Cost Effective and High Performance 28nm FPGA with New Disruptive Silicon-Less Interconnect Technology (SLIT)

2014 ◽  
Vol 2014 (1) ◽  
pp. 000599-000605 ◽  
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Process Integration ◽  
Cost Effective ◽  
Disruptive Innovation ◽  
Design Rule ◽  
Wind Condition ◽  
Silicon Etching ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This paper introduces the first comprehensive demonstration of new disruptive innovation technology comprising multiple Xilinx patent-pending innovations for highly cost effective and high performance Xilinx FPGA, which is so called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex® -7 2000T FPGA product. Chip-to-Wafer stacking, wafer level flux cleaning, micro-bump underfilling, mold encapsulation are newly developed. Of all technology elements, both full silicon etching with high etch selectivity to dielectric/fast etch rate and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. In order to manage the wafer warpage after full Si removal, a couple of knobs are identified and employed such as top reinforcement layer, micro-bump underfill properties tuning, die thickness/die-to-die space/total thickness adjustments. It's also discussed in the paper how the wafer warpage behaves and how the wafer warpge is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ~ −40 μm at room temperature for 25 mm × 31 mm in size and +20 μm ~ +25 μm at reflow temperature. Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T FCBGA package using TSV interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

New Stacked Die Interconnect Technology for High-Performance and Low-Cost FPGA

2015 ◽  
Vol 12 (3) ◽  
pp. 111-117
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Integration ◽  
Cost Effective ◽  
Design Rule ◽  
Innovative Technology ◽  
Wind Condition ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This article introduces the first comprehensive demonstration of new innovative technology comprising multiple key technologies for highly cost-effective and high-performance Xilinx field programmable gate array (FPGA), which is so-called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex®-7 2000T FPGA product with chip-to-wafer stacking, wafer-level flux cleaning, microbump underfilling, mold encapsulation, and backside silicon removal. Of all technology elements, both full silicon removal process with faster etching and no dielectric layer damage and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. To manage the wafer warpage after full Si removal, a couple of knobs are identified and used such as top reinforcement layer, microbump underfill properties tuning, die thickness, die-to-die space, and total thickness adjustments. It is also discussed in the article how the wafer warpage behaves and how the wafer warpage is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ∼ −40 μm at room temperature (25°C) for 25 mm × 31 mm in size and +20 μm ∼ +25 μm at reflow temperature (250°C). Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T flip-chip ball grid array (FC-BGA) package using through silicon via interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

Journey Toward Process Convergence in TSV Technology

2010 ◽  
Vol 2010 (DPC) ◽  
pp. 001282-001321
Author(s):  
Sesh Ramaswami ◽  
John Dukovic
Keyword(s):  
Process Integration ◽  
Semiconductor Industry ◽  
Rapid Development ◽  
Chemical Mechanical Planarization ◽  
Cost Effective ◽  
Superior Performance ◽  
Wafer Level ◽  
Unit Process ◽  
Integration Schemes ◽  
Process Convergence

Continuous demand for more advanced electronic devices with higher functionality and superior performance in smaller packages is driving the semiconductor industry to develop new and more advanced 3D wafer-level interconnect technologies involving TSVs (through-silicon vias). The TSVs are created either on full-thickness wafer from the wafer front-side ¡V as part of wafer-fab processing during Middle-Of-Line (¡§via middle¡¨) or Back-End-Of-Line (¡§via last BEOL¡¨) ¡V or from the wafer backside after wafer thinning (¡§via last backside¡¨). Independent of the specific approach, the main steps include via etching, lining with insulator, copper barrier/seed deposition, via fill, and chemical mechanical planarization (CMP). Over the past year, the industry has been converging toward some primary unit processes and integration schemes for creating the TSVs. A common cost-of-ownership framework has also begun to emerge. Active collaboration underway among equipment suppliers, materials providers and end users is bringing about rapid development and validation of cost-effective TSV technology in end products. This presentation will address unit-process and integration challenges of TSV fabrication in the context of 20x100ƒÝm and 5x50ƒÝm baseline process flows at Applied Materials. Highlights of wafer-backside process integration involving wafers bonded to silicon or glass carriers will also be discussed.

