple redistribution layers (RDL) and fine line/width spacing are fabricated and implemented on the eWLB platform. Successful reliability and electrical characterization results on multi-die and 3D eWLB-SiP configurations are reported as an enabling technology for highly integrated, miniaturized, low profile and cost effective solutions.

A Lithography-Based Compliant Chip-to-Substrate Wafer-Level Interconnect

2002 ◽  
Author(s):  
Qi Zhu ◽  
Lunyu Ma ◽  
Suresh K. Sitaraman
Keyword(s):  
High Performance ◽  
Coefficient Of Thermal Expansion ◽  
Low Cost ◽  
Optimization Technique ◽  
Cost Effective ◽  
Organic Substrate ◽  
Electrical Performance ◽  
Wafer Level ◽  
Good Reliability ◽  
Mechanical Compliance

As the rapid advances in IC design and fabrication continue to challenge and push the electronic packaging technology, in terms of fine pitch, high performance, low cost, and good reliability, compliant interconnects show great advantages for next-generation packaging. β-fly is designed as a compliant chip-to-substrate interconnect for performing wafer-level probing and for packaging without underfill. β-fly has good compliance in all directions to compensate the coefficient of thermal expansion (CTE) mismatch between the silicon die and an organic substrate. The fabrication of β-fly is similar to standard IC fabrication, and wafer-level packaging makes it cost effective. In this work, self-weight effect and stress distribution under planar displacement loading of β-fly is studied. The effect of geometry parameters on mechanical and electrical performance of β-fly is also studied. β-fly with thinner and narrower arcuate beams with larger radius and taller post is found to have better mechanical compliance. In addition to mechanical compliance, electrical characteristics of β-fly have also been studied in this work. However, it is found that structures with excellent mechanical compliance cannot have good electrical performance. Therefore, a trade off is needed for the design of β-fly. Response surface methodology and an optimization technique have been used to select the optimal β-fly structure parameters.

Innovative Integration Solutions for SiP Packages Using Fan-Out Wafer Level eWLB Technology

2017 ◽  
Vol 2017 (1) ◽  
pp. 000263-000269 ◽  
Author(s):  
Jacinta Aman Lim ◽  
Vinayak Pandey
Keyword(s):  
Form Factor ◽  
Line Width ◽  
Graphics Processing Units ◽  
Power Efficiency ◽  
Building Blocks ◽  
Electrical Performance ◽  
Rf Power Amplifiers ◽  
Wafer Level ◽  
Central Processing ◽  
Wafer Level Packaging

Abstract Fan-Out Wafer Level Packaging (FOWLP) has been established as one of the most versatile packaging technologies in the recent past and already accounts for a market value of over 1 billion USD due to its unique advantages. The technology combines high performance, increased functionality with a high potential for heterogeneous integration and reduced overall form factor as well as cost effectiveness. The increasing complexities in achieving a higher degree of performance, bandwidth and better power efficiency in various markets are pushing the boundaries of emerging packaging technologies to smaller form factor packaging designs with finer line/width spacing as well as improved thermal/electrical performance and the integration of System-in-Package (SiP) or 3D capabilities. SiP technology has been evolving through utilization of various package technology building blocks to serve the market needs with respect to miniaturization, higher integration, and smaller form factor as cited above, with the added benefits of lower cost and faster time to market as compared to silicon (Si) level integration, which is commonly called system-on-chip or SoC. As such, SiP incorporates flip chip (FC), wire bond (WB), and fan-out wafer-level packaging (FOWLP) as its technology building blocks and serves various end applications ranging from radio frequency (RF), power amplifiers (PA), Micro-Electro-Mechanical-Systems (MEMS) and Sensors, and connectivity, to more advanced application processors (AP), and other logic devices such as graphics processing units (GPUs)/central processing units (CPUs). FOWLP, also referred to as advanced embedded Wafer Level Ball Grid Array (eWLB) technology, provides a versatile platform for the semiconductor industry's technology evolution from single or multi-die 2D package designs to 2.5D interposers and 3D SiP configurations. This paper presents developments in SiP applications with eWLB/Fan-out WLP technology, integration of various functional blocks such as wire bonding, Package-on-Package (PoP), 2.5D, 3D, smaller form factor, embedded passives, multiple redistribution layer routing and z-height reduction. Test vehicles have been designed and fabricated to demonstrate and characterize these low profile and integrated packaging solutions for mobile products including Internet of Things (IoT)/wearable electronics (WE), MEMS and sensors. Finer line/width spacing of 2/2mm with multiple redistribution layers (RDL) are fabricated and implemented on the eWLB platform to enable higher interconnect density and signal routing. Assembly process details, component level reliability, board level reliability and characterization results for eWLB SiP will be discussed.

