Wafer Level Integration of MMIC and Microwave IPD with Metal/BCB Multilayer Interconnection Based on Low Resistance Silicon

2011 ◽  
Vol 2011 (1) ◽  
pp. 001067-001073
Author(s):  
Jiajie Tang ◽  
Le Luo
Keyword(s):  
Silicon Wafer ◽  
Integrated Circuit ◽  
Performance Test ◽  
Low Cost ◽  
Cost Effective ◽  
Film Deposition ◽  
Thermal Dissipation ◽  
Shielding Effect ◽  
Wafer Level ◽  
Expansion Matching

A new high-density wafer-level integration of a GaAs based monolithic microwave integrated circuit (MMIC) chip and a microwave integrated passive device (IPD) is presented. This integration technology, an important and IC-compatible option for system-in-package (SiP), utilizes bulk Si fabrication and film deposition based multichip module (MCM-D) process. MMIC is entirely embedded into the silicon wafer while IPDs are integrated on the dielectric layers simultaneously with the metal/BCB multilayer interconnection. Key fabrication processes and crucial technologies are described in detail. Normal silicon wafer is selected as substrate because of its mature processing technology, low cost, good thermal dissipation as well as its thermal expansion matching with GaAs. To obtain excellent microwave performances and good planarization, thick photosensitive BCB of 25um/layer is adopted as dielectric and thus the use of tapered via that is hollow inside or filled by BCB is a cost-effective way to accomplish inter-layer connection instead of Au bump bonding or column used in dry-etch BCB process. Further promotions on microwave performances are achieved by the shielding effect through ground layer coverage on silicon surface and the application of microstrip lines. Several experiment results such as dc inter-layer connection resistance and thermal resistance measurements are complemented to investigate the characteristic of the whole package. The Microwave properties of the integration sample are measured by transmission performance test from 15GHz to 30GHz. The measurement results are analyzed and discussed comparing with the theoretical or simulation results.

Through Silicon Via Technology: Cost effective Cu-TSV Interconnects by EMC3D and Technical Challenges with Cu-TSV

2010 ◽  
Vol 2010 (DPC) ◽  
pp. 000425-000445
Author(s):  
Paul Siblerud ◽  
Rozalia Beica ◽  
Bioh Kim ◽  
Erik Young
Keyword(s):  
Low Cost ◽  
Cost Effective ◽  
High Yield ◽  
Integrated Process ◽  
Wafer Level ◽  
Through Silicon Via ◽  
Wafer Level Packaging ◽  
Current State ◽  
Future Technologies ◽  
Ic Technology

The development of IC technology is driven by the need to increase performance and functionality while reducing size, power and cost. The continuous pressure to meet those requirements has created innovative, small, cost-effective 3-D packaging technologies. 3-D packaging can offer significant advantages in performance, functionality and form factor for future technologies. Breakthrough in wafer level packaging using through silicon via technology has proven to be technologically beneficial. Integration of several key and challenging process steps with a high yield and low cost is key to the general adoption of the technology. This paper will outline the breakthroughs in cost associated with an iTSV or Via-Mid structure in a integrated process flow. Key process technologies enabling 3-D chip:Via formationInsulator, barrier and seed depositionCopper filling (plating),CMPWafer thinningDie to Wafer/chip alignment, bonding and dicing This presentation will investigate these techniques that require interdisciplinary coordination and integration that previously have not been practiced. We will review the current state of 3-D interconnects and the of a cost effective Via-first TSV integrated process.