A Lithography-Based Compliant Chip-to-Substrate Wafer-Level Interconnect

2002 ◽  
Author(s):  
Qi Zhu ◽  
Lunyu Ma ◽  
Suresh K. Sitaraman
Keyword(s):  
High Performance ◽  
Coefficient Of Thermal Expansion ◽  
Low Cost ◽  
Optimization Technique ◽  
Cost Effective ◽  
Organic Substrate ◽  
Electrical Performance ◽  
Wafer Level ◽  
Good Reliability ◽  
Mechanical Compliance

As the rapid advances in IC design and fabrication continue to challenge and push the electronic packaging technology, in terms of fine pitch, high performance, low cost, and good reliability, compliant interconnects show great advantages for next-generation packaging. β-fly is designed as a compliant chip-to-substrate interconnect for performing wafer-level probing and for packaging without underfill. β-fly has good compliance in all directions to compensate the coefficient of thermal expansion (CTE) mismatch between the silicon die and an organic substrate. The fabrication of β-fly is similar to standard IC fabrication, and wafer-level packaging makes it cost effective. In this work, self-weight effect and stress distribution under planar displacement loading of β-fly is studied. The effect of geometry parameters on mechanical and electrical performance of β-fly is also studied. β-fly with thinner and narrower arcuate beams with larger radius and taller post is found to have better mechanical compliance. In addition to mechanical compliance, electrical characteristics of β-fly have also been studied in this work. However, it is found that structures with excellent mechanical compliance cannot have good electrical performance. Therefore, a trade off is needed for the design of β-fly. Response surface methodology and an optimization technique have been used to select the optimal β-fly structure parameters.

Ultra Fine Pitch RDL Development in Multi-layer eWLB (embedded Wafer Level BGA) Packages

2015 ◽  
Vol 2015 (1) ◽  
pp. 000822-000826 ◽  
Author(s):  
Won Kyoung Choi ◽  
Duk Ju Na ◽  
Kyaw Oo Aung ◽  
Andy Yong ◽  
Jaesik Lee ◽  
...  
Keyword(s):  
High Performance ◽  
Process Development ◽  
Cost Effective ◽  
Access Point ◽  
Data Access ◽  
Memory Device ◽  
Logic Device ◽  
Wafer Level ◽  
Component Level ◽  
Fine Pitch

The market for portable and mobile data access devices connected to a virtual cloud access point is exploding and driving increased functional convergence as well as increased packaging complexity and sophistication. This is creating unprecedented demand for higher input/output (I/O) density, higher bandwidths and low power consumption in smaller package sizes. There are exciting interconnect technologies in wafer level packaging such as eWLB (embedded Wafer Level Ball Grid Array), 2.5D interposers, thin PoP (Package-on-Package) and TSV (Through Silicon Via) interposer solutions to meet these needs. eWLB technologies with the ability to extend the package size beyond the area of the chip are leading the way to the next level of high density, thin packaging capability. eWLB provides a robust packaging platform supporting very dense interconnection and routing of multiple die in very reliable, low profile, low warpage 2.5D and 3D solutions. The use of these embedded eWLB packages in a side-by-side configuration to replace a stacked package configuration is critical to enable a more cost effective mobile market capability. Combining the analog or memory device with digital logic device in a semiconductor package can provide an optimum solution for achieving the best performance in thin, multiple-die integration aimed at very high performance. This paper highlights the rapidly moving trend towards eWLB packaging technologies with ultra fine 2/2μm line width and line spacing and multi-layer RDL. A package design study, process development and optimization, and mechanical characterization will be discussed as well as test vehicle preparation. JEDEC component level reliability test results will also be presented.

Optimization of laser release layer, glass carrier, and organic build-up layer to enable RDL-first fan-out wafer-level packaging

2016 ◽  
Vol 2016 (1) ◽  
pp. 000190-000195 ◽  
Author(s):  
Alvin Lee ◽  
Jay Su ◽  
Baron Huang ◽  
Ram Trichur ◽  
Dongshun Bai ◽  
...  
Keyword(s):  
High Speed ◽  
Process Integration ◽  
Cost Effective ◽  
Wafer Level ◽  
Molding Compound ◽  
Fine Line ◽  
Glass Substrates ◽  
Laser Ablation Process ◽  
Wafer Level Packaging ◽  
Increasing Demand