scholarly journals Design and Demonstration of Glass Panel Embedding for 3D System Packages for Heterogeneous Integration Applications

2019 ◽  
Vol 16 (3) ◽  
pp. 124-135 ◽  
Author(s):  
Siddharth Ravichandran ◽  
Shuhei Yamada ◽  
Tomonori Ogawa ◽  
Tailong Shi ◽  
Fuhan Liu ◽  
...  
Keyword(s):  
Form Factor ◽  
High Performance ◽  
Coefficient Of Thermal Expansion ◽  
Large Body ◽  
Electrical Performance ◽  
Heterogeneous Integration ◽  
Wafer Level ◽  
Glass Panel ◽  
Packaging Technology ◽  
3D Packaging

Abstract This article demonstrates a next-generation high-performance 3D packaging technology with smaller form factor, excellent electrical performance, and reliability for heterogeneous integration. High-density logic-memory integration, today, is built predominantly using interposers which are fundamentally limited in assembly pitch and interconnect lengths, and they also are expensive as the package sizes increase. On the other hand, high-frequency applications continue to use laminates which are also limited by package size and ability to integrate many components. Wafer-level fan-out (WLFO) packaging promises better performance and form factor at lower costs, but current WLFO packages are mold-based and hence are limited to small packages. This article presents a 3D packaging technology using glass panel embedding (GPE) for high-performance with potential for large body size heterogeneous integration applications. The tailorable coefficient of thermal expansion of glass allows a reliable direct board attach of large GPE packages that not only benefits the form factor and signal speed but also provides radical benefits to power delivery. Unlike interposers and silicon bridges, GPE packages are not bump-limited and can support I/O densities comparable with backend-of-line with silicon-like redistribution wiring at much lower costs. The fundamental limitations such as die shift and poor dimensional stability of current organic WLFO packages are addressed by parametric process improvements to reduce die shift to <2 μm while also improving the RDL surface planarity for high-yielding fine-line structures and integrating through glass via (TGV) in the fan-out region for 3D packaging. This article describes the fabrication process for 3D GPE, leading to demonstration of a technology using embedding of chips with all-Cu interconnections at 40-μm I/O pitch with TGVs at 300-μm pitch, thus enabling double-side RDL and assembly of chips to achieve three levels of device integration.

Electrical Characterization on a High-Speed Wafer-Level Package

2013 ◽  
Vol 2013 (DPC) ◽  
pp. 001937-001962
Author(s):  
Kai Liu ◽  
YongTaek Lee ◽  
HyunTai Kim ◽  
MaPhooPwint Hlaing ◽  
Susan Park ◽  
...  
Keyword(s):  
High Speed ◽  
Unit Length ◽  
Ground Plane ◽  
Measurement Data ◽  
Electrical Characterization ◽  
Electrical Performance ◽  
Metal Loss ◽  
Signal Loss ◽  
Wafer Level ◽  
Wafer Level Package