Wafer Level Assembly Technique Development for Fine Pitch Flip Chip 3D Die-to-Wafer Integration

2010 ◽  
Vol 2010 (1) ◽  
pp. 000548-000553
Author(s):  
Zhaozhi Li ◽  
Brian J. Lewis ◽  
Paul N. Houston ◽  
Daniel F. Baldwin ◽  
Eugene A. Stout ◽  
...  
Keyword(s):  
Flip Chip ◽  
Low Cost ◽  
Three Dimensional ◽  
Cost Effective ◽  
Market Demand ◽  
Wafer Level ◽  
Packaging Technology ◽  
Fine Pitch ◽  
3D Packaging ◽  
Assembly Technique

Three Dimensional (3D) Packaging has become an industry obsession as the market demand continues to grow toward higher packaging densities and smaller form factor. In the meanwhile, the 3D die-to-wafer (D2W) packaging structure is gaining popularity due to its high manufacturing throughput and low cost per package. In this paper, the development of the assembly process for a 3D die-to-wafer packaging technology, that leverages the wafer level assembly technique and flip chip process, is introduced. Research efforts were focused on the high-density flip chip wafer level assembly techniques, as well as the challenges, innovations and solutions associated with this type of 3D packaging technology. Processing challenges and innovations addressed include flip chip fluxing methods for very fine-pitch and small bump sizes; wafer level flip chip assembly program creation and yield improvements; and set up of the Pb-free reflow profile for the assembled wafer. 100% yield was achieved on the test vehicle wafer that has totally 1,876 flip chip dies assembled on it. This work has demonstrated that the flip chip 3D die-to-wafer packaging architecture can be processed with robust yield and high manufacturing throughput, and thus to be a cost effective, rapid time to market alternative to emerging 3D wafer level integration methodologies.

scholarly journals Fan-Out Wafer and Panel Level Packaging as Packaging Platform for Heterogeneous Integration

Micromachines ◽  
2019 ◽  
Vol 10 (5) ◽  
pp. 342 ◽  
Author(s):  
Tanja Braun ◽  
Karl-Friedrich Becker ◽  
Ole Hoelck ◽  
Steve Voges ◽  
Ruben Kahle ◽  
...  
Keyword(s):  
Integrated Circuit ◽  
Low Cost ◽  
Form Factors ◽  
Heterogeneous Integration ◽  
Passive Component ◽  
Wafer Level ◽  
Large Area ◽  
Component Integration ◽  
Application Specific Integrated Circuit ◽  
Power Management Unit

Fan-out wafer level packaging (FOWLP) is one of the latest packaging trends in microelectronics. Besides technology developments towards heterogeneous integration, including multiple die packaging, passive component integration in packages and redistribution layers or package-on-package approaches, larger substrate formats are also targeted. Manufacturing is currently done on a wafer level of up to 12”/300 mm and 330 mm respectively. For a higher productivity and, consequently, lower costs, larger form factors are introduced. Instead of following the wafer level roadmaps to 450 mm, panel level packaging (PLP) might be the next big step. Both technology approaches offer a lot of opportunities as high miniaturization and are well suited for heterogeneous integration. Hence, FOWLP and PLP are well suited for the packaging of a highly miniaturized energy harvester system consisting of a piezo-based harvester, a power management unit and a supercapacitor for energy storage. In this study, the FOWLP and PLP approaches have been chosen for an application-specific integrated circuit (ASIC) package development with integrated SMD (surface mount device) capacitors. The process developments and the successful overall proof of concept for the packaging approach have been done on a 200 mm wafer size. In a second step, the technology was scaled up to a 457 × 305 mm2 panel size using the same materials, equipment and process flow, demonstrating the low cost and large area capabilities of the approach.

scholarly journals Fabrication of Multiscale-Structure Wafer-Level Microlens Array Mold

2019 ◽  
Vol 9 (3) ◽  
pp. 487 ◽  
Author(s):  
Shuping Xie ◽  
Xinjun Wan ◽  
Xiaoxiao Wei
Keyword(s):  
Low Cost ◽  
Form Factors ◽  
Cost Effective ◽  
Microlens Array ◽  
Practical Method ◽  
Reduced Form ◽  
Wafer Level ◽  
Polycrystalline Aluminum ◽  
Microlens Arrays ◽  
Multiscale Structure