Abstract With increasing demand for mobile devices to be lighter and thinner and consume less power while operating at high speed and high bandwidth, many equipment suppliers and assembly participants have invested great efforts to achieve fine-line fan-out wafer-level packaging (FOWLP). However, the inherent warp of reconstituted wafers, which can contribute to poor die placement accuracy and/or delamination at the interface of the build-up layer and carrier, remains a major challenge. In this study, the interactions among laser release layer, glass carrier, and build-up layer were evaluated for optimization of redistribution layer (RDL)–first FOWLP as a foundation to move toward fine-line FOWLP. In this study, a series of experiments incorporating glass carrier, laser release layer, and build-up layers were carried out to determine the optimal setup for RDL-first FOWLP. First, glass carriers (300 mm × 300 mm × 0.7 mm) with coefficients of thermal expansion of 3 and 8 ppm/°C were treated with 150-nm laser release layers. After deposition of 0.1 μm of sacrificial material on the glass carrier, 8-μm build-up layers were coated and patterned by lithography to electroplate Cu interconnections with a density of approximately 10% of the surface area. Subsequent to die attachment, molding compound was applied on top to form a 200-μm protective overcoat. The reconstituted wafer was then separated from the glass carrier through a laser ablation process using a 308-nm laser to complete the design of experiments (DOE). An experiment to study the correlation of glass carrier, laser release layer, build-up layers, and molding compound in RDL-first FOWLP processes is discussed to address full process integration on 300-mm glass substrates. The combination of glass carrier, laser release layer, build-up layer, and molding compound will pave the way for realizing cost-effective RDL-first FOWLP on panel-size substrates.

SiPs in the medical domain and in the defense and industrial domain produced with WDoDTM technology

2015 ◽  
Vol 2015 (DPC) ◽  
pp. 000143-000181
Author(s):  
Pascal COUDERC ◽  
Jérôme NOIRAY
Keyword(s):  
High Performance ◽  
Process Integration ◽  
New Technology ◽  
Three Dimensional ◽  
Integrated System ◽  
Electrical Performance ◽  
Integration Scheme ◽  
Disruptive Technology ◽  
Wafer Level ◽  
Wafer Processing

Based on Wire free Die on Die disruptive technology (WDoDTM), complex SiPs can be manufactured in a small factor package size. Stacking known good rebuilt wafers allows high yields while integrating high performance devices (1). Wafer processing is done with e-WLB technology and a specific redistribution layer (RDL) is designed to match with 3D PLUS bus metal edge interconnect technology. 300 mm rebuilt wafers are processed and thinned down to 200 μm before stacking and polymer bonding. Bonding alignment is within ±5 μm allowing small lateral pitches demonstrating WDoDTM versatility with denser IO products such as FPGA. Besides, this new process integration scheme allows the stacking of both conventional boards with SMDs not available at wafer level together with rebuilt wafers made of known good dies. WDoDTM technology has been successfully used with different kind of products in the defense and medical markets. A calculator node including a 484 I/O FPGA with 2 mDDR and an EEPROM in addition to more than 150 decoupling capacitors was manufactured and is exhibiting better electrical performance when compared to the 2 dimensions version. Moreover, a medical implant has been successfully developed embedding 2 ASICS and several PICS capacitors allowing an 8 times shrink of the electronics compared to advance lead based pacemakers.. With this new technology, 3D PLUS is highlighting the way to highly integrated System in Package (SiP) and demonstrates its know-how in the three dimensional integration.

Advanced 3D eWLB-SiP (embedded Wafer Level Ball Grid Array – System in Package) Technology

2017 ◽  
Vol 2017 (DPC) ◽  
pp. 1-20
Author(s):  
Seung Wook Yoon
Keyword(s):  
Form Factor ◽  
Power Efficiency ◽  
High Performance ◽  
Electrical Characterization ◽  
Cost Effective ◽  
Electrical Performance ◽  
Wearable Electronics ◽  
Wafer Level ◽  
Low Profile ◽  
Line Spacing