In this paper, a 2-layer eWLB (embedded Wafer-Level BGA) is studied and its performance is compared with an equivalent 4-layer laminate package. Since eWLB package is processed by using lithographical method, design rules on width (W) and spacing (S) are much finer (usually 2–3 times finer) than those for laminate package. In other words, signal traces can be implemented in smaller fan-out regions. The smaller feature sizes for signal traces would end up with more metal loss per unit length. But as the signal traces can be implemented in smaller fan-out regions, overall trace-routing may be shorter, and equivalent insertion-loss may be achieved. In eWLB, the ground plane is closer to the signal traces. This actually helps to reduce cross-talk between wide I/O buses, as the electrical field is contained in a smaller region by the closer ground plane. Another key advantage from wafer-level package is a smoother metal surface, which greatly reduces the extra signal loss, due to surface-roughness effect, especially for higher-frequency and higher-speed applications. In addition, through-via structures for wafer-level package are typically 2–3 times smaller. This allows to implement power/ground planes in a more continuous way, achieving better resistance and inductance for power/ground nets. Overall electrical performance, which takes into account of all the impacts above, can be evaluated by signal-integrity analysis (E-diagram). Measurement data of a 2-layer eWLB package for a LPDDR application will be presented, which shows the comparable performance typically obtained from a 4-layer laminate package

Cost Effective and High Performance 28nm FPGA with New Disruptive Silicon-Less Interconnect Technology (SLIT)

2014 ◽  
Vol 2014 (1) ◽  
pp. 000599-000605 ◽  
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Process Integration ◽  
Cost Effective ◽  
Disruptive Innovation ◽  
Design Rule ◽  
Wind Condition ◽  
Silicon Etching ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This paper introduces the first comprehensive demonstration of new disruptive innovation technology comprising multiple Xilinx patent-pending innovations for highly cost effective and high performance Xilinx FPGA, which is so called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex® -7 2000T FPGA product. Chip-to-Wafer stacking, wafer level flux cleaning, micro-bump underfilling, mold encapsulation are newly developed. Of all technology elements, both full silicon etching with high etch selectivity to dielectric/fast etch rate and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. In order to manage the wafer warpage after full Si removal, a couple of knobs are identified and employed such as top reinforcement layer, micro-bump underfill properties tuning, die thickness/die-to-die space/total thickness adjustments. It's also discussed in the paper how the wafer warpage behaves and how the wafer warpge is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ~ −40 μm at room temperature for 25 mm × 31 mm in size and +20 μm ~ +25 μm at reflow temperature. Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T FCBGA package using TSV interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

New Stacked Die Interconnect Technology for High-Performance and Low-Cost FPGA

2015 ◽  
Vol 12 (3) ◽  
pp. 111-117
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Integration ◽  
Cost Effective ◽  
Design Rule ◽  
Innovative Technology ◽  
Wind Condition ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This article introduces the first comprehensive demonstration of new innovative technology comprising multiple key technologies for highly cost-effective and high-performance Xilinx field programmable gate array (FPGA), which is so-called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex®-7 2000T FPGA product with chip-to-wafer stacking, wafer-level flux cleaning, microbump underfilling, mold encapsulation, and backside silicon removal. Of all technology elements, both full silicon removal process with faster etching and no dielectric layer damage and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. To manage the wafer warpage after full Si removal, a couple of knobs are identified and used such as top reinforcement layer, microbump underfill properties tuning, die thickness, die-to-die space, and total thickness adjustments. It is also discussed in the article how the wafer warpage behaves and how the wafer warpage is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ∼ −40 μm at room temperature (25°C) for 25 mm × 31 mm in size and +20 μm ∼ +25 μm at reflow temperature (250°C). Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T flip-chip ball grid array (FC-BGA) package using through silicon via interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

scholarly journals Deposition Time and Annealing Effects of ZnO Seed Layer on Enhancing Vertical Alignment of Piezoelectric ZnO Nanowires

Chemosensors ◽  
2019 ◽  
Vol 7 (1) ◽  
pp. 7 ◽  
Author(s):  
Taoufik Slimani Tlemcani ◽  
Camille Justeau ◽  
Kevin Nadaud ◽  
Guylaine Poulin-Vittrant ◽  
Daniel Alquier
Keyword(s):  
High Performance ◽  
Deposition Time ◽  
Mechanical Energy ◽  
Annealing Treatment ◽  
Cost Effective ◽  
Zno Nanowires ◽  
Wearable Electronics ◽  
Si Substrates ◽  
Radio Frequency Sputtering ◽  
Seed Layers