The design and manufacture of cost-effective miniaturized optics at wafer level, usingadvanced semiconductor-like techniques, enables the production of reduced form-factor cameramodules for optical devices. However, suppressing the Fresnel reflection of wafer-level microlensesis a major challenge. Moth-eye nanostructures not only satisfy the antireflection requirementof microlens arrays, but also overcome the problem of coating fracture. This novel fabricationprocess, based on a precision wafer-level microlens array mold, is designed to meet the demandfor small form factors, high resolution, and cost effectiveness. In this study, three different kinds ofaluminum material, namely 6061-T6 aluminum alloy, high-purity polycrystalline aluminum, and purenanocrystalline aluminum were used to fabricate microlens array molds with uniform nanostructures.Of these three materials, the pure nanocrystalline aluminum microlens array mold exhibited auniform nanostructure and met the optical requirements. This study lays a solid foundation for theindustrial acceptation of novel and functional multiscale-structure wafer-level microlens arrays andprovides a practical method for the low-cost manufacture of large, high-quality wafer-level molds.

A Lithography-Based Compliant Chip-to-Substrate Wafer-Level Interconnect

2002 ◽  
Author(s):  
Qi Zhu ◽  
Lunyu Ma ◽  
Suresh K. Sitaraman
Keyword(s):  
High Performance ◽  
Coefficient Of Thermal Expansion ◽  
Low Cost ◽  
Optimization Technique ◽  
Cost Effective ◽  
Organic Substrate ◽  
Electrical Performance ◽  
Wafer Level ◽  
Good Reliability ◽  
Mechanical Compliance

As the rapid advances in IC design and fabrication continue to challenge and push the electronic packaging technology, in terms of fine pitch, high performance, low cost, and good reliability, compliant interconnects show great advantages for next-generation packaging. β-fly is designed as a compliant chip-to-substrate interconnect for performing wafer-level probing and for packaging without underfill. β-fly has good compliance in all directions to compensate the coefficient of thermal expansion (CTE) mismatch between the silicon die and an organic substrate. The fabrication of β-fly is similar to standard IC fabrication, and wafer-level packaging makes it cost effective. In this work, self-weight effect and stress distribution under planar displacement loading of β-fly is studied. The effect of geometry parameters on mechanical and electrical performance of β-fly is also studied. β-fly with thinner and narrower arcuate beams with larger radius and taller post is found to have better mechanical compliance. In addition to mechanical compliance, electrical characteristics of β-fly have also been studied in this work. However, it is found that structures with excellent mechanical compliance cannot have good electrical performance. Therefore, a trade off is needed for the design of β-fly. Response surface methodology and an optimization technique have been used to select the optimal β-fly structure parameters.

Thin Film Packaging Reinforcement for Overmolded MEMS

2010 ◽  
Vol 2010 (DPC) ◽  
pp. 001095-001119
Author(s):  
Gillot Charlotte ◽  
Jean-Louis Pornin ◽  
Christophe Billard ◽  
Emannuelle Lagoute ◽  
Mihel Pellat ◽  
...  
Keyword(s):  
Thin Film ◽  
Flip Chip ◽  
Low Cost ◽  
Short Circuit ◽  
Cost Effective ◽  
Wafer Level ◽  
Silicon Area ◽  
Mechanical Constraints ◽  
Test Card ◽  
Manufacturing Technologies

Thin Film packaging (TFP) is now well known at CEA/LETI and mainly used as a protection for MEMS against degradation which can occur during back end processes: TFP is strong enough to endure the mechanical constraints due to grinding, handling and protects the device from water during the sawing step. Our TFP process is also compatible with under bump metallisation, balling and flip chip processes. The main advantages of our TFP is a very low lost of silicon area, a low cost process with 3 mask levels, and is performed on equipments commonly used in IC fab. In this paper we will speek about process improvement for a TFP overmolded. The thermo-mechanical constraints due to the standard overmolding step (100 bars and 200°C) are much more challenging for TFP: the cavity is about 5 μm high, the cap layer 2μm thick and the polymer plugging layer 6μm thick. So TFP needs to be reinforced to withstand these high constraints. Two processes using conventional IC manufacturing technologies have been developed at wafer level with two materials. 200μm and 500μm wide cavities with TFP were reinforced with these processes and first tested under pneumatically pressure at room temperature: in case of contact between the cap and the substrate, a short circuit is measured between one electrode on the substrate and another electrode behind the cap. Then, the same devices were overmolded at 75 bars and 100 bars at 185°C. In the same run, BAW resonators with TFP and one type of reinforcement were overmolded at 100 bars. The electrical performances of these resonators after overmolding fit very well to the modelling of the test card and are very good. This Compatibility between TFP and overmolding constraints could be a cost effective solution in MEMS packaging.

