scholarly journals Error-Tolerant Reconfigurable VDD 10T SRAM Architecture for IoT Applications

Electronics ◽  
2021 ◽  
Vol 10 (14) ◽  
pp. 1718
Author(s):  
Neha Gupta ◽  
Ambika Prasad Shah ◽  
Sajid Khan ◽  
Santosh Kumar Vishvakarma ◽  
Michael Waltl ◽  
...  
Keyword(s):  
Power Dissipation ◽  
Supply Voltage ◽  
Leakage Power ◽  
Functional Improvement ◽  
Scaling Technique ◽  
Iot Applications ◽  
Sram Cell ◽  
Improved Stability ◽  
Supply Voltage Scaling ◽  
Power Delay Product

This paper proposes an error-tolerant reconfigurable VDD (R-VDD) scaled SRAM architecture, which significantly reduces the read and hold power using the supply voltage scaling technique. The data-dependent low-power 10T (D2LP10T) SRAM cell is used for the R-VDD scaled architecture with the improved stability and lower power consumption. The R-VDD scaled SRAM architecture is developed to avoid unessential read and hold power using VDD scaling. In this work, the cells are implemented and analyzed considering a technologically relevant 65 nm CMOS node. We analyze the failure probability during read, write, and hold mode, which shows that the proposed D2LP10T cell exhibits the lowest failure rate compared to other existing cells. Furthermore, the D2LP10T cell design offers 1.66×, 4.0×, and 1.15× higher write, read, and hold stability, respectively, as compared to the 6T cell. Moreover, leakage power, write power-delay-product (PDP), and read PDP has been reduced by 89.96%, 80.52%, and 59.80%, respectively, compared to the 6T SRAM cell at 0.4 V supply voltage. The functional improvement becomes even more apparent when the quality factor (QF) is evaluated, which is 458× higher for the proposed design than the 6T SRAM cell at 0.4 V supply voltage. A significant improvement of power dissipation, i.e., 46.07% and 74.55%, can also be observed for the R-VDD scaled architecture compared to the conventional array for the respective read and hold operation at 0.4 V supply voltage.

scholarly journals Comprehensive Analysis of SRAM Cell Architectures With 18nm FinFET for Low Power Applications

2021 ◽  
Author(s):  
T. Santosh Kumar ◽  
Suman Lata Tripathi
Keyword(s):  
Power Consumption ◽  
Low Power ◽  
Power Dissipation ◽  
Supply Voltage ◽  
Reduction Technique ◽  
Leakage Currents ◽  
Leakage Reduction ◽  
Sram Cell ◽  
Supply Voltage Scaling ◽  
Better Than

Abstract The SRAM cells are used in many applications where power consumption will be the main constraint. The Conventional 6T SRAM cell has reduced stability and more power consumption when technology is scaled resulting in supply voltage scaling, so other alternative SRAM cells from 7T to 12T have been proposed which can address these problems. Here a low power 7T SRAM cell is suggested which has low power consumption and condensed leakage currents and power dissipation. The projected design has a leakage power of 5.31nW and leakage current of 7.58nA which is 84.9% less than the 7T SRAM cell without using the proposed leakage reduction technique and it is 22.4% better than 6T SRAM and 22.1% better than 8T SRAM cell when both use the same leakage reduction technique. The cell area of the 7T SRAM cell is 1.25µM2, 6T SRAM is 1.079µM2 and that of 8T SRAM is 1.28µM2all the results are simulated in cadence virtuoso using 18nm technology.

scholarly journals Robust 12T Sram Cell Using 45nm Technology

2020 ◽  
pp. 170-174
Author(s):  
N. Geetha Rani ◽  
N. Jyothi ◽  
P. Leelavathi ◽  
P. Deepthi Swarupa Rani ◽  
S. Reshma
Keyword(s):  
Power Consumption ◽  
Low Power ◽  
Power Supply ◽  
Power Dissipation ◽  
Supply Voltage ◽  
Leakage Power ◽  
Sram Cell ◽  
Static Power ◽  
Low Supply Voltage ◽  
Multi Core Processor

SRAM cells are used in many applications such as micro and multi core processor. SRAM cell improves both read stability and write ability at low supply voltage. The objective is to reduce the power dissipation of a novel low power 12T SRAM cell. This method removes half-select issue in 6T and 9T SRAM cell. This work proposes new functional low-power designs of SRAM cells with 6T, 9T and 12 transistors which operate at only 0.4V power supply in sub-threshold operation at 45 nm technology. The leakage power consumption of the proposed SRAM cell is thereby reduced compared to that of the conventional six-transistor (6T) SRAM cell. 12T cell obtains low static power dissipation.