Well aligned crystalline zinc oxide (ZnO) nanowires (NWs) on ZnO/Au/Ti/Si substrates were grown by so-called “hydrothermal synthesis”. ZnO seed layers with different thicknesses ranging from 5 to 100 nm, achieved by controlling the deposition time, were prepared by radio-frequency sputtering, followed by a post-annealing treatment in air at 400 °C. The effects of deposition time and annealing treatment of ZnO seed layers on the subsequent growth of ZnO NWs were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM), and scanning electron microscopy (SEM). The experimental results reveal that the quality and growth behaviors of ZnO NWs are strongly dependent on both the thickness and the heat treatment of the ZnO seed layers. This work is an optimization step of an easy, cost-effective, and industrially scalable process flow recently developed for the fabrication of a high performance, nanocomposite-based stretchable nanogenerator (SNG) on polydimethylsiloxane (PDMS) substrate. The morphological improvement of hydrothermally grown ZnO NWs may therefore lead to higher performance SNGs for the targeted application of mechanical energy harvesting, in order to supply flexible and wearable electronics.

Extending WLCSP Packaging Technology Capabilities to Enable Miniaturized Sensor and MEMS Packaging Applications

2016 ◽  
Vol 2016 (DPC) ◽  
pp. 000397-000420
Author(s):  
Ted Tessier
Keyword(s):  
Smart Phone ◽  
Cost Effective ◽  
Wearable Electronics ◽  
Wafer Level ◽  
Technology Infrastructure ◽  
Sensor Applications ◽  
Mems Sensor ◽  
Sensing Applications ◽  
Communication Devices ◽  
Multiple Sensor

WLCSP has been widely deployed in portable computing and communication devices for efficient die level packaging of integrated semiconductor and integrated passive applications. More recently with the proliferation of smart phone capabilities and applications as well as the emergence of Internet of Things and Wearable Electronics, MEMS and sensor devices in minimized package formats have become increasingly pervasive. These include image sensors, light sensors, finger print sensors as well as accelerometer, gyroscope and other MEMS motion sensing devices. It is predicted that the widespread adoption of WLCSP packaging for sensing applications will accelerate the proliferation of the incorporation of multiple sensor technologies within future communication devices. A number of these MEMS/Sensor applications have been able to leverage the existing WLCSP technology infrastructure and has led to opportunities to packaging and cost-effective standardization and miniaturization. On the other hand, some significant new changes to WLCSP process flows have also emerged that have had to be addressed. This paper will provide an overview of MEMS and Sensor applications that are currently or will use 2D, 2.5D or 3D wafer level packaging formats. Process enhancements including the ability to process thinner substrates with the adoption of temporary carrier technologies will also be highlighted.

CoC (Chip on Chip) or FtoF (Face to Face) - PossumTM Technology for 3D MEMS and ASIC eliminating the need of TSV or Wire Bonding

2013 ◽  
Vol 2013 (DPC) ◽  
pp. 000916-000936
Author(s):  
Jemmy Sutanto ◽  
D. H. Kang ◽  
J. H. Yoon ◽  
K. S. Oh ◽  
Michael Oh ◽  
...  
Keyword(s):  
Form Factor ◽  
System Integration ◽  
Wire Bonding ◽  
Electrical Performance ◽  
Wafer Level ◽  
3D Integration ◽  
Face To Face ◽  
Parasitic Resistance ◽  
On Chip ◽  
Packaging Cost