300mm Large Scale eWLB(embedded Wafer Level BGA) : Cost Effective Solution with Performance

2011 ◽  
Vol 2011 (DPC) ◽  
pp. 001046-001070
Author(s):  
Seung Wook Yoon ◽  
Yaojian Lin ◽  
Pandi C. Marimuthu ◽  
Yeong J. Lee
Keyword(s):  
Large Scale ◽  
Low Cost ◽  
Cost Effective ◽  
Batch Process ◽  
Dielectric Materials ◽  
Design Parameters ◽  
Wafer Level ◽  
Molding Compound ◽  
Package Size ◽  
Chip Size

Demand for Wafer Level Package (WLP) is being driven by the need to shrink package size and height, simplify the supply chain and provide a lower overall cost by using the infrastructure of a batch process. The increasing demand for new and more advanced electronic products with smaller form factor, superior functionality and performance is driving the integration of functionality into the third dimension. There are some restrictions in possible applications for fan-in WLPs since global chip trends tend toward smaller chip areas with an increasing number of interconnects. The shrinkage of the pitches and pads at the chip to package interface is happening much faster than the shrinkage at the package to board interface. This interconnection gap requires fan-out packaging, where the package size is larger than the chip size in order to provide a sufficient area to accommodate the 2nd level interconnects. eWLB is a type of fan-out WLP that has the potential to realize any number of interconnects with standard pitches at any shrink stage of the wafer node technology. 200mm eWLB is in HVM from industry last three years and there was need to move 300mm for scaling-up and low-cost solutions. This paper will highlight some of the recent advancements in large scale 300mm eWLB development. Compared to 200mm case, 300mm has more warpage and process issues due to its area increase. Thermo-mechanical simulation shows 100~150% more warpage with 300mm compared to 200mm. So various design parameters were studied to optimized warpage, such as dielectric materials and thickness, molding compound thickness etc. This paper presents study of process optimization for 300mm eWLB and mechanical characterization, reliability data including component/board level, challenges encountered and overcome, and future steps of scalability for higher throughput and manufacturability.

Mechanical and Electrical Study of Linear Spring and J-Spring

2002 ◽  
Author(s):  
Lunyu Ma ◽  
Qi Zhu ◽  
Suresh K. Sitaraman
Keyword(s):  
Integrated Circuit ◽  
Numerical Models ◽  
Low Cost ◽  
Stress Gradient ◽  
Electrical Characteristics ◽  
Wafer Level ◽  
Technology Roadmap ◽  
Linear Spring ◽  
Compliant Interconnect ◽  
Institute Of Technology

The integrated circuit (IC) fabrication technology continues to push the limits of microelectronics packaging technologies. Today millions of transistors can be fabricated in a chip of about 1 cm × 1 cm in size, and the required I/O density is about 1600/cm2. Although tremendous advances have been made in die to substrate interconnect technologies as well as substrate/PWB technologies, these advances have not kept pace with advances in semiconductor technology, and therefore, continue to be a bottleneck for further advances in semiconductor technologies. In addition to fabrication constraints, low cost and reliability are other requirements that affect interconnect development. Wafer-level Packaging (WLP) is an effective solution to address some of these issues. A compliant interconnect, called “J-Spring”, has been proposed and developed at Georgia Institute of Technology. Although based on the same concept of inherent stress-gradient used in the linear spring, the J-Spring will provide greater in-plane compliance. These compliant interconnects can be fabricated in batch at wafer level and the pitch can be as low as 30 μm. The fine pitch can meet and exceed the requirements of International Technology Roadmap for Semiconductor (ITRS) for 2011 [ITRS, 2001] and beyond. J-Springs with different radius, angle, width, and release length have been fabricated on a test wafer. Numerical model has been created to determine the release height based on J-Spring geometry and stress gradients. Also, the compliance of J-Spring has been determined in three orthogonal directions using parametric numerical models. The compliance of J-Spring is compared with the compliance of the linear spring. The proposed compliant interconnects can accommodate the differential displacement due to CTE mismatch between the die and the substrate. In addition, to their mechanical characteristics, their electrical characteristics have been studied as well. The electrical characteristics are dependent on the geometry, dimensions and the materials used.