scholarly journals Analysis On Power Gating Circuits Based Low Power VLSI Circuits (BCD Adder)

2021 ◽  
Vol 2089 (1) ◽  
pp. 012080
Author(s):  
M. Srinivas ◽  
K.V. Daya Sagar
Keyword(s):  
Energy Consumption ◽  
Low Power ◽  
Power Dissipation ◽  
Supply Voltage ◽  
Oxide Thickness ◽  
Cmos Technology ◽  
Digital Circuit ◽  
Leakage Power ◽  
Vlsi Circuits ◽  
Battery Life

Abstract Currently, energy consumption in the digital circuit is a key design parameter for emerging mobile products. The principal cause of the power dissipation during idle mode is leakage currents, which are rising dramatically. Sub-threshold leakage is increased by the scaling of threshold voltage when gate current leakage increases because oxide thickness is scaled. With rising demands for mobile devices, leakage energy consumption has received even greater attention. Since a mobile device spends most of its time in standby mode, leakage power savings need to prolong the battery life. That is why low power has become a significant factor in CMOS circuit design. The required design and simulation of an AND gate with the BSIM4 MOS parameter model at 27 0C, supply voltage of 0,70V with CMOS technology of 65nm are the validation of the suitability of the proposed circuit technology. AND simulation. The performance parameters for the two AND input gate are compared with the current MTCMOS and SCCMOS techniques, such as sub-threshold leakage power dissipations in active and standby modes, the dynamic dissipation, and propagation period. The proposed hybrid super cutoff complete stack technique compared to the current MTCMOS technology shows a reduction in sub-threshold dissipation power dissipation by 3. 50x and 1.15x in standby modes and active modes respectively. The hybrid surface-cutting technique also shows savings of 2,50 and 1,04 in power dissipation at the sub-threshold in standby modes and active modes compared with the existing SCCMOS Technique.

scholarly journals Comparative analysis of SRAM cell with leakage power reduction approaches

2018 ◽  
Vol 7 (2.7) ◽  
pp. 863
Author(s):  
Damarla Paradhasaradhi ◽  
Kollu Jaya Lakshmi ◽  
Yadavalli Harika ◽  
Busa Ravi Teja Sai ◽  
Golla Jayanth Krishna
Keyword(s):  
Low Power ◽  
Power Dissipation ◽  
Low Voltage ◽  
Power Saving ◽  
Vital Role ◽  
Power Reduction ◽  
Leakage Power ◽  
Access Time ◽  
Chip Area ◽  
Sram Cell

In deep sub-micron technologies, high number of transistors is mounted onto a small chip area where, SRAM plays a vital role and is considered as a major part in many VLSI ICs because of its large density of storage and very less access time. Due to the demand of low power applications the design of low power and low voltage memory is a demanding task. In these memories majority of power dissipation depends on leakage power. This paper analyzes the basic 6T SRAM cell operation. Here two different leakage power reduction approaches are introduced to apply for basic 6T SRAM. The performance analysis of basic SRAM cell, SRAM cell using drowsy-cache approach and SRAM cell using clamping diode are designed at 130nm using Mentor Graphics IC Studio tool. The proposed SRAM cell using clamping diode proves to be a better power reduction technique in terms of power as compared with others SRAM structures. At 3.3V, power saving by the proposed SRAM cell is 20% less than associated to basic 6T SRAM Cell.

Various Logically Optimized D Flip Flop Circuits-A Comparative Study in Submicron Technology

2015 ◽  
Vol 4 (2) ◽  
Author(s):  
Abhijit Asthana ◽  
Shyam Akashe
Keyword(s):  
Comparative Study ◽  
Power Dissipation ◽  
Leakage Power ◽  
Simulation Test ◽  
Flip Flop ◽  
Chip Area ◽  
Low Leakage ◽  
Signal Systems ◽  
To Come ◽  
Power Delay Product

D-Flip Flop (D_FF) is a very important component of various digital, analog and mixed signal systems and designs. It is obvious to come up with optimized D_FF, that cater the needs of low leakage power, less power dissipation, less chip area on the chip and low delays. This paper presents a comparative study of various logically optimized circuits of D_FF using 8T, 11T, 12T and conventional 18T D_FF. The simulation, test circuits, schematics & layouts etc are done on Cadence Virtuoso tool in 180 nm technology. Designs are compared on grounds of power dissipation, leakage power, delays and power delay product.