This paper describes the ongoing 3 years research and development at Amkor Technology on CoC (Chip on Chip)/FtF (Face to Face) – PossumTM technology. This technology has showed a lot of interests from the microelectronics customers/industries because of its various advantages, which include a) providing smaller form factor (SFF) to the final package, b) more functionalities (dies) can be incorporated/assembled in one package, c) improving the electrical performance - including lower parasitic resistance, lower power, and higher frequency bandwidth, and d) Opportunity for lower cost 3D system integration. Unlike other 3D Packaging technology (e.g. using TSV (Through Silicon Vias)) that requires some works in the front stream (wafer foundry) level, needs new capitals for machines/equipments, and needs modified assembly lines; CoC/FtF technology uses the existing flip Chip Attach (C/A) or TC (Thermal Compression) equipment/machine to perform the assembly joint between the two dies, which are named as the mother (larger) die and the daughter (smaller) die. Furthermore, the cost to assemble CoC/FtF is relatively inexpensive while the applications are very wide and endless, which include the 3D integration of MEMS and ASIC. The current MEMS packaging and test cost contributes about 35 to 45% to the overall MEMS unit cost. WLC (Wafer Level Capping) with wire bonding have been widely used for mass production for accelerometer (e.g. ADI and Motorola), gyroscope (e.g. Bosch and Invensense), and oscillator /timer (e.g. Discera). The WLC produce drawbacks of a large form factor and the increase in the capacitive and electrical resistances. Currently, the industries have been developing a new approach of 3D WLP (Wafer Level Packaging) by using a) TSV MEMS cap with wire bonding (e.g. Discera), b) TSV MAME cap with solder bump (e.g. Samsung, IMEC, and VTI), and c) TSV MEMS wafer/die with cap (e.g. Silex Microsystems). The needs of TSVs in the 3D WLP will add the packaging cost and reduce the design flexibility is pre-TSV wafer is used. “Amkor CoC/FtoF – PossumTM” is an alternative technology for 3D integration of MEMS and ASIC. CoC/FtoF – PossumTM does not require TSV or wire bonding; Miniaturizing form factor of 1.5 mm x 1.5 mm x 0.95 mm (including the package) of MEMS and ASIC can be achieved by using CoC/FtoF – PossumTM while Discera's design of 3D WLP requires substrate size > 2 mm x 2 mm. CoC/FtoF – PossumTM will likely produce packaging cost which is lower than WLC or 3D WLP – TSV at the same time the customer is benefited from smaller FF and reduced electrical/parasitic resistance. CoC/FtoF – PossumTM can be applied to any substrates including FCBGA and laminate. This technology also can be applied to package multiple MEMS microsensors, together with ASIC, microcontroller, and wireless RF to realize the 3D system integration.

Ultra Fine Pitch RDL Development in Multi-layer eWLB (embedded Wafer Level BGA) Packages

2015 ◽  
Vol 2015 (1) ◽  
pp. 000822-000826 ◽  
Author(s):  
Won Kyoung Choi ◽  
Duk Ju Na ◽  
Kyaw Oo Aung ◽  
Andy Yong ◽  
Jaesik Lee ◽  
...  
Keyword(s):  
High Performance ◽  
Process Development ◽  
Cost Effective ◽  
Access Point ◽  
Data Access ◽  
Memory Device ◽  
Logic Device ◽  
Wafer Level ◽  
Component Level ◽  
Fine Pitch

The market for portable and mobile data access devices connected to a virtual cloud access point is exploding and driving increased functional convergence as well as increased packaging complexity and sophistication. This is creating unprecedented demand for higher input/output (I/O) density, higher bandwidths and low power consumption in smaller package sizes. There are exciting interconnect technologies in wafer level packaging such as eWLB (embedded Wafer Level Ball Grid Array), 2.5D interposers, thin PoP (Package-on-Package) and TSV (Through Silicon Via) interposer solutions to meet these needs. eWLB technologies with the ability to extend the package size beyond the area of the chip are leading the way to the next level of high density, thin packaging capability. eWLB provides a robust packaging platform supporting very dense interconnection and routing of multiple die in very reliable, low profile, low warpage 2.5D and 3D solutions. The use of these embedded eWLB packages in a side-by-side configuration to replace a stacked package configuration is critical to enable a more cost effective mobile market capability. Combining the analog or memory device with digital logic device in a semiconductor package can provide an optimum solution for achieving the best performance in thin, multiple-die integration aimed at very high performance. This paper highlights the rapidly moving trend towards eWLB packaging technologies with ultra fine 2/2μm line width and line spacing and multi-layer RDL. A package design study, process development and optimization, and mechanical characterization will be discussed as well as test vehicle preparation. JEDEC component level reliability test results will also be presented.

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