FO-WLP (Fan-Out Wafer Level Packaging) has been established as one of the most versatile packaging technologies in the recent past and is already accounting for a market value of over 1 billion USD due to its unique advantages. The technology combines high performance, increased functionality with a high potential for heterogeneous integration and reduce the total form factor as well as cost-effectiveness. The emerging of advanced of silicon node technology down to 10 nanometer (nm) in support of higher performance, bandwidth and better power efficiency in mobile products pushes the boundaries of emerging packaging technologies to smaller form-factor packaging designs with finer line/spacing as well as improved thermal electrical/performance and integration of SiP or 3D capabilities. Advanced eWLB FO-WLP technology provides a versatile platform for the semiconductor industry's technology evolution from single or multi-die 2D package designs to 2.5D interposers and 3D System-in-Package (SiP) configurations. This paper reports developments that extend multi-die and 3D SiP applications with eWLB technology, including ultra thin devices or/and with an interposer substrate attachment. Test vehicles have been designed and fabricated to demonstrate and characterize integrated packaging solutions for network, mobile products including IoT and wearable electronics. The test vehicles have ranged from ~30mm2 to large sizes up to ~230mm2 and 0.4mm ball pitch. Assembly process details including 3D vertical interconnect, laser ablation, RDL processes and mechanical reliability characterizations are to be discussed with component and board level reliability results. In addition, warpage behavior and the PoP stacking process will also be presented. Innovative structure optimization that provides dual advantages of both height reduction and enhanced package reliability are reported. To enable higher interconnection density and signal routing, packages with multiple redistribution layers (RDL) and fine line/width spacing are fabricated and implemented on the eWLB platform. Successful reliability and electrical characterization results on multi-die and 3D eWLB-SiP configurations are reported as an enabling technology for highly integrated, miniaturized, low profile and cost effective solutions.

Investigation of Dual Electrical Paths for Off-Chip Compliant Interconnects

2013 ◽  
Vol 135 (3) ◽  
Author(s):  
Raphael Okereke ◽  
Karan Kacker ◽  
Suresh K. Sitaraman
Keyword(s):  
Cost Effective ◽  
Wafer Level ◽  
Mechanical Compliance ◽  
Interconnect Design ◽  
Compliant Interconnect ◽  
Thermomechanical Reliability ◽  
Interconnect Technology ◽  
Low K ◽  
Level Process

This paper presents a study on a dual-path compliant interconnect design which attempts to improve the balance between mechanical compliance and electrical parasitics by using multiple electrical paths in place of a single electrical path. The high compliance of the parallel-path compliant interconnect structure will ensure the reliability of low-K dies. Implementation of this interconnect technology can be cost effective by using a wafer-level process and by eliminating the underfill process. Although an underfill is not required for thermomechanical reliability purposes, an underfill may be used for reducing contamination and oxidation of the interconnects and also to provide additional rigidity against mechanical loads. Therefore, this paper also examines the role of an underfill on the thermomechanical reliability of a dual-path compliant interconnect.

Cost-effective process integration for a high performance 0.5 μm CMOS logic device

2002 ◽  
Author(s):  
Young-Wug Kim ◽  
Yongsik Kim ◽  
Chang-Bong Oh ◽  
Bong-Seok Kim ◽  
Jong Shik Yoon ◽  
...  
Keyword(s):  
High Performance ◽  
Process Integration ◽  
Cost Effective ◽  
Logic Device

Epitaxial and Non-Epitaxial Heterogeneous Integration Technologies at NGST

2008 ◽  
Vol 1068 ◽  
Author(s):  
Augusto Gutierrez-Aitken ◽  
Patty Chang-Chien ◽  
Bert Oyama ◽  
Kelly Tornquist ◽  
Khanh Thai ◽  
...  
Keyword(s):  
High Performance ◽  
Cost Effective ◽  
Heterogeneous Integration ◽  
Space Technology ◽  
Wafer Level ◽  
Selective Epitaxial Growth ◽  
Wafer Level Packaging ◽  
Design Flexibility ◽  
Systems Requirements ◽  
And Performance

ABSTRACTTo meet increasingly challenging and complex systems requirements, it is not enough to use one single semiconductor technology but to integrate several high performance technologies in an efficient and cost effective way. Heterogeneous integration (HI) approaches lead to a significant higher design flexibility and performance. In this paper we present some of the HI approaches that are being used and developed at Northrop Grumman Space Technology (NGST) that include selective epitaxial growth, metamorphic growth and wafer level packaging (WLP) technology. More recently we are developing a scaled and selective wafer packaging technique to integrate III-V semiconductors with silicon under the COSMOS DARPA program.

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