scholarly journals A Novel Design of Low-Power 1-Bit CMOS Full-Adder Cell using XNOR and MUX

2013 ◽  
Vol 7 (3) ◽  
pp. 1155-1165
Author(s):  
Dayadi Lakshmaiah ◽  
Dr. M.V. Subramanyam ◽  
Dr. K.Sathya Prasad
Keyword(s):  
Low Power ◽  
Threshold Voltage ◽  
Supply Voltage ◽  
Full Adder ◽  
High Threshold ◽  
Low Threshold ◽  
Supply Voltage Scaling ◽  
Critical Paths ◽  
Power Delay Product ◽  
Novel Design

This paper process a novel design for low power 1-bit CMOS full adder using XNOR and MUX, with reduced number of transistors using GDI cell. The circuits were simulated with supply voltage scaling from 1.2V to 0.6V &0.6V to 0.3V. To achieve the desired performance of power delay product, area, capacitance the transistors with low threshold voltage were used at critical paths and high threshold voltage at non critical paths. The results show the efficiency of the proposed technique in terms of power consumption, delay and area.

scholarly journals Estimation of Leakage Power and Delay in CMOS Circuits

2020 ◽  
Vol 4 (7) ◽  
pp. 14-19
Author(s):  
Mohasinul Huq N Md ◽  
Mohan Das S ◽  
Bilal N Md
Keyword(s):  
Power Dissipation ◽  
Supply Voltage ◽  
Full Adder ◽  
Cmos Technology ◽  
Propagation Delay ◽  
Leakage Power ◽  
Nand Gate ◽  
High Threshold ◽  
Cmos Circuits ◽  
Low Leakage

This paper presents an estimation of leakage power and delay for 1-bit Full Adder (FA)designed which is based on Leakage Control Transistor (LCT) NAND gates as basic building block. The main objective is to design low leakage full adder circuit with the help of low and high threshold transistors. The simulations for the designed circuits performed in cadence virtuoso tool with 45 nm CMOS technology at a supply voltage of 0.9 Volts. Further, analysis of effect of parametric variation on leakage current and propagation delay in CMOS circuits is performed. The saving in leakage power dissipation for LCT NAND_HVT gate is up to 72.33% and 45.64% when compared to basic NAND and LCT NAND gate. Similarly for 1-bit full adder the saving is up to 90.9% and 40.08% when compared to basic NAND FA and LCT NAND.

Design of a Bit-Interleaved Low Power 10T SRAM Cell with Enhanced Stability

2020 ◽  
pp. 2150142
Author(s):  
R. Manoj Kumar ◽  
P. V. Sridevi
Keyword(s):  
Low Power ◽  
Supply Voltage ◽  
Random Access ◽  
Leakage Power ◽  
High Threshold ◽  
Point Selection ◽  
Cross Point ◽  
Design Metrics ◽  
Fully Differential ◽  
Sram Cell

The technology is shrinking in recent days which leads to growing concerns related to various design metrics. Leakage power tends to grow with the array size as most of the Static Random Access Memory (SRAM) cells operate in standby mode. The data to be written into the SRAM become difficult as the supply voltage decreases. So, stability in write mode requires enhancement. As SRAM is used for the on-chip computations, the faster write operation is required. The half-select issue in SRAM design needs to be eliminated so that bit interleaving architecture can be employed for the SRAM array enabling the protection from soft errors. A new Proposed 10 Transistor Bit-Interleaved SRAM cell has been designed addressing the above concerns. Employment of high-threshold voltage devices in read path and absence of NMOS device in one of the inverters reduces leakage power. Cut-off switch enables faster write operation and enhanced write stability. Cross point selection in write mode eliminates the half-select issue observed by carrying 1000 Monte-Carlo simulations. It has lower leakage power while holding 0 compared to 8 Transistor, Fully Differential 8 Transistor and Write Assist Low Power 11 Transistor SRAM cells at the worst fast-fast process corner for 0.9 V supply voltage. Write 1 Power Delay Product is lower than 8 Transistor, Fully Differential 8 Transistor and Write Assist Low Power 11 Transistor SRAM cells at slow-slow corner at 0.9V supply voltage. All the design metrics have been evaluated by performing post-layout simulation in Cadence Virtuoso in 45-nm technology.

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