Advances in the Fabrication Processes and Applications of Wafer Level Packaging

2014 ◽  
Vol 136 (2) ◽  
Author(s):  
Peisheng Liu ◽  
Jinlan Wang ◽  
Liangyu Tong ◽  
Yujuan Tao
Keyword(s):  
Integrated Circuit ◽  
Microelectromechanical Systems ◽  
Low Cost ◽  
Electrical Performance ◽  
Wafer Level ◽  
Wafer Level Packaging ◽  
3D Packaging ◽  
Circuit Fabrication ◽  
Fast Development ◽  
Small Form Factor

Fast development of wafer level packaging (WLP) in recent years is mainly owing to the advances in integrated circuit fabrication process and the market demands for devices with high electrical performance, small form factor, low cost etc. This paper reviews the advances of WLP technology in recent years. An overall introduction to WLP is presented in the first part. The fabrication processes of WLP and redistribution technology are introduced in the second part. Reliability problems of WLPs, such as the strength of solder joints and reliability problems concerning fan-out WLPs are introduced in the third part. Typical applications of WLP technologies are discussed in the last part, which include the application of fan-out WLP, 3D packaging integrating with WLP technologies and its application in microelectromechanical systems (MEMS).

ChipletT, A Cost-Effective, High Reliability, Embedded Die Fan-Out Package Based on Multilayer Flex Laminate with Enhanced Thermal Performance

2012 ◽  
Vol 2012 (DPC) ◽  
pp. 1-32
Author(s):  
Senthil Sivaswamy ◽  
Theodore (Ted) G. Tessier ◽  
Tony Curtis ◽  
David Clark ◽  
Kazuhisa Itoi ◽  
...  
Keyword(s):  
Thermal Performance ◽  
High Reliability ◽  
Low Cost ◽  
Cost Effective ◽  
Polymer Processing ◽  
Wafer Level ◽  
Component Level ◽  
Novel Approach ◽  
Reliability Performance ◽  
Board Level

Fan-Out Wafer Level Packaging (FO-WLP) technology has been developed in recent years to overcome the limitations of Fan-in WLP (FI-WLP) packages and to add more functionality to WLP. Fan-Out packages expand the WLP market to higher pin count devices and add multiple die System in Package (SiP) capability. In this paper, a novel approach to low cost fan-out packaging based on polyimide flex circuits and wafer level Embedded Die Customization (EDC) is discussed. ChipletT refers to Fan-Out packaging. ChipsetT refers to System in Package developed with WABE (Wafer and Board Level Embedding) technology. WABE technology is based on co-lamination of multi layer polyimide flex wiring and conductive z-axis sintered metal interconnections. Using WABE technology, ultra thin fan-out packages (0.4mm) can be fabricated with lower processing costs, higher throughput and with 3D extendibility. Embedded Die Customization is performed at the wafer level and involves optimization of the die-to-embedding process by using optimized wafer level processing capabilities including polymer processing, copper plating and wafer thinning. Reliability of the ChipletT packages, both component level and board level is evaluated. ChipletT packages show high reliability in component level testing and board level testing (Thermal Cycling and Drop Testing). The thermal performance of ChipletT packages were also evaluated in this study. Thermal resistance parameters θja and θjc were simulated with and without thermal vias for both face up and face down configurations. ChipletT provides a new low cost fan out packaging option with proven component level and board level reliability performance